Abstract

Multilayer (ML) structures composed of alternating, ultrathin layers of Ru and B₄C have been grown by dc magnetron sputtering. The ML microstructure has been characterized using x-ray diffraction and high-resolution transmission electron microscopy, and the normal-incidence reflectivity has been measured using synchrotron radiation. It is found that, under optimum deposition conditions, the ML structures exhibit smooth and compositionally abrupt interfaces, with a normal-incidence reflectivity as high as 20% at 7.2 nm. The reflectivity decreases when the ML structures are annealed at 500°C owing to interdiffusion and compound formation at the interfaces.

© 1991 Optical Society of America

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