Abstract

Ta2O5/SiO2 quasi-rugate filters with high damage thresholds were deposited by ion-beam sputtering and then annealed at temperature of 200-800°C. The relations between microstructure, optical properties, chemical composition, weak absorption, and laser-induced damage threshold (LIDT) were studied. It was found that the transmittance spectra shifted to short wavelength as the annealing temperature increased. Three evolution courses of the films in the annealing process were analyzed by Atomic Force microscopy (AFM), Zygo interferometer measurement and Focused Ion Beam microscope (FIB). The decreased weak absorption during annealing process was found with significant effect on the LIDT. As the annealing temperature increased to 600°C, the weak absorption of films decreased from 39.99 to 7.2 ppm and the 50%-LIDTs increased from 59.32 to 158.87J/cm2. Distinct damage micrographs of the films annealed at different temperature were obtained. A combination of substoichiometric defect and structural defect dominant description was used to illustrate the aggravation of laser-induced damage.

© 2016 Optical Society of America

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References

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    [Crossref]
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    [Crossref] [PubMed]
  3. B. Wu, U. Bartch, M. Jupé, L. Jensen, M. Lappschies, K. Starke, and D. Ristau, “Morphology investigations of laser induced damage,” Proc. SPIE 6403, 640319 (2007).
    [Crossref]
  4. J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, “Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films,” Thin Solid Films 515(4), 1674–1682 (2006).
    [Crossref]
  5. X. L. He, J. H. Wu, X. M. Li, X. D. Gao, X. Y. Gan, and L. L. Zhao, “Effects of the post-annealing ambience on the microstructure and optical properties of tantalum oxide films prepared by pulsed laser deposition,” J. Alloys Compd. 478(1–2), 453–457 (2009).
    [Crossref]
  6. Y. N. Zhao, Y. J. Wang, H. Gong, J. D. Shao, and Zh. X. Fan, “Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors,” Appl. Surf. Sci. 210(3–4), 353–358 (2003).
    [Crossref]
  7. Y. S. Kim, S. H. K. Park, J. Y. Sun, and S. K. Jung, “Effect of rapid thermal annealing on the structure and the electrical properties of atomic-layer-deposited Ta2O5 films,” J. Korean Phys. Soc. 37(6), 975–979 (2000).
    [Crossref]
  8. H. Grüger, Ch. Kunath, E. Kurth, S. Sorge, W. Pufe, and T. Pechstein, “High quality r.f. sputtered metal oxides(Ta2O5, HfO2) and their properties after annealing,” Thin Solid Films 447, 509–515 (2004).
    [Crossref]
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    [Crossref]
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    [Crossref]
  12. H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, “Promising storage capacitor structures with thin Ta2O5 film for low-power high-density DRAM’s,” IEEE Trans. Electron Dev. 37(9), 1939–1947 (1990).
    [Crossref]
  13. Ch. Xu, Y. H. Qiang, Y. B. Zhu, T. T. Zhai, L. T. Guo, Y. L. Zhao, J. D. Shao, and Z. X. Fan, “Laser-induced damage threshold at different wavelengths of Ta2O5 films annealed over a wide temperature range,” Vacuum 84(11), 1310–1314 (2010).
    [Crossref]
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    [Crossref]
  15. Z. Liu, S. Chen, P. Ma, Y. Wei, Y. Zheng, F. Pan, H. Liu, and G. Tang, “Characterization of 1064nm nanosecond laser-induced damage on antireflection coatings grown by atomic layer deposition,” Opt. Express 20(2), 854–863 (2012).
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    [Crossref]

2012 (2)

C. Joseph, P. Bourson, and M. D. Fontana, “Amorphous to crystalline transformation in Ta2O5 studied by Raman spectroscopy,” J. Raman Spectrosc. 43(5), 1146–1150 (2012).
[Crossref]

Z. Liu, S. Chen, P. Ma, Y. Wei, Y. Zheng, F. Pan, H. Liu, and G. Tang, “Characterization of 1064nm nanosecond laser-induced damage on antireflection coatings grown by atomic layer deposition,” Opt. Express 20(2), 854–863 (2012).
[Crossref] [PubMed]

2010 (1)

Ch. Xu, Y. H. Qiang, Y. B. Zhu, T. T. Zhai, L. T. Guo, Y. L. Zhao, J. D. Shao, and Z. X. Fan, “Laser-induced damage threshold at different wavelengths of Ta2O5 films annealed over a wide temperature range,” Vacuum 84(11), 1310–1314 (2010).
[Crossref]

2009 (2)

X. L. He, J. H. Wu, X. M. Li, X. D. Gao, X. Y. Gan, and L. L. Zhao, “Effects of the post-annealing ambience on the microstructure and optical properties of tantalum oxide films prepared by pulsed laser deposition,” J. Alloys Compd. 478(1–2), 453–457 (2009).
[Crossref]

Ch. Xu, H. C. Dong, L. Yuan, H. B. He, J. D. Shao, and Z. X. Fan, “Investigation of annealing effects on the laser-induced damage threshold of amorphous Ta2O5 films,” Opt. Laser Technol. 41(3), 258–263 (2009).
[Crossref]

2008 (1)

Ch. Xu, Q. L. Xiao, J. Y. Ma, Y. X. Jin, J. D. Shao, and Z. X. Fan, “High temperature annealing effect on structure, optical property and laser-induced damage threshold of Ta2O5 films,” Appl. Surf. Sci. 254(20), 6554–6559 (2008).
[Crossref]

2007 (1)

B. Wu, U. Bartch, M. Jupé, L. Jensen, M. Lappschies, K. Starke, and D. Ristau, “Morphology investigations of laser induced damage,” Proc. SPIE 6403, 640319 (2007).
[Crossref]

2006 (1)

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, “Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films,” Thin Solid Films 515(4), 1674–1682 (2006).
[Crossref]

2004 (1)

H. Grüger, Ch. Kunath, E. Kurth, S. Sorge, W. Pufe, and T. Pechstein, “High quality r.f. sputtered metal oxides(Ta2O5, HfO2) and their properties after annealing,” Thin Solid Films 447, 509–515 (2004).
[Crossref]

2003 (1)

Y. N. Zhao, Y. J. Wang, H. Gong, J. D. Shao, and Zh. X. Fan, “Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors,” Appl. Surf. Sci. 210(3–4), 353–358 (2003).
[Crossref]

2000 (1)

Y. S. Kim, S. H. K. Park, J. Y. Sun, and S. K. Jung, “Effect of rapid thermal annealing on the structure and the electrical properties of atomic-layer-deposited Ta2O5 films,” J. Korean Phys. Soc. 37(6), 975–979 (2000).
[Crossref]

1990 (1)

H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, “Promising storage capacitor structures with thin Ta2O5 film for low-power high-density DRAM’s,” IEEE Trans. Electron Dev. 37(9), 1939–1947 (1990).
[Crossref]

1988 (1)

1986 (2)

P. Baumeister, “Simulation of a rugate filter via a stepped-index dielectric multilayer,” Appl. Opt. 25(16), 2644–2645 (1986).
[Crossref] [PubMed]

H. A. Macleod, “Structure-related optical properties of thin films,” J. Vac. Sci. Technol. A 4(3), 418–422 (1986).
[Crossref]

Amassian, A.

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, “Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films,” Thin Solid Films 515(4), 1674–1682 (2006).
[Crossref]

Bartch, U.

B. Wu, U. Bartch, M. Jupé, L. Jensen, M. Lappschies, K. Starke, and D. Ristau, “Morphology investigations of laser induced damage,” Proc. SPIE 6403, 640319 (2007).
[Crossref]

Baumeister, P.

Bourson, P.

C. Joseph, P. Bourson, and M. D. Fontana, “Amorphous to crystalline transformation in Ta2O5 studied by Raman spectroscopy,” J. Raman Spectrosc. 43(5), 1146–1150 (2012).
[Crossref]

Chen, S.

Dong, H. C.

Ch. Xu, H. C. Dong, L. Yuan, H. B. He, J. D. Shao, and Z. X. Fan, “Investigation of annealing effects on the laser-induced damage threshold of amorphous Ta2O5 films,” Opt. Laser Technol. 41(3), 258–263 (2009).
[Crossref]

Fan, Z. X.

Ch. Xu, Y. H. Qiang, Y. B. Zhu, T. T. Zhai, L. T. Guo, Y. L. Zhao, J. D. Shao, and Z. X. Fan, “Laser-induced damage threshold at different wavelengths of Ta2O5 films annealed over a wide temperature range,” Vacuum 84(11), 1310–1314 (2010).
[Crossref]

Ch. Xu, H. C. Dong, L. Yuan, H. B. He, J. D. Shao, and Z. X. Fan, “Investigation of annealing effects on the laser-induced damage threshold of amorphous Ta2O5 films,” Opt. Laser Technol. 41(3), 258–263 (2009).
[Crossref]

Ch. Xu, Q. L. Xiao, J. Y. Ma, Y. X. Jin, J. D. Shao, and Z. X. Fan, “High temperature annealing effect on structure, optical property and laser-induced damage threshold of Ta2O5 films,” Appl. Surf. Sci. 254(20), 6554–6559 (2008).
[Crossref]

Fan, Zh. X.

Y. N. Zhao, Y. J. Wang, H. Gong, J. D. Shao, and Zh. X. Fan, “Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors,” Appl. Surf. Sci. 210(3–4), 353–358 (2003).
[Crossref]

Fontana, M. D.

C. Joseph, P. Bourson, and M. D. Fontana, “Amorphous to crystalline transformation in Ta2O5 studied by Raman spectroscopy,” J. Raman Spectrosc. 43(5), 1146–1150 (2012).
[Crossref]

Gan, X. Y.

X. L. He, J. H. Wu, X. M. Li, X. D. Gao, X. Y. Gan, and L. L. Zhao, “Effects of the post-annealing ambience on the microstructure and optical properties of tantalum oxide films prepared by pulsed laser deposition,” J. Alloys Compd. 478(1–2), 453–457 (2009).
[Crossref]

Gao, X. D.

X. L. He, J. H. Wu, X. M. Li, X. D. Gao, X. Y. Gan, and L. L. Zhao, “Effects of the post-annealing ambience on the microstructure and optical properties of tantalum oxide films prepared by pulsed laser deposition,” J. Alloys Compd. 478(1–2), 453–457 (2009).
[Crossref]

Gong, H.

Y. N. Zhao, Y. J. Wang, H. Gong, J. D. Shao, and Zh. X. Fan, “Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors,” Appl. Surf. Sci. 210(3–4), 353–358 (2003).
[Crossref]

Grüger, H.

H. Grüger, Ch. Kunath, E. Kurth, S. Sorge, W. Pufe, and T. Pechstein, “High quality r.f. sputtered metal oxides(Ta2O5, HfO2) and their properties after annealing,” Thin Solid Films 447, 509–515 (2004).
[Crossref]

Guo, L. T.

Ch. Xu, Y. H. Qiang, Y. B. Zhu, T. T. Zhai, L. T. Guo, Y. L. Zhao, J. D. Shao, and Z. X. Fan, “Laser-induced damage threshold at different wavelengths of Ta2O5 films annealed over a wide temperature range,” Vacuum 84(11), 1310–1314 (2010).
[Crossref]

He, H. B.

Ch. Xu, H. C. Dong, L. Yuan, H. B. He, J. D. Shao, and Z. X. Fan, “Investigation of annealing effects on the laser-induced damage threshold of amorphous Ta2O5 films,” Opt. Laser Technol. 41(3), 258–263 (2009).
[Crossref]

He, X. L.

X. L. He, J. H. Wu, X. M. Li, X. D. Gao, X. Y. Gan, and L. L. Zhao, “Effects of the post-annealing ambience on the microstructure and optical properties of tantalum oxide films prepared by pulsed laser deposition,” J. Alloys Compd. 478(1–2), 453–457 (2009).
[Crossref]

Jensen, L.

B. Wu, U. Bartch, M. Jupé, L. Jensen, M. Lappschies, K. Starke, and D. Ristau, “Morphology investigations of laser induced damage,” Proc. SPIE 6403, 640319 (2007).
[Crossref]

Jin, Y. X.

Ch. Xu, Q. L. Xiao, J. Y. Ma, Y. X. Jin, J. D. Shao, and Z. X. Fan, “High temperature annealing effect on structure, optical property and laser-induced damage threshold of Ta2O5 films,” Appl. Surf. Sci. 254(20), 6554–6559 (2008).
[Crossref]

Joseph, C.

C. Joseph, P. Bourson, and M. D. Fontana, “Amorphous to crystalline transformation in Ta2O5 studied by Raman spectroscopy,” J. Raman Spectrosc. 43(5), 1146–1150 (2012).
[Crossref]

Jung, S. K.

Y. S. Kim, S. H. K. Park, J. Y. Sun, and S. K. Jung, “Effect of rapid thermal annealing on the structure and the electrical properties of atomic-layer-deposited Ta2O5 films,” J. Korean Phys. Soc. 37(6), 975–979 (2000).
[Crossref]

Jupé, M.

B. Wu, U. Bartch, M. Jupé, L. Jensen, M. Lappschies, K. Starke, and D. Ristau, “Morphology investigations of laser induced damage,” Proc. SPIE 6403, 640319 (2007).
[Crossref]

Kawamoto, Y.

H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, “Promising storage capacitor structures with thin Ta2O5 film for low-power high-density DRAM’s,” IEEE Trans. Electron Dev. 37(9), 1939–1947 (1990).
[Crossref]

Kim, Y. S.

Y. S. Kim, S. H. K. Park, J. Y. Sun, and S. K. Jung, “Effect of rapid thermal annealing on the structure and the electrical properties of atomic-layer-deposited Ta2O5 films,” J. Korean Phys. Soc. 37(6), 975–979 (2000).
[Crossref]

Kimura, S.

H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, “Promising storage capacitor structures with thin Ta2O5 film for low-power high-density DRAM’s,” IEEE Trans. Electron Dev. 37(9), 1939–1947 (1990).
[Crossref]

Kisu, T.

H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, “Promising storage capacitor structures with thin Ta2O5 film for low-power high-density DRAM’s,” IEEE Trans. Electron Dev. 37(9), 1939–1947 (1990).
[Crossref]

Klemberg-Sapieha, J. E.

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, “Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films,” Thin Solid Films 515(4), 1674–1682 (2006).
[Crossref]

Kunath, Ch.

H. Grüger, Ch. Kunath, E. Kurth, S. Sorge, W. Pufe, and T. Pechstein, “High quality r.f. sputtered metal oxides(Ta2O5, HfO2) and their properties after annealing,” Thin Solid Films 447, 509–515 (2004).
[Crossref]

Kurth, E.

H. Grüger, Ch. Kunath, E. Kurth, S. Sorge, W. Pufe, and T. Pechstein, “High quality r.f. sputtered metal oxides(Ta2O5, HfO2) and their properties after annealing,” Thin Solid Films 447, 509–515 (2004).
[Crossref]

Lappschies, M.

B. Wu, U. Bartch, M. Jupé, L. Jensen, M. Lappschies, K. Starke, and D. Ristau, “Morphology investigations of laser induced damage,” Proc. SPIE 6403, 640319 (2007).
[Crossref]

Li, X. M.

X. L. He, J. H. Wu, X. M. Li, X. D. Gao, X. Y. Gan, and L. L. Zhao, “Effects of the post-annealing ambience on the microstructure and optical properties of tantalum oxide films prepared by pulsed laser deposition,” J. Alloys Compd. 478(1–2), 453–457 (2009).
[Crossref]

Liu, H.

Liu, Z.

Ma, J. Y.

Ch. Xu, Q. L. Xiao, J. Y. Ma, Y. X. Jin, J. D. Shao, and Z. X. Fan, “High temperature annealing effect on structure, optical property and laser-induced damage threshold of Ta2O5 films,” Appl. Surf. Sci. 254(20), 6554–6559 (2008).
[Crossref]

Ma, P.

Macleod, H. A.

H. A. Macleod, “Structure-related optical properties of thin films,” J. Vac. Sci. Technol. A 4(3), 418–422 (1986).
[Crossref]

Martinu, L.

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, “Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films,” Thin Solid Films 515(4), 1674–1682 (2006).
[Crossref]

Masse, J.-P.

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, “Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films,” Thin Solid Films 515(4), 1674–1682 (2006).
[Crossref]

Mukai, K.

H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, “Promising storage capacitor structures with thin Ta2O5 film for low-power high-density DRAM’s,” IEEE Trans. Electron Dev. 37(9), 1939–1947 (1990).
[Crossref]

Nishioka, Y.

H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, “Promising storage capacitor structures with thin Ta2O5 film for low-power high-density DRAM’s,” IEEE Trans. Electron Dev. 37(9), 1939–1947 (1990).
[Crossref]

Pan, F.

Park, S. H. K.

Y. S. Kim, S. H. K. Park, J. Y. Sun, and S. K. Jung, “Effect of rapid thermal annealing on the structure and the electrical properties of atomic-layer-deposited Ta2O5 films,” J. Korean Phys. Soc. 37(6), 975–979 (2000).
[Crossref]

Pechstein, T.

H. Grüger, Ch. Kunath, E. Kurth, S. Sorge, W. Pufe, and T. Pechstein, “High quality r.f. sputtered metal oxides(Ta2O5, HfO2) and their properties after annealing,” Thin Solid Films 447, 509–515 (2004).
[Crossref]

Pufe, W.

H. Grüger, Ch. Kunath, E. Kurth, S. Sorge, W. Pufe, and T. Pechstein, “High quality r.f. sputtered metal oxides(Ta2O5, HfO2) and their properties after annealing,” Thin Solid Films 447, 509–515 (2004).
[Crossref]

Qiang, Y. H.

Ch. Xu, Y. H. Qiang, Y. B. Zhu, T. T. Zhai, L. T. Guo, Y. L. Zhao, J. D. Shao, and Z. X. Fan, “Laser-induced damage threshold at different wavelengths of Ta2O5 films annealed over a wide temperature range,” Vacuum 84(11), 1310–1314 (2010).
[Crossref]

Ristau, D.

B. Wu, U. Bartch, M. Jupé, L. Jensen, M. Lappschies, K. Starke, and D. Ristau, “Morphology investigations of laser induced damage,” Proc. SPIE 6403, 640319 (2007).
[Crossref]

Shao, J. D.

Ch. Xu, Y. H. Qiang, Y. B. Zhu, T. T. Zhai, L. T. Guo, Y. L. Zhao, J. D. Shao, and Z. X. Fan, “Laser-induced damage threshold at different wavelengths of Ta2O5 films annealed over a wide temperature range,” Vacuum 84(11), 1310–1314 (2010).
[Crossref]

Ch. Xu, H. C. Dong, L. Yuan, H. B. He, J. D. Shao, and Z. X. Fan, “Investigation of annealing effects on the laser-induced damage threshold of amorphous Ta2O5 films,” Opt. Laser Technol. 41(3), 258–263 (2009).
[Crossref]

Ch. Xu, Q. L. Xiao, J. Y. Ma, Y. X. Jin, J. D. Shao, and Z. X. Fan, “High temperature annealing effect on structure, optical property and laser-induced damage threshold of Ta2O5 films,” Appl. Surf. Sci. 254(20), 6554–6559 (2008).
[Crossref]

Y. N. Zhao, Y. J. Wang, H. Gong, J. D. Shao, and Zh. X. Fan, “Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors,” Appl. Surf. Sci. 210(3–4), 353–358 (2003).
[Crossref]

Shinriki, H.

H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, “Promising storage capacitor structures with thin Ta2O5 film for low-power high-density DRAM’s,” IEEE Trans. Electron Dev. 37(9), 1939–1947 (1990).
[Crossref]

Sorge, S.

H. Grüger, Ch. Kunath, E. Kurth, S. Sorge, W. Pufe, and T. Pechstein, “High quality r.f. sputtered metal oxides(Ta2O5, HfO2) and their properties after annealing,” Thin Solid Films 447, 509–515 (2004).
[Crossref]

Southwell, W. H.

Starke, K.

B. Wu, U. Bartch, M. Jupé, L. Jensen, M. Lappschies, K. Starke, and D. Ristau, “Morphology investigations of laser induced damage,” Proc. SPIE 6403, 640319 (2007).
[Crossref]

Sun, J. Y.

Y. S. Kim, S. H. K. Park, J. Y. Sun, and S. K. Jung, “Effect of rapid thermal annealing on the structure and the electrical properties of atomic-layer-deposited Ta2O5 films,” J. Korean Phys. Soc. 37(6), 975–979 (2000).
[Crossref]

Szymanowski, H.

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, “Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films,” Thin Solid Films 515(4), 1674–1682 (2006).
[Crossref]

Tang, G.

Wang, Y. J.

Y. N. Zhao, Y. J. Wang, H. Gong, J. D. Shao, and Zh. X. Fan, “Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors,” Appl. Surf. Sci. 210(3–4), 353–358 (2003).
[Crossref]

Wei, Y.

Wu, B.

B. Wu, U. Bartch, M. Jupé, L. Jensen, M. Lappschies, K. Starke, and D. Ristau, “Morphology investigations of laser induced damage,” Proc. SPIE 6403, 640319 (2007).
[Crossref]

Wu, J. H.

X. L. He, J. H. Wu, X. M. Li, X. D. Gao, X. Y. Gan, and L. L. Zhao, “Effects of the post-annealing ambience on the microstructure and optical properties of tantalum oxide films prepared by pulsed laser deposition,” J. Alloys Compd. 478(1–2), 453–457 (2009).
[Crossref]

Xiao, Q. L.

Ch. Xu, Q. L. Xiao, J. Y. Ma, Y. X. Jin, J. D. Shao, and Z. X. Fan, “High temperature annealing effect on structure, optical property and laser-induced damage threshold of Ta2O5 films,” Appl. Surf. Sci. 254(20), 6554–6559 (2008).
[Crossref]

Xu, Ch.

Ch. Xu, Y. H. Qiang, Y. B. Zhu, T. T. Zhai, L. T. Guo, Y. L. Zhao, J. D. Shao, and Z. X. Fan, “Laser-induced damage threshold at different wavelengths of Ta2O5 films annealed over a wide temperature range,” Vacuum 84(11), 1310–1314 (2010).
[Crossref]

Ch. Xu, H. C. Dong, L. Yuan, H. B. He, J. D. Shao, and Z. X. Fan, “Investigation of annealing effects on the laser-induced damage threshold of amorphous Ta2O5 films,” Opt. Laser Technol. 41(3), 258–263 (2009).
[Crossref]

Ch. Xu, Q. L. Xiao, J. Y. Ma, Y. X. Jin, J. D. Shao, and Z. X. Fan, “High temperature annealing effect on structure, optical property and laser-induced damage threshold of Ta2O5 films,” Appl. Surf. Sci. 254(20), 6554–6559 (2008).
[Crossref]

Yuan, L.

Ch. Xu, H. C. Dong, L. Yuan, H. B. He, J. D. Shao, and Z. X. Fan, “Investigation of annealing effects on the laser-induced damage threshold of amorphous Ta2O5 films,” Opt. Laser Technol. 41(3), 258–263 (2009).
[Crossref]

Zabeida, O.

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, “Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films,” Thin Solid Films 515(4), 1674–1682 (2006).
[Crossref]

Zhai, T. T.

Ch. Xu, Y. H. Qiang, Y. B. Zhu, T. T. Zhai, L. T. Guo, Y. L. Zhao, J. D. Shao, and Z. X. Fan, “Laser-induced damage threshold at different wavelengths of Ta2O5 films annealed over a wide temperature range,” Vacuum 84(11), 1310–1314 (2010).
[Crossref]

Zhao, L. L.

X. L. He, J. H. Wu, X. M. Li, X. D. Gao, X. Y. Gan, and L. L. Zhao, “Effects of the post-annealing ambience on the microstructure and optical properties of tantalum oxide films prepared by pulsed laser deposition,” J. Alloys Compd. 478(1–2), 453–457 (2009).
[Crossref]

Zhao, Y. L.

Ch. Xu, Y. H. Qiang, Y. B. Zhu, T. T. Zhai, L. T. Guo, Y. L. Zhao, J. D. Shao, and Z. X. Fan, “Laser-induced damage threshold at different wavelengths of Ta2O5 films annealed over a wide temperature range,” Vacuum 84(11), 1310–1314 (2010).
[Crossref]

Zhao, Y. N.

Y. N. Zhao, Y. J. Wang, H. Gong, J. D. Shao, and Zh. X. Fan, “Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors,” Appl. Surf. Sci. 210(3–4), 353–358 (2003).
[Crossref]

Zheng, Y.

Zhu, Y. B.

Ch. Xu, Y. H. Qiang, Y. B. Zhu, T. T. Zhai, L. T. Guo, Y. L. Zhao, J. D. Shao, and Z. X. Fan, “Laser-induced damage threshold at different wavelengths of Ta2O5 films annealed over a wide temperature range,” Vacuum 84(11), 1310–1314 (2010).
[Crossref]

Appl. Opt. (1)

Appl. Surf. Sci. (2)

Ch. Xu, Q. L. Xiao, J. Y. Ma, Y. X. Jin, J. D. Shao, and Z. X. Fan, “High temperature annealing effect on structure, optical property and laser-induced damage threshold of Ta2O5 films,” Appl. Surf. Sci. 254(20), 6554–6559 (2008).
[Crossref]

Y. N. Zhao, Y. J. Wang, H. Gong, J. D. Shao, and Zh. X. Fan, “Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors,” Appl. Surf. Sci. 210(3–4), 353–358 (2003).
[Crossref]

IEEE Trans. Electron Dev. (1)

H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, and K. Mukai, “Promising storage capacitor structures with thin Ta2O5 film for low-power high-density DRAM’s,” IEEE Trans. Electron Dev. 37(9), 1939–1947 (1990).
[Crossref]

J. Alloys Compd. (1)

X. L. He, J. H. Wu, X. M. Li, X. D. Gao, X. Y. Gan, and L. L. Zhao, “Effects of the post-annealing ambience on the microstructure and optical properties of tantalum oxide films prepared by pulsed laser deposition,” J. Alloys Compd. 478(1–2), 453–457 (2009).
[Crossref]

J. Korean Phys. Soc. (1)

Y. S. Kim, S. H. K. Park, J. Y. Sun, and S. K. Jung, “Effect of rapid thermal annealing on the structure and the electrical properties of atomic-layer-deposited Ta2O5 films,” J. Korean Phys. Soc. 37(6), 975–979 (2000).
[Crossref]

J. Opt. Soc. Am. A (1)

J. Raman Spectrosc. (1)

C. Joseph, P. Bourson, and M. D. Fontana, “Amorphous to crystalline transformation in Ta2O5 studied by Raman spectroscopy,” J. Raman Spectrosc. 43(5), 1146–1150 (2012).
[Crossref]

J. Vac. Sci. Technol. A (1)

H. A. Macleod, “Structure-related optical properties of thin films,” J. Vac. Sci. Technol. A 4(3), 418–422 (1986).
[Crossref]

Opt. Express (1)

Opt. Laser Technol. (1)

Ch. Xu, H. C. Dong, L. Yuan, H. B. He, J. D. Shao, and Z. X. Fan, “Investigation of annealing effects on the laser-induced damage threshold of amorphous Ta2O5 films,” Opt. Laser Technol. 41(3), 258–263 (2009).
[Crossref]

Proc. SPIE (1)

B. Wu, U. Bartch, M. Jupé, L. Jensen, M. Lappschies, K. Starke, and D. Ristau, “Morphology investigations of laser induced damage,” Proc. SPIE 6403, 640319 (2007).
[Crossref]

Thin Solid Films (2)

J.-P. Masse, H. Szymanowski, O. Zabeida, A. Amassian, J. E. Klemberg-Sapieha, and L. Martinu, “Stability and effect of annealing on the optical properties of plasma-deposited Ta2O5 and Nb2O5 films,” Thin Solid Films 515(4), 1674–1682 (2006).
[Crossref]

H. Grüger, Ch. Kunath, E. Kurth, S. Sorge, W. Pufe, and T. Pechstein, “High quality r.f. sputtered metal oxides(Ta2O5, HfO2) and their properties after annealing,” Thin Solid Films 447, 509–515 (2004).
[Crossref]

Vacuum (1)

Ch. Xu, Y. H. Qiang, Y. B. Zhu, T. T. Zhai, L. T. Guo, Y. L. Zhao, J. D. Shao, and Z. X. Fan, “Laser-induced damage threshold at different wavelengths of Ta2O5 films annealed over a wide temperature range,” Vacuum 84(11), 1310–1314 (2010).
[Crossref]

Other (1)

ISO 11551: “Optics and optical instruments-Lasers and laser-related equipment-Test method for absorptance of optical laser components” (2003).

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Figures (8)

Fig. 1
Fig. 1

(a) Experimental setup for the deposition of Ta2O5/SiO2 rugate filters. (b) The refractive indexes as a function of different target positions. (c) Relationship between refractive index and volume ratio of Ta2O5.

Fig. 2
Fig. 2

Refractive index and electric field distribution of the Ta2O5/SiO2 rugate filters.

Fig. 3
Fig. 3

(a) Transmittance spectra of the as-deposited and annealed films at different temperatures. (b) Blue shifts of the as-deposited and annealed films. (c) Reflectances of the as-deposited and annealed films at 1064nm.

Fig. 4
Fig. 4

Weak absorptions of the as-deposited and annealed films at different temperatures: (A), (B) and (C) represent the evolution of the films in the annealing process individually.

Fig. 5
Fig. 5

(A) AFM (3D) images of the quasi-rugate films: (a1) unannealed film and (a2) annealed film at 400°C. (B) The curvature radii of quasi-rugate films obtained by Zygo interferometer measurements: (b1) annealed film at 400 °C and (b2) annealed film at 600°C. (C) Profiles of the quasi-rugate films imaged by FIB/SEM: (c1) annealed film at 600°C and (c2) annealed film at 800°C.

Fig. 6
Fig. 6

S-on-1 performances of the as-deposited and annealed films at different temperatures.

Fig. 7
Fig. 7

Typical damage morphologies of the as-deposited and annealed films at different temperatures.

Fig. 8
Fig. 8

Typical damage morphology of annealed film at 800°C.

Equations (5)

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n 2 1 n 2 +2 = f a n a 2 1 n b 2 +2 + f b n b 2 1 n b 2 +2
n f =P n s +( 1P ) n ν
( 4 5 )Ta+ O 2 ( 2 5 )T a 2 O 5 Δ G o =196+0.04( kJ / mol )
σ= E s 6( 1 υ s ) t s 2 t f ( 1 R 2 1 R 1 )
F( N )=Aexp( N /B )+ Φ

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