Abstract

We have observed intense extreme-ultraviolet emission, within the 10–16-nm-wavelength range, emitted by a xenon capillary discharge plasma. Within a 0.3-nm bandwidth centered at 13.5  nm the axial emission intensity was comparable with that from the brightest laser-produced plasma sources, and a similar intensity was measured at approximately 11.3  nm. This source could thus be suitable for extreme-ultraviolet imaging applications, such as extreme-ultraviolet lithography.

© 1998 Optical Society of America

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