Abstract

A hollow fiber composed of a glass-tube substrate and an aluminum thin film coated upon the inside of the tube delivers F2-excimer laser light. A smooth, aluminum thin film was deposited by using metal-organic chemical vapor deposition using dimethylethylamine:alane (DMEAA) as the precursor. It was shown that the transmission loss of the fiber with a 1.0-mm inner diameter was as low as 0.5 dB/m for the fiber with 1.0-mm diameter when the bore of the fiber is pressurized with an inert gas to remove the absorption of air. When the fiber is bent at the radius of 30 cm, the additional loss was 1.6 dB.

© 2000 Optical Society of America

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References

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  1. H.G. Craighead, J. C. White, R. E. Howard, L. D. Jackel, R. E. Behringer, J. E. Sweeney, and R. W. Epworth, “Contact lithography at 157 nm with an F2 excimer laser,” J. Vac. Sci. & Technol. B 1, 1186–1189 (1983).
    [Crossref]
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    [Crossref]
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1999 (3)

1998 (1)

1995 (1)

H. Nagai, “Applications of excimer lasers,” Rev. Laser Eng. 23, 1038–1050 (1995).
[Crossref]

1991 (1)

M. G. Simmonds, E. C. Phillips, J.-W. Hwang, and W. L. Gladfelter, “A stable, liquid precursor for aluminum,” Chemtronics 5, 155–158 (1991).

1988 (1)

1983 (1)

H.G. Craighead, J. C. White, R. E. Howard, L. D. Jackel, R. E. Behringer, J. E. Sweeney, and R. W. Epworth, “Contact lithography at 157 nm with an F2 excimer laser,” J. Vac. Sci. & Technol. B 1, 1186–1189 (1983).
[Crossref]

Basting, D.

U. Stamm, I. Bragin, S. Govorkov, J. Kleinschmidt, R. Patzel, E. Slobodtchikov, K. Vogler, F. Voss, and D. Basting, “Excimer laser for 157 nm lithography,” in Emerging Lithographic Technologies III, Yuli Vladimirsky, ed., Proc. SPIE3676, 816–826 (1999).

Bates, A. K.

Beckley, K.

P. R. Herman, K. Beckley, B. Jackson, K. Kurosawa, D. Moore, T. Yamanishi, and J. Yang, “Processing applications with the 157-nm fluorine excimer laser,” in Excimer Lasers, Optics, and Applications, H Shields and P E Dyer, eds., Proc. SPIE2992, 86–95 (1997).

Behringer, R. E.

H.G. Craighead, J. C. White, R. E. Howard, L. D. Jackel, R. E. Behringer, J. E. Sweeney, and R. W. Epworth, “Contact lithography at 157 nm with an F2 excimer laser,” J. Vac. Sci. & Technol. B 1, 1186–1189 (1983).
[Crossref]

Bragin, I.

U. Stamm, I. Bragin, S. Govorkov, J. Kleinschmidt, R. Patzel, E. Slobodtchikov, K. Vogler, F. Voss, and D. Basting, “Excimer laser for 157 nm lithography,” in Emerging Lithographic Technologies III, Yuli Vladimirsky, ed., Proc. SPIE3676, 816–826 (1999).

Brimacombe, R. K.

Craighead, H.G.

H.G. Craighead, J. C. White, R. E. Howard, L. D. Jackel, R. E. Behringer, J. E. Sweeney, and R. W. Epworth, “Contact lithography at 157 nm with an F2 excimer laser,” J. Vac. Sci. & Technol. B 1, 1186–1189 (1983).
[Crossref]

Epworth, R. W.

H.G. Craighead, J. C. White, R. E. Howard, L. D. Jackel, R. E. Behringer, J. E. Sweeney, and R. W. Epworth, “Contact lithography at 157 nm with an F2 excimer laser,” J. Vac. Sci. & Technol. B 1, 1186–1189 (1983).
[Crossref]

Gladfelter, W. L.

M. G. Simmonds, E. C. Phillips, J.-W. Hwang, and W. L. Gladfelter, “A stable, liquid precursor for aluminum,” Chemtronics 5, 155–158 (1991).

Govorkov, S.

U. Stamm, I. Bragin, S. Govorkov, J. Kleinschmidt, R. Patzel, E. Slobodtchikov, K. Vogler, F. Voss, and D. Basting, “Excimer laser for 157 nm lithography,” in Emerging Lithographic Technologies III, Yuli Vladimirsky, ed., Proc. SPIE3676, 816–826 (1999).

Grenville, A.

Herman, P. R.

P. R. Herman, K. Beckley, B. Jackson, K. Kurosawa, D. Moore, T. Yamanishi, and J. Yang, “Processing applications with the 157-nm fluorine excimer laser,” in Excimer Lasers, Optics, and Applications, H Shields and P E Dyer, eds., Proc. SPIE2992, 86–95 (1997).

Hosono, H.

Howard, R. E.

H.G. Craighead, J. C. White, R. E. Howard, L. D. Jackel, R. E. Behringer, J. E. Sweeney, and R. W. Epworth, “Contact lithography at 157 nm with an F2 excimer laser,” J. Vac. Sci. & Technol. B 1, 1186–1189 (1983).
[Crossref]

Hwang, J.-W.

M. G. Simmonds, E. C. Phillips, J.-W. Hwang, and W. L. Gladfelter, “A stable, liquid precursor for aluminum,” Chemtronics 5, 155–158 (1991).

Jackel, L. D.

H.G. Craighead, J. C. White, R. E. Howard, L. D. Jackel, R. E. Behringer, J. E. Sweeney, and R. W. Epworth, “Contact lithography at 157 nm with an F2 excimer laser,” J. Vac. Sci. & Technol. B 1, 1186–1189 (1983).
[Crossref]

Jackson, B.

P. R. Herman, K. Beckley, B. Jackson, K. Kurosawa, D. Moore, T. Yamanishi, and J. Yang, “Processing applications with the 157-nm fluorine excimer laser,” in Excimer Lasers, Optics, and Applications, H Shields and P E Dyer, eds., Proc. SPIE2992, 86–95 (1997).

Kleinschmidt, J.

U. Stamm, I. Bragin, S. Govorkov, J. Kleinschmidt, R. Patzel, E. Slobodtchikov, K. Vogler, F. Voss, and D. Basting, “Excimer laser for 157 nm lithography,” in Emerging Lithographic Technologies III, Yuli Vladimirsky, ed., Proc. SPIE3676, 816–826 (1999).

Kurosawa, K.

P. R. Herman, K. Beckley, B. Jackson, K. Kurosawa, D. Moore, T. Yamanishi, and J. Yang, “Processing applications with the 157-nm fluorine excimer laser,” in Excimer Lasers, Optics, and Applications, H Shields and P E Dyer, eds., Proc. SPIE2992, 86–95 (1997).

Leopold, K. E.

Liberman, V.

Matsuura, Y.

Mihailov, S.

Miyagi, M.

Mizuguchi, M.

Moore, D.

P. R. Herman, K. Beckley, B. Jackson, K. Kurosawa, D. Moore, T. Yamanishi, and J. Yang, “Processing applications with the 157-nm fluorine excimer laser,” in Excimer Lasers, Optics, and Applications, H Shields and P E Dyer, eds., Proc. SPIE2992, 86–95 (1997).

Nagai, H.

H. Nagai, “Applications of excimer lasers,” Rev. Laser Eng. 23, 1038–1050 (1995).
[Crossref]

Ogawa, T.

Patzel, R.

U. Stamm, I. Bragin, S. Govorkov, J. Kleinschmidt, R. Patzel, E. Slobodtchikov, K. Vogler, F. Voss, and D. Basting, “Excimer laser for 157 nm lithography,” in Emerging Lithographic Technologies III, Yuli Vladimirsky, ed., Proc. SPIE3676, 816–826 (1999).

Phillips, E. C.

M. G. Simmonds, E. C. Phillips, J.-W. Hwang, and W. L. Gladfelter, “A stable, liquid precursor for aluminum,” Chemtronics 5, 155–158 (1991).

Rothschild, M.

Sedlacak, J. H. C.

Simmonds, M. G.

M. G. Simmonds, E. C. Phillips, J.-W. Hwang, and W. L. Gladfelter, “A stable, liquid precursor for aluminum,” Chemtronics 5, 155–158 (1991).

Skuja, L.

Slobodtchikov, E.

U. Stamm, I. Bragin, S. Govorkov, J. Kleinschmidt, R. Patzel, E. Slobodtchikov, K. Vogler, F. Voss, and D. Basting, “Excimer laser for 157 nm lithography,” in Emerging Lithographic Technologies III, Yuli Vladimirsky, ed., Proc. SPIE3676, 816–826 (1999).

Stamm, U.

U. Stamm, I. Bragin, S. Govorkov, J. Kleinschmidt, R. Patzel, E. Slobodtchikov, K. Vogler, F. Voss, and D. Basting, “Excimer laser for 157 nm lithography,” in Emerging Lithographic Technologies III, Yuli Vladimirsky, ed., Proc. SPIE3676, 816–826 (1999).

Sweeney, J. E.

H.G. Craighead, J. C. White, R. E. Howard, L. D. Jackel, R. E. Behringer, J. E. Sweeney, and R. W. Epworth, “Contact lithography at 157 nm with an F2 excimer laser,” J. Vac. Sci. & Technol. B 1, 1186–1189 (1983).
[Crossref]

Taylor, R. S.

Uttaro, R. S.

Van Peski, C.

Vogler, K.

U. Stamm, I. Bragin, S. Govorkov, J. Kleinschmidt, R. Patzel, E. Slobodtchikov, K. Vogler, F. Voss, and D. Basting, “Excimer laser for 157 nm lithography,” in Emerging Lithographic Technologies III, Yuli Vladimirsky, ed., Proc. SPIE3676, 816–826 (1999).

Voss, F.

U. Stamm, I. Bragin, S. Govorkov, J. Kleinschmidt, R. Patzel, E. Slobodtchikov, K. Vogler, F. Voss, and D. Basting, “Excimer laser for 157 nm lithography,” in Emerging Lithographic Technologies III, Yuli Vladimirsky, ed., Proc. SPIE3676, 816–826 (1999).

White, J. C.

H.G. Craighead, J. C. White, R. E. Howard, L. D. Jackel, R. E. Behringer, J. E. Sweeney, and R. W. Epworth, “Contact lithography at 157 nm with an F2 excimer laser,” J. Vac. Sci. & Technol. B 1, 1186–1189 (1983).
[Crossref]

Yamanishi, T.

P. R. Herman, K. Beckley, B. Jackson, K. Kurosawa, D. Moore, T. Yamanishi, and J. Yang, “Processing applications with the 157-nm fluorine excimer laser,” in Excimer Lasers, Optics, and Applications, H Shields and P E Dyer, eds., Proc. SPIE2992, 86–95 (1997).

Yang, J.

P. R. Herman, K. Beckley, B. Jackson, K. Kurosawa, D. Moore, T. Yamanishi, and J. Yang, “Processing applications with the 157-nm fluorine excimer laser,” in Excimer Lasers, Optics, and Applications, H Shields and P E Dyer, eds., Proc. SPIE2992, 86–95 (1997).

Appl. Opt. (2)

Chemtronics (1)

M. G. Simmonds, E. C. Phillips, J.-W. Hwang, and W. L. Gladfelter, “A stable, liquid precursor for aluminum,” Chemtronics 5, 155–158 (1991).

J. Vac. Sci. & Technol. B (1)

H.G. Craighead, J. C. White, R. E. Howard, L. D. Jackel, R. E. Behringer, J. E. Sweeney, and R. W. Epworth, “Contact lithography at 157 nm with an F2 excimer laser,” J. Vac. Sci. & Technol. B 1, 1186–1189 (1983).
[Crossref]

Opt. Lett. (3)

Rev. Laser Eng. (1)

H. Nagai, “Applications of excimer lasers,” Rev. Laser Eng. 23, 1038–1050 (1995).
[Crossref]

Other (3)

P. R. Herman, K. Beckley, B. Jackson, K. Kurosawa, D. Moore, T. Yamanishi, and J. Yang, “Processing applications with the 157-nm fluorine excimer laser,” in Excimer Lasers, Optics, and Applications, H Shields and P E Dyer, eds., Proc. SPIE2992, 86–95 (1997).

U. Stamm, I. Bragin, S. Govorkov, J. Kleinschmidt, R. Patzel, E. Slobodtchikov, K. Vogler, F. Voss, and D. Basting, “Excimer laser for 157 nm lithography,” in Emerging Lithographic Technologies III, Yuli Vladimirsky, ed., Proc. SPIE3676, 816–826 (1999).

T. Kodas and M. Hampden-Smith, Ed., The Chemistry of Metal CVD (VCH, Weinheim, 1994).

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Figures (5)

Fig. 1.
Fig. 1.

Loss spectra of the aluminum-coated fibers fabricated before and after optimizing the fabrication process. The inner diameter of the fiber is 1.0 mm and the length is 1m. The fiber is excited by a Gaussian beam with a wide divergence angle of 3.7° at FWHM.

Fig. 2.
Fig. 2.

#x2022; Gas introducing attachment for hollow fibers

Fig. 3.
Fig. 3.

Transmission losses of aluminum-coated hollow fiber versus purged nitrogen pressure. The inner diameter of the fiber is 1.0 mm and the length is 1m.

Fig. 4.
Fig. 4.

Measured straight and bending losses of aluminum hollow waveguides for F2 laser light (λ=157 nm). The length of the fibers is 1 m and the bore diameters are 1 mm and 0.7 mm.

Fig. 5.
Fig. 5.

Power density profiles of (a) laser source beam, (b) output beam from a straight hollow fiber, and (c) output beam from a bent hollow fiber. The profiles are measured by using a thermal paper and burn patterns are processed by a computer software.

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