Abstract

The fabrication of an ion-exchanged waveguide beam deflector containing a photowritten grating is described. The planar waveguide was fabricated by thermal K+ exchange in a borosilicate glass. The grating was written by photobleaching an absorption defect centered at 330 nm, which was created by γ-ray irradiation of the glass. The bleaching was accomplished with the 351-nm line from an argon laser. The device achieved 35% deflection efficiency at 633 nm, which corresponded to a grating with a photoinduced index change of 2.6 × 10−5. This is to our knowledge the first demonstration of an ion-exchanged glass waveguide device containing a permanent photowritten grating.

© 1993 Optical Society of America

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