Abstract

We present the design, fabrication, and characterization of a subwavelength-pulse-width spatially modulated diffractive array illuminator for an operating wavelength of 0.633 μm. Electromagnetic and scalar diffraction theories are used to reduce manufacturing difficulties while yielding high diffraction efficiency coupled with low reconstruction error. We employ direct electron beam writing and reactive ion etching to realize a transmission-type three-beam array illuminator in photoresist.

© 1996 Optical Society of America

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