Abstract

We etched thermally poled fused-silica coverslips in 49% HF for 30 s transverse to the poling direction to reveal structural details of the nonlinear region. A peaked ridge below the anode surface, corresponding to a slower etch rate than that of the bulk SiO<sub>2</sub> , was located ~5μm below the anode surface for a poling time of 30 s. The ridge moved deeper into the glass logarithmically with poling time. This trend is qualitatively consistent with a recent model for the formation of the space-charge region that includes injection of hydrogen ions at the anode surface.

© 1998 Optical Society of America

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