The resolution limit of present wavelength microexposure tools is compared to next-generation lithography research requirements. Findings suggest that a successor design is needed for patterning starting at the semiconductor process technology node. A two-mirror optical design is presented, and performance expectations are established from detailed optical and lithographic simulation. We report on the results from a SEMATECH program to fabricate a projection optic with an ultimate resolution limit of approximately .
© 2008 Optical Society of AmericaFull Article | PDF Article
Patrick Naulleau, Kenneth A. Goldberg, Eric M. Gullikson, and Jeffrey Bokor
Appl. Opt. 39(17) 2941-2947 (2000)
Yanqiu Li, Hiroo Kinoshita, Takeo Watanabe, Shigeo Irie, Shigeru Shirayone, and Shinji Okazaki
Appl. Opt. 39(19) 3253-3260 (2000)
Patrick P. Naulleau, Kenneth A. Goldberg, Phil Batson, Jeffrey Bokor, Paul Denham, and Senajith Rekawa
Appl. Opt. 42(5) 820-826 (2003)