Abstract

We report the densification of fused silica as a function of exposure to pulsed 193-nm excimer-laser irradiation. Defining a dose as the number of pulses N times the square of fluence I per pulse, we find that densification follows a universal function of dose, a × (NI2)b, where a and b can vary somewhat according to glass preparation. Densification is measured with interferometry and birefringence, interpreted with a finite-element elastic model. Wave-front distortion for a typical photolithographic lens element in typical use conditions is described.

© 1996 Optical Society of America

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