Abstract

A hologram recording geometry that was total internal reflection of the reference and reconstruction beams from a photosensitive material surface is used to achieve 0.5-μm resolution at λ = 457 nm in the readout of a reconstructed image on a photoresist. Such a geometry has demonstrated stable image quality for parallel displacement within the illuminated area and diffraction efficiency tolerance within a ±2° tilt about the axis of the reconstruction beam. The total-internal-reflection recording system provides double-fringe sets for each plane component inside the volume hologram; therefore, a diffraction efficiency as high as 80% was observed. The result is applicable to high-volume submicrometer lithography and can be expanded to a 20-cm (8-in.) semiconductor submicrometer pattern. The use of a large-aperture, well-collimated laser beam provides us with much higher throughput than that of existing lithography machines.

© 1990 Optical Society of America

Full Article  |  PDF Article
OSA Recommended Articles
High-resolution holographic image projection at visible and ultraviolet wavelengths

I. N. Ross, G. M. Davis, and D. Klemitz
Appl. Opt. 27(5) 967-972 (1988)

Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

Andreas Vetter, Raoul Kirner, Dmitrijs Opalevs, Matthias Scholz, Patrick Leisching, Toralf Scharf, Wilfried Noell, Carsten Rockstuhl, and Reinhard Voelkel
Opt. Express 26(17) 22218-22233 (2018)

Resolution enhancement for advanced mask aligner lithography using phase-shifting photomasks

T. Weichelt, U. Vogler, L. Stuerzebecher, R. Voelkel, and U. D. Zeitner
Opt. Express 22(13) 16310-16321 (2014)

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Figures (4)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Equations (2)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Metrics

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription