Abstract

Completely (001) textured LiNbO3 films have been fabricated upon thermally oxidized SiO2/Si substrates by in situ application of a low electric field in a pulsed-laser deposition system. The biased voltage was 70–75 V on parallel electrodes separated by 7.0 mm. Li-enriched crystal and ceramic targets were used. The achieved films were nearly stoichiometric and have smooth surfaces. Waveguiding performance of the films was demonstrated by a prism-coupling method. The refractive indices were calculated on the basis of isotropic and anisotropic waveguide theories. A low-light propagation loss of 1.9 dB/cm in the films was achieved. It is expected that the films can be used in integrated-optical devices that require d33, γ33, 33, and n33 elements.

© 1996 Optical Society of America

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