Abstract

We have observed intense extreme-ultraviolet emission, within the 10–16-nm-wavelength range, emitted by a xenon capillary discharge plasma. Within a 0.3-nm bandwidth centered at 13.5  nm the axial emission intensity was comparable with that from the brightest laser-produced plasma sources, and a similar intensity was measured at approximately 11.3  nm. This source could thus be suitable for extreme-ultraviolet imaging applications, such as extreme-ultraviolet lithography.

© 1998 Optical Society of America

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1998

G. Kubiak, L. Bernardez, and K. Krenz, Proc. SPIE 3331, 81–89 (1998).
[CrossRef]

1997

A. Hawryluk, N. Ceglio, and D. Markle, Microlithogr. World 6, 17 (1997).

M. Klosner, H. Bender, W. Silfvast, and J. Rocca, Opt. Lett. 22, 34 (1997).
[CrossRef] [PubMed]

1995

1993

1983

Alford, C.

Bender, H.

Bernardez, L.

G. Kubiak, L. Bernardez, and K. Krenz, Proc. SPIE 3331, 81–89 (1998).
[CrossRef]

Bionta, R.

Blackburn, J.

Bowyer, S.

Carroll, P.

Ceglio, N.

A. Hawryluk, N. Ceglio, and D. Markle, Microlithogr. World 6, 17 (1997).

Cerjan, C.

R. Spitzer, R. Kauffman, T. Orzechowski, D. Phillion, and C. Cerjan, in Soft-X-Ray Projection Lithography, A. Hawryluk and R. Stulen, eds., Vol. 18 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1993), pp. 142–145.

Costello, J.

Gullikson, E.

Hawryluk, A.

A. Hawryluk, N. Ceglio, and D. Markle, Microlithogr. World 6, 17 (1997).

Hunter, J.

P. Rockett, J. Hunter, G. Kubiak, K. Krenz, H. Shields, and M. Powers, in Extreme Ultraviolet Lithography, F. Zernike and D. Atwood, eds., Vol. 23 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1995), pp. 255–259.

Kauffman, R.

R. Kauffman, D. Phillion, and R. Spitzer, Appl. Opt. 32, 6896 (1993).
[CrossRef]

R. Spitzer, R. Kauffman, T. Orzechowski, D. Phillion, and C. Cerjan, in Soft-X-Ray Projection Lithography, A. Hawryluk and R. Stulen, eds., Vol. 18 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1993), pp. 142–145.

Kaufman, V.

Klosner, M.

Kortright, J.

Krenz, K.

G. Kubiak, L. Bernardez, and K. Krenz, Proc. SPIE 3331, 81–89 (1998).
[CrossRef]

P. Rockett, J. Hunter, G. Kubiak, K. Krenz, H. Shields, and M. Powers, in Extreme Ultraviolet Lithography, F. Zernike and D. Atwood, eds., Vol. 23 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1995), pp. 255–259.

Kubiak, G.

G. Kubiak, L. Bernardez, and K. Krenz, Proc. SPIE 3331, 81–89 (1998).
[CrossRef]

P. Rockett, J. Hunter, G. Kubiak, K. Krenz, H. Shields, and M. Powers, in Extreme Ultraviolet Lithography, F. Zernike and D. Atwood, eds., Vol. 23 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1995), pp. 255–259.

MacDowell, A.

Makowieki, D.

Markle, D.

A. Hawryluk, N. Ceglio, and D. Markle, Microlithogr. World 6, 17 (1997).

McGeoch, M.

M. McGeoch, in Extreme Ultraviolet Lithography, G. Kubiak and D. Kania, eds., Vol. 4 of Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 1996), pp. 84–88.

Murphy, J.

O’Sullivan, G.

Orzechowski, T.

R. Spitzer, R. Kauffman, T. Orzechowski, D. Phillion, and C. Cerjan, in Soft-X-Ray Projection Lithography, A. Hawryluk and R. Stulen, eds., Vol. 18 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1993), pp. 142–145.

Phillion, D.

R. Kauffman, D. Phillion, and R. Spitzer, Appl. Opt. 32, 6896 (1993).
[CrossRef]

R. Spitzer, R. Kauffman, T. Orzechowski, D. Phillion, and C. Cerjan, in Soft-X-Ray Projection Lithography, A. Hawryluk and R. Stulen, eds., Vol. 18 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1993), pp. 142–145.

Powers, M.

P. Rockett, J. Hunter, G. Kubiak, K. Krenz, H. Shields, and M. Powers, in Extreme Ultraviolet Lithography, F. Zernike and D. Atwood, eds., Vol. 23 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1995), pp. 255–259.

Rocca, J.

Rockett, P.

P. Rockett, J. Hunter, G. Kubiak, K. Krenz, H. Shields, and M. Powers, in Extreme Ultraviolet Lithography, F. Zernike and D. Atwood, eds., Vol. 23 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1995), pp. 255–259.

Rosen, R.

Shields, H.

P. Rockett, J. Hunter, G. Kubiak, K. Krenz, H. Shields, and M. Powers, in Extreme Ultraviolet Lithography, F. Zernike and D. Atwood, eds., Vol. 23 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1995), pp. 255–259.

Silfvast, W.

Skulina, K.

Soufli, R.

Spitzer, R.

R. Kauffman, D. Phillion, and R. Spitzer, Appl. Opt. 32, 6896 (1993).
[CrossRef]

R. Spitzer, R. Kauffman, T. Orzechowski, D. Phillion, and C. Cerjan, in Soft-X-Ray Projection Lithography, A. Hawryluk and R. Stulen, eds., Vol. 18 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1993), pp. 142–145.

Stearns, D.

Sugar, J.

Tech, J.

Underwood, J.

K. Skulina, C. Alford, R. Bionta, D. Makowieki, E. Gullikson, R. Soufli, J. Kortright, and J. Underwood, Appl. Opt. 34, 3727 (1995).
[CrossRef] [PubMed]

J. Underwood, in Extreme Ultraviolet Lithography, G. Kubiak and D. Kania, eds., Vol. 4 of Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 1996), pp. 162–166.

Vernon, S.

White, D.

Wood, O.

Appl. Opt.

J. Opt. Soc. Am.

Microlithogr. World

A. Hawryluk, N. Ceglio, and D. Markle, Microlithogr. World 6, 17 (1997).

Opt. Lett.

Proc. SPIE

G. Kubiak, L. Bernardez, and K. Krenz, Proc. SPIE 3331, 81–89 (1998).
[CrossRef]

Other

M. McGeoch, in Extreme Ultraviolet Lithography, G. Kubiak and D. Kania, eds., Vol. 4 of Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 1996), pp. 84–88.

P. Rockett, J. Hunter, G. Kubiak, K. Krenz, H. Shields, and M. Powers, in Extreme Ultraviolet Lithography, F. Zernike and D. Atwood, eds., Vol. 23 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1995), pp. 255–259.

L. Thompson, C. Wilson, and M. Bowden, eds., Introduction to Microlithography, 2nd ed. (American Chemical Society, Washington, D.C., 1994), Chap. 2.

J. Underwood, in Extreme Ultraviolet Lithography, G. Kubiak and D. Kania, eds., Vol. 4 of Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 1996), pp. 162–166.

R. Spitzer, R. Kauffman, T. Orzechowski, D. Phillion, and C. Cerjan, in Soft-X-Ray Projection Lithography, A. Hawryluk and R. Stulen, eds., Vol. 18 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1993), pp. 142–145.

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Figures (4)

Fig. 1
Fig. 1

Schematic diagram of the xenon capillary discharge device.

Fig. 2
Fig. 2

Lineout of EUV pinhole image recorded on axis. Emission flux was filtered by a 1µmthick beryllium foil.

Fig. 3
Fig. 3

Time-integrated axial emission spectrum. Xenon-ion stages contributing emission are indicated. Oxygen-contamination lines are also noted.

Fig. 4
Fig. 4

(a) Time-resolved EUV emission filtered by a 1µmthick beryllium filter and (b) current pulse.

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