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S. K. Selvaraja, E. Rosseel, L. Fernandez, M. Tabat, W. Bogaerts, J. Hautala, and P. Absil, “SOI thickness uniformity improvement using corrective etching for silicon nano-photonic device,” in 8th IEEE International Conference on Group IV Photonics (2011), pp. 71–73.
S. K. Selvaraja, E. Rosseel, L. Fernandez, M. Tabat, W. Bogaerts, J. Hautala, and P. Absil, “SOI thickness uniformity improvement using wafer-scale corrective etching for silicon nano-photonic device,” in Proceedings of the 2011 Annual Symposium of the IEEE Photonics Benelux Chapter (2011), pp. 289–292.
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[Crossref]
Y. Yang, Y. Ma, H. Guan, Y. Liu, S. Danziger, S. Ocheltree, K. Bergman, T. Baehr-Jones, and M. Hochberg, “Phase coherence length in silicon photonic platform,” Opt. Express 23, 16890–16902 (2015).
[Crossref]
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Y. Zhang, S. Yang, A. E.-J. Lim, G.-Q. Lo, C. Galland, T. Baehr-Jones, and M. Hochberg, “A compact and low loss y-junction for submicron silicon waveguide,” Opt. Express 21, 1310–1316 (2013).
[Crossref]
[PubMed]
W. Bogaerts, P. De Heyn, T. Van Vaerenbergh, K. De Vos, S. Kumar Selvaraja, T. Claes, P. Dumon, P. Bienstman, D. Van Thourhout, and R. Baets, “Silicon microring resonators,” Laser Photonics Rev. 6, 47–73 (2012).
[Crossref]
S. K. Selvaraja, W. Bogaerts, P. Dumon, D. V. Thourhout, and R. Baets, “Subnanometer linewidth uniformity in silicon nanophotonic waveguide devices using CMOS fabrication technology,” IEEE J. Sel. Top. Quantum Electron. 16, 316–324 (2010).
[Crossref]
R. Wu, C. H. Chen, T. C. Huang, R. Beausoleil, and K. T. Cheng, “Spatial pattern analysis of process variations in silicon microring modulators,” in IEEE Optical Interconnects Conference (2016), pp. 116–117.
R. G. Beausoleil, A. Faraon, D. Fattal, M. Fiorentino, Z. Peng, and C. Santori, “Devices and architectures for large-scale integrated silicon photonics circuits,” Proc. SPIE 7942, 794204 (2011).
[Crossref]
Y. Yang, Y. Ma, H. Guan, Y. Liu, S. Danziger, S. Ocheltree, K. Bergman, T. Baehr-Jones, and M. Hochberg, “Phase coherence length in silicon photonic platform,” Opt. Express 23, 16890–16902 (2015).
[Crossref]
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W. Bogaerts, P. De Heyn, T. Van Vaerenbergh, K. De Vos, S. Kumar Selvaraja, T. Claes, P. Dumon, P. Bienstman, D. Van Thourhout, and R. Baets, “Silicon microring resonators,” Laser Photonics Rev. 6, 47–73 (2012).
[Crossref]
A. Agarwal, D. Blaauw, and V. Zolotov, “Statistical timing analysis for intra-die process variations with spatial correlations,” in International Conference on Computer Aided Design (2003), pp. 900–907.
Y. Xing, D. Spina, A. Li, T. Dhaene, and W. Bogaerts, “Stochastic collocation for device-level variability analysis in integrated photonics,” Photonics Res. 4, 93–100 (2016).
[Crossref]
S. K. Selvaraja, G. Winroth, S. Locorotondo, G. Murdoch, A. Milenin, C. Delvaux, P. Ong, S. Pathak, W. Xie, G. Sterckx, G. Lepage, D. Van Thourhout, W. Bogaerts, J. Van Campenhout, and P. Absil, “193nm immersion lithography for high-performance silicon photonic circuits,” Proc. SPIE 9052, 90520F (2014).
W. Bogaerts, M. Fiers, and P. Dumon, “Design challenges in silicon photonics,” IEEE J. Sel. Top. Quantum Electron. 20, 1–8 (2014).
[Crossref]
W. Bogaerts, P. De Heyn, T. Van Vaerenbergh, K. De Vos, S. Kumar Selvaraja, T. Claes, P. Dumon, P. Bienstman, D. Van Thourhout, and R. Baets, “Silicon microring resonators,” Laser Photonics Rev. 6, 47–73 (2012).
[Crossref]
S. K. Selvaraja, W. Bogaerts, P. Dumon, D. V. Thourhout, and R. Baets, “Subnanometer linewidth uniformity in silicon nanophotonic waveguide devices using CMOS fabrication technology,” IEEE J. Sel. Top. Quantum Electron. 16, 316–324 (2010).
[Crossref]
S. K. Selvaraja, E. Rosseel, L. Fernandez, M. Tabat, W. Bogaerts, J. Hautala, and P. Absil, “SOI thickness uniformity improvement using wafer-scale corrective etching for silicon nano-photonic device,” in Proceedings of the 2011 Annual Symposium of the IEEE Photonics Benelux Chapter (2011), pp. 289–292.
S. K. Selvaraja, E. Rosseel, L. Fernandez, M. Tabat, W. Bogaerts, J. Hautala, and P. Absil, “SOI thickness uniformity improvement using corrective etching for silicon nano-photonic device,” in 8th IEEE International Conference on Group IV Photonics (2011), pp. 71–73.
Y. Wang, X. Wang, J. Flueckiger, H. Yun, W. Shi, R. Bojko, N. A. F. Jaeger, and L. Chrostowski, “Focusing sub-wavelength grating couplers with low back reflections for rapid prototyping of silicon photonic circuits,” Opt. Express 22, 20652–20662 (2014).
[Crossref]
N. Eid, H. Jayatilleka, M. Caverley, S. Shekhar, L. Chrostowski, and N. A. F. Jaeger, “Wide FSR silicon-on-insulator microring resonator with bent couplers,” IEEE 12th International Conference on Group IV Photonics (GFP, 2015), paper 96–97.
R. Wu, C. H. Chen, T. C. Huang, R. Beausoleil, and K. T. Cheng, “Spatial pattern analysis of process variations in silicon microring modulators,” in IEEE Optical Interconnects Conference (2016), pp. 116–117.
D. X. Xu, J. H. Schmid, G. T. Reed, G. Z. Mashanovich, D. J. Thomson, M. Nedeljkovic, X. Chen, D. V. Thourhout, S. Keyvaninia, and S. K. Selvaraja, “Silicon photonic integration platform–have we found the sweet spot,” IEEE J. Sel. Top. Quantum Electron. 20, 189–205 (2014).
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[Crossref]
L. Chrostowski, Z. Lu, J. Flückiger, J. Pond, J. Klein, X. Wang, S. Li, W. Tai, E. Y. Hsu, C. Kim, J. Ferguson, and C. Cone, “Schematic driven silicon photonics design,” Proc. SPIE 9751, 975103 (2016).
[Crossref]
Z. Lu, H. Yun, Y. Wang, Z. Chen, F. Zhang, N. A. F. Jaeger, and L. Chrostowski, “Broadband silicon photonic directional coupler using asymmetric-waveguide based phase control,” Opt. Express 23, 3795–3808 (2015).
[Crossref]
[PubMed]
Y. Wang, X. Wang, J. Flueckiger, H. Yun, W. Shi, R. Bojko, N. A. F. Jaeger, and L. Chrostowski, “Focusing sub-wavelength grating couplers with low back reflections for rapid prototyping of silicon photonic circuits,” Opt. Express 22, 20652–20662 (2014).
[Crossref]
X. Wang, W. Shi, H. Yun, S. Grist, N. A. F. Jaeger, and L. Chrostowski, “Narrow-band waveguide Bragg gratings on SOI wafers with CMOS-compatible fabrication process,” Opt. Express 20, 15547–15558 (2012).
[Crossref]
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L. Chrostowski, X. Wang, J. Flueckiger, Y. Wu, Y. Wang, and S. T. Fard, “Impact of fabrication non-uniformity on chip-scale silicon photonic integrated circuits,” in Optical Fiber Communication Conference (2014), paper. Th2A.37.
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L. Chrostowski and M. Hochberg, Silicon Photonics Design (Cambridge University, 2015).
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N. Eid, H. Jayatilleka, M. Caverley, S. Shekhar, L. Chrostowski, and N. A. F. Jaeger, “Wide FSR silicon-on-insulator microring resonator with bent couplers,” IEEE 12th International Conference on Group IV Photonics (GFP, 2015), paper 96–97.
W. Bogaerts, P. De Heyn, T. Van Vaerenbergh, K. De Vos, S. Kumar Selvaraja, T. Claes, P. Dumon, P. Bienstman, D. Van Thourhout, and R. Baets, “Silicon microring resonators,” Laser Photonics Rev. 6, 47–73 (2012).
[Crossref]
L. Chrostowski, Z. Lu, J. Flückiger, J. Pond, J. Klein, X. Wang, S. Li, W. Tai, E. Y. Hsu, C. Kim, J. Ferguson, and C. Cone, “Schematic driven silicon photonics design,” Proc. SPIE 9751, 975103 (2016).
[Crossref]
Y. Yang, Y. Ma, H. Guan, Y. Liu, S. Danziger, S. Ocheltree, K. Bergman, T. Baehr-Jones, and M. Hochberg, “Phase coherence length in silicon photonic platform,” Opt. Express 23, 16890–16902 (2015).
[Crossref]
[PubMed]
S. K. Selvaraja, G. Winroth, S. Locorotondo, G. Murdoch, A. Milenin, C. Delvaux, P. Ong, S. Pathak, W. Xie, G. Sterckx, G. Lepage, D. Van Thourhout, W. Bogaerts, J. Van Campenhout, and P. Absil, “193nm immersion lithography for high-performance silicon photonic circuits,” Proc. SPIE 9052, 90520F (2014).
Y. Xing, D. Spina, A. Li, T. Dhaene, and W. Bogaerts, “Stochastic collocation for device-level variability analysis in integrated photonics,” Photonics Res. 4, 93–100 (2016).
[Crossref]
W. Bogaerts, M. Fiers, and P. Dumon, “Design challenges in silicon photonics,” IEEE J. Sel. Top. Quantum Electron. 20, 1–8 (2014).
[Crossref]
W. Bogaerts, P. De Heyn, T. Van Vaerenbergh, K. De Vos, S. Kumar Selvaraja, T. Claes, P. Dumon, P. Bienstman, D. Van Thourhout, and R. Baets, “Silicon microring resonators,” Laser Photonics Rev. 6, 47–73 (2012).
[Crossref]
S. K. Selvaraja, W. Bogaerts, P. Dumon, D. V. Thourhout, and R. Baets, “Subnanometer linewidth uniformity in silicon nanophotonic waveguide devices using CMOS fabrication technology,” IEEE J. Sel. Top. Quantum Electron. 16, 316–324 (2010).
[Crossref]
N. Eid, H. Jayatilleka, M. Caverley, S. Shekhar, L. Chrostowski, and N. A. F. Jaeger, “Wide FSR silicon-on-insulator microring resonator with bent couplers,” IEEE 12th International Conference on Group IV Photonics (GFP, 2015), paper 96–97.
R. G. Beausoleil, A. Faraon, D. Fattal, M. Fiorentino, Z. Peng, and C. Santori, “Devices and architectures for large-scale integrated silicon photonics circuits,” Proc. SPIE 7942, 794204 (2011).
[Crossref]
L. Chrostowski, X. Wang, J. Flueckiger, Y. Wu, Y. Wang, and S. T. Fard, “Impact of fabrication non-uniformity on chip-scale silicon photonic integrated circuits,” in Optical Fiber Communication Conference (2014), paper. Th2A.37.
[Crossref]
R. G. Beausoleil, A. Faraon, D. Fattal, M. Fiorentino, Z. Peng, and C. Santori, “Devices and architectures for large-scale integrated silicon photonics circuits,” Proc. SPIE 7942, 794204 (2011).
[Crossref]
L. Chrostowski, Z. Lu, J. Flückiger, J. Pond, J. Klein, X. Wang, S. Li, W. Tai, E. Y. Hsu, C. Kim, J. Ferguson, and C. Cone, “Schematic driven silicon photonics design,” Proc. SPIE 9751, 975103 (2016).
[Crossref]
S. K. Selvaraja, E. Rosseel, L. Fernandez, M. Tabat, W. Bogaerts, J. Hautala, and P. Absil, “SOI thickness uniformity improvement using wafer-scale corrective etching for silicon nano-photonic device,” in Proceedings of the 2011 Annual Symposium of the IEEE Photonics Benelux Chapter (2011), pp. 289–292.
S. K. Selvaraja, E. Rosseel, L. Fernandez, M. Tabat, W. Bogaerts, J. Hautala, and P. Absil, “SOI thickness uniformity improvement using corrective etching for silicon nano-photonic device,” in 8th IEEE International Conference on Group IV Photonics (2011), pp. 71–73.
W. Bogaerts, M. Fiers, and P. Dumon, “Design challenges in silicon photonics,” IEEE J. Sel. Top. Quantum Electron. 20, 1–8 (2014).
[Crossref]
R. G. Beausoleil, A. Faraon, D. Fattal, M. Fiorentino, Z. Peng, and C. Santori, “Devices and architectures for large-scale integrated silicon photonics circuits,” Proc. SPIE 7942, 794204 (2011).
[Crossref]
L. Chrostowski, Z. Lu, J. Flückiger, J. Pond, J. Klein, X. Wang, S. Li, W. Tai, E. Y. Hsu, C. Kim, J. Ferguson, and C. Cone, “Schematic driven silicon photonics design,” Proc. SPIE 9751, 975103 (2016).
[Crossref]
L. Chrostowski, Z. Lu, J. Flueckiger, X. Wang, J. Klein, A. Liu, J. Jhoja, and J. Pond, “Design and simulation of silicon photonic schematics and layouts,” Proc. SPIE 9891, 989114 (2016).
[Crossref]
Y. Wang, X. Wang, J. Flueckiger, H. Yun, W. Shi, R. Bojko, N. A. F. Jaeger, and L. Chrostowski, “Focusing sub-wavelength grating couplers with low back reflections for rapid prototyping of silicon photonic circuits,” Opt. Express 22, 20652–20662 (2014).
[Crossref]
L. Chrostowski, X. Wang, J. Flueckiger, Y. Wu, Y. Wang, and S. T. Fard, “Impact of fabrication non-uniformity on chip-scale silicon photonic integrated circuits,” in Optical Fiber Communication Conference (2014), paper. Th2A.37.
[Crossref]
Y. Yang, Y. Ma, H. Guan, Y. Liu, S. Danziger, S. Ocheltree, K. Bergman, T. Baehr-Jones, and M. Hochberg, “Phase coherence length in silicon photonic platform,” Opt. Express 23, 16890–16902 (2015).
[Crossref]
[PubMed]
S. K. Selvaraja, E. Rosseel, L. Fernandez, M. Tabat, W. Bogaerts, J. Hautala, and P. Absil, “SOI thickness uniformity improvement using corrective etching for silicon nano-photonic device,” in 8th IEEE International Conference on Group IV Photonics (2011), pp. 71–73.
S. K. Selvaraja, E. Rosseel, L. Fernandez, M. Tabat, W. Bogaerts, J. Hautala, and P. Absil, “SOI thickness uniformity improvement using wafer-scale corrective etching for silicon nano-photonic device,” in Proceedings of the 2011 Annual Symposium of the IEEE Photonics Benelux Chapter (2011), pp. 289–292.
W. Bogaerts, P. De Heyn, T. Van Vaerenbergh, K. De Vos, S. Kumar Selvaraja, T. Claes, P. Dumon, P. Bienstman, D. Van Thourhout, and R. Baets, “Silicon microring resonators,” Laser Photonics Rev. 6, 47–73 (2012).
[Crossref]
Y. Yang, Y. Ma, H. Guan, Y. Liu, S. Danziger, S. Ocheltree, K. Bergman, T. Baehr-Jones, and M. Hochberg, “Phase coherence length in silicon photonic platform,” Opt. Express 23, 16890–16902 (2015).
[Crossref]
[PubMed]
Y. Zhang, S. Yang, A. E.-J. Lim, G.-Q. Lo, C. Galland, T. Baehr-Jones, and M. Hochberg, “A compact and low loss y-junction for submicron silicon waveguide,” Opt. Express 21, 1310–1316 (2013).
[Crossref]
[PubMed]
L. Chrostowski and M. Hochberg, Silicon Photonics Design (Cambridge University, 2015).
[Crossref]
L. Chrostowski, Z. Lu, J. Flückiger, J. Pond, J. Klein, X. Wang, S. Li, W. Tai, E. Y. Hsu, C. Kim, J. Ferguson, and C. Cone, “Schematic driven silicon photonics design,” Proc. SPIE 9751, 975103 (2016).
[Crossref]
R. Wu, C. H. Chen, T. C. Huang, R. Beausoleil, and K. T. Cheng, “Spatial pattern analysis of process variations in silicon microring modulators,” in IEEE Optical Interconnects Conference (2016), pp. 116–117.
Z. Lu, H. Yun, Y. Wang, Z. Chen, F. Zhang, N. A. F. Jaeger, and L. Chrostowski, “Broadband silicon photonic directional coupler using asymmetric-waveguide based phase control,” Opt. Express 23, 3795–3808 (2015).
[Crossref]
[PubMed]
Y. Wang, X. Wang, J. Flueckiger, H. Yun, W. Shi, R. Bojko, N. A. F. Jaeger, and L. Chrostowski, “Focusing sub-wavelength grating couplers with low back reflections for rapid prototyping of silicon photonic circuits,” Opt. Express 22, 20652–20662 (2014).
[Crossref]
X. Wang, W. Shi, H. Yun, S. Grist, N. A. F. Jaeger, and L. Chrostowski, “Narrow-band waveguide Bragg gratings on SOI wafers with CMOS-compatible fabrication process,” Opt. Express 20, 15547–15558 (2012).
[Crossref]
[PubMed]
N. Eid, H. Jayatilleka, M. Caverley, S. Shekhar, L. Chrostowski, and N. A. F. Jaeger, “Wide FSR silicon-on-insulator microring resonator with bent couplers,” IEEE 12th International Conference on Group IV Photonics (GFP, 2015), paper 96–97.
N. Eid, H. Jayatilleka, M. Caverley, S. Shekhar, L. Chrostowski, and N. A. F. Jaeger, “Wide FSR silicon-on-insulator microring resonator with bent couplers,” IEEE 12th International Conference on Group IV Photonics (GFP, 2015), paper 96–97.
L. Chrostowski, Z. Lu, J. Flueckiger, X. Wang, J. Klein, A. Liu, J. Jhoja, and J. Pond, “Design and simulation of silicon photonic schematics and layouts,” Proc. SPIE 9891, 989114 (2016).
[Crossref]
D. X. Xu, J. H. Schmid, G. T. Reed, G. Z. Mashanovich, D. J. Thomson, M. Nedeljkovic, X. Chen, D. V. Thourhout, S. Keyvaninia, and S. K. Selvaraja, “Silicon photonic integration platform–have we found the sweet spot,” IEEE J. Sel. Top. Quantum Electron. 20, 189–205 (2014).
[Crossref]
L. Chrostowski, Z. Lu, J. Flückiger, J. Pond, J. Klein, X. Wang, S. Li, W. Tai, E. Y. Hsu, C. Kim, J. Ferguson, and C. Cone, “Schematic driven silicon photonics design,” Proc. SPIE 9751, 975103 (2016).
[Crossref]
L. Chrostowski, Z. Lu, J. Flückiger, J. Pond, J. Klein, X. Wang, S. Li, W. Tai, E. Y. Hsu, C. Kim, J. Ferguson, and C. Cone, “Schematic driven silicon photonics design,” Proc. SPIE 9751, 975103 (2016).
[Crossref]
L. Chrostowski, Z. Lu, J. Flueckiger, X. Wang, J. Klein, A. Liu, J. Jhoja, and J. Pond, “Design and simulation of silicon photonic schematics and layouts,” Proc. SPIE 9891, 989114 (2016).
[Crossref]
W. Bogaerts, P. De Heyn, T. Van Vaerenbergh, K. De Vos, S. Kumar Selvaraja, T. Claes, P. Dumon, P. Bienstman, D. Van Thourhout, and R. Baets, “Silicon microring resonators,” Laser Photonics Rev. 6, 47–73 (2012).
[Crossref]
N. Ayotte, A. D. Simard, and S. LaRochelle, “Long integrated Bragg gratings for SOI wafer metrology,” IEEE Photonics Technol. Lett. 27, 755–758 (2015).
[Crossref]
L. Lavagno, L. Scheffer, and G. Martin, EDA for IC Implementation, Circuit Design, and Process Technology (CRC, 2006).
S. K. Selvaraja, G. Winroth, S. Locorotondo, G. Murdoch, A. Milenin, C. Delvaux, P. Ong, S. Pathak, W. Xie, G. Sterckx, G. Lepage, D. Van Thourhout, W. Bogaerts, J. Van Campenhout, and P. Absil, “193nm immersion lithography for high-performance silicon photonic circuits,” Proc. SPIE 9052, 90520F (2014).
Y. Xing, D. Spina, A. Li, T. Dhaene, and W. Bogaerts, “Stochastic collocation for device-level variability analysis in integrated photonics,” Photonics Res. 4, 93–100 (2016).
[Crossref]
L. Chrostowski, Z. Lu, J. Flückiger, J. Pond, J. Klein, X. Wang, S. Li, W. Tai, E. Y. Hsu, C. Kim, J. Ferguson, and C. Cone, “Schematic driven silicon photonics design,” Proc. SPIE 9751, 975103 (2016).
[Crossref]
L. Chrostowski, Z. Lu, J. Flueckiger, X. Wang, J. Klein, A. Liu, J. Jhoja, and J. Pond, “Design and simulation of silicon photonic schematics and layouts,” Proc. SPIE 9891, 989114 (2016).
[Crossref]
Y. Yang, Y. Ma, H. Guan, Y. Liu, S. Danziger, S. Ocheltree, K. Bergman, T. Baehr-Jones, and M. Hochberg, “Phase coherence length in silicon photonic platform,” Opt. Express 23, 16890–16902 (2015).
[Crossref]
[PubMed]
S. K. Selvaraja, G. Winroth, S. Locorotondo, G. Murdoch, A. Milenin, C. Delvaux, P. Ong, S. Pathak, W. Xie, G. Sterckx, G. Lepage, D. Van Thourhout, W. Bogaerts, J. Van Campenhout, and P. Absil, “193nm immersion lithography for high-performance silicon photonic circuits,” Proc. SPIE 9052, 90520F (2014).
L. Chrostowski, Z. Lu, J. Flückiger, J. Pond, J. Klein, X. Wang, S. Li, W. Tai, E. Y. Hsu, C. Kim, J. Ferguson, and C. Cone, “Schematic driven silicon photonics design,” Proc. SPIE 9751, 975103 (2016).
[Crossref]
L. Chrostowski, Z. Lu, J. Flueckiger, X. Wang, J. Klein, A. Liu, J. Jhoja, and J. Pond, “Design and simulation of silicon photonic schematics and layouts,” Proc. SPIE 9891, 989114 (2016).
[Crossref]
Z. Lu, H. Yun, Y. Wang, Z. Chen, F. Zhang, N. A. F. Jaeger, and L. Chrostowski, “Broadband silicon photonic directional coupler using asymmetric-waveguide based phase control,” Opt. Express 23, 3795–3808 (2015).
[Crossref]
[PubMed]
Y. Yang, Y. Ma, H. Guan, Y. Liu, S. Danziger, S. Ocheltree, K. Bergman, T. Baehr-Jones, and M. Hochberg, “Phase coherence length in silicon photonic platform,” Opt. Express 23, 16890–16902 (2015).
[Crossref]
[PubMed]
L. Lavagno, L. Scheffer, and G. Martin, EDA for IC Implementation, Circuit Design, and Process Technology (CRC, 2006).
D. X. Xu, J. H. Schmid, G. T. Reed, G. Z. Mashanovich, D. J. Thomson, M. Nedeljkovic, X. Chen, D. V. Thourhout, S. Keyvaninia, and S. K. Selvaraja, “Silicon photonic integration platform–have we found the sweet spot,” IEEE J. Sel. Top. Quantum Electron. 20, 189–205 (2014).
[Crossref]
D. Melati, A. Melloni, and F. Morichetti, “Real photonic waveguides: guiding light through imperfections,” Adv. Opt. Photonics 6, 156–224 (2014).
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T.-W. Weng, Z. Zhang, Z. Su, Y. Marzouk, A. Melloni, and L. Daniel, “Uncertainty quantification of silicon photonic devices with correlated and non-gaussian random parameters,” Opt. Express 23, 4242–4254 (2015).
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D. Melati, A. Melloni, and F. Morichetti, “Real photonic waveguides: guiding light through imperfections,” Adv. Opt. Photonics 6, 156–224 (2014).
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S. K. Selvaraja, G. Winroth, S. Locorotondo, G. Murdoch, A. Milenin, C. Delvaux, P. Ong, S. Pathak, W. Xie, G. Sterckx, G. Lepage, D. Van Thourhout, W. Bogaerts, J. Van Campenhout, and P. Absil, “193nm immersion lithography for high-performance silicon photonic circuits,” Proc. SPIE 9052, 90520F (2014).
D. Melati, A. Melloni, and F. Morichetti, “Real photonic waveguides: guiding light through imperfections,” Adv. Opt. Photonics 6, 156–224 (2014).
[Crossref]
S. K. Selvaraja, G. Winroth, S. Locorotondo, G. Murdoch, A. Milenin, C. Delvaux, P. Ong, S. Pathak, W. Xie, G. Sterckx, G. Lepage, D. Van Thourhout, W. Bogaerts, J. Van Campenhout, and P. Absil, “193nm immersion lithography for high-performance silicon photonic circuits,” Proc. SPIE 9052, 90520F (2014).
D. X. Xu, J. H. Schmid, G. T. Reed, G. Z. Mashanovich, D. J. Thomson, M. Nedeljkovic, X. Chen, D. V. Thourhout, S. Keyvaninia, and S. K. Selvaraja, “Silicon photonic integration platform–have we found the sweet spot,” IEEE J. Sel. Top. Quantum Electron. 20, 189–205 (2014).
[Crossref]
Y. Yang, Y. Ma, H. Guan, Y. Liu, S. Danziger, S. Ocheltree, K. Bergman, T. Baehr-Jones, and M. Hochberg, “Phase coherence length in silicon photonic platform,” Opt. Express 23, 16890–16902 (2015).
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