Abstract

High performance III-V lasers at datacom and telecom wavelengths on on-axis (001) Si are needed for scalable datacenter interconnect technologies. We demonstrate electrically injected quantum dot lasers grown on on-axis (001) Si patterned with {111} v-grooves lying in the [110] direction. No additional Ge buffers or substrate miscut was used. The active region consists of five InAs/InGaAs dot-in-a-well layers. We achieve continuous wave lasing with thresholds as low as 36 mA and operation up to 80°C.

© 2017 Optical Society of America

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    [Crossref]
  2. A. Y. Liu, C. Zhang, J. Norman, A. Snyder, D. Lubyshev, J. M. Fastenau, A. W. K. Liu, A. C. Gossard, and J. E. Bowers, “High performance continuous wave 1.3 µm quantum dot lasers on silicon,” Appl. Phys. Lett. 104(4), 041104 (2014).
    [Crossref] [PubMed]
  3. A. Y. Liu, S. Srinivasan, J. Norman, A. C. Gossard, and J. E. Bowers, “Quantum dot lasers for silicon photonics,” Photon. Reas. 3(5), B1–B9 (2015).
    [Crossref]
  4. A. Y. Liu, R. W. Herrick, O. Ueda, P. M. Petroff, A. C. Gossard, and J. E. Bowers, “Reliability of InAs/GaAs quantum dot lasers epitaxially grown on silicon,” IEEE J. Sel. Top. Quantum Electron. 21(6), 1900708 (2015).
    [Crossref]
  5. S. Chen, W. Li, J. Wu, Q. Jiang, M. Tang, S. Shutts, S. N. Elliott, A. Sobiesierski, A. J. Seeds, I. Ross, P. M. Smowton, and H. Liu, “Electrically pumped continuous-wave III-V quantum dot lasers on silicon,” Nat. Photonics 10(5), 307–311 (2016).
    [Crossref]
  6. A. Y. Liu, J. Peters, X. Huang, D. Jung, J. Norman, M. L. Lee, A. C. Gossard, and J. E. Bowers, “Electrically pumped continuous-wave 1.3 μm quantum-dot lasers epitaxially grown on on-axis (001) GaP/Si,” Opt. Lett. 42(2), 338–341 (2017).
    [Crossref] [PubMed]
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    [Crossref]
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    [Crossref]
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    [Crossref] [PubMed]
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    [Crossref] [PubMed]
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    [Crossref]
  14. Z. Wang, B. Tian, M. Pantouvaki, W. Guo, P. Absil, J. V. Campenhout, C. Merckling, and D. V. Thourhout, “Room-temperature InP distributed feedback laser array directly grown on silicon,” Nat. Photonics 9(12), 837–842 (2015).
    [Crossref]
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2017 (1)

2016 (5)

Y. Wan, Q. Li, A. Y. Liu, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “Optically pumped 1.3 μm room-temperature InAs quantum-dot micro-disk lasers directly grown on (001) silicon,” Opt. Lett. 41(7), 1664–1667 (2016).
[Crossref] [PubMed]

G. Kurczveil, D. Liang, M. Fiorentino, and R. G. Beausoleil, “Robust hybrid quantum dot laser for integrated silicon photonics,” Opt. Express 24(14), 16167–16174 (2016).
[Crossref] [PubMed]

Q. Li, Y. Wan, A. Y. Liu, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “1.3-μm InAs quantum-dot micro-disk lasers on V-groove patterned and unpatterned (001) silicon,” Opt. Express 24(18), 21038–21045 (2016).
[Crossref] [PubMed]

S. Chen, W. Li, J. Wu, Q. Jiang, M. Tang, S. Shutts, S. N. Elliott, A. Sobiesierski, A. J. Seeds, I. Ross, P. M. Smowton, and H. Liu, “Electrically pumped continuous-wave III-V quantum dot lasers on silicon,” Nat. Photonics 10(5), 307–311 (2016).
[Crossref]

Y. Wan, Q. Li, A. Y. Liu, W. W. Chow, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “Sub-wavelength InAs quantum dot micro-disk lasers epitaxially grown on exact Si (001) substrates,” Appl. Phys. Lett. 108(22), 221101 (2016).
[Crossref]

2015 (5)

Z. Wang, B. Tian, M. Pantouvaki, W. Guo, P. Absil, J. V. Campenhout, C. Merckling, and D. V. Thourhout, “Room-temperature InP distributed feedback laser array directly grown on silicon,” Nat. Photonics 9(12), 837–842 (2015).
[Crossref]

Q. Li, K. W. Ng, and K. M. Lau, “Growing antiphase-domain-free GaAs thin films out of highly ordered planar nanowire arrays on exact (001) silicon,” Appl. Phys. Lett. 106(7), 072105 (2015).
[Crossref]

Z. Zhou, B. Yin, and J. Michel, “On-chip light sources for silicon photonics,” Light Sci. Appl. 4(11), e358 (2015).
[Crossref]

A. Y. Liu, S. Srinivasan, J. Norman, A. C. Gossard, and J. E. Bowers, “Quantum dot lasers for silicon photonics,” Photon. Reas. 3(5), B1–B9 (2015).
[Crossref]

A. Y. Liu, R. W. Herrick, O. Ueda, P. M. Petroff, A. C. Gossard, and J. E. Bowers, “Reliability of InAs/GaAs quantum dot lasers epitaxially grown on silicon,” IEEE J. Sel. Top. Quantum Electron. 21(6), 1900708 (2015).
[Crossref]

2014 (1)

A. Y. Liu, C. Zhang, J. Norman, A. Snyder, D. Lubyshev, J. M. Fastenau, A. W. K. Liu, A. C. Gossard, and J. E. Bowers, “High performance continuous wave 1.3 µm quantum dot lasers on silicon,” Appl. Phys. Lett. 104(4), 041104 (2014).
[Crossref] [PubMed]

2012 (1)

M. Paladugu, C. Merckling, R. Loo, O. Richard, H. Bender, J. Dekoster, W. Vandervorst, M. Caymax, and M. Heyns, “Site selective integration of III-V materials on Si for nanoscale logic and photonic devices,” Cryst. Growth Des. 12(10), 4696–4702 (2012).
[Crossref]

Absil, P.

Z. Wang, B. Tian, M. Pantouvaki, W. Guo, P. Absil, J. V. Campenhout, C. Merckling, and D. V. Thourhout, “Room-temperature InP distributed feedback laser array directly grown on silicon,” Nat. Photonics 9(12), 837–842 (2015).
[Crossref]

Beausoleil, R. G.

Bender, H.

M. Paladugu, C. Merckling, R. Loo, O. Richard, H. Bender, J. Dekoster, W. Vandervorst, M. Caymax, and M. Heyns, “Site selective integration of III-V materials on Si for nanoscale logic and photonic devices,” Cryst. Growth Des. 12(10), 4696–4702 (2012).
[Crossref]

Bowers, J. E.

A. Y. Liu, J. Peters, X. Huang, D. Jung, J. Norman, M. L. Lee, A. C. Gossard, and J. E. Bowers, “Electrically pumped continuous-wave 1.3 μm quantum-dot lasers epitaxially grown on on-axis (001) GaP/Si,” Opt. Lett. 42(2), 338–341 (2017).
[Crossref] [PubMed]

Q. Li, Y. Wan, A. Y. Liu, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “1.3-μm InAs quantum-dot micro-disk lasers on V-groove patterned and unpatterned (001) silicon,” Opt. Express 24(18), 21038–21045 (2016).
[Crossref] [PubMed]

Y. Wan, Q. Li, A. Y. Liu, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “Optically pumped 1.3 μm room-temperature InAs quantum-dot micro-disk lasers directly grown on (001) silicon,” Opt. Lett. 41(7), 1664–1667 (2016).
[Crossref] [PubMed]

Y. Wan, Q. Li, A. Y. Liu, W. W. Chow, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “Sub-wavelength InAs quantum dot micro-disk lasers epitaxially grown on exact Si (001) substrates,” Appl. Phys. Lett. 108(22), 221101 (2016).
[Crossref]

A. Y. Liu, S. Srinivasan, J. Norman, A. C. Gossard, and J. E. Bowers, “Quantum dot lasers for silicon photonics,” Photon. Reas. 3(5), B1–B9 (2015).
[Crossref]

A. Y. Liu, R. W. Herrick, O. Ueda, P. M. Petroff, A. C. Gossard, and J. E. Bowers, “Reliability of InAs/GaAs quantum dot lasers epitaxially grown on silicon,” IEEE J. Sel. Top. Quantum Electron. 21(6), 1900708 (2015).
[Crossref]

A. Y. Liu, C. Zhang, J. Norman, A. Snyder, D. Lubyshev, J. M. Fastenau, A. W. K. Liu, A. C. Gossard, and J. E. Bowers, “High performance continuous wave 1.3 µm quantum dot lasers on silicon,” Appl. Phys. Lett. 104(4), 041104 (2014).
[Crossref] [PubMed]

Campenhout, J. V.

Z. Wang, B. Tian, M. Pantouvaki, W. Guo, P. Absil, J. V. Campenhout, C. Merckling, and D. V. Thourhout, “Room-temperature InP distributed feedback laser array directly grown on silicon,” Nat. Photonics 9(12), 837–842 (2015).
[Crossref]

Caymax, M.

M. Paladugu, C. Merckling, R. Loo, O. Richard, H. Bender, J. Dekoster, W. Vandervorst, M. Caymax, and M. Heyns, “Site selective integration of III-V materials on Si for nanoscale logic and photonic devices,” Cryst. Growth Des. 12(10), 4696–4702 (2012).
[Crossref]

Chen, S.

S. Chen, W. Li, J. Wu, Q. Jiang, M. Tang, S. Shutts, S. N. Elliott, A. Sobiesierski, A. J. Seeds, I. Ross, P. M. Smowton, and H. Liu, “Electrically pumped continuous-wave III-V quantum dot lasers on silicon,” Nat. Photonics 10(5), 307–311 (2016).
[Crossref]

Chow, W. W.

Y. Wan, Q. Li, A. Y. Liu, W. W. Chow, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “Sub-wavelength InAs quantum dot micro-disk lasers epitaxially grown on exact Si (001) substrates,” Appl. Phys. Lett. 108(22), 221101 (2016).
[Crossref]

Dekoster, J.

M. Paladugu, C. Merckling, R. Loo, O. Richard, H. Bender, J. Dekoster, W. Vandervorst, M. Caymax, and M. Heyns, “Site selective integration of III-V materials on Si for nanoscale logic and photonic devices,” Cryst. Growth Des. 12(10), 4696–4702 (2012).
[Crossref]

Elliott, S. N.

S. Chen, W. Li, J. Wu, Q. Jiang, M. Tang, S. Shutts, S. N. Elliott, A. Sobiesierski, A. J. Seeds, I. Ross, P. M. Smowton, and H. Liu, “Electrically pumped continuous-wave III-V quantum dot lasers on silicon,” Nat. Photonics 10(5), 307–311 (2016).
[Crossref]

Fastenau, J. M.

A. Y. Liu, C. Zhang, J. Norman, A. Snyder, D. Lubyshev, J. M. Fastenau, A. W. K. Liu, A. C. Gossard, and J. E. Bowers, “High performance continuous wave 1.3 µm quantum dot lasers on silicon,” Appl. Phys. Lett. 104(4), 041104 (2014).
[Crossref] [PubMed]

Fiorentino, M.

Gossard, A. C.

A. Y. Liu, J. Peters, X. Huang, D. Jung, J. Norman, M. L. Lee, A. C. Gossard, and J. E. Bowers, “Electrically pumped continuous-wave 1.3 μm quantum-dot lasers epitaxially grown on on-axis (001) GaP/Si,” Opt. Lett. 42(2), 338–341 (2017).
[Crossref] [PubMed]

Y. Wan, Q. Li, A. Y. Liu, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “Optically pumped 1.3 μm room-temperature InAs quantum-dot micro-disk lasers directly grown on (001) silicon,” Opt. Lett. 41(7), 1664–1667 (2016).
[Crossref] [PubMed]

Q. Li, Y. Wan, A. Y. Liu, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “1.3-μm InAs quantum-dot micro-disk lasers on V-groove patterned and unpatterned (001) silicon,” Opt. Express 24(18), 21038–21045 (2016).
[Crossref] [PubMed]

Y. Wan, Q. Li, A. Y. Liu, W. W. Chow, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “Sub-wavelength InAs quantum dot micro-disk lasers epitaxially grown on exact Si (001) substrates,” Appl. Phys. Lett. 108(22), 221101 (2016).
[Crossref]

A. Y. Liu, R. W. Herrick, O. Ueda, P. M. Petroff, A. C. Gossard, and J. E. Bowers, “Reliability of InAs/GaAs quantum dot lasers epitaxially grown on silicon,” IEEE J. Sel. Top. Quantum Electron. 21(6), 1900708 (2015).
[Crossref]

A. Y. Liu, S. Srinivasan, J. Norman, A. C. Gossard, and J. E. Bowers, “Quantum dot lasers for silicon photonics,” Photon. Reas. 3(5), B1–B9 (2015).
[Crossref]

A. Y. Liu, C. Zhang, J. Norman, A. Snyder, D. Lubyshev, J. M. Fastenau, A. W. K. Liu, A. C. Gossard, and J. E. Bowers, “High performance continuous wave 1.3 µm quantum dot lasers on silicon,” Appl. Phys. Lett. 104(4), 041104 (2014).
[Crossref] [PubMed]

Guo, W.

Z. Wang, B. Tian, M. Pantouvaki, W. Guo, P. Absil, J. V. Campenhout, C. Merckling, and D. V. Thourhout, “Room-temperature InP distributed feedback laser array directly grown on silicon,” Nat. Photonics 9(12), 837–842 (2015).
[Crossref]

Herrick, R. W.

A. Y. Liu, R. W. Herrick, O. Ueda, P. M. Petroff, A. C. Gossard, and J. E. Bowers, “Reliability of InAs/GaAs quantum dot lasers epitaxially grown on silicon,” IEEE J. Sel. Top. Quantum Electron. 21(6), 1900708 (2015).
[Crossref]

Heyns, M.

M. Paladugu, C. Merckling, R. Loo, O. Richard, H. Bender, J. Dekoster, W. Vandervorst, M. Caymax, and M. Heyns, “Site selective integration of III-V materials on Si for nanoscale logic and photonic devices,” Cryst. Growth Des. 12(10), 4696–4702 (2012).
[Crossref]

Hu, E. L.

Huang, X.

Jiang, Q.

S. Chen, W. Li, J. Wu, Q. Jiang, M. Tang, S. Shutts, S. N. Elliott, A. Sobiesierski, A. J. Seeds, I. Ross, P. M. Smowton, and H. Liu, “Electrically pumped continuous-wave III-V quantum dot lasers on silicon,” Nat. Photonics 10(5), 307–311 (2016).
[Crossref]

Jung, D.

Kurczveil, G.

Lau, K. M.

Q. Li, Y. Wan, A. Y. Liu, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “1.3-μm InAs quantum-dot micro-disk lasers on V-groove patterned and unpatterned (001) silicon,” Opt. Express 24(18), 21038–21045 (2016).
[Crossref] [PubMed]

Y. Wan, Q. Li, A. Y. Liu, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “Optically pumped 1.3 μm room-temperature InAs quantum-dot micro-disk lasers directly grown on (001) silicon,” Opt. Lett. 41(7), 1664–1667 (2016).
[Crossref] [PubMed]

Y. Wan, Q. Li, A. Y. Liu, W. W. Chow, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “Sub-wavelength InAs quantum dot micro-disk lasers epitaxially grown on exact Si (001) substrates,” Appl. Phys. Lett. 108(22), 221101 (2016).
[Crossref]

Q. Li, K. W. Ng, and K. M. Lau, “Growing antiphase-domain-free GaAs thin films out of highly ordered planar nanowire arrays on exact (001) silicon,” Appl. Phys. Lett. 106(7), 072105 (2015).
[Crossref]

Lee, M. L.

Li, Q.

Q. Li, Y. Wan, A. Y. Liu, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “1.3-μm InAs quantum-dot micro-disk lasers on V-groove patterned and unpatterned (001) silicon,” Opt. Express 24(18), 21038–21045 (2016).
[Crossref] [PubMed]

Y. Wan, Q. Li, A. Y. Liu, W. W. Chow, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “Sub-wavelength InAs quantum dot micro-disk lasers epitaxially grown on exact Si (001) substrates,” Appl. Phys. Lett. 108(22), 221101 (2016).
[Crossref]

Y. Wan, Q. Li, A. Y. Liu, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “Optically pumped 1.3 μm room-temperature InAs quantum-dot micro-disk lasers directly grown on (001) silicon,” Opt. Lett. 41(7), 1664–1667 (2016).
[Crossref] [PubMed]

Q. Li, K. W. Ng, and K. M. Lau, “Growing antiphase-domain-free GaAs thin films out of highly ordered planar nanowire arrays on exact (001) silicon,” Appl. Phys. Lett. 106(7), 072105 (2015).
[Crossref]

Li, W.

S. Chen, W. Li, J. Wu, Q. Jiang, M. Tang, S. Shutts, S. N. Elliott, A. Sobiesierski, A. J. Seeds, I. Ross, P. M. Smowton, and H. Liu, “Electrically pumped continuous-wave III-V quantum dot lasers on silicon,” Nat. Photonics 10(5), 307–311 (2016).
[Crossref]

Liang, D.

Liu, A. W. K.

A. Y. Liu, C. Zhang, J. Norman, A. Snyder, D. Lubyshev, J. M. Fastenau, A. W. K. Liu, A. C. Gossard, and J. E. Bowers, “High performance continuous wave 1.3 µm quantum dot lasers on silicon,” Appl. Phys. Lett. 104(4), 041104 (2014).
[Crossref] [PubMed]

Liu, A. Y.

A. Y. Liu, J. Peters, X. Huang, D. Jung, J. Norman, M. L. Lee, A. C. Gossard, and J. E. Bowers, “Electrically pumped continuous-wave 1.3 μm quantum-dot lasers epitaxially grown on on-axis (001) GaP/Si,” Opt. Lett. 42(2), 338–341 (2017).
[Crossref] [PubMed]

Q. Li, Y. Wan, A. Y. Liu, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “1.3-μm InAs quantum-dot micro-disk lasers on V-groove patterned and unpatterned (001) silicon,” Opt. Express 24(18), 21038–21045 (2016).
[Crossref] [PubMed]

Y. Wan, Q. Li, A. Y. Liu, W. W. Chow, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “Sub-wavelength InAs quantum dot micro-disk lasers epitaxially grown on exact Si (001) substrates,” Appl. Phys. Lett. 108(22), 221101 (2016).
[Crossref]

Y. Wan, Q. Li, A. Y. Liu, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “Optically pumped 1.3 μm room-temperature InAs quantum-dot micro-disk lasers directly grown on (001) silicon,” Opt. Lett. 41(7), 1664–1667 (2016).
[Crossref] [PubMed]

A. Y. Liu, S. Srinivasan, J. Norman, A. C. Gossard, and J. E. Bowers, “Quantum dot lasers for silicon photonics,” Photon. Reas. 3(5), B1–B9 (2015).
[Crossref]

A. Y. Liu, R. W. Herrick, O. Ueda, P. M. Petroff, A. C. Gossard, and J. E. Bowers, “Reliability of InAs/GaAs quantum dot lasers epitaxially grown on silicon,” IEEE J. Sel. Top. Quantum Electron. 21(6), 1900708 (2015).
[Crossref]

A. Y. Liu, C. Zhang, J. Norman, A. Snyder, D. Lubyshev, J. M. Fastenau, A. W. K. Liu, A. C. Gossard, and J. E. Bowers, “High performance continuous wave 1.3 µm quantum dot lasers on silicon,” Appl. Phys. Lett. 104(4), 041104 (2014).
[Crossref] [PubMed]

Liu, H.

S. Chen, W. Li, J. Wu, Q. Jiang, M. Tang, S. Shutts, S. N. Elliott, A. Sobiesierski, A. J. Seeds, I. Ross, P. M. Smowton, and H. Liu, “Electrically pumped continuous-wave III-V quantum dot lasers on silicon,” Nat. Photonics 10(5), 307–311 (2016).
[Crossref]

Loo, R.

M. Paladugu, C. Merckling, R. Loo, O. Richard, H. Bender, J. Dekoster, W. Vandervorst, M. Caymax, and M. Heyns, “Site selective integration of III-V materials on Si for nanoscale logic and photonic devices,” Cryst. Growth Des. 12(10), 4696–4702 (2012).
[Crossref]

Lubyshev, D.

A. Y. Liu, C. Zhang, J. Norman, A. Snyder, D. Lubyshev, J. M. Fastenau, A. W. K. Liu, A. C. Gossard, and J. E. Bowers, “High performance continuous wave 1.3 µm quantum dot lasers on silicon,” Appl. Phys. Lett. 104(4), 041104 (2014).
[Crossref] [PubMed]

Merckling, C.

Z. Wang, B. Tian, M. Pantouvaki, W. Guo, P. Absil, J. V. Campenhout, C. Merckling, and D. V. Thourhout, “Room-temperature InP distributed feedback laser array directly grown on silicon,” Nat. Photonics 9(12), 837–842 (2015).
[Crossref]

M. Paladugu, C. Merckling, R. Loo, O. Richard, H. Bender, J. Dekoster, W. Vandervorst, M. Caymax, and M. Heyns, “Site selective integration of III-V materials on Si for nanoscale logic and photonic devices,” Cryst. Growth Des. 12(10), 4696–4702 (2012).
[Crossref]

Michel, J.

Z. Zhou, B. Yin, and J. Michel, “On-chip light sources for silicon photonics,” Light Sci. Appl. 4(11), e358 (2015).
[Crossref]

Ng, K. W.

Q. Li, K. W. Ng, and K. M. Lau, “Growing antiphase-domain-free GaAs thin films out of highly ordered planar nanowire arrays on exact (001) silicon,” Appl. Phys. Lett. 106(7), 072105 (2015).
[Crossref]

Norman, J.

A. Y. Liu, J. Peters, X. Huang, D. Jung, J. Norman, M. L. Lee, A. C. Gossard, and J. E. Bowers, “Electrically pumped continuous-wave 1.3 μm quantum-dot lasers epitaxially grown on on-axis (001) GaP/Si,” Opt. Lett. 42(2), 338–341 (2017).
[Crossref] [PubMed]

A. Y. Liu, S. Srinivasan, J. Norman, A. C. Gossard, and J. E. Bowers, “Quantum dot lasers for silicon photonics,” Photon. Reas. 3(5), B1–B9 (2015).
[Crossref]

A. Y. Liu, C. Zhang, J. Norman, A. Snyder, D. Lubyshev, J. M. Fastenau, A. W. K. Liu, A. C. Gossard, and J. E. Bowers, “High performance continuous wave 1.3 µm quantum dot lasers on silicon,” Appl. Phys. Lett. 104(4), 041104 (2014).
[Crossref] [PubMed]

Paladugu, M.

M. Paladugu, C. Merckling, R. Loo, O. Richard, H. Bender, J. Dekoster, W. Vandervorst, M. Caymax, and M. Heyns, “Site selective integration of III-V materials on Si for nanoscale logic and photonic devices,” Cryst. Growth Des. 12(10), 4696–4702 (2012).
[Crossref]

Pantouvaki, M.

Z. Wang, B. Tian, M. Pantouvaki, W. Guo, P. Absil, J. V. Campenhout, C. Merckling, and D. V. Thourhout, “Room-temperature InP distributed feedback laser array directly grown on silicon,” Nat. Photonics 9(12), 837–842 (2015).
[Crossref]

Peters, J.

Petroff, P. M.

A. Y. Liu, R. W. Herrick, O. Ueda, P. M. Petroff, A. C. Gossard, and J. E. Bowers, “Reliability of InAs/GaAs quantum dot lasers epitaxially grown on silicon,” IEEE J. Sel. Top. Quantum Electron. 21(6), 1900708 (2015).
[Crossref]

Richard, O.

M. Paladugu, C. Merckling, R. Loo, O. Richard, H. Bender, J. Dekoster, W. Vandervorst, M. Caymax, and M. Heyns, “Site selective integration of III-V materials on Si for nanoscale logic and photonic devices,” Cryst. Growth Des. 12(10), 4696–4702 (2012).
[Crossref]

Ross, I.

S. Chen, W. Li, J. Wu, Q. Jiang, M. Tang, S. Shutts, S. N. Elliott, A. Sobiesierski, A. J. Seeds, I. Ross, P. M. Smowton, and H. Liu, “Electrically pumped continuous-wave III-V quantum dot lasers on silicon,” Nat. Photonics 10(5), 307–311 (2016).
[Crossref]

Seeds, A. J.

S. Chen, W. Li, J. Wu, Q. Jiang, M. Tang, S. Shutts, S. N. Elliott, A. Sobiesierski, A. J. Seeds, I. Ross, P. M. Smowton, and H. Liu, “Electrically pumped continuous-wave III-V quantum dot lasers on silicon,” Nat. Photonics 10(5), 307–311 (2016).
[Crossref]

Shutts, S.

S. Chen, W. Li, J. Wu, Q. Jiang, M. Tang, S. Shutts, S. N. Elliott, A. Sobiesierski, A. J. Seeds, I. Ross, P. M. Smowton, and H. Liu, “Electrically pumped continuous-wave III-V quantum dot lasers on silicon,” Nat. Photonics 10(5), 307–311 (2016).
[Crossref]

Smowton, P. M.

S. Chen, W. Li, J. Wu, Q. Jiang, M. Tang, S. Shutts, S. N. Elliott, A. Sobiesierski, A. J. Seeds, I. Ross, P. M. Smowton, and H. Liu, “Electrically pumped continuous-wave III-V quantum dot lasers on silicon,” Nat. Photonics 10(5), 307–311 (2016).
[Crossref]

Snyder, A.

A. Y. Liu, C. Zhang, J. Norman, A. Snyder, D. Lubyshev, J. M. Fastenau, A. W. K. Liu, A. C. Gossard, and J. E. Bowers, “High performance continuous wave 1.3 µm quantum dot lasers on silicon,” Appl. Phys. Lett. 104(4), 041104 (2014).
[Crossref] [PubMed]

Sobiesierski, A.

S. Chen, W. Li, J. Wu, Q. Jiang, M. Tang, S. Shutts, S. N. Elliott, A. Sobiesierski, A. J. Seeds, I. Ross, P. M. Smowton, and H. Liu, “Electrically pumped continuous-wave III-V quantum dot lasers on silicon,” Nat. Photonics 10(5), 307–311 (2016).
[Crossref]

Srinivasan, S.

A. Y. Liu, S. Srinivasan, J. Norman, A. C. Gossard, and J. E. Bowers, “Quantum dot lasers for silicon photonics,” Photon. Reas. 3(5), B1–B9 (2015).
[Crossref]

Tang, M.

S. Chen, W. Li, J. Wu, Q. Jiang, M. Tang, S. Shutts, S. N. Elliott, A. Sobiesierski, A. J. Seeds, I. Ross, P. M. Smowton, and H. Liu, “Electrically pumped continuous-wave III-V quantum dot lasers on silicon,” Nat. Photonics 10(5), 307–311 (2016).
[Crossref]

Thourhout, D. V.

Z. Wang, B. Tian, M. Pantouvaki, W. Guo, P. Absil, J. V. Campenhout, C. Merckling, and D. V. Thourhout, “Room-temperature InP distributed feedback laser array directly grown on silicon,” Nat. Photonics 9(12), 837–842 (2015).
[Crossref]

Tian, B.

Z. Wang, B. Tian, M. Pantouvaki, W. Guo, P. Absil, J. V. Campenhout, C. Merckling, and D. V. Thourhout, “Room-temperature InP distributed feedback laser array directly grown on silicon,” Nat. Photonics 9(12), 837–842 (2015).
[Crossref]

Ueda, O.

A. Y. Liu, R. W. Herrick, O. Ueda, P. M. Petroff, A. C. Gossard, and J. E. Bowers, “Reliability of InAs/GaAs quantum dot lasers epitaxially grown on silicon,” IEEE J. Sel. Top. Quantum Electron. 21(6), 1900708 (2015).
[Crossref]

Vandervorst, W.

M. Paladugu, C. Merckling, R. Loo, O. Richard, H. Bender, J. Dekoster, W. Vandervorst, M. Caymax, and M. Heyns, “Site selective integration of III-V materials on Si for nanoscale logic and photonic devices,” Cryst. Growth Des. 12(10), 4696–4702 (2012).
[Crossref]

Wan, Y.

Wang, Z.

Z. Wang, B. Tian, M. Pantouvaki, W. Guo, P. Absil, J. V. Campenhout, C. Merckling, and D. V. Thourhout, “Room-temperature InP distributed feedback laser array directly grown on silicon,” Nat. Photonics 9(12), 837–842 (2015).
[Crossref]

Wu, J.

S. Chen, W. Li, J. Wu, Q. Jiang, M. Tang, S. Shutts, S. N. Elliott, A. Sobiesierski, A. J. Seeds, I. Ross, P. M. Smowton, and H. Liu, “Electrically pumped continuous-wave III-V quantum dot lasers on silicon,” Nat. Photonics 10(5), 307–311 (2016).
[Crossref]

Yin, B.

Z. Zhou, B. Yin, and J. Michel, “On-chip light sources for silicon photonics,” Light Sci. Appl. 4(11), e358 (2015).
[Crossref]

Zhang, C.

A. Y. Liu, C. Zhang, J. Norman, A. Snyder, D. Lubyshev, J. M. Fastenau, A. W. K. Liu, A. C. Gossard, and J. E. Bowers, “High performance continuous wave 1.3 µm quantum dot lasers on silicon,” Appl. Phys. Lett. 104(4), 041104 (2014).
[Crossref] [PubMed]

Zhou, Z.

Z. Zhou, B. Yin, and J. Michel, “On-chip light sources for silicon photonics,” Light Sci. Appl. 4(11), e358 (2015).
[Crossref]

Appl. Phys. Lett. (3)

A. Y. Liu, C. Zhang, J. Norman, A. Snyder, D. Lubyshev, J. M. Fastenau, A. W. K. Liu, A. C. Gossard, and J. E. Bowers, “High performance continuous wave 1.3 µm quantum dot lasers on silicon,” Appl. Phys. Lett. 104(4), 041104 (2014).
[Crossref] [PubMed]

Q. Li, K. W. Ng, and K. M. Lau, “Growing antiphase-domain-free GaAs thin films out of highly ordered planar nanowire arrays on exact (001) silicon,” Appl. Phys. Lett. 106(7), 072105 (2015).
[Crossref]

Y. Wan, Q. Li, A. Y. Liu, W. W. Chow, A. C. Gossard, J. E. Bowers, E. L. Hu, and K. M. Lau, “Sub-wavelength InAs quantum dot micro-disk lasers epitaxially grown on exact Si (001) substrates,” Appl. Phys. Lett. 108(22), 221101 (2016).
[Crossref]

Cryst. Growth Des. (1)

M. Paladugu, C. Merckling, R. Loo, O. Richard, H. Bender, J. Dekoster, W. Vandervorst, M. Caymax, and M. Heyns, “Site selective integration of III-V materials on Si for nanoscale logic and photonic devices,” Cryst. Growth Des. 12(10), 4696–4702 (2012).
[Crossref]

IEEE J. Sel. Top. Quantum Electron. (1)

A. Y. Liu, R. W. Herrick, O. Ueda, P. M. Petroff, A. C. Gossard, and J. E. Bowers, “Reliability of InAs/GaAs quantum dot lasers epitaxially grown on silicon,” IEEE J. Sel. Top. Quantum Electron. 21(6), 1900708 (2015).
[Crossref]

Light Sci. Appl. (1)

Z. Zhou, B. Yin, and J. Michel, “On-chip light sources for silicon photonics,” Light Sci. Appl. 4(11), e358 (2015).
[Crossref]

Nat. Photonics (2)

Z. Wang, B. Tian, M. Pantouvaki, W. Guo, P. Absil, J. V. Campenhout, C. Merckling, and D. V. Thourhout, “Room-temperature InP distributed feedback laser array directly grown on silicon,” Nat. Photonics 9(12), 837–842 (2015).
[Crossref]

S. Chen, W. Li, J. Wu, Q. Jiang, M. Tang, S. Shutts, S. N. Elliott, A. Sobiesierski, A. J. Seeds, I. Ross, P. M. Smowton, and H. Liu, “Electrically pumped continuous-wave III-V quantum dot lasers on silicon,” Nat. Photonics 10(5), 307–311 (2016).
[Crossref]

Opt. Express (2)

Opt. Lett. (2)

Photon. Reas. (1)

A. Y. Liu, S. Srinivasan, J. Norman, A. C. Gossard, and J. E. Bowers, “Quantum dot lasers for silicon photonics,” Photon. Reas. 3(5), B1–B9 (2015).
[Crossref]

Other (2)

D. Jung, A. Y. Liu, J. Peters, J. Norman, X. Huang, M. L. Lee, A. C. Gossard, and J. E. Bowers, “Electrically pumped continuous wave III-V quantum dot lasers epitaxially grown on exact GaP/Si (001),” presented at the International Conference on Molecular Beam Epitaxy, Montpellier, France, 4–9, Sept. 2016.

A. Y. Liu, J. Peters, D. Jung, X. Huang, J. Norman, M. L. Lee, A. C. Gossard, and J. E. Bowers, “InAs/GaAs quantum dot lasers on exact GaP/Si (001),” presented at the North American Conference on Molecular Beam Epitaxy, Saratoga Springs, New York, 18–21, Sept. 2016.

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Figures (7)

Fig. 1
Fig. 1 Scanning electron microscope image of a polished facet with false color indicating the various sections of the device.
Fig. 2
Fig. 2 (a) A schematic cross-section of the fabricated devices. (b) Top-down optical micrograph of the fabricated ridge lasers before dicing.
Fig. 3
Fig. 3 Plan-view electron channeling contrast image (ECCI) of a GaAs-on-v-groove-Si template. The bright dashes are attributed to stacking faults while the pinpoints represent threading dislocations intersecting the sample surface. Counting reveals a threading dislocation density of 7x107 cm−2 and a stacking fault density of 2x107 cm−2. (Inset) The electron channeling pattern corresponding to the ( 2 ¯ 20) and (0 2 ¯ 0) imaging condition used.
Fig. 4
Fig. 4 (a) Atomic force microscope image of a 1x1 µm2 region of quantum dots showing a total dot density of 6x1010 cm−2. (b) A photoluminescence spectrum for the quantum dots grown on a native GaAs substrate with conditions identical to those used for the laser showing a peak wavelength of 1277 nm and full-width at half-maximum of 36 meV.
Fig. 5
Fig. 5 (a) Continuous wave light output and voltage as a function of the injection current of a 9x1200 µm2 device showing a threshold of 81 mA and maximum single-side output power of 55 mW. (b) The above threshold optical spectrum showing ground state lasing near 1250 nm which transitions to dual lasing attributed to multimode lasing from higher order transverse modes. Excited state lasing was not observed for the given injection levels.
Fig. 6
Fig. 6 The aggregation of laser performance figures of merit is presented. For clarity data from different cavity lengths has been shifted in the scatter plots to the left or right about a given ridge width. Error bars indicate the interquartile range of device performance, circular data points indicate the median peroformance, and triangles designate the best measurement for each cavity size. (a) Threshold current for all lasers of varying ridge width and length is plotted. (b) Threshold current density is plotted for all devices as a histogram showing peaked distribution around 700-1000 A/cm2 and a minimum value of 498 A/cm2. (c) The single-side peak output power (ground state lasing only) is plotted for according to geometry for all devices with a peak value of 84 mW. (d) The differential quantum efficiency is plotted for all devices calculated using the central wavelength of 1260 nm from Fig. 5(b) with a maximum value of 40%.
Fig. 7
Fig. 7 Continuous wave light output power as a function of injection current for a 8x1200 µm2 device with one polished facet and one 95% high reflection coated facet at temperatures from 20 to 80°C.

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