Abstract

Ten-level transmission phase holograms (kinoforms) manufactured in one resist layer by electron-beam lithography are reported for the first time to our knowledge. The measured hologram diffraction efficiencies were 70% for the two resist materials used. This corresponds to 82% of the maximum theoretical value for these holograms and is, to our knowledge, the highest reported to date.

© 1990 Optical Society of America

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References

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    [CrossRef]
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    [CrossRef] [PubMed]
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  7. H. Andersson, M. Ekberg, S. Hård, S. Jacobsson, M. Larsson, T. Nilsson, “Single photomask, multilevel kinoforms: manufacture and evaluation,” submitted to Appl. Opt.

1989

R. W. Smith, R. G. Canas, A. A. West, Proc. Soc. Photo-Opt. Instrum. Eng. 1052, 77 (1989).

1988

L. F. Halle, IEEE Trans. Circuits Devices 4, 11 (1988).
[CrossRef]

J. R. Leger, M. L. Scott, P. Bundman, M. P. Griswold, Proc. Soc. Photo-Opt. Instrum. Eng. 884, 82 (1988).

1985

S. M. Arnold, Opt. Eng. 24, 803 (1985).

1982

1981

Andersson, H.

H. Andersson, M. Ekberg, S. Hård, S. Jacobsson, M. Larsson, T. Nilsson, “Single photomask, multilevel kinoforms: manufacture and evaluation,” submitted to Appl. Opt.

Arnold, S. M.

S. M. Arnold, Opt. Eng. 24, 803 (1985).

Bundman, P.

J. R. Leger, M. L. Scott, P. Bundman, M. P. Griswold, Proc. Soc. Photo-Opt. Instrum. Eng. 884, 82 (1988).

Canas, R. G.

R. W. Smith, R. G. Canas, A. A. West, Proc. Soc. Photo-Opt. Instrum. Eng. 1052, 77 (1989).

Ekberg, M.

H. Andersson, M. Ekberg, S. Hård, S. Jacobsson, M. Larsson, T. Nilsson, “Single photomask, multilevel kinoforms: manufacture and evaluation,” submitted to Appl. Opt.

Fujita, T.

Griswold, M. P.

J. R. Leger, M. L. Scott, P. Bundman, M. P. Griswold, Proc. Soc. Photo-Opt. Instrum. Eng. 884, 82 (1988).

Halle, L. F.

L. F. Halle, IEEE Trans. Circuits Devices 4, 11 (1988).
[CrossRef]

Hård, S.

H. Andersson, M. Ekberg, S. Hård, S. Jacobsson, M. Larsson, T. Nilsson, “Single photomask, multilevel kinoforms: manufacture and evaluation,” submitted to Appl. Opt.

Jacobsson, S.

H. Andersson, M. Ekberg, S. Hård, S. Jacobsson, M. Larsson, T. Nilsson, “Single photomask, multilevel kinoforms: manufacture and evaluation,” submitted to Appl. Opt.

Koyama, J.

Larsson, M.

H. Andersson, M. Ekberg, S. Hård, S. Jacobsson, M. Larsson, T. Nilsson, “Single photomask, multilevel kinoforms: manufacture and evaluation,” submitted to Appl. Opt.

Leger, J. R.

J. R. Leger, M. L. Scott, P. Bundman, M. P. Griswold, Proc. Soc. Photo-Opt. Instrum. Eng. 884, 82 (1988).

Nilsson, T.

H. Andersson, M. Ekberg, S. Hård, S. Jacobsson, M. Larsson, T. Nilsson, “Single photomask, multilevel kinoforms: manufacture and evaluation,” submitted to Appl. Opt.

Nishihara, H.

Scott, M. L.

J. R. Leger, M. L. Scott, P. Bundman, M. P. Griswold, Proc. Soc. Photo-Opt. Instrum. Eng. 884, 82 (1988).

Smith, R. W.

R. W. Smith, R. G. Canas, A. A. West, Proc. Soc. Photo-Opt. Instrum. Eng. 1052, 77 (1989).

West, A. A.

R. W. Smith, R. G. Canas, A. A. West, Proc. Soc. Photo-Opt. Instrum. Eng. 1052, 77 (1989).

IEEE Trans. Circuits Devices

L. F. Halle, IEEE Trans. Circuits Devices 4, 11 (1988).
[CrossRef]

Opt. Eng.

S. M. Arnold, Opt. Eng. 24, 803 (1985).

Opt. Lett.

Proc. Soc. Photo-Opt. Instrum. Eng.

J. R. Leger, M. L. Scott, P. Bundman, M. P. Griswold, Proc. Soc. Photo-Opt. Instrum. Eng. 884, 82 (1988).

R. W. Smith, R. G. Canas, A. A. West, Proc. Soc. Photo-Opt. Instrum. Eng. 1052, 77 (1989).

Other

H. Andersson, M. Ekberg, S. Hård, S. Jacobsson, M. Larsson, T. Nilsson, “Single photomask, multilevel kinoforms: manufacture and evaluation,” submitted to Appl. Opt.

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Figures (2)

Fig. 1
Fig. 1

Measured resist depth versus the electron dose for PMMA and SAL-110. Acceleration voltage 25 kV, beam current 5 nA, beam spot width 0.25 μm, beam step size 0.15 μm.

Fig. 2
Fig. 2

Diffraction pattern of the zeroth and first orders from EBL-manufactured SAL-110 resist kinoform. The fraction of transmitted power in the intended two rectangles is 70%.

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