Abstract

Achieving a uniform fan-out energy distribution is critical to the successful applications of substrate guided-wave optical interconnects. Using Dupont photopolymer film HRF-600X001-20, we investigated the optimum recording beam intensity for obtaining a large dynamic region of diffraction efficiency relative to exposure dosage. Based on the experimental diffraction efficiency curve, 1-to-5 and 1-to-9 surface-normal fan-out devices were fabricated that operated at a wavelength of 850  nm, and output nonuniformities of ±4% and ±10% were obtained for the two devices.

© 1997 Optical Society of America

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