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OSA Publishing

The Optical Society (OSA) publishes high-quality, peer-reviewed articles in its portfolio of journals, which serve the full breadth of the optics and photonics community.

Optics Express is the all-electronic, open access journal for optics providing rapid publication for peer-reviewed articles that emphasize scientific and technology innovations in all aspects of optics and photonics.

Additionally, Optics Express publishes papers dedicated to new developments in the science and engineering of light and their impact on sustainable energy, the environment, and green technologies in its dedicated section, Energy Express. These papers are published online as they are ready, but are also combined for readers into a bimonthly dedicated section.

For details about the scope of Optics Express with regards to digital image processing, see the editorial published in April 2014.

Optics Express considers original research articles, special issue contributions, invited reviews and comments on published articles.

Submission Information

Is my paper appropriate for Optics Express? Read about all OSA journals here.

Please see the Author Resource Center for instructions to prepare and submit a manuscript.


Key Journal Metrics

Impact Factor: 3.307*
Eigenfactor Score: 0.19931 (ranked 1st out of 92 journals)*
Total Citations: 97,617 (ranked 2nd out of 92 journals)*
Google Scholar h5-index: 104 (ranked 3rd out of 20 top journals)
Median Time to Publication: 63 days

*According to Optics category rankings in the 2016 Journal Citation Reports® (Clarivate Analytics, 2017)
June 2017 Google Scholar Optics & Photonics Top Publications.

For more information on Journal metrics, click here.

Editorial Board

Andrew M. Weiner,
Purdue University, USA

Senior Deputy Editor
James Leger, University of Minnesota, USA
Deputy Editors
Glenn Boreman, University of North Carolina at Charlotte, USA
James Burge, University of Arizona, USA
Magnus Karlsson, Chalmers University of Technology, Sweden
Xiang Liu, Futurewei Technologies, USA
Alexander I. Lvovsky, University of Calgary, Canada
Takashige Omatsu, Chiba University, Japan
Thomas E. Murphy, University of Maryland at College Park, USA
Vitor Schneider, Corning Inc., USA
Christian Seassal, CNRS, University of Lyon, France, Energy Express
Associate Editors

Ayman Alfalou, ISEN-Brest, France
Nikola Alic, University of California, San Diego, USA
Tatiana Alieva, Universidad Complutense de Madrid, Spain
Christos Argyropoulos, University of Nebraska Lincoln, USA
Paul Barclay, University of Calgary, Canada
Andreas Behrendt, University of Hohenheim, Germany
Peter Bermel, Purdue University, USA
Nicolas Bonod, CNRS, Aix-Marseille Université, France
Jörn Bonse, Federal Institute for Materials Research and Testing, Germany
Gerard Bouwmans, Lille I University, France
Igal Brener, Sandia National Labs, USA
Christophe Caucheteur, Universite de Mons, Belgium
Stanley Chan, Purdue University, USA
Sethumadhavan Chandrasekhar, Alcatel-Lucent, USA
Yanne Chembo, CNRS, FEMTO-ST Institute, France
Yung-Fu Chen, National Chiao Tung University, Taiwan
Dmitry Chigrin, RWTH Aachen University, Germany
David Cooke, McGill University, Canada
Chris Dainty, National University of Ireland (Ireland) and University College London, UK
Paolo De Natale, CNR - INO, Italy
Hilmi Volkan Demir, Nanyang Technological University LUMINOUS!, Singapore, and Bilkent University UNAM, Turkey
Olivier Deparis, University of Namur, Belgium
Po Dong, Alcatel-Lucent Bell Labs, USA
Yajie Dong, University of Central Florida, USA
Yannick Dumeige, Université de Rennes I, France
Jonathan Ellis, University of Rochester, USA
Andrew Forbes, University of the Witwatersrand, South Africa
Amy Foster, Johns Hopkins University, USA
Sonja Franke-Arnold, University of Glasgow, UK
Takeshi Fujisawa, Hokkaido University, Japan
Lukas Gallmann, ETH Zurich, Switzerland
Katia Gallo, KTH—Royal Institute of Technology, Sweden
Rafael Gattass, US Naval Research Laboratory, USA
John Girkin, University of Durham, USA
Jeffrey Gordon, Ben-Gurion University of the Negev, Israel
Reuven Gordon, University of Victoria, Canada
Michael Gorodetsky, Moscow State University and Russian Quantum Center, Russia
Frédéric Grillot, Télécom ParisTech, France
Robert Hadfield, University of Glasgow, UK
Amr Helmy, Univ. of Toronto, Canada
Anthony Hoffman, University of Notre Dame, USA
Ryoichi Horisaki, Osaka University, Japan
Weisheng Hu, Shanghai Jiao Tong University, China
Ravi Jain, University of New Mexico, USA
Ebrahim Karimi, University of Ottawa, Canada
Mercedeh Khajavikhan, University of Central Florida, CREOL, USA
Dae Wook Kim, University of Arizona, USA
Hoon Kim, KAIST, South Korea
Yoon-Ho Kim, Pohang University of Science and Technology, South Korea
Christian Kränkel, University of Hamburg, Germany
Michael Kudenov, North Carolina State University, USA
Uriel Levy, Hebrew University of Jerusalem, Israel
Chanhui Li, Peking University, China
Jensen Li, University of Birmingham, UK
Mo Li, University of Minnesota, USA
Yan Li, Shanghai Jiao Tong University, China
Yi-Hsin Lin, National Chiao Tung University, Taiwan
Natalia Litchinitser, State University of New York, Buffalo, USA
Shutian Liu, Harbin Institute of Technology, China
Chao Lu, Hong Kong Polytechnic University, Hong Kong
Robert P. Lucht, Purdue University, USA
Penghui Ma, National Research Council Canada, Canada
Mangirdas Malinauskas, Vilnius University, Lithuania
David McKee, University of Strathclyde, UK
Antonio Mecozzi, University of L'Aquila, Italy
Rajesh Menon, University of Utah, USA
Stuart Murdoch, University of Auckland, New Zealand
Otto Muskens, University of Southampton, UK
Patrick P. Naulleau, Lawrence Berkeley National Laboratory, USA
Jeffrey W. Nicholson, OFS Laboratories, USA
Boon Ooi, King Abdullah University of Science & Technology, Saudi Arabia
Q-Han Park, Korea University, South Korea
YongKeun (Paul) Park, KAIST, South Korea
Marco Peccianti, University of Sussex, UK
Daniele Pelliccia, RMIT University, Australia
Nicholas Peters, Oak Ridge National Laboratory, USA
Paul Planken, Advanced Research Center for Nanolithography, the Netherlands
Mariola Ramirez, Universidad Autonoma Madrid, Spain
Mahmoud Rasras, Masdar Institute of Science and Technology, UAE
Ronald Reano, Ohio State University, USA
Jessie Rosenberg, IBM Watson Research Center, USA
Fabian Rotermund, KAIST, South Korea
Tero Setala, University of Eastern Finland, Finland
David Shealy, University of Alabama, Birmingham, USA
Kehar Singh, The NorthCap University Gurgaon, India
Balaji Srinivasan, Indian Institute of Technology, Madras, India
Vasily Strelkov, Russian Academy of Sciences, Russia
Marija Strojnik, Optical Research Center, Mexico
Xiankai Sun, Chinese University of Hong Kong, Hong Kong
V R Supradeepa, Indian Institute of Science, India
Dingyuan Tang, Nanyang Technological University, Singapore
Frank Vollmer, Max Planck Institute for the Science of Light, Germany
Qiong-Hua Wang, Sichuan University, China
Daniel Wasserman, University of Illinois Urbana Champaign, USA
Thomas White, Australian National University, Australia
Michael Withford, Macquarie University, Australia
Kenneth Kin-Yip Wong, University of Hong Kong, Hong Kong
Gerard Wysocki, Princeton University, USA
Fatih Yaman, NEC Labs America, USA
Ho-Soon Yang, Korea Research Institute of Standards and Science, South Korea
Joel Yang, Singapore University of Technology and Design, Singapore
Lan Yang, Washington University, St. Louis, USA
Xiaodong Yang, Missouri University of Science and Technology, USA
Seunghyup Yoo, Korea Advanced Institute of Science and Technology, South Korea
Chang-Jae Yu, Hangyang University, South Korea
Seok Hyun (Andy) Yun, Harvard Medical School, Wellman Center for Photomedicine, Massachusetts General Hospital, USA
Zeev Zalevsky, Bar-Ilan University, Israel
Michalis Zervas, University of Southampton, UK
Benyuan Zhu, OFS Laboratories, USA
Ning Hua Zhu, Institute of Semiconductors, Chinese Academy of Sciences, China
Yucong Zhu, Nikon Corporation, Japan


Editorial and Production E-mail Phone
Carmelita Washington, Peer Review Manager opex@osa.org 202-416-1921
Feature proposals dmcdonold@osa.org
Sharon Jeffress, Director, Electronic Publishing sjeffr@osa.org 202-416-1448
Sara Naughton, Managing Editor 202-416-1920
Sarah Walker, Managing Editor 202-416-1482
Marshal Staggs, Electronic Production Editor 202-416-1495
Lynne Sturtz, Electronic Production Editor 202-416-1922
Article processing charges billing@osa.org

General Information
Copyright Permission Requests copyright@osa.org
Online journal technical support elec@osa.org
Elizabeth Nolan, Chief Publishing Officer
Kelly Cohen, Senior Publisher
M. Scott Dineen, Senior Director, Publishing, Production & Technology
Jennifer Mayfield, Deputy Senior Director, Electronic Publications
Christopher Videll, Deputy Senior Director, Production & Technology
Tim Fincham, Director, Production & Technology
Dan McDonold, Editorial Director
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