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OSA Publishing

The Optical Society (OSA) publishes high-quality, peer-reviewed articles in its portfolio of journals, which serve the full breadth of the optics and photonics community.

Optics Express is the all-electronic, open access journal for optics providing rapid publication for peer-reviewed articles that emphasize scientific and technology innovations in all aspects of optics and photonics.

Additionally, Optics Express publishes papers dedicated to new developments in the science and engineering of light and their impact on sustainable energy, the environment, and green technologies in its dedicated section, Energy Express. These papers are published online as they are ready, but are also combined for readers into a bimonthly dedicated section.

For details about the scope of Optics Express with regards to digital image processing, see the editorial published in April 2014.

Optics Express considers original research articles, special issue contributions, invited reviews and comments on published articles.

Submission Information

Is my paper appropriate for Optics Express? Read about all OSA journals here.

Please see the Author Resource Center for instructions to prepare and submit a manuscript.


Key Journal Metrics

Impact Factor: 3.148*
EigenFactor Score: 0.24990 (ranked 1st out of 86 journals)*
Total Citations: 81,379 (ranked 2nd out of 86 journals)*
Google Scholar h-index: 105 (ranked 2nd out of 20 top journals)
Median Time to Publication: 69 days

*According to Optics category rankings in the 2015 Journal Citation Reports® (Thomson Reuters, 2016)
June 2016 Google Scholar Optics & Photonics Top Publications.

For more information on Journal metrics, click here.

Editorial Board

Andrew M. Weiner,
Purdue University (USA)

Senior Deputy Editor
James Leger, University of Minnesota (USA)
Deputy Editors
Glenn Boreman, University of North Carolina at Charlotte (USA)
James Burge, University of Arizona (USA)
Magnus Karlsson, Chalmers University of Technology (Sweden)
Xiang Liu, Futurewei Technologies (USA)
Alexander I. Lvovsky, University of Calgary (Canada)
Takashige Omatsu, Chiba University (Japan)
Thomas E. Murphy, University of Maryland at College Park (USA)
Vitor Schneider, Corning Inc. (USA)
Christian Seassal, CNRS, University of Lyon (France), Energy Express
Associate Editors

Nikola Alic, University of California, San Diego (USA)
Tatiana Alieva, Universidad Complutense de Madrid (Spain)
Andrea Alu, University of Texas at Austin (USA)
Christos Argyropoulos, University of Nebraska Lincoln, USA
Paul Barclay, University of Calgary, Canada
Andreas Behrendt, University of Hohenheim, Germany
Peter Bermel, Purdue University (USA)
Nicolas Bonod, CNRS, Aix-Marseille Université (France)
Jörn Bonse, Federal Institute for Materials Research and Testing (Germany)
Igal Brener, Sandia National Labs (USA)
Christian Brosseau, Université de Bretagne Occidentale (France)
Christophe Caucheteur, Universite de Mons (Belgium)
Stanley Chan, Purdue University (USA)
Sethumadhavan Chandrasekhar, Alcatel-Lucent (USA)
Yanne Chembo, CNRS, FEMTO-ST Institute (France)
Yung-Fu Chen, National Chiao Tung University (Taiwan)
Dmitry Chigrin, RWTH Aachen University (Germany)
David Cooke, McGill University (Canada)
Chris Dainty, National University of Ireland (Ireland) and University College London (UK)
Paolo De Natale, CNR - INO (Italy)
Hilmi Volkan Demir, Nanyang Technological University LUMINOUS! (Singapore) and Bilkent University UNAM (Turkey)
Olivier Deparis, University of Namur (Belgium)
Po Dong, Alcatel-Lucent Bell Labs (USA)
Yajie Dong, University of Central Florida (USA)
Yannick Dumeige, Université de Rennes I (France)
Andrew Forbes, University of the Witwatersrand (South Africa)
Amy Foster, Johns Hopkins University (USA)
Sonja Franke-Arnold, University of Glasgow (Scotland)
Takeshi Fujisawa, Hokkaido University (Japan)
Lukas Gallmann, ETH Zurich, Switzerland
Katia Gallo, KTH—Royal Institute of Technology (Sweden)
Rafael Gattass, US Naval Research Laboratory (USA)
John Girkin, University of Durham (USA)
Jeffrey Gordon, Ben-Gurion University of the Negev (Israel)
Reuven Gordon, University of Victoria (Canada)
Michael Gorodetsky, Moscow State University and Russian Quantum Center (Russia)
Frédéric Grillot, Télécom ParisTech (France)
Robert Hadfield, University of Glasgow (United Kingdom)
Amr Helmy, Univ. of Toronto (Canada)
Ryoichi Horisaki, Osaka University
Weisheng Hu, Shanghai Jiao Tong University (China)
Ebrahim Karimi, University of Ottawa (Canada)
Mercedeh Khajavikhan, University of Central Florida, CREOL (USA)
Dae Wook Kim, University of Arizona (USA)
Hoon Kim, KAIST, S. Korea
Yoon-Ho Kim, Pohang University of Science and Technology (South Korea)
Christian Kränkel, University of Hamburg (Germany)
Michael Kudenov, North Carolina State University (USA)
Eric Lantz, Université de Franche Comté (France)
Uriel Levy, Hebrew University of Jerusalem (Israel)
Chanhui Li, Peking University (China)
Jensen Li, University of Birmingham (UK)
Mo Li, University of Minnesota (USA)
Yi-Hsin Lin, National Chiao Tung University (Taiwan)
Shutian Liu, Harbin Institute of Technology (China)
Chao Lu, Hong Kong Polytechnic University (Hong Kong)
Robert P. Lucht, Purdue University (USA)
Penghui Ma, National Research Council Canada (Canada)
Mangirdas Malinauskas, Vilnius University (Lithuania)
David McKee, University of Strathclyde (UK)
Antonio Mecozzi, University of L'Aquila (Italy)
Rajesh Menon, University of Utah (USA)
Stuart Murdoch, University of Auckland (New Zealand)
Otto Muskens, University of Southampton (UK)
Patrick P. Naulleau, Lawrence Berkeley National Laboratory (USA)
Jeffrey W. Nicholson, OFS Laboratories (USA)
Q-Han Park, Korea University (South Korea)
YongKeun (Paul) Park, KAIST, (South Korea)
Marco Peccianti, University of Sussex (UK)
Daniele Pelliccia, RMIT University (Australia)
Nicholas Peters, Oak Ridge National Laboratory (USA)
Paul Planken, Advanced Research Center for Nanolithography (The Netherlands)
Yves Quiquempois, Universite Lille 1 (France)
Mariola Ramirez, Universidad Autonoma Madrid (Spain)
Mahmoud Rasras, Masdar Institute of Science and Technology (United Arab Emirates)
Ronald Reano, Ohio State University (USA)
Jessie Rosenberg, IBM Watson Research Center (USA)
Fabian Rotermund, KAIST (South Korea)
Jae-Hyun Ryou, University of Houston (USA)
Tero Setala, University of Eastern Finland (Finland)
David Shealy, University of Alabama, Birmingham (USA)
Kehar Singh, The NorthCap University Gurgaon (India)
Balaji Srinivasan, Indian Institute of Technology, Madras (India)
Andrew Stockman, University College London (UK)
Vasily Strelkov, Russian Academy of Sciences (Russia)
Marija Strojnik, Optical Research Center (Mexico)
Xiankai Sun, Chinese University of Hong Kong (Hong Kong)
V R Supradeepa, Indian Institute of Science (India)
Dingyuan Tang, Nanyang Technological University (Singapore)
Frank Vollmer, Max Planck Institute for the Science of Light (Germany)
Qiong-Hua Wang, Sichuan University (China)
Daniel Wasserman, University of Illinois Urbana Champaign (USA)
Thomas White, Australian National University (Australia)
Michael Withford, Macquarie University (Australia)
Kenneth Kin-Yip Wong, University of Hong Kong, Hong Kong
Gerard Wysocki, Princeton University (USA)
Fatih Yaman, NEC Labs America (USA)
Ho-Soon Yang, Korea Research Institute of Standards and Science (South Korea)
Joel Yang, Singapore University of Technology and Design (Singapore)
Lan Yang, Washington University, St. Louis (USA)
Seunghyup Yoo, Korea Advanced Institute of Science and Technology (South Korea)
Chang-Jae Yu, Hangyang University (South Korea)
Seok Hyun (Andy) Yun, Harvard Medical School,Wellman Center for Photomedicine, Massachusetts General Hospital (USA)
Zeev Zalevsky, Bar-Ilan University (Israel)
Michalis Zervas, University of Southampton (UK)
Benyuan Zhu, OFS Laboratories, USA
Ning Hua Zhu, Institute of Semiconductors, Chinese Academy of Sciences (China)
Yucong Zhu, Nikon Corporation (Japan)


Editorial and Production E-mail Phone
Carmelita Washington, Peer Review Manager opex@osa.org 202-416-1921
Feature proposals dmcdonold@osa.org
Sharon Jeffress, Senior Managing Editor sjeffr@osa.org 202-416-1448
Sara Naughton, Managing Editor 202-416-1920
Sarah Walker, Managing Editor 202-416-1482
Marshal Staggs, Electronic Production Editor 202-416-1495
Lynne Sturtz, Electronic Production Editor 202-416-1922
Article processing charges billing@osa.org

General Information
Copyright Permission Requests copyright@osa.org
Online journal technical support elec@osa.org
Elizabeth Nolan, Chief Publishing Officer
Kelly Cohen, Senior Publisher
M. Scott Dineen, Senior Director, Publishing, Production & Technology
Jennifer Mayfield, Deputy Senior Director, Electronic Publications
Christopher Videll, Director, Production & Technology
Tim Fincham, Associate Director, Production and Technology
Dan McDonold, Editorial Director
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