Abstract

We have extended the use of a dispersive white-light interferometer for absolute distance measurement to include effects of dielectric multilayer systems on the target. The phase of the reflected wave changes as a function of wavelength and layer thickness and causes errors in the interferometric distance measurement. With dispersive white-light interferometry these effects can be measured in situ, and the correct mechanical distance can be determined. The effects of thin films deposited upon the target have been investigated for one and two layers (photoresist and SiO2 upon Si). Experimental results show that the thicknesses of these layers can also be determined with an accuracy of the order of 10 nm.

© 1996 Optical Society of America

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