Abstract

In this article we present a radial phase mask specially designed and manufactured for direct micro-structuration under UV photolithography of a cylindrical surface covered by a photoresist TiO2 film. The period of the phase mask is sub-micron (between 480 nm and 720 nm) and allows direct printing on several types of cylindrical components. With this dedicated reversible phase mask we have demonstrated the feasibility of a TiO2 grating with a period of 960 nm, printed on a SiO2 cylinder or inside a SiO2 tube of 8 mm diameter.

© 2017 Optical Society of America

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References

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  1. S. Tonchev, Y. Jourlin, S. Reynaud, and O. Parriaux, “Cylindrical grating projection by single-shot normal exposure of a radial phase mask,” IEEE Photonics J. 4(4), 1170–1177 (2012).
    [Crossref]
  2. S. Tonchev, Y. Jourlin, C. Veillas, S. Reynaud, N. Lyndin, O. Parriaux, J. Laukkanen, and M. Kuittinen, “Subwavelength cylindrical grating by holistic phase-mask coordinate transform,” Opt. Express 20(7), 7946–7953 (2012).
    [Crossref] [PubMed]
  3. G. Pellegrini, “Experimental methods for the preparation of selectively absorbing textured surfaces for photothermal solar conversion,” Sol. Energy Mater. Sol. Cells 3(3), 391–404 (1980).
    [Crossref]
  4. O. Parriaux, Y. Jourlin, and N. Lyndin, “Cylindrical grating rotation sensor,” U.S. Patent 20100245841 (March 22, 2010).
  5. S. Briche, Z. Tebby, D. Riassetto, M. Messaoud, E. Gamet, E. Pernot, H. Roussel, O. Dellea, Y. Jourlin, and M. Langlet, “New insights in photo-patterned sol-gel-derived TiO2 films,” J. Mater. Sci. 46(5), 1474–1486 (2011).
    [Crossref]
  6. V. Gâté, Y. Jourlin, F. Vocanson, O. Dellea, G. Vercasson, S. Reynaud, D. Riassetto, and M. Langlet, “Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist,” Opt. Mater. 35(9), 1706–1713 (2013).
    [Crossref]
  7. S. Josset, J. Taranto, N. Keller, V. Keller, M. C. Lett, M. J. Ledoux, V. Bonnet, and S. Rougeau, “UV-A photocatalytic treatment of high flow rate air contaminated with Legionella pneumophila,” Catal. Today 129(1-2), 215–222 (2007).
    [Crossref]
  8. N. Lyndin, “MC Grating software”, http://www.mcgrating.com .
  9. M. G. Moharam and T. K. Gaylord, “Rigorous coupled-wave analysis of planar-grating diffraction,” J. Opt. Soc. Am. 71(7), 811–818 (1981).
    [Crossref]

2013 (1)

V. Gâté, Y. Jourlin, F. Vocanson, O. Dellea, G. Vercasson, S. Reynaud, D. Riassetto, and M. Langlet, “Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist,” Opt. Mater. 35(9), 1706–1713 (2013).
[Crossref]

2012 (2)

S. Tonchev, Y. Jourlin, S. Reynaud, and O. Parriaux, “Cylindrical grating projection by single-shot normal exposure of a radial phase mask,” IEEE Photonics J. 4(4), 1170–1177 (2012).
[Crossref]

S. Tonchev, Y. Jourlin, C. Veillas, S. Reynaud, N. Lyndin, O. Parriaux, J. Laukkanen, and M. Kuittinen, “Subwavelength cylindrical grating by holistic phase-mask coordinate transform,” Opt. Express 20(7), 7946–7953 (2012).
[Crossref] [PubMed]

2011 (1)

S. Briche, Z. Tebby, D. Riassetto, M. Messaoud, E. Gamet, E. Pernot, H. Roussel, O. Dellea, Y. Jourlin, and M. Langlet, “New insights in photo-patterned sol-gel-derived TiO2 films,” J. Mater. Sci. 46(5), 1474–1486 (2011).
[Crossref]

2007 (1)

S. Josset, J. Taranto, N. Keller, V. Keller, M. C. Lett, M. J. Ledoux, V. Bonnet, and S. Rougeau, “UV-A photocatalytic treatment of high flow rate air contaminated with Legionella pneumophila,” Catal. Today 129(1-2), 215–222 (2007).
[Crossref]

1981 (1)

1980 (1)

G. Pellegrini, “Experimental methods for the preparation of selectively absorbing textured surfaces for photothermal solar conversion,” Sol. Energy Mater. Sol. Cells 3(3), 391–404 (1980).
[Crossref]

Bonnet, V.

S. Josset, J. Taranto, N. Keller, V. Keller, M. C. Lett, M. J. Ledoux, V. Bonnet, and S. Rougeau, “UV-A photocatalytic treatment of high flow rate air contaminated with Legionella pneumophila,” Catal. Today 129(1-2), 215–222 (2007).
[Crossref]

Briche, S.

S. Briche, Z. Tebby, D. Riassetto, M. Messaoud, E. Gamet, E. Pernot, H. Roussel, O. Dellea, Y. Jourlin, and M. Langlet, “New insights in photo-patterned sol-gel-derived TiO2 films,” J. Mater. Sci. 46(5), 1474–1486 (2011).
[Crossref]

Dellea, O.

V. Gâté, Y. Jourlin, F. Vocanson, O. Dellea, G. Vercasson, S. Reynaud, D. Riassetto, and M. Langlet, “Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist,” Opt. Mater. 35(9), 1706–1713 (2013).
[Crossref]

S. Briche, Z. Tebby, D. Riassetto, M. Messaoud, E. Gamet, E. Pernot, H. Roussel, O. Dellea, Y. Jourlin, and M. Langlet, “New insights in photo-patterned sol-gel-derived TiO2 films,” J. Mater. Sci. 46(5), 1474–1486 (2011).
[Crossref]

Gamet, E.

S. Briche, Z. Tebby, D. Riassetto, M. Messaoud, E. Gamet, E. Pernot, H. Roussel, O. Dellea, Y. Jourlin, and M. Langlet, “New insights in photo-patterned sol-gel-derived TiO2 films,” J. Mater. Sci. 46(5), 1474–1486 (2011).
[Crossref]

Gâté, V.

V. Gâté, Y. Jourlin, F. Vocanson, O. Dellea, G. Vercasson, S. Reynaud, D. Riassetto, and M. Langlet, “Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist,” Opt. Mater. 35(9), 1706–1713 (2013).
[Crossref]

Gaylord, T. K.

Josset, S.

S. Josset, J. Taranto, N. Keller, V. Keller, M. C. Lett, M. J. Ledoux, V. Bonnet, and S. Rougeau, “UV-A photocatalytic treatment of high flow rate air contaminated with Legionella pneumophila,” Catal. Today 129(1-2), 215–222 (2007).
[Crossref]

Jourlin, Y.

V. Gâté, Y. Jourlin, F. Vocanson, O. Dellea, G. Vercasson, S. Reynaud, D. Riassetto, and M. Langlet, “Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist,” Opt. Mater. 35(9), 1706–1713 (2013).
[Crossref]

S. Tonchev, Y. Jourlin, C. Veillas, S. Reynaud, N. Lyndin, O. Parriaux, J. Laukkanen, and M. Kuittinen, “Subwavelength cylindrical grating by holistic phase-mask coordinate transform,” Opt. Express 20(7), 7946–7953 (2012).
[Crossref] [PubMed]

S. Tonchev, Y. Jourlin, S. Reynaud, and O. Parriaux, “Cylindrical grating projection by single-shot normal exposure of a radial phase mask,” IEEE Photonics J. 4(4), 1170–1177 (2012).
[Crossref]

S. Briche, Z. Tebby, D. Riassetto, M. Messaoud, E. Gamet, E. Pernot, H. Roussel, O. Dellea, Y. Jourlin, and M. Langlet, “New insights in photo-patterned sol-gel-derived TiO2 films,” J. Mater. Sci. 46(5), 1474–1486 (2011).
[Crossref]

Keller, N.

S. Josset, J. Taranto, N. Keller, V. Keller, M. C. Lett, M. J. Ledoux, V. Bonnet, and S. Rougeau, “UV-A photocatalytic treatment of high flow rate air contaminated with Legionella pneumophila,” Catal. Today 129(1-2), 215–222 (2007).
[Crossref]

Keller, V.

S. Josset, J. Taranto, N. Keller, V. Keller, M. C. Lett, M. J. Ledoux, V. Bonnet, and S. Rougeau, “UV-A photocatalytic treatment of high flow rate air contaminated with Legionella pneumophila,” Catal. Today 129(1-2), 215–222 (2007).
[Crossref]

Kuittinen, M.

Langlet, M.

V. Gâté, Y. Jourlin, F. Vocanson, O. Dellea, G. Vercasson, S. Reynaud, D. Riassetto, and M. Langlet, “Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist,” Opt. Mater. 35(9), 1706–1713 (2013).
[Crossref]

S. Briche, Z. Tebby, D. Riassetto, M. Messaoud, E. Gamet, E. Pernot, H. Roussel, O. Dellea, Y. Jourlin, and M. Langlet, “New insights in photo-patterned sol-gel-derived TiO2 films,” J. Mater. Sci. 46(5), 1474–1486 (2011).
[Crossref]

Laukkanen, J.

Ledoux, M. J.

S. Josset, J. Taranto, N. Keller, V. Keller, M. C. Lett, M. J. Ledoux, V. Bonnet, and S. Rougeau, “UV-A photocatalytic treatment of high flow rate air contaminated with Legionella pneumophila,” Catal. Today 129(1-2), 215–222 (2007).
[Crossref]

Lett, M. C.

S. Josset, J. Taranto, N. Keller, V. Keller, M. C. Lett, M. J. Ledoux, V. Bonnet, and S. Rougeau, “UV-A photocatalytic treatment of high flow rate air contaminated with Legionella pneumophila,” Catal. Today 129(1-2), 215–222 (2007).
[Crossref]

Lyndin, N.

Messaoud, M.

S. Briche, Z. Tebby, D. Riassetto, M. Messaoud, E. Gamet, E. Pernot, H. Roussel, O. Dellea, Y. Jourlin, and M. Langlet, “New insights in photo-patterned sol-gel-derived TiO2 films,” J. Mater. Sci. 46(5), 1474–1486 (2011).
[Crossref]

Moharam, M. G.

Parriaux, O.

S. Tonchev, Y. Jourlin, S. Reynaud, and O. Parriaux, “Cylindrical grating projection by single-shot normal exposure of a radial phase mask,” IEEE Photonics J. 4(4), 1170–1177 (2012).
[Crossref]

S. Tonchev, Y. Jourlin, C. Veillas, S. Reynaud, N. Lyndin, O. Parriaux, J. Laukkanen, and M. Kuittinen, “Subwavelength cylindrical grating by holistic phase-mask coordinate transform,” Opt. Express 20(7), 7946–7953 (2012).
[Crossref] [PubMed]

Pellegrini, G.

G. Pellegrini, “Experimental methods for the preparation of selectively absorbing textured surfaces for photothermal solar conversion,” Sol. Energy Mater. Sol. Cells 3(3), 391–404 (1980).
[Crossref]

Pernot, E.

S. Briche, Z. Tebby, D. Riassetto, M. Messaoud, E. Gamet, E. Pernot, H. Roussel, O. Dellea, Y. Jourlin, and M. Langlet, “New insights in photo-patterned sol-gel-derived TiO2 films,” J. Mater. Sci. 46(5), 1474–1486 (2011).
[Crossref]

Reynaud, S.

V. Gâté, Y. Jourlin, F. Vocanson, O. Dellea, G. Vercasson, S. Reynaud, D. Riassetto, and M. Langlet, “Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist,” Opt. Mater. 35(9), 1706–1713 (2013).
[Crossref]

S. Tonchev, Y. Jourlin, C. Veillas, S. Reynaud, N. Lyndin, O. Parriaux, J. Laukkanen, and M. Kuittinen, “Subwavelength cylindrical grating by holistic phase-mask coordinate transform,” Opt. Express 20(7), 7946–7953 (2012).
[Crossref] [PubMed]

S. Tonchev, Y. Jourlin, S. Reynaud, and O. Parriaux, “Cylindrical grating projection by single-shot normal exposure of a radial phase mask,” IEEE Photonics J. 4(4), 1170–1177 (2012).
[Crossref]

Riassetto, D.

V. Gâté, Y. Jourlin, F. Vocanson, O. Dellea, G. Vercasson, S. Reynaud, D. Riassetto, and M. Langlet, “Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist,” Opt. Mater. 35(9), 1706–1713 (2013).
[Crossref]

S. Briche, Z. Tebby, D. Riassetto, M. Messaoud, E. Gamet, E. Pernot, H. Roussel, O. Dellea, Y. Jourlin, and M. Langlet, “New insights in photo-patterned sol-gel-derived TiO2 films,” J. Mater. Sci. 46(5), 1474–1486 (2011).
[Crossref]

Rougeau, S.

S. Josset, J. Taranto, N. Keller, V. Keller, M. C. Lett, M. J. Ledoux, V. Bonnet, and S. Rougeau, “UV-A photocatalytic treatment of high flow rate air contaminated with Legionella pneumophila,” Catal. Today 129(1-2), 215–222 (2007).
[Crossref]

Roussel, H.

S. Briche, Z. Tebby, D. Riassetto, M. Messaoud, E. Gamet, E. Pernot, H. Roussel, O. Dellea, Y. Jourlin, and M. Langlet, “New insights in photo-patterned sol-gel-derived TiO2 films,” J. Mater. Sci. 46(5), 1474–1486 (2011).
[Crossref]

Taranto, J.

S. Josset, J. Taranto, N. Keller, V. Keller, M. C. Lett, M. J. Ledoux, V. Bonnet, and S. Rougeau, “UV-A photocatalytic treatment of high flow rate air contaminated with Legionella pneumophila,” Catal. Today 129(1-2), 215–222 (2007).
[Crossref]

Tebby, Z.

S. Briche, Z. Tebby, D. Riassetto, M. Messaoud, E. Gamet, E. Pernot, H. Roussel, O. Dellea, Y. Jourlin, and M. Langlet, “New insights in photo-patterned sol-gel-derived TiO2 films,” J. Mater. Sci. 46(5), 1474–1486 (2011).
[Crossref]

Tonchev, S.

S. Tonchev, Y. Jourlin, S. Reynaud, and O. Parriaux, “Cylindrical grating projection by single-shot normal exposure of a radial phase mask,” IEEE Photonics J. 4(4), 1170–1177 (2012).
[Crossref]

S. Tonchev, Y. Jourlin, C. Veillas, S. Reynaud, N. Lyndin, O. Parriaux, J. Laukkanen, and M. Kuittinen, “Subwavelength cylindrical grating by holistic phase-mask coordinate transform,” Opt. Express 20(7), 7946–7953 (2012).
[Crossref] [PubMed]

Veillas, C.

Vercasson, G.

V. Gâté, Y. Jourlin, F. Vocanson, O. Dellea, G. Vercasson, S. Reynaud, D. Riassetto, and M. Langlet, “Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist,” Opt. Mater. 35(9), 1706–1713 (2013).
[Crossref]

Vocanson, F.

V. Gâté, Y. Jourlin, F. Vocanson, O. Dellea, G. Vercasson, S. Reynaud, D. Riassetto, and M. Langlet, “Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist,” Opt. Mater. 35(9), 1706–1713 (2013).
[Crossref]

Catal. Today (1)

S. Josset, J. Taranto, N. Keller, V. Keller, M. C. Lett, M. J. Ledoux, V. Bonnet, and S. Rougeau, “UV-A photocatalytic treatment of high flow rate air contaminated with Legionella pneumophila,” Catal. Today 129(1-2), 215–222 (2007).
[Crossref]

IEEE Photonics J. (1)

S. Tonchev, Y. Jourlin, S. Reynaud, and O. Parriaux, “Cylindrical grating projection by single-shot normal exposure of a radial phase mask,” IEEE Photonics J. 4(4), 1170–1177 (2012).
[Crossref]

J. Mater. Sci. (1)

S. Briche, Z. Tebby, D. Riassetto, M. Messaoud, E. Gamet, E. Pernot, H. Roussel, O. Dellea, Y. Jourlin, and M. Langlet, “New insights in photo-patterned sol-gel-derived TiO2 films,” J. Mater. Sci. 46(5), 1474–1486 (2011).
[Crossref]

J. Opt. Soc. Am. (1)

Opt. Express (1)

Opt. Mater. (1)

V. Gâté, Y. Jourlin, F. Vocanson, O. Dellea, G. Vercasson, S. Reynaud, D. Riassetto, and M. Langlet, “Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist,” Opt. Mater. 35(9), 1706–1713 (2013).
[Crossref]

Sol. Energy Mater. Sol. Cells (1)

G. Pellegrini, “Experimental methods for the preparation of selectively absorbing textured surfaces for photothermal solar conversion,” Sol. Energy Mater. Sol. Cells 3(3), 391–404 (1980).
[Crossref]

Other (2)

O. Parriaux, Y. Jourlin, and N. Lyndin, “Cylindrical grating rotation sensor,” U.S. Patent 20100245841 (March 22, 2010).

N. Lyndin, “MC Grating software”, http://www.mcgrating.com .

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Figures (7)

Fig. 1
Fig. 1

Principle of the cylindrical photolithography a) radial phase mask, b) interferogram issued from the diffracted orders + 1 and −1 and c) cylinder or tube for grating printing.

Fig. 2
Fig. 2

Choice of the phase mask depth for TE and TM polarizations and for a normal incident wave a) from cover to substrate and b) from substrate to cover.

Fig. 3
Fig. 3

Choice of the phase mask line space ratio for TE and TM polarizations and for a normal incident wave a) from cover to substrate and b) from substrate to cover.

Fig. 4
Fig. 4

Geometry of the phase mask: a) designed and b) fabricated.

Fig. 5
Fig. 5

Phase mask: a) Photograph of the projected diffraction orders at 10 cm b) interferogram.

Fig. 6
Fig. 6

Optical bench for cylindrical lithography.

Fig. 7
Fig. 7

Grating on a cylindrical surface a) photograph of the cylinder, b) microscope image of the cylinder, c) 3D AFM image and d) AFM profile on the cylinder, e) photograph of the tube.

Equations (1)

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L cyl = L φcyl . R =( L φpm . R)/.

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