Abstract

The resolution limit of present 0.3NA 13.5nm wavelength microexposure tools is compared to next-generation lithography research requirements. Findings suggest that a successor design is needed for patterning starting at the 16nm semiconductor process technology node. A two-mirror 0.5NA optical design is presented, and performance expectations are established from detailed optical and lithographic simulation. We report on the results from a SEMATECH program to fabricate a projection optic with an ultimate resolution limit of approximately 11nm.

© 2008 Optical Society of America

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N. Nishimura, G. Takahashi, T. Tsuji, H. Morishima, K. Kajiyama, and S. Uzawa, Proc. SPIE 6921, 1 (2008).

A. Isoyan, A. Wüest, J. Wallace, F. Jiang, and F. Cerrina, Opt. Express 16, 9106 (2008).
[CrossRef] [PubMed]

M. Goldstein, A. Wüest, and D. Barnhart, Appl. Phys. Lett. 93, 083110 (2008).
[CrossRef]

2007 (4)

P. Naulleau, C. Anderson, and S. Horne, Proc. SPIE 6517, 65172T (2007).
[CrossRef]

S. Wurm, C. Jeon, and M. Lercel, Proc. SPIE 6517, 651705 (2007).
[CrossRef]

Y. C. Cheng, A. Isoyan, J. Wallace, M. Khan, and F. Cerrina, Appl. Phys. Lett. 90, 023116 (2007).
[CrossRef]

M. Dusa, J. Quaedackers, O. Larsen, J. Meessen, E. Heijden, G. Dicker, O. Wismans, P. Haas, K. Schenau, J. Finders, B. Vleeming, G. Stroms, P. Jaensen, S. Cheng, and M. Maenhoudt, Proc. SPIE 6520, 1 (2007).

2006 (3)

P. Naulleau, J. Cain, E. Anderson, K. Dean, P. Denham, K. Goldberg, B. Hoef, and K. Jackson, IEEE J. Quantum Electron. 42, 44 (2006).
[CrossRef]

J. Roberts, T. Bacuita, R. L. Bristol, H. Cao, M. Chandhok, S. H. Lee, M. Leeson, T. Liang, E. Panning, B. J. Rice, U. Shah, M. Shell, W. Yueh, and G. Zhang, Microelectron. Eng. 83, 672 (2006).
[CrossRef]

T. Matsuyama, Y. Ohmura, and D. M. Williamson, Proc. SPIE 6154, 1 (2006).

2005 (3)

C. Spence, Proc. SPIE 5751, 1 (2005).
[CrossRef]

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

P. Naulleau, P. Denham, and S. Rekawa, Opt. Eng. (Bellingham) 44, 13605 (2005).
[CrossRef]

2004 (1)

V. N. Golovkina, P. F. Nealey, F. Cerrina, J. W. Taylor, H. H. Solak, C. David, and J. Gobrecht, J. Vac. Sci. Technol. B 22, 99 (2004).
[CrossRef]

2003 (1)

1994 (1)

M. Wei, D. Attwood, T. Gustafson, and E. Anderson, J. Vac. Sci. Technol. B 12, 3648 (1994).
[CrossRef]

1965 (1)

G. Moore, Electronics 38, 114 (1965).

Anderson, C.

P. Naulleau, C. Anderson, and S. Horne, Proc. SPIE 6517, 65172T (2007).
[CrossRef]

Anderson, E.

P. Naulleau, J. Cain, E. Anderson, K. Dean, P. Denham, K. Goldberg, B. Hoef, and K. Jackson, IEEE J. Quantum Electron. 42, 44 (2006).
[CrossRef]

M. Wei, D. Attwood, T. Gustafson, and E. Anderson, J. Vac. Sci. Technol. B 12, 3648 (1994).
[CrossRef]

Attwood, D.

M. Wei, D. Attwood, T. Gustafson, and E. Anderson, J. Vac. Sci. Technol. B 12, 3648 (1994).
[CrossRef]

Bacuita, T.

J. Roberts, T. Bacuita, R. L. Bristol, H. Cao, M. Chandhok, S. H. Lee, M. Leeson, T. Liang, E. Panning, B. J. Rice, U. Shah, M. Shell, W. Yueh, and G. Zhang, Microelectron. Eng. 83, 672 (2006).
[CrossRef]

Barnhart, D.

M. Goldstein, A. Wüest, and D. Barnhart, Appl. Phys. Lett. 93, 083110 (2008).
[CrossRef]

M. Goldstein, D. Barnhart, R. D. Venables, B. V. D. Meer, and Y. A. Shroff, in Proceedings of the 2006 International Symposium on EUV Lithography (2006).

Batson, P.

Bokor, J.

Booth, M.

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

Brioso, O.

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

Bristol, R. L.

J. Roberts, T. Bacuita, R. L. Bristol, H. Cao, M. Chandhok, S. H. Lee, M. Leeson, T. Liang, E. Panning, B. J. Rice, U. Shah, M. Shell, W. Yueh, and G. Zhang, Microelectron. Eng. 83, 672 (2006).
[CrossRef]

Brunton, A.

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

Cain, J.

P. Naulleau, J. Cain, E. Anderson, K. Dean, P. Denham, K. Goldberg, B. Hoef, and K. Jackson, IEEE J. Quantum Electron. 42, 44 (2006).
[CrossRef]

Cao, H.

J. Roberts, T. Bacuita, R. L. Bristol, H. Cao, M. Chandhok, S. H. Lee, M. Leeson, T. Liang, E. Panning, B. J. Rice, U. Shah, M. Shell, W. Yueh, and G. Zhang, Microelectron. Eng. 83, 672 (2006).
[CrossRef]

Cashmore, J.

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

Cerrina, F.

A. Isoyan, A. Wüest, J. Wallace, F. Jiang, and F. Cerrina, Opt. Express 16, 9106 (2008).
[CrossRef] [PubMed]

Y. C. Cheng, A. Isoyan, J. Wallace, M. Khan, and F. Cerrina, Appl. Phys. Lett. 90, 023116 (2007).
[CrossRef]

V. N. Golovkina, P. F. Nealey, F. Cerrina, J. W. Taylor, H. H. Solak, C. David, and J. Gobrecht, J. Vac. Sci. Technol. B 22, 99 (2004).
[CrossRef]

Chandhok, M.

J. Roberts, T. Bacuita, R. L. Bristol, H. Cao, M. Chandhok, S. H. Lee, M. Leeson, T. Liang, E. Panning, B. J. Rice, U. Shah, M. Shell, W. Yueh, and G. Zhang, Microelectron. Eng. 83, 672 (2006).
[CrossRef]

Cheng, S.

M. Dusa, J. Quaedackers, O. Larsen, J. Meessen, E. Heijden, G. Dicker, O. Wismans, P. Haas, K. Schenau, J. Finders, B. Vleeming, G. Stroms, P. Jaensen, S. Cheng, and M. Maenhoudt, Proc. SPIE 6520, 1 (2007).

Cheng, Y. C.

Y. C. Cheng, A. Isoyan, J. Wallace, M. Khan, and F. Cerrina, Appl. Phys. Lett. 90, 023116 (2007).
[CrossRef]

David, C.

V. N. Golovkina, P. F. Nealey, F. Cerrina, J. W. Taylor, H. H. Solak, C. David, and J. Gobrecht, J. Vac. Sci. Technol. B 22, 99 (2004).
[CrossRef]

Dean, K.

P. Naulleau, J. Cain, E. Anderson, K. Dean, P. Denham, K. Goldberg, B. Hoef, and K. Jackson, IEEE J. Quantum Electron. 42, 44 (2006).
[CrossRef]

Denham, P.

P. Naulleau, J. Cain, E. Anderson, K. Dean, P. Denham, K. Goldberg, B. Hoef, and K. Jackson, IEEE J. Quantum Electron. 42, 44 (2006).
[CrossRef]

P. Naulleau, P. Denham, and S. Rekawa, Opt. Eng. (Bellingham) 44, 13605 (2005).
[CrossRef]

P. Naulleau, K. Goldberg, P. Batson, J. Bokor, P. Denham, and S. Rekawa, Appl. Opt. 42, 820 (2003).
[CrossRef] [PubMed]

Dicker, G.

M. Dusa, J. Quaedackers, O. Larsen, J. Meessen, E. Heijden, G. Dicker, O. Wismans, P. Haas, K. Schenau, J. Finders, B. Vleeming, G. Stroms, P. Jaensen, S. Cheng, and M. Maenhoudt, Proc. SPIE 6520, 1 (2007).

Dusa, M.

M. Dusa, J. Quaedackers, O. Larsen, J. Meessen, E. Heijden, G. Dicker, O. Wismans, P. Haas, K. Schenau, J. Finders, B. Vleeming, G. Stroms, P. Jaensen, S. Cheng, and M. Maenhoudt, Proc. SPIE 6520, 1 (2007).

Elbourn, P.

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

Elliner, G.

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

Finders, J.

M. Dusa, J. Quaedackers, O. Larsen, J. Meessen, E. Heijden, G. Dicker, O. Wismans, P. Haas, K. Schenau, J. Finders, B. Vleeming, G. Stroms, P. Jaensen, S. Cheng, and M. Maenhoudt, Proc. SPIE 6520, 1 (2007).

Gobrecht, J.

V. N. Golovkina, P. F. Nealey, F. Cerrina, J. W. Taylor, H. H. Solak, C. David, and J. Gobrecht, J. Vac. Sci. Technol. B 22, 99 (2004).
[CrossRef]

Goldberg, K.

P. Naulleau, J. Cain, E. Anderson, K. Dean, P. Denham, K. Goldberg, B. Hoef, and K. Jackson, IEEE J. Quantum Electron. 42, 44 (2006).
[CrossRef]

P. Naulleau, K. Goldberg, P. Batson, J. Bokor, P. Denham, and S. Rekawa, Appl. Opt. 42, 820 (2003).
[CrossRef] [PubMed]

Goldstein, M.

M. Goldstein, A. Wüest, and D. Barnhart, Appl. Phys. Lett. 93, 083110 (2008).
[CrossRef]

M. Goldstein, D. Barnhart, R. D. Venables, B. V. D. Meer, and Y. A. Shroff, in Proceedings of the 2006 International Symposium on EUV Lithography (2006).

Golovkina, V. N.

V. N. Golovkina, P. F. Nealey, F. Cerrina, J. W. Taylor, H. H. Solak, C. David, and J. Gobrecht, J. Vac. Sci. Technol. B 22, 99 (2004).
[CrossRef]

Gower, M.

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

Greuters, J.

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

Grünewald, P.

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

Gustafson, T.

M. Wei, D. Attwood, T. Gustafson, and E. Anderson, J. Vac. Sci. Technol. B 12, 3648 (1994).
[CrossRef]

Gutierrez, R.

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

Haas, P.

M. Dusa, J. Quaedackers, O. Larsen, J. Meessen, E. Heijden, G. Dicker, O. Wismans, P. Haas, K. Schenau, J. Finders, B. Vleeming, G. Stroms, P. Jaensen, S. Cheng, and M. Maenhoudt, Proc. SPIE 6520, 1 (2007).

Heijden, E.

M. Dusa, J. Quaedackers, O. Larsen, J. Meessen, E. Heijden, G. Dicker, O. Wismans, P. Haas, K. Schenau, J. Finders, B. Vleeming, G. Stroms, P. Jaensen, S. Cheng, and M. Maenhoudt, Proc. SPIE 6520, 1 (2007).

Hill, T.

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

Hirsch, J.

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

Hoef, B.

P. Naulleau, J. Cain, E. Anderson, K. Dean, P. Denham, K. Goldberg, B. Hoef, and K. Jackson, IEEE J. Quantum Electron. 42, 44 (2006).
[CrossRef]

Horne, S.

P. Naulleau, C. Anderson, and S. Horne, Proc. SPIE 6517, 65172T (2007).
[CrossRef]

Hudyma, R.

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

Isoyan, A.

A. Isoyan, A. Wüest, J. Wallace, F. Jiang, and F. Cerrina, Opt. Express 16, 9106 (2008).
[CrossRef] [PubMed]

Y. C. Cheng, A. Isoyan, J. Wallace, M. Khan, and F. Cerrina, Appl. Phys. Lett. 90, 023116 (2007).
[CrossRef]

Jackson, K.

P. Naulleau, J. Cain, E. Anderson, K. Dean, P. Denham, K. Goldberg, B. Hoef, and K. Jackson, IEEE J. Quantum Electron. 42, 44 (2006).
[CrossRef]

Jaensen, P.

M. Dusa, J. Quaedackers, O. Larsen, J. Meessen, E. Heijden, G. Dicker, O. Wismans, P. Haas, K. Schenau, J. Finders, B. Vleeming, G. Stroms, P. Jaensen, S. Cheng, and M. Maenhoudt, Proc. SPIE 6520, 1 (2007).

Jeon, C.

S. Wurm, C. Jeon, and M. Lercel, Proc. SPIE 6517, 651705 (2007).
[CrossRef]

Jiang, F.

Kajiyama, K.

N. Nishimura, G. Takahashi, T. Tsuji, H. Morishima, K. Kajiyama, and S. Uzawa, Proc. SPIE 6921, 1 (2008).

Khan, M.

Y. C. Cheng, A. Isoyan, J. Wallace, M. Khan, and F. Cerrina, Appl. Phys. Lett. 90, 023116 (2007).
[CrossRef]

Kling, L.

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

Larsen, O.

M. Dusa, J. Quaedackers, O. Larsen, J. Meessen, E. Heijden, G. Dicker, O. Wismans, P. Haas, K. Schenau, J. Finders, B. Vleeming, G. Stroms, P. Jaensen, S. Cheng, and M. Maenhoudt, Proc. SPIE 6520, 1 (2007).

Lee, S. H.

J. Roberts, T. Bacuita, R. L. Bristol, H. Cao, M. Chandhok, S. H. Lee, M. Leeson, T. Liang, E. Panning, B. J. Rice, U. Shah, M. Shell, W. Yueh, and G. Zhang, Microelectron. Eng. 83, 672 (2006).
[CrossRef]

Leeson, M.

J. Roberts, T. Bacuita, R. L. Bristol, H. Cao, M. Chandhok, S. H. Lee, M. Leeson, T. Liang, E. Panning, B. J. Rice, U. Shah, M. Shell, W. Yueh, and G. Zhang, Microelectron. Eng. 83, 672 (2006).
[CrossRef]

Lercel, M.

S. Wurm, C. Jeon, and M. Lercel, Proc. SPIE 6517, 651705 (2007).
[CrossRef]

Liang, T.

J. Roberts, T. Bacuita, R. L. Bristol, H. Cao, M. Chandhok, S. H. Lee, M. Leeson, T. Liang, E. Panning, B. J. Rice, U. Shah, M. Shell, W. Yueh, and G. Zhang, Microelectron. Eng. 83, 672 (2006).
[CrossRef]

Maenhoudt, M.

M. Dusa, J. Quaedackers, O. Larsen, J. Meessen, E. Heijden, G. Dicker, O. Wismans, P. Haas, K. Schenau, J. Finders, B. Vleeming, G. Stroms, P. Jaensen, S. Cheng, and M. Maenhoudt, Proc. SPIE 6520, 1 (2007).

Matsuyama, T.

T. Matsuyama, Y. Ohmura, and D. M. Williamson, Proc. SPIE 6154, 1 (2006).

McEntee, N.

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

Meer, B. V. D.

M. Goldstein, D. Barnhart, R. D. Venables, B. V. D. Meer, and Y. A. Shroff, in Proceedings of the 2006 International Symposium on EUV Lithography (2006).

Meessen, J.

M. Dusa, J. Quaedackers, O. Larsen, J. Meessen, E. Heijden, G. Dicker, O. Wismans, P. Haas, K. Schenau, J. Finders, B. Vleeming, G. Stroms, P. Jaensen, S. Cheng, and M. Maenhoudt, Proc. SPIE 6520, 1 (2007).

Moore, G.

G. Moore, Electronics 38, 114 (1965).

Morishima, H.

N. Nishimura, G. Takahashi, T. Tsuji, H. Morishima, K. Kajiyama, and S. Uzawa, Proc. SPIE 6921, 1 (2008).

Mundair, S.

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

Naulleau, P.

P. Naulleau, C. Anderson, and S. Horne, Proc. SPIE 6517, 65172T (2007).
[CrossRef]

P. Naulleau, J. Cain, E. Anderson, K. Dean, P. Denham, K. Goldberg, B. Hoef, and K. Jackson, IEEE J. Quantum Electron. 42, 44 (2006).
[CrossRef]

P. Naulleau, P. Denham, and S. Rekawa, Opt. Eng. (Bellingham) 44, 13605 (2005).
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P. Naulleau, K. Goldberg, P. Batson, J. Bokor, P. Denham, and S. Rekawa, Appl. Opt. 42, 820 (2003).
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V. N. Golovkina, P. F. Nealey, F. Cerrina, J. W. Taylor, H. H. Solak, C. David, and J. Gobrecht, J. Vac. Sci. Technol. B 22, 99 (2004).
[CrossRef]

Nishimura, N.

N. Nishimura, G. Takahashi, T. Tsuji, H. Morishima, K. Kajiyama, and S. Uzawa, Proc. SPIE 6921, 1 (2008).

Ohmura, Y.

T. Matsuyama, Y. Ohmura, and D. M. Williamson, Proc. SPIE 6154, 1 (2006).

Panning, E.

J. Roberts, T. Bacuita, R. L. Bristol, H. Cao, M. Chandhok, S. H. Lee, M. Leeson, T. Liang, E. Panning, B. J. Rice, U. Shah, M. Shell, W. Yueh, and G. Zhang, Microelectron. Eng. 83, 672 (2006).
[CrossRef]

Quaedackers, J.

M. Dusa, J. Quaedackers, O. Larsen, J. Meessen, E. Heijden, G. Dicker, O. Wismans, P. Haas, K. Schenau, J. Finders, B. Vleeming, G. Stroms, P. Jaensen, S. Cheng, and M. Maenhoudt, Proc. SPIE 6520, 1 (2007).

Rekawa, S.

Rice, B. J.

J. Roberts, T. Bacuita, R. L. Bristol, H. Cao, M. Chandhok, S. H. Lee, M. Leeson, T. Liang, E. Panning, B. J. Rice, U. Shah, M. Shell, W. Yueh, and G. Zhang, Microelectron. Eng. 83, 672 (2006).
[CrossRef]

Richards, P.

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

Roberts, J.

J. Roberts, T. Bacuita, R. L. Bristol, H. Cao, M. Chandhok, S. H. Lee, M. Leeson, T. Liang, E. Panning, B. J. Rice, U. Shah, M. Shell, W. Yueh, and G. Zhang, Microelectron. Eng. 83, 672 (2006).
[CrossRef]

Schenau, K.

M. Dusa, J. Quaedackers, O. Larsen, J. Meessen, E. Heijden, G. Dicker, O. Wismans, P. Haas, K. Schenau, J. Finders, B. Vleeming, G. Stroms, P. Jaensen, S. Cheng, and M. Maenhoudt, Proc. SPIE 6520, 1 (2007).

Shah, U.

J. Roberts, T. Bacuita, R. L. Bristol, H. Cao, M. Chandhok, S. H. Lee, M. Leeson, T. Liang, E. Panning, B. J. Rice, U. Shah, M. Shell, W. Yueh, and G. Zhang, Microelectron. Eng. 83, 672 (2006).
[CrossRef]

Shell, M.

J. Roberts, T. Bacuita, R. L. Bristol, H. Cao, M. Chandhok, S. H. Lee, M. Leeson, T. Liang, E. Panning, B. J. Rice, U. Shah, M. Shell, W. Yueh, and G. Zhang, Microelectron. Eng. 83, 672 (2006).
[CrossRef]

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M. Goldstein, D. Barnhart, R. D. Venables, B. V. D. Meer, and Y. A. Shroff, in Proceedings of the 2006 International Symposium on EUV Lithography (2006).

Solak, H. H.

V. N. Golovkina, P. F. Nealey, F. Cerrina, J. W. Taylor, H. H. Solak, C. David, and J. Gobrecht, J. Vac. Sci. Technol. B 22, 99 (2004).
[CrossRef]

Spence, C.

C. Spence, Proc. SPIE 5751, 1 (2005).
[CrossRef]

Stroms, G.

M. Dusa, J. Quaedackers, O. Larsen, J. Meessen, E. Heijden, G. Dicker, O. Wismans, P. Haas, K. Schenau, J. Finders, B. Vleeming, G. Stroms, P. Jaensen, S. Cheng, and M. Maenhoudt, Proc. SPIE 6520, 1 (2007).

Takahashi, G.

N. Nishimura, G. Takahashi, T. Tsuji, H. Morishima, K. Kajiyama, and S. Uzawa, Proc. SPIE 6921, 1 (2008).

Taylor, J. W.

V. N. Golovkina, P. F. Nealey, F. Cerrina, J. W. Taylor, H. H. Solak, C. David, and J. Gobrecht, J. Vac. Sci. Technol. B 22, 99 (2004).
[CrossRef]

Truffert, V.

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

Tsuji, T.

N. Nishimura, G. Takahashi, T. Tsuji, H. Morishima, K. Kajiyama, and S. Uzawa, Proc. SPIE 6921, 1 (2008).

Uzawa, S.

N. Nishimura, G. Takahashi, T. Tsuji, H. Morishima, K. Kajiyama, and S. Uzawa, Proc. SPIE 6921, 1 (2008).

Venables, R. D.

M. Goldstein, D. Barnhart, R. D. Venables, B. V. D. Meer, and Y. A. Shroff, in Proceedings of the 2006 International Symposium on EUV Lithography (2006).

Vleeming, B.

M. Dusa, J. Quaedackers, O. Larsen, J. Meessen, E. Heijden, G. Dicker, O. Wismans, P. Haas, K. Schenau, J. Finders, B. Vleeming, G. Stroms, P. Jaensen, S. Cheng, and M. Maenhoudt, Proc. SPIE 6520, 1 (2007).

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A. Isoyan, A. Wüest, J. Wallace, F. Jiang, and F. Cerrina, Opt. Express 16, 9106 (2008).
[CrossRef] [PubMed]

Y. C. Cheng, A. Isoyan, J. Wallace, M. Khan, and F. Cerrina, Appl. Phys. Lett. 90, 023116 (2007).
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M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
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M. Wei, D. Attwood, T. Gustafson, and E. Anderson, J. Vac. Sci. Technol. B 12, 3648 (1994).
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M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

Williamson, D. M.

T. Matsuyama, Y. Ohmura, and D. M. Williamson, Proc. SPIE 6154, 1 (2006).

Wismans, O.

M. Dusa, J. Quaedackers, O. Larsen, J. Meessen, E. Heijden, G. Dicker, O. Wismans, P. Haas, K. Schenau, J. Finders, B. Vleeming, G. Stroms, P. Jaensen, S. Cheng, and M. Maenhoudt, Proc. SPIE 6520, 1 (2007).

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A. Wong, Resolution Enhancement Techniques in Optical Lithography (SPIE, 2001).
[CrossRef]

Wüest, A.

Wurm, S.

S. Wurm, C. Jeon, and M. Lercel, Proc. SPIE 6517, 651705 (2007).
[CrossRef]

Yueh, W.

J. Roberts, T. Bacuita, R. L. Bristol, H. Cao, M. Chandhok, S. H. Lee, M. Leeson, T. Liang, E. Panning, B. J. Rice, U. Shah, M. Shell, W. Yueh, and G. Zhang, Microelectron. Eng. 83, 672 (2006).
[CrossRef]

Zhang, G.

J. Roberts, T. Bacuita, R. L. Bristol, H. Cao, M. Chandhok, S. H. Lee, M. Leeson, T. Liang, E. Panning, B. J. Rice, U. Shah, M. Shell, W. Yueh, and G. Zhang, Microelectron. Eng. 83, 672 (2006).
[CrossRef]

Appl. Opt. (1)

Appl. Phys. Lett. (2)

Y. C. Cheng, A. Isoyan, J. Wallace, M. Khan, and F. Cerrina, Appl. Phys. Lett. 90, 023116 (2007).
[CrossRef]

M. Goldstein, A. Wüest, and D. Barnhart, Appl. Phys. Lett. 93, 083110 (2008).
[CrossRef]

Electronics (1)

G. Moore, Electronics 38, 114 (1965).

IEEE J. Quantum Electron. (1)

P. Naulleau, J. Cain, E. Anderson, K. Dean, P. Denham, K. Goldberg, B. Hoef, and K. Jackson, IEEE J. Quantum Electron. 42, 44 (2006).
[CrossRef]

J. Vac. Sci. Technol. B (2)

M. Wei, D. Attwood, T. Gustafson, and E. Anderson, J. Vac. Sci. Technol. B 12, 3648 (1994).
[CrossRef]

V. N. Golovkina, P. F. Nealey, F. Cerrina, J. W. Taylor, H. H. Solak, C. David, and J. Gobrecht, J. Vac. Sci. Technol. B 22, 99 (2004).
[CrossRef]

Microelectron. Eng. (1)

J. Roberts, T. Bacuita, R. L. Bristol, H. Cao, M. Chandhok, S. H. Lee, M. Leeson, T. Liang, E. Panning, B. J. Rice, U. Shah, M. Shell, W. Yueh, and G. Zhang, Microelectron. Eng. 83, 672 (2006).
[CrossRef]

Opt. Eng. (Bellingham) (1)

P. Naulleau, P. Denham, and S. Rekawa, Opt. Eng. (Bellingham) 44, 13605 (2005).
[CrossRef]

Opt. Express (1)

Proc. SPIE (7)

S. Wurm, C. Jeon, and M. Lercel, Proc. SPIE 6517, 651705 (2007).
[CrossRef]

P. Naulleau, C. Anderson, and S. Horne, Proc. SPIE 6517, 65172T (2007).
[CrossRef]

N. Nishimura, G. Takahashi, T. Tsuji, H. Morishima, K. Kajiyama, and S. Uzawa, Proc. SPIE 6921, 1 (2008).

M. Booth, O. Brioso, A. Brunton, J. Cashmore, P. Elbourn, G. Elliner, M. Gower, J. Greuters, P. Grünewald, R. Gutierrez, T. Hill, J. Hirsch, L. Kling, N. McEntee, S. Mundair, P. Richards, V. Truffert, I. Wallhead, M. Whitfield, and R. Hudyma, Proc. SPIE 5751, 78 (2005).
[CrossRef]

T. Matsuyama, Y. Ohmura, and D. M. Williamson, Proc. SPIE 6154, 1 (2006).

C. Spence, Proc. SPIE 5751, 1 (2005).
[CrossRef]

M. Dusa, J. Quaedackers, O. Larsen, J. Meessen, E. Heijden, G. Dicker, O. Wismans, P. Haas, K. Schenau, J. Finders, B. Vleeming, G. Stroms, P. Jaensen, S. Cheng, and M. Maenhoudt, Proc. SPIE 6520, 1 (2007).

Other (3)

“International Technology Roadmap for Semiconductors,” http://public.itrs.net.

A. Wong, Resolution Enhancement Techniques in Optical Lithography (SPIE, 2001).
[CrossRef]

M. Goldstein, D. Barnhart, R. D. Venables, B. V. D. Meer, and Y. A. Shroff, in Proceedings of the 2006 International Symposium on EUV Lithography (2006).

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Figures (4)

Fig. 1
Fig. 1

(a) SEMATECH 0.3 NA EUV MET1 ray trace; (b) image contrast versus resolution for coherent, 0.35 0.55 annular, and 0.1 0.57 dipole illumination; and (c) SEM images exposed at 15.2 mJ cm 2 with dipole illumination.

Fig. 2
Fig. 2

Three 0.5 NA EUV (MET2) optical designs: (a) near-equal radii with 5 × demagnification, (b) radii ratio of 78% with 5 × demagnification, and (c) four reflections with a 4 × demagnification.

Fig. 3
Fig. 3

(a) Aberration phasemaps and RMS wavefront errors over the 30 × 200 μ m MET2 field. The piston, tilt, and defocus have been removed individually from the phasemaps and retained in RMS errors. The 7.1% area central obscuration and the analysis point are shown. (b) Primary and secondary mirror aspheric departures from RMS best-fit spheres.

Fig. 4
Fig. 4

(a) Equal line/space image contrast at the analysis point with 7% flare for coherent, 0.30 0.55 annular, and 0.1 0.57 radii dipole illumination; (b) aerial image contours of 16 nm elbow feature; (c) 16 nm line/space aerial image intensity; (d) Bossung curves with annular illumination; (e) 11 nm line/space aerial image intensity; and (f) Bossung curves with dipole illumination.

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