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Image evaluation of the light-enhanced vaporization photolithographic process in As2S3 thin films

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Abstract

Photolithography by light-enhanced vaporization (LEV) of thin films of amorphous As2S3 is described. Diffraction gratings were produced by laser double-beam interference patterns recorded on the As2S3 thin film using the LEV process. The gratings were evaluated progressively during the recording, and the modulation transfer function of the process was obtained.

© 1978 Optical Society of America

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