Abstract

GeO2–SiO2 thin glass films were prepared by the rf sputtering deposition method. Changes in the refractive index of −3% and in the volume of 118% were induced in the film by irradiation with excimer-laser pulses. Bragg gratings a (periodic surface-relief pattern with a sinusoidal wave) have been written in the film by irradiation through a phase mask.

© 1996 Optical Society of America

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