Abstract

Background scattered light should normally be reduced in industrial fabrication processes; however, we demonstrated that background scattered light from an optical element contains significant structural information about the element. This was revealed by quite good agreement between the measured scattering intensity distribution of a sample and a computer simulation of the light intensity from the sample. The intensity distribution from a carefully fabricated sample with artificially controlled defects was obtained with a measurement system designed to measure ultraweak background scattered light covering an intensity range of over 1010.

© 2013 Optical Society of America

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