Abstract

A monolithic double-grating phase mask comprising three short-pitch grating sections of spatial frequencies k1 and k2 collocated at one side of a substrate produces a large-period interferogram without higher harmonics to print in a photoresist film a latent grating of small spatial frequency equal to twice k2k1. When incorporated in a write-on-the-fly scheme, the elements permit the fabrication of unlimitedly long gratings.

© 2009 Optical Society of America

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References

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  1. G. D. Pitt, Eng. Sci. Educ. J. 10, 225 (2001).
    [CrossRef]
  2. J. Thiel and E. Spanner, in Proceedings of the EUSPEN (1999), pp. 419-422.
  3. Y. Jourlin, O. Parriaux, S. Reynaud, J. C. Pommier, M. Johnson, A. Last, and M. Guttmann, Proc. SPIE 6188, 61881B.1 (2006).
  4. E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, Microelectron. Eng. 83, 734 (2006).
    [CrossRef]
  5. P. E. Dyer, R. J. Farley, and R. Giedl, Opt. Commun. 129, 98 (1996).
    [CrossRef]
  6. A. L. Charley, A. Lagrange, O. Lartigue, J. Simon, P. Thony, and P. Schiavone, J. Vac. Sci. Technol. B 23, 2668 (2005).
    [CrossRef]
  7. M. Flury, A. V. Tishchenko, and O. Parriaux, J. Lightwave Technol. 25, 1870 (2007).
    [CrossRef]

2007 (1)

2006 (2)

Y. Jourlin, O. Parriaux, S. Reynaud, J. C. Pommier, M. Johnson, A. Last, and M. Guttmann, Proc. SPIE 6188, 61881B.1 (2006).

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, Microelectron. Eng. 83, 734 (2006).
[CrossRef]

2005 (1)

A. L. Charley, A. Lagrange, O. Lartigue, J. Simon, P. Thony, and P. Schiavone, J. Vac. Sci. Technol. B 23, 2668 (2005).
[CrossRef]

2001 (1)

G. D. Pitt, Eng. Sci. Educ. J. 10, 225 (2001).
[CrossRef]

1996 (1)

P. E. Dyer, R. J. Farley, and R. Giedl, Opt. Commun. 129, 98 (1996).
[CrossRef]

Charley, A. L.

A. L. Charley, A. Lagrange, O. Lartigue, J. Simon, P. Thony, and P. Schiavone, J. Vac. Sci. Technol. B 23, 2668 (2005).
[CrossRef]

Dyer, P. E.

P. E. Dyer, R. J. Farley, and R. Giedl, Opt. Commun. 129, 98 (1996).
[CrossRef]

Farley, R. J.

P. E. Dyer, R. J. Farley, and R. Giedl, Opt. Commun. 129, 98 (1996).
[CrossRef]

Flury, M.

Gamet, E.

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, Microelectron. Eng. 83, 734 (2006).
[CrossRef]

Giedl, R.

P. E. Dyer, R. J. Farley, and R. Giedl, Opt. Commun. 129, 98 (1996).
[CrossRef]

Guttmann, M.

Y. Jourlin, O. Parriaux, S. Reynaud, J. C. Pommier, M. Johnson, A. Last, and M. Guttmann, Proc. SPIE 6188, 61881B.1 (2006).

Johnson, M.

Y. Jourlin, O. Parriaux, S. Reynaud, J. C. Pommier, M. Johnson, A. Last, and M. Guttmann, Proc. SPIE 6188, 61881B.1 (2006).

Jourlin, Y.

Y. Jourlin, O. Parriaux, S. Reynaud, J. C. Pommier, M. Johnson, A. Last, and M. Guttmann, Proc. SPIE 6188, 61881B.1 (2006).

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, Microelectron. Eng. 83, 734 (2006).
[CrossRef]

Lagrange, A.

A. L. Charley, A. Lagrange, O. Lartigue, J. Simon, P. Thony, and P. Schiavone, J. Vac. Sci. Technol. B 23, 2668 (2005).
[CrossRef]

Lartigue, O.

A. L. Charley, A. Lagrange, O. Lartigue, J. Simon, P. Thony, and P. Schiavone, J. Vac. Sci. Technol. B 23, 2668 (2005).
[CrossRef]

Last, A.

Y. Jourlin, O. Parriaux, S. Reynaud, J. C. Pommier, M. Johnson, A. Last, and M. Guttmann, Proc. SPIE 6188, 61881B.1 (2006).

Min, R.

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, Microelectron. Eng. 83, 734 (2006).
[CrossRef]

Parriaux, O.

M. Flury, A. V. Tishchenko, and O. Parriaux, J. Lightwave Technol. 25, 1870 (2007).
[CrossRef]

Y. Jourlin, O. Parriaux, S. Reynaud, J. C. Pommier, M. Johnson, A. Last, and M. Guttmann, Proc. SPIE 6188, 61881B.1 (2006).

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, Microelectron. Eng. 83, 734 (2006).
[CrossRef]

Pelissier, S.

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, Microelectron. Eng. 83, 734 (2006).
[CrossRef]

Pitt, G. D.

G. D. Pitt, Eng. Sci. Educ. J. 10, 225 (2001).
[CrossRef]

Pommier, J. C.

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, Microelectron. Eng. 83, 734 (2006).
[CrossRef]

Y. Jourlin, O. Parriaux, S. Reynaud, J. C. Pommier, M. Johnson, A. Last, and M. Guttmann, Proc. SPIE 6188, 61881B.1 (2006).

Reynaud, S.

Y. Jourlin, O. Parriaux, S. Reynaud, J. C. Pommier, M. Johnson, A. Last, and M. Guttmann, Proc. SPIE 6188, 61881B.1 (2006).

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, Microelectron. Eng. 83, 734 (2006).
[CrossRef]

Schiavone, P.

A. L. Charley, A. Lagrange, O. Lartigue, J. Simon, P. Thony, and P. Schiavone, J. Vac. Sci. Technol. B 23, 2668 (2005).
[CrossRef]

Simon, J.

A. L. Charley, A. Lagrange, O. Lartigue, J. Simon, P. Thony, and P. Schiavone, J. Vac. Sci. Technol. B 23, 2668 (2005).
[CrossRef]

Spanner, E.

J. Thiel and E. Spanner, in Proceedings of the EUSPEN (1999), pp. 419-422.

Thiel, J.

J. Thiel and E. Spanner, in Proceedings of the EUSPEN (1999), pp. 419-422.

Thony, P.

A. L. Charley, A. Lagrange, O. Lartigue, J. Simon, P. Thony, and P. Schiavone, J. Vac. Sci. Technol. B 23, 2668 (2005).
[CrossRef]

Tishchenko, A. V.

Veillas, C.

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, Microelectron. Eng. 83, 734 (2006).
[CrossRef]

Eng. Sci. Educ. J. (1)

G. D. Pitt, Eng. Sci. Educ. J. 10, 225 (2001).
[CrossRef]

J. Lightwave Technol. (1)

J. Vac. Sci. Technol. B (1)

A. L. Charley, A. Lagrange, O. Lartigue, J. Simon, P. Thony, and P. Schiavone, J. Vac. Sci. Technol. B 23, 2668 (2005).
[CrossRef]

Microelectron. Eng. (1)

E. Gamet, Y. Jourlin, S. Pelissier, R. Min, S. Reynaud, C. Veillas, J. C. Pommier, and O. Parriaux, Microelectron. Eng. 83, 734 (2006).
[CrossRef]

Opt. Commun. (1)

P. E. Dyer, R. J. Farley, and R. Giedl, Opt. Commun. 129, 98 (1996).
[CrossRef]

Proc. SPIE (1)

Y. Jourlin, O. Parriaux, S. Reynaud, J. C. Pommier, M. Johnson, A. Last, and M. Guttmann, Proc. SPIE 6188, 61881B.1 (2006).

Other (1)

J. Thiel and E. Spanner, in Proceedings of the EUSPEN (1999), pp. 419-422.

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Figures (4)

Fig. 1
Fig. 1

Integrated Mach–Zehnder light circulation scheme in the double-grating phase mask.

Fig. 2
Fig. 2

Picture of the monolithic double-grating phase mask before Al coating.

Fig. 3
Fig. 3

SEM picture of a 2 μ m period grating printed by the monolithic double-grating phase mask.

Fig. 4
Fig. 4

Scheme of the write-on-the-fly technique.

Equations (1)

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1 p = 2 ( 1 Λ 2 1 Λ 1 ) .

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