Abstract
Although plasmonic photolithography can break through the diffraction limit and produce super-resolution patterns, the intrinsic high loss from metal severely obstructs its application in practice. Here we proposed a novel photolithography method based on a dielectric photonic crystal (PC) structure, where the nanofilms are analyzed systematically. It is shown that the PC can efficiently transmit the desired high- waves, which is advantageous in generating deep subwavelength patterns and realizing super-resolution lithography. Typically, a PC composed of stacked nine films of a multilayer is demonstrated. The nanopatterns with a period of 60 nm are formed in the photoresist layer. Furthermore, this PC-based lithography system is tolerant to the surface roughness in a multilayer. The analyses indicate that this dielectric PC-based design is applicable for super-resolution lithography to produce periodic patterns with strong field intensity, high aspect ratios, and great uniformity.
© 2019 Optical Society of America
Full Article | PDF ArticleMore Like This
Qijian Jin, Gaofeng Liang, Gang Chen, Fen Zhao, Shaokui Yan, Kun Zhang, Mengyu Yang, Qi Zhang, Zhongquan Wen, and Zhihai Zhang
Opt. Lett. 45(11) 3159-3162 (2020)
Zhongjun Jiang, Huiwen Luo, Songpo Guo, and Liang Wang
Opt. Lett. 44(4) 783-786 (2019)
Tao Xu, Anan Fang, Ziyuan Jia, Liyu Ji, and Zhi Hong Hang
Opt. Lett. 42(23) 4909-4912 (2017)