Abstract

An investigation of the effects of ion-assisted deposition on the laser-induced damage threshold of thin-film polarizers has been carried out. It shows that the laser-induced damage threshold of polarizers with 50–100-eV oxygen-ion bombardment during deposition is improved considerably.

© 1994 Optical Society of America

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References

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  1. P. F. Gu, J. T. Tang, Proc. Soc. Photo-Opt. Instrum. Eng. 1158, 351 (1989).
  2. P. F. Gu, Y. M. Chen, X. Q. Hu, J. F. Tang, Appl. Opt. 28, 3318 (1989).
    [CrossRef] [PubMed]
  3. P. F. Gu, X. Liu, J. F. Tang, Appl. Opt. 32, 1528 (1993).
    [CrossRef] [PubMed]
  4. H. Kuser, J. Ebert, Natl. Bur. Stand. (U.S.) Spec. Publ. 568, 269 (1980).
  5. K. H. Guenther, Appl. Opt. 23, 3743 (1984).
    [CrossRef] [PubMed]

1993 (1)

1989 (2)

P. F. Gu, J. T. Tang, Proc. Soc. Photo-Opt. Instrum. Eng. 1158, 351 (1989).

P. F. Gu, Y. M. Chen, X. Q. Hu, J. F. Tang, Appl. Opt. 28, 3318 (1989).
[CrossRef] [PubMed]

1984 (1)

1980 (1)

H. Kuser, J. Ebert, Natl. Bur. Stand. (U.S.) Spec. Publ. 568, 269 (1980).

Appl. Opt. (3)

Natl. Bur. Stand. (U.S.) Spec. Publ. (1)

H. Kuser, J. Ebert, Natl. Bur. Stand. (U.S.) Spec. Publ. 568, 269 (1980).

Proc. Soc. Photo-Opt. Instrum. Eng. (1)

P. F. Gu, J. T. Tang, Proc. Soc. Photo-Opt. Instrum. Eng. 1158, 351 (1989).

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Figures (1)

Fig. 1
Fig. 1

Comparison of the damage thresholds of the polarizer: (a) without oxygen-ion-assisted deposition, (b) with ion energy of 50–100 eV, (c) with ion energy of 100–300 eV. The deposition conditions are oxygen pressure, 1.0–3.0 × 10−4 Torr; substrate temperature, 250–280 °C; evaporation rate, 0.2–0.6 nm/s; baking temperature, 350–400 °C.

Tables (3)

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Table 1 Summary of Experimental Conditions of the LIDT Test

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Table 2 Process Parameters of Factorial Design

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Table 3 Analysis of Experimental Results

Equations (1)

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G | n L ( H L ) 3 H 1 . 5 L ( H L ) 2 1 . 5 H ( L H ) 2 1 . 5 L ( H L ) 3 H m L | A ,

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