Extrinsic photoluminescence properties of individual micro-particle of Cs₄PbBr₆ perovskite with “defect” structure

Liuli Yang, Ting Wang, Xi Yang, Mingyu Zhang, Chaojie Pi, Jie Yu, Dacheng Zhou, Xue Yu, Jianbei Qiu, and Xuhui Xu

Opt. Express 27(22), 31207-31216 (2019)  View: HTML | PDF

Description and tolerance analysis of freeform surface figure error using specific-probability-distributed Gaussian radial basis functions

Junhao Ni, Tong Yang, Yue Liu, Dewen Cheng, and Yongtian Wang

Opt. Express 27(22), 31820-31839 (2019)  View: HTML | PDF

User-defined microstructures array fabricated by DMD based multistep lithography with dose modulation

Ying Zhang, Jun Luo, Zheng Xiong, Hua Liu, Li Wang, Yingying Gu, Zifeng Lu, Jinhuan Li, and Jipeng Huang

Opt. Express 27(22), 31956-31966 (2019)  View: HTML | PDF

“Double” displacement Talbot lithography: fast, wafer-scale, direct-writing of complex periodic nanopatterns

Pierre Chausse, Emmanuel Le Boulbar, Pierre-Marie Coulon, and Philip A. Shields

Opt. Express 27(22), 32037-32046 (2019)  View: HTML | PDF

Achromatic annular folded lens with reflective-diffractive optics

Bo Zhang, Mingxu Piao, and Qingfeng Cui

Opt. Express 27(22), 32337-32348 (2019)  View: HTML | PDF

Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography

Andreas Vetter, Chen Yan, Raoul Kirner, Toralf Scharf, Wilfried Noell, Reinhard Voelkel, and Carsten Rockstuhl

Opt. Express 27(22), 32523-32535 (2019)  View: HTML | PDF

Simple methods for estimating the performance and specification of optical components with anisotropic mid-spatial frequency surface errors

Hamidreza Aryan, Glenn D. Boreman, and Thomas J. Suleski

Opt. Express 27(22), 32709-32721 (2019)  View: HTML | PDF