Abstract

We demonstrate the application of nondiffracting Bessel beams for reproducible nanometric-scale feature patterning in glass. A femtosecond pulse zero-order Bessel beam with a central spot radius of 360 nm was used to write 500 nm radius nanocraters over a longitudinal positioning range exceeding 20μm, with a variation in radius of less than 10%. The use of Bessel beams significantly reduces constraints on critical sample positioning in the nanoscale writing regime, enabling the use of femtosecond pulses for fast inscription of nanometer-scale features over large sample areas.

© 2009 Optical Society of America

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