The OSA journals Optics Express and Optical Materials Express will be teaming up to publish papers from the ASSL 2017 Congress (1-5 October 2017 in Nagoya, Japan) in a joint Feature Issue. The journals published joint feature issues on the ASSL Congresses held in 2013 through 2016. Submissions to the Feature Issue are restricted to oral or poster papers accepted for the Congress.
Authors may choose to submit to either Optics Express or Optical Materials Express, but authors should recognize the difference between them and select the appropriate journal for submission. If the selection of the journal is inappropriate, the guest editors could recommend the authors to transfer to the other journal. For Optical Materials Express, submissions will emphasize the development, characterization, or applications of new materials for lasers and photonics. All other topics from the ASSL Congress will be better suited for Optics Express.
All papers need to present original, previously unpublished work, and will be subject to the normal standards and peer-review process of the journals. The standard Optics Express or Optical Materials Express publication charges will apply to all published articles. To be eligible for publication, the paper needs to add substantial and/or significant new information to the original conference summary, in accordance with OSA's Policy on Conference Papers.
Papers will appear in their respective journals and will be published online upon acceptance. Additionally, a combined table of contents of papers from both journals will appear once all papers are published.
Manuscripts must be prepared according to the usual standards for submission to Optics Express and Optics Materials Express and must be uploaded through OSA's electronic submission system, specifying from the drop-down menu that the manuscript is for the Feature Issue on Advanced Solid-State Lasers 2017.
Benoît Boulanger, University Grenoble Alpes—CNRS, FranceOptics Express Editors
Johan Nilsson, Universtity of Southampton, United Kingdom
Alan Petersen, Spectra Physics, USA
Fabian Rotermund, Korea Advanced Institute of Science and Technology, Korea
Shibin Jiang, AdValue Photonics, Inc, USA
Sergey Mirov, University of Alabama of Birmingham, USA
Stefano Taccheo, Swansea University, United Kingdom
Takunori Taira, Institute for Molecular Science, Japan