Abstract

We report achromatic form-birefringence wave plates for optical pickup units. Material dispersion and structure dispersion are balanced in a rigorous multilayer design. A trilayer grating using SiNxSiOyNzSiO2 provides easily accessible process control points and relaxed fabrication tolerance. We demonstrate precise patterning by using nanoimprint lithography on UV-curable polymers, alleviating a major fabrication challenge. The achromatic wave plates exhibit 90±3° retardance and >95% transmittance as measured by a Mueller matrix method at wavelengths of 640800nm.

© 2005 Optical Society of America

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