Abstract

We demonstrate a large-area red-emitting vertical-cavity surface-emitting laser (VCSEL) structure with significant improvement in the uniformity of charge carrier distribution by adopting a Si-doped $ {{\rm Al}_{0.20}}{\rm GaInP} $ current spreading layer and a bottom disk contact. The new structure emitting at 670 nm with a bottom disk contact diameter of 20 µm was compared with the conventional oxide-confined top-emitting structure with a similar aperture size. The maximum output peak power increased from 8.8 mW to 22.5 mW under pulsed-mode operation at room temperature. The far field improved from a strong multiple-mode pattern to a Gaussian-like profile. The corresponding divergence angle of the far-field pattern at $ 2{\rm {I}}_{\rm{th}} $ injection current reduced from 16.2° to 10.9°.

© 2020 Optical Society of America

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