Abstract

The transfer of continuous-relief diffractive structures from resist into diamond by use of direct-write electron-beam lithography followed by dry etching in an inductively coupled plasma is demonstrated. The gases used for the diamond etching are O2 and Ar. The chemical-vapor-deposited diamond substrate is of optical quality. Our results show that the transfer process generates fairly smooth etched structures. Blazed gratings with periods of 45 μm and Fresnel lenses have been manufactured. The blazed gratings have been optically evaluated with a femtosecond laser operating at 400  nm. The diffraction efficiency was 68% in the first order, with a theoretical value of 100%. We intend to investigate the transfer process further and then to fabricate diffractive and refractive elements for use with Nd:YAG high-power lasers.

© 2001 Optical Society of America

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References

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V. Ralchenko, A. Khomich, L. Butvina, I. Vlasov, V. Konov, L. Schirone, and G. Sotgiu, New Diamond Frontier Carbon Technol. 10, 109 (2000).

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S. Kiyohara, Y. Yagi, and K. Mori, Nanotechnology 10, 385 (1999).
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Pavel’ev, V. S.

V. V. Kononenko, V. I. Konov, S. M. Pimenov, A. M. Prokhorov, V. S. Pavel’ev, and V. A. Soifer, Quantum Electron. 29, 9 (1999).
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[CrossRef]

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V. V. Kononenko, V. I. Konov, S. M. Pimenov, A. M. Prokhorov, V. S. Pavel’ev, and V. A. Soifer, Quantum Electron. 29, 9 (1999).
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[CrossRef]

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S. J. Pearton, A. Katz, F. Ren, and J. R. Lothian, Electron. Lett. 28, 822 (1992).
[CrossRef]

Schirone, L.

V. Ralchenko, A. Khomich, L. Butvina, I. Vlasov, V. Konov, L. Schirone, and G. Sotgiu, New Diamond Frontier Carbon Technol. 10, 109 (2000).

Soifer, V. A.

V. V. Kononenko, V. I. Konov, S. M. Pimenov, A. M. Prokhorov, V. S. Pavel’ev, and V. A. Soifer, Quantum Electron. 29, 9 (1999).
[CrossRef]

Sotgiu, G.

V. Ralchenko, A. Khomich, L. Butvina, I. Vlasov, V. Konov, L. Schirone, and G. Sotgiu, New Diamond Frontier Carbon Technol. 10, 109 (2000).

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A. Vescan, W. Ebert, T. H. Borst, and E. Kohn, Diamond Relat. Mater. 5, 6 (1996).

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V. Ralchenko, A. Khomich, L. Butvina, I. Vlasov, V. Konov, L. Schirone, and G. Sotgiu, New Diamond Frontier Carbon Technol. 10, 109 (2000).

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O. Dorsch, M. Werner, and E. Obermeier, Diamond Relat. Mater. 4, 456 (1995).
[CrossRef]

Yagi, Y.

S. Kiyohara, Y. Yagi, and K. Mori, Nanotechnology 10, 385 (1999).
[CrossRef]

Appl. Opt.

Diamond Relat. Mater.

O. Dorsch, M. Werner, and E. Obermeier, Diamond Relat. Mater. 4, 456 (1995).
[CrossRef]

A. Vescan, W. Ebert, T. H. Borst, and E. Kohn, Diamond Relat. Mater. 5, 6 (1996).

Electron. Lett.

S. J. Pearton, A. Katz, F. Ren, and J. R. Lothian, Electron. Lett. 28, 822 (1992).
[CrossRef]

Nanotechnology

S. Kiyohara, Y. Yagi, and K. Mori, Nanotechnology 10, 385 (1999).
[CrossRef]

New Diamond Frontier Carbon Technol.

V. Ralchenko, A. Khomich, L. Butvina, I. Vlasov, V. Konov, L. Schirone, and G. Sotgiu, New Diamond Frontier Carbon Technol. 10, 109 (2000).

Quantum Electron.

V. V. Kononenko, V. I. Konov, S. M. Pimenov, A. M. Prokhorov, V. S. Pavel’ev, and V. A. Soifer, Quantum Electron. 29, 9 (1999).
[CrossRef]

Sensors Actuators A

H. Bjorkman, P. Rangsten, and K. Hjort, Sensors Actuators A 78, 41 (1999).
[CrossRef]

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Figures (3)

Fig. 1
Fig. 1

(a) AFM scan of a blazed grating (45μm period; depth, 3 μm) in e-beam resist. The ripple along the grating originates from the 16 different e-beam exposure doses used. (b) AFM scan of the same grating transferred into diamond by ICP etching.

Fig. 2
Fig. 2

Microscope picture of a Fresnel lens in diamond (the faint lines come from Cartesian e-beam exposure).

Fig. 3
Fig. 3

Measured intensity in some diffraction orders for a 45μm diamond blazed grating.

Tables (1)

Tables Icon

Table 1 Properties of CVD Diamond Substrates (Drukker International) Used for Fabrication of Blazed Gratings and Fresnel Lenses

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