Abstract
A hologram recording geometry that was total internal reflection of the reference and reconstruction beams from a photosensitive material surface is used to achieve 0.5-μm resolution at λ = 457 nm in the readout of a reconstructed image on a photoresist. Such a geometry has demonstrated stable image quality for parallel displacement within the illuminated area and diffraction efficiency tolerance within a ±2° tilt about the axis of the reconstruction beam. The total-internal-reflection recording system provides double-fringe sets for each plane component inside the volume hologram; therefore, a diffraction efficiency as high as 80% was observed. The result is applicable to high-volume submicrometer lithography and can be expanded to a 20-cm (8-in.) semiconductor submicrometer pattern. The use of a large-aperture, well-collimated laser beam provides us with much higher throughput than that of existing lithography machines.
© 1990 Optical Society of America
Full Article | PDF ArticleMore Like This
Jun Amako, Daisuke Sawaki, and Eiichi Fujii
Appl. Opt. 48(27) 5105-5113 (2009)
Lenore Pugliese and G. Michael Morris
Opt. Lett. 15(6) 338-340 (1990)
D. W. Berreman, J. E. Bjorkholm, L. Eichner, R. R. Freeman, T. E. Jewell, W. M. Mansfield, A. A. MacDowell, M. L. O’Malley, E. L. Raab, W. T. Silfvast, L. H. Szeto, D. M. Tennant, W. K. Waskiewicz, D. L. White, D. L. Windt, O. R. Wood, and J. H. Bruning
Opt. Lett. 15(10) 529-531 (1990)