Abstract

Laser induced damage of fused silica optics occurs primarily on optical surface or subsurface resulting from various defects produced during polishing/grinding process. Many new kinds of surface treatment processes are explored to remove or control the defects on fused silica surface. In this study, we report a new application of reaction ion etching (RIE)-based surface treatment process for manufacture of high quality fused silica optics. The influence of RIE processes on laser damage resistance as a function of etching depth and the evolution of typical defects which are associated with laser damage performance were investigated. The results show that the impurity element defects and subsurface damage on the samples surface were efficiently removed and prevented. Pure silica surface with relatively single-stable stoichiometry and low carbon atomic concentration was created during the etching. The laser damage resistance of the etched samples increased dramatically. The increase of roughness and ODC point defect with deeper etching are believed to be the main factors to limit further increase of the damage resistance of fused silica. The study is expected to contribute to the development of fused silica optics with high resistance to laser induced degradation in the future.

© 2016 Optical Society of America

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  1. N. Shen, J. D. Bude, and C. W. Carr, “Model laser damage precursors for high quality optical materials,” Opt. Express 22(3), 3393–3404 (2014).
    [Crossref] [PubMed]
  2. A. A. Manenkov, “Fundamental mechanisms of laser-induced damage in optical materials: today’s state of understanding and problems,” Opt. Eng. 53(1), 010901 (2014).
    [Crossref]
  3. T. I. Suratwala, P. E. Miller, J. D. Bude, W. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
    [Crossref]
  4. J. Bude, P. Miller, S. Baxamusa, N. Shen, T. Laurence, W. Steele, T. Suratwala, L. Wong, W. Carr, D. Cross, and M. Monticelli, “High fluence laser damage precursors and their mitigation in fused silica,” Opt. Express 22(5), 5839–5851 (2014).
    [Crossref] [PubMed]
  5. P. Miller, T. Suratwala, J. Bude, T. Laurence, N. Shen, W. Steele, M. Feit, J. Menapace, and L. Wong, “Laser damage precursors in fused silica,” Proc. SPIE 7504, 75040X (2009).
    [Crossref]
  6. L. Hongjie, H. Jin, W. Fengrui, Z. Xinda, Y. Xin, Z. Xiaoyan, S. Laixi, J. Xiaodong, S. Zhan, and Z. Wanguo, “Subsurface defects of fused silica optics and laser induced damage at 351 nm,” Opt. Express 21(10), 12204–12217 (2013).
    [Crossref] [PubMed]
  7. P. E. Miller, J. D. Bude, T. I. Suratwala, N. Shen, T. A. Laurence, W. A. Steele, J. Menapace, M. D. Feit, and L. L. Wong, “Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces,” Opt. Lett. 35(16), 2702–2704 (2010).
    [Crossref] [PubMed]
  8. T. Suratwala, L. Wong, P. Miller, M. Feit, J. Menapace, R. Steele, P. Davis, and D. Walmer, “Sub-surface mechanical damage distributions during grinding of fused silica,” J. Non-Cryst. Solids 352(52-54), 5601–5617 (2006).
    [Crossref]
  9. J. Neauport, L. Lamaignere, H. Bercegol, F. Pilon, and J. C. Birolleau, “Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm,” Opt. Express 13(25), 10163–10171 (2005).
    [Crossref] [PubMed]
  10. H. Liu, X. Ye, X. Zhou, J. Huang, F. Wang, X. Zhou, W. Wu, X. Jiang, Z. Sui, and W. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
    [Crossref]
  11. H.-B. Lü, S.-Z. Xu, H.-J. Wang, X.-D. Yuan, C. Zhao, and Y. Q. Fu, “Evolution of oxygen deficiency center on fused silica surface irradiated by ultraviolet laser and posttreatment,” Adv. Condens. Matter Phys. 2014, 1–4 (2014).
    [Crossref]
  12. L. Vaccaro, M. Cannas, V. Radzig, and R. Boscaino, “Luminescence of the surface nonbridging oxygen hole center in silica: Spectral and decay properties,” Phys. Rev. B 78(7), 075421 (2008).
    [Crossref]
  13. F. Shi, Y. Tian, X. Peng, and Y. Dai, “Combined technique of elastic magnetorheological finishing and HF etching for high-efficiency improving of the laser-induced damage threshold of fused silica optics,” Appl. Opt. 53(4), 598–604 (2014).
    [Crossref] [PubMed]
  14. T. Kamimura, S. Akamatsu, H. Horibe, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jitsuno, T. Okamato, and K. Yoshida, “Enhancement of surface-damage resistance by removing subsurface damage in fused silica and its dependence on wavelength,” Jap. J Appl. Phys. 43(No. 9A/B), L1229–L1231 (2004).
    [Crossref]
  15. J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
    [Crossref]
  16. A. During, P. Bouchut, J.-G. Coutard, C. Leymarie, and H. Bercegol, “Mitigation of laser damage on fused silica surfaces with a variable profile CO2 laser beam,” Proc. SPIE 6403, 640323 (2006).
    [Crossref]
  17. D. Flamm, F. Frost, and D. Hirsch, “Evolution of surface topography of fused silica by ion beam sputtering,” Appl. Surf. Sci. 179(1-4), 95–101 (2001).
    [Crossref]
  18. N. Savvides, “Surface microroughness of ion-beam etched optical surfaces,” J. Appl. Phys. 97(5), 053517 (2005).
    [Crossref]
  19. F. Frost, R. Fechner, D. Flamm, B. Ziberi, W. Frank, and A. Schindler, “Ion beam assisted smoothing of optical surfaces,” Appl. Phys., A Mater. Sci. Process. 78(5), 651–654 (2004).
    [Crossref]
  20. J. Néauport, C. Ambard, P. Cormont, N. Darbois, J. Destribats, C. Luitot, and O. Rondeau, “Subsurface damage measurement of ground fused silica parts by HF etching techniques,” Opt. Express 17(22), 20448–20456 (2009).
    [Crossref] [PubMed]
  21. J. Huang, X. Zhou, H. Liu, F. Wang, X. Jiang, W. Wu, Y. Tang, and W. Zheng, “Influence of subsurface defects on damage performance of fused silica in ultraviolet laser,” Opt. Eng. 52(2), 024203 (2013).
    [Crossref]
  22. M. Feit, T. Suratwala, L. Wong, W. Steele, P. Miller, and J. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
    [Crossref]
  23. L. Wong, T. Suratwala, M. Feit, P. Miller, and R. Steele, “The effect of HF/NH4F etching on the morphology of surface fractures on fused silica,” J. Non-Cryst. Solids 355(13), 797–810 (2009).
    [Crossref]
  24. A. Paul, A. Dimri, and R. Bajpai, “Plasma etching processes for the realization of micromechanical structures for MEMS. (MoO3) x thin films,” J. Indian I. Sci. 81, 669–674 (2013).
  25. L. Lallement, A. Rhallabi, C. Cardinaud, and M. C. P. Fernandez, “Modelling of fluorine based high density plasma for the etching of silica glasses,” J. Vac. Sci. Technol. A 29(5), 0513041 (2011).
    [Crossref]
  26. L. Lallement, C. Gosse, C. Cardinaud, M.-C. Peignon-Fernandez, and A. Rhallabi, “Etching studies of silica glasses in SF6/Ar inductively coupled plasmas: implications for microfluidic devices fabrication,” J. Vac. Sci. Technol. A 28(2), 277–286 (2010).
    [Crossref]
  27. X. Ye, X. Jiang, J. Huang, F. Geng, L. Sun, X. Zu, W. Wu, and W. Zheng, “Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching,” Sci. Rep. 5, 13023 (2015).
  28. L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
    [Crossref]
  29. J. Chang and J. Coburn, “Plasma–surface interactions,” J. Vac. Sci. Technol. A 21(5), S145–S151 (2003).
    [Crossref]
  30. D. G. Voloshin, K. S. Klopovskiy, Y. A. Mankelevich, N. A. Popov, T. V. Rakhimova, and A. T. Rakhimov, “Simulation of gas-phase kinetics in CHF3: H2: O2 mixtures,” IEEE Trans. Plasma Sci. 35(6), 1691–1703 (2007).
    [Crossref]
  31. J. P. Barz, C. Oehr, and A. Lunk, “Analysis and modeling of gas‐phase processes in a CHF3/Ar discharge,” Plasma Process. Polym. 8(5), 409–423 (2011).
    [Crossref]
  32. A. K. Paul, A. K. Dimri, and S. Mohan, “Fabrication of micromechanical structures in silicon using SF6/O2 gas mixtures,” Proc. SPIE 3903, 2–8 (1999).
    [Crossref]
  33. H. Norström, R. Buchta, F. Runovc, and P. Wiklund, “RIE of SiO2 in doped and undoped fluorocarbon plasmas,” Vacuum 32(12), 737–745 (1982).
    [Crossref]
  34. H. Lehmann and R. Widmer, “Profile control by reactive sputter etching,” J. Vac. Sci. Technol. 15(2), 319–326 (1978).
    [Crossref]
  35. D. Bose, M. Rao, T. Govindan, and M. Meyyappan, “Uncertainty and sensitivity analysis of gas-phase chemistry in a CHF3 plasma,” Plasma Sources Sci. Technol. 12(2), 225–234 (2003).
    [Crossref]
  36. J. Hue, P. Garrec, J. Dijon, and P. Lyan, “R-on-1 automatic mapping: a new tool for laser damage testing,” Proc. SPIE 2714, 90–101 (1996).
    [Crossref]
  37. J. Neauport, P. Cormont, P. Legros, C. Ambard, and J. Destribats, “Imaging subsurface damage of grinded fused silica optics by confocal fluorescence microscopy,” Opt. Express 17(5), 3543–3554 (2009).
    [Crossref] [PubMed]
  38. Y. Tanizawa and T. Suzuki, “Effects of silicate ions on the formation and transformation of calcium phosphates in neutral aqueous solutions,” J. Chem. Soc., Faraday Trans. 91(19), 3499–3503 (1995).
    [Crossref]
  39. M. Edgell, D. Baer, and J. Castle, “Biased referencing experiments for the XPS analysis of non-conducting materials,” Appl. Surf. Sci. 26(2), 129–149 (1986).
    [Crossref]
  40. M. R. Kozlowski, J. Carr, I. D. Hutcheon, R. A. Torres, L. M. Sheehan, D. W. Camp, and M. Yan, “Depth profile of polishing-induced contamination on fused silica surface,” Proc. SPIE 3244, 365–375 (1998).
    [Crossref]
  41. S. Kucheyev and S. Demos, “Optical defects produced in fused silica during laser-induced breakdown,” Appl. Phys. Lett. 82(19), 3230–3232 (2003).
    [Crossref]
  42. R. House, J. R. Bettis, and A. H. Guenther, “Surface roughness and laser damage threshold,” IEEE. J. Quantum Electron. 13(5), 361–363 (1977).
    [Crossref]

2015 (1)

X. Ye, X. Jiang, J. Huang, F. Geng, L. Sun, X. Zu, W. Wu, and W. Zheng, “Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching,” Sci. Rep. 5, 13023 (2015).

2014 (6)

N. Shen, J. D. Bude, and C. W. Carr, “Model laser damage precursors for high quality optical materials,” Opt. Express 22(3), 3393–3404 (2014).
[Crossref] [PubMed]

A. A. Manenkov, “Fundamental mechanisms of laser-induced damage in optical materials: today’s state of understanding and problems,” Opt. Eng. 53(1), 010901 (2014).
[Crossref]

J. Bude, P. Miller, S. Baxamusa, N. Shen, T. Laurence, W. Steele, T. Suratwala, L. Wong, W. Carr, D. Cross, and M. Monticelli, “High fluence laser damage precursors and their mitigation in fused silica,” Opt. Express 22(5), 5839–5851 (2014).
[Crossref] [PubMed]

H. Liu, X. Ye, X. Zhou, J. Huang, F. Wang, X. Zhou, W. Wu, X. Jiang, Z. Sui, and W. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

H.-B. Lü, S.-Z. Xu, H.-J. Wang, X.-D. Yuan, C. Zhao, and Y. Q. Fu, “Evolution of oxygen deficiency center on fused silica surface irradiated by ultraviolet laser and posttreatment,” Adv. Condens. Matter Phys. 2014, 1–4 (2014).
[Crossref]

F. Shi, Y. Tian, X. Peng, and Y. Dai, “Combined technique of elastic magnetorheological finishing and HF etching for high-efficiency improving of the laser-induced damage threshold of fused silica optics,” Appl. Opt. 53(4), 598–604 (2014).
[Crossref] [PubMed]

2013 (3)

L. Hongjie, H. Jin, W. Fengrui, Z. Xinda, Y. Xin, Z. Xiaoyan, S. Laixi, J. Xiaodong, S. Zhan, and Z. Wanguo, “Subsurface defects of fused silica optics and laser induced damage at 351 nm,” Opt. Express 21(10), 12204–12217 (2013).
[Crossref] [PubMed]

J. Huang, X. Zhou, H. Liu, F. Wang, X. Jiang, W. Wu, Y. Tang, and W. Zheng, “Influence of subsurface defects on damage performance of fused silica in ultraviolet laser,” Opt. Eng. 52(2), 024203 (2013).
[Crossref]

A. Paul, A. Dimri, and R. Bajpai, “Plasma etching processes for the realization of micromechanical structures for MEMS. (MoO3) x thin films,” J. Indian I. Sci. 81, 669–674 (2013).

2011 (3)

L. Lallement, A. Rhallabi, C. Cardinaud, and M. C. P. Fernandez, “Modelling of fluorine based high density plasma for the etching of silica glasses,” J. Vac. Sci. Technol. A 29(5), 0513041 (2011).
[Crossref]

J. P. Barz, C. Oehr, and A. Lunk, “Analysis and modeling of gas‐phase processes in a CHF3/Ar discharge,” Plasma Process. Polym. 8(5), 409–423 (2011).
[Crossref]

T. I. Suratwala, P. E. Miller, J. D. Bude, W. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

2010 (2)

P. E. Miller, J. D. Bude, T. I. Suratwala, N. Shen, T. A. Laurence, W. A. Steele, J. Menapace, M. D. Feit, and L. L. Wong, “Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces,” Opt. Lett. 35(16), 2702–2704 (2010).
[Crossref] [PubMed]

L. Lallement, C. Gosse, C. Cardinaud, M.-C. Peignon-Fernandez, and A. Rhallabi, “Etching studies of silica glasses in SF6/Ar inductively coupled plasmas: implications for microfluidic devices fabrication,” J. Vac. Sci. Technol. A 28(2), 277–286 (2010).
[Crossref]

2009 (5)

M. Feit, T. Suratwala, L. Wong, W. Steele, P. Miller, and J. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

L. Wong, T. Suratwala, M. Feit, P. Miller, and R. Steele, “The effect of HF/NH4F etching on the morphology of surface fractures on fused silica,” J. Non-Cryst. Solids 355(13), 797–810 (2009).
[Crossref]

J. Néauport, C. Ambard, P. Cormont, N. Darbois, J. Destribats, C. Luitot, and O. Rondeau, “Subsurface damage measurement of ground fused silica parts by HF etching techniques,” Opt. Express 17(22), 20448–20456 (2009).
[Crossref] [PubMed]

J. Neauport, P. Cormont, P. Legros, C. Ambard, and J. Destribats, “Imaging subsurface damage of grinded fused silica optics by confocal fluorescence microscopy,” Opt. Express 17(5), 3543–3554 (2009).
[Crossref] [PubMed]

P. Miller, T. Suratwala, J. Bude, T. Laurence, N. Shen, W. Steele, M. Feit, J. Menapace, and L. Wong, “Laser damage precursors in fused silica,” Proc. SPIE 7504, 75040X (2009).
[Crossref]

2008 (2)

L. Vaccaro, M. Cannas, V. Radzig, and R. Boscaino, “Luminescence of the surface nonbridging oxygen hole center in silica: Spectral and decay properties,” Phys. Rev. B 78(7), 075421 (2008).
[Crossref]

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
[Crossref]

2007 (1)

D. G. Voloshin, K. S. Klopovskiy, Y. A. Mankelevich, N. A. Popov, T. V. Rakhimova, and A. T. Rakhimov, “Simulation of gas-phase kinetics in CHF3: H2: O2 mixtures,” IEEE Trans. Plasma Sci. 35(6), 1691–1703 (2007).
[Crossref]

2006 (2)

A. During, P. Bouchut, J.-G. Coutard, C. Leymarie, and H. Bercegol, “Mitigation of laser damage on fused silica surfaces with a variable profile CO2 laser beam,” Proc. SPIE 6403, 640323 (2006).
[Crossref]

T. Suratwala, L. Wong, P. Miller, M. Feit, J. Menapace, R. Steele, P. Davis, and D. Walmer, “Sub-surface mechanical damage distributions during grinding of fused silica,” J. Non-Cryst. Solids 352(52-54), 5601–5617 (2006).
[Crossref]

2005 (2)

2004 (2)

F. Frost, R. Fechner, D. Flamm, B. Ziberi, W. Frank, and A. Schindler, “Ion beam assisted smoothing of optical surfaces,” Appl. Phys., A Mater. Sci. Process. 78(5), 651–654 (2004).
[Crossref]

T. Kamimura, S. Akamatsu, H. Horibe, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jitsuno, T. Okamato, and K. Yoshida, “Enhancement of surface-damage resistance by removing subsurface damage in fused silica and its dependence on wavelength,” Jap. J Appl. Phys. 43(No. 9A/B), L1229–L1231 (2004).
[Crossref]

2003 (3)

D. Bose, M. Rao, T. Govindan, and M. Meyyappan, “Uncertainty and sensitivity analysis of gas-phase chemistry in a CHF3 plasma,” Plasma Sources Sci. Technol. 12(2), 225–234 (2003).
[Crossref]

J. Chang and J. Coburn, “Plasma–surface interactions,” J. Vac. Sci. Technol. A 21(5), S145–S151 (2003).
[Crossref]

S. Kucheyev and S. Demos, “Optical defects produced in fused silica during laser-induced breakdown,” Appl. Phys. Lett. 82(19), 3230–3232 (2003).
[Crossref]

2002 (1)

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

2001 (1)

D. Flamm, F. Frost, and D. Hirsch, “Evolution of surface topography of fused silica by ion beam sputtering,” Appl. Surf. Sci. 179(1-4), 95–101 (2001).
[Crossref]

1999 (1)

A. K. Paul, A. K. Dimri, and S. Mohan, “Fabrication of micromechanical structures in silicon using SF6/O2 gas mixtures,” Proc. SPIE 3903, 2–8 (1999).
[Crossref]

1998 (1)

M. R. Kozlowski, J. Carr, I. D. Hutcheon, R. A. Torres, L. M. Sheehan, D. W. Camp, and M. Yan, “Depth profile of polishing-induced contamination on fused silica surface,” Proc. SPIE 3244, 365–375 (1998).
[Crossref]

1996 (1)

J. Hue, P. Garrec, J. Dijon, and P. Lyan, “R-on-1 automatic mapping: a new tool for laser damage testing,” Proc. SPIE 2714, 90–101 (1996).
[Crossref]

1995 (1)

Y. Tanizawa and T. Suzuki, “Effects of silicate ions on the formation and transformation of calcium phosphates in neutral aqueous solutions,” J. Chem. Soc., Faraday Trans. 91(19), 3499–3503 (1995).
[Crossref]

1986 (1)

M. Edgell, D. Baer, and J. Castle, “Biased referencing experiments for the XPS analysis of non-conducting materials,” Appl. Surf. Sci. 26(2), 129–149 (1986).
[Crossref]

1982 (1)

H. Norström, R. Buchta, F. Runovc, and P. Wiklund, “RIE of SiO2 in doped and undoped fluorocarbon plasmas,” Vacuum 32(12), 737–745 (1982).
[Crossref]

1978 (1)

H. Lehmann and R. Widmer, “Profile control by reactive sputter etching,” J. Vac. Sci. Technol. 15(2), 319–326 (1978).
[Crossref]

1977 (1)

R. House, J. R. Bettis, and A. H. Guenther, “Surface roughness and laser damage threshold,” IEEE. J. Quantum Electron. 13(5), 361–363 (1977).
[Crossref]

Akamatsu, S.

T. Kamimura, S. Akamatsu, H. Horibe, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jitsuno, T. Okamato, and K. Yoshida, “Enhancement of surface-damage resistance by removing subsurface damage in fused silica and its dependence on wavelength,” Jap. J Appl. Phys. 43(No. 9A/B), L1229–L1231 (2004).
[Crossref]

Ambard, C.

J. Neauport, P. Cormont, P. Legros, C. Ambard, and J. Destribats, “Imaging subsurface damage of grinded fused silica optics by confocal fluorescence microscopy,” Opt. Express 17(5), 3543–3554 (2009).
[Crossref] [PubMed]

J. Néauport, C. Ambard, P. Cormont, N. Darbois, J. Destribats, C. Luitot, and O. Rondeau, “Subsurface damage measurement of ground fused silica parts by HF etching techniques,” Opt. Express 17(22), 20448–20456 (2009).
[Crossref] [PubMed]

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
[Crossref]

Baer, D.

M. Edgell, D. Baer, and J. Castle, “Biased referencing experiments for the XPS analysis of non-conducting materials,” Appl. Surf. Sci. 26(2), 129–149 (1986).
[Crossref]

Bajpai, R.

A. Paul, A. Dimri, and R. Bajpai, “Plasma etching processes for the realization of micromechanical structures for MEMS. (MoO3) x thin films,” J. Indian I. Sci. 81, 669–674 (2013).

Barz, J. P.

J. P. Barz, C. Oehr, and A. Lunk, “Analysis and modeling of gas‐phase processes in a CHF3/Ar discharge,” Plasma Process. Polym. 8(5), 409–423 (2011).
[Crossref]

Baxamusa, S.

Bercegol, H.

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
[Crossref]

A. During, P. Bouchut, J.-G. Coutard, C. Leymarie, and H. Bercegol, “Mitigation of laser damage on fused silica surfaces with a variable profile CO2 laser beam,” Proc. SPIE 6403, 640323 (2006).
[Crossref]

J. Neauport, L. Lamaignere, H. Bercegol, F. Pilon, and J. C. Birolleau, “Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm,” Opt. Express 13(25), 10163–10171 (2005).
[Crossref] [PubMed]

Bettis, J. R.

R. House, J. R. Bettis, and A. H. Guenther, “Surface roughness and laser damage threshold,” IEEE. J. Quantum Electron. 13(5), 361–363 (1977).
[Crossref]

Birolleau, J. C.

Boscaino, R.

L. Vaccaro, M. Cannas, V. Radzig, and R. Boscaino, “Luminescence of the surface nonbridging oxygen hole center in silica: Spectral and decay properties,” Phys. Rev. B 78(7), 075421 (2008).
[Crossref]

Bose, D.

D. Bose, M. Rao, T. Govindan, and M. Meyyappan, “Uncertainty and sensitivity analysis of gas-phase chemistry in a CHF3 plasma,” Plasma Sources Sci. Technol. 12(2), 225–234 (2003).
[Crossref]

Bouchut, P.

A. During, P. Bouchut, J.-G. Coutard, C. Leymarie, and H. Bercegol, “Mitigation of laser damage on fused silica surfaces with a variable profile CO2 laser beam,” Proc. SPIE 6403, 640323 (2006).
[Crossref]

Brusasco, R. M.

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

Buchta, R.

H. Norström, R. Buchta, F. Runovc, and P. Wiklund, “RIE of SiO2 in doped and undoped fluorocarbon plasmas,” Vacuum 32(12), 737–745 (1982).
[Crossref]

Bude, J.

J. Bude, P. Miller, S. Baxamusa, N. Shen, T. Laurence, W. Steele, T. Suratwala, L. Wong, W. Carr, D. Cross, and M. Monticelli, “High fluence laser damage precursors and their mitigation in fused silica,” Opt. Express 22(5), 5839–5851 (2014).
[Crossref] [PubMed]

M. Feit, T. Suratwala, L. Wong, W. Steele, P. Miller, and J. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

P. Miller, T. Suratwala, J. Bude, T. Laurence, N. Shen, W. Steele, M. Feit, J. Menapace, and L. Wong, “Laser damage precursors in fused silica,” Proc. SPIE 7504, 75040X (2009).
[Crossref]

Bude, J. D.

Burnham, A. K.

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

Butler, J. A.

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

Cahuc, O.

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
[Crossref]

Camp, D. W.

M. R. Kozlowski, J. Carr, I. D. Hutcheon, R. A. Torres, L. M. Sheehan, D. W. Camp, and M. Yan, “Depth profile of polishing-induced contamination on fused silica surface,” Proc. SPIE 3244, 365–375 (1998).
[Crossref]

Cannas, M.

L. Vaccaro, M. Cannas, V. Radzig, and R. Boscaino, “Luminescence of the surface nonbridging oxygen hole center in silica: Spectral and decay properties,” Phys. Rev. B 78(7), 075421 (2008).
[Crossref]

Cardinaud, C.

L. Lallement, A. Rhallabi, C. Cardinaud, and M. C. P. Fernandez, “Modelling of fluorine based high density plasma for the etching of silica glasses,” J. Vac. Sci. Technol. A 29(5), 0513041 (2011).
[Crossref]

L. Lallement, C. Gosse, C. Cardinaud, M.-C. Peignon-Fernandez, and A. Rhallabi, “Etching studies of silica glasses in SF6/Ar inductively coupled plasmas: implications for microfluidic devices fabrication,” J. Vac. Sci. Technol. A 28(2), 277–286 (2010).
[Crossref]

Carr, C. W.

N. Shen, J. D. Bude, and C. W. Carr, “Model laser damage precursors for high quality optical materials,” Opt. Express 22(3), 3393–3404 (2014).
[Crossref] [PubMed]

T. I. Suratwala, P. E. Miller, J. D. Bude, W. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

Carr, J.

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

M. R. Kozlowski, J. Carr, I. D. Hutcheon, R. A. Torres, L. M. Sheehan, D. W. Camp, and M. Yan, “Depth profile of polishing-induced contamination on fused silica surface,” Proc. SPIE 3244, 365–375 (1998).
[Crossref]

Carr, W.

Castle, J.

M. Edgell, D. Baer, and J. Castle, “Biased referencing experiments for the XPS analysis of non-conducting materials,” Appl. Surf. Sci. 26(2), 129–149 (1986).
[Crossref]

Champreux, J.

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
[Crossref]

Chang, J.

J. Chang and J. Coburn, “Plasma–surface interactions,” J. Vac. Sci. Technol. A 21(5), S145–S151 (2003).
[Crossref]

Charles, J.

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
[Crossref]

Coburn, J.

J. Chang and J. Coburn, “Plasma–surface interactions,” J. Vac. Sci. Technol. A 21(5), S145–S151 (2003).
[Crossref]

Cormont, P.

J. Neauport, P. Cormont, P. Legros, C. Ambard, and J. Destribats, “Imaging subsurface damage of grinded fused silica optics by confocal fluorescence microscopy,” Opt. Express 17(5), 3543–3554 (2009).
[Crossref] [PubMed]

J. Néauport, C. Ambard, P. Cormont, N. Darbois, J. Destribats, C. Luitot, and O. Rondeau, “Subsurface damage measurement of ground fused silica parts by HF etching techniques,” Opt. Express 17(22), 20448–20456 (2009).
[Crossref] [PubMed]

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
[Crossref]

Coutard, J.-G.

A. During, P. Bouchut, J.-G. Coutard, C. Leymarie, and H. Bercegol, “Mitigation of laser damage on fused silica surfaces with a variable profile CO2 laser beam,” Proc. SPIE 6403, 640323 (2006).
[Crossref]

Cross, D.

Dai, Y.

Darbois, N.

J. Néauport, C. Ambard, P. Cormont, N. Darbois, J. Destribats, C. Luitot, and O. Rondeau, “Subsurface damage measurement of ground fused silica parts by HF etching techniques,” Opt. Express 17(22), 20448–20456 (2009).
[Crossref] [PubMed]

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
[Crossref]

Darnis, P.

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
[Crossref]

Davis, P.

T. Suratwala, L. Wong, P. Miller, M. Feit, J. Menapace, R. Steele, P. Davis, and D. Walmer, “Sub-surface mechanical damage distributions during grinding of fused silica,” J. Non-Cryst. Solids 352(52-54), 5601–5617 (2006).
[Crossref]

Demos, S.

S. Kucheyev and S. Demos, “Optical defects produced in fused silica during laser-induced breakdown,” Appl. Phys. Lett. 82(19), 3230–3232 (2003).
[Crossref]

Destribats, J.

J. Neauport, P. Cormont, P. Legros, C. Ambard, and J. Destribats, “Imaging subsurface damage of grinded fused silica optics by confocal fluorescence microscopy,” Opt. Express 17(5), 3543–3554 (2009).
[Crossref] [PubMed]

J. Néauport, C. Ambard, P. Cormont, N. Darbois, J. Destribats, C. Luitot, and O. Rondeau, “Subsurface damage measurement of ground fused silica parts by HF etching techniques,” Opt. Express 17(22), 20448–20456 (2009).
[Crossref] [PubMed]

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
[Crossref]

Dijon, J.

J. Hue, P. Garrec, J. Dijon, and P. Lyan, “R-on-1 automatic mapping: a new tool for laser damage testing,” Proc. SPIE 2714, 90–101 (1996).
[Crossref]

Dimri, A.

A. Paul, A. Dimri, and R. Bajpai, “Plasma etching processes for the realization of micromechanical structures for MEMS. (MoO3) x thin films,” J. Indian I. Sci. 81, 669–674 (2013).

Dimri, A. K.

A. K. Paul, A. K. Dimri, and S. Mohan, “Fabrication of micromechanical structures in silicon using SF6/O2 gas mixtures,” Proc. SPIE 3903, 2–8 (1999).
[Crossref]

Donohue, E. E.

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

During, A.

A. During, P. Bouchut, J.-G. Coutard, C. Leymarie, and H. Bercegol, “Mitigation of laser damage on fused silica surfaces with a variable profile CO2 laser beam,” Proc. SPIE 6403, 640323 (2006).
[Crossref]

Edgell, M.

M. Edgell, D. Baer, and J. Castle, “Biased referencing experiments for the XPS analysis of non-conducting materials,” Appl. Surf. Sci. 26(2), 129–149 (1986).
[Crossref]

Fargin, E.

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
[Crossref]

Fechner, R.

F. Frost, R. Fechner, D. Flamm, B. Ziberi, W. Frank, and A. Schindler, “Ion beam assisted smoothing of optical surfaces,” Appl. Phys., A Mater. Sci. Process. 78(5), 651–654 (2004).
[Crossref]

Feit, M.

L. Wong, T. Suratwala, M. Feit, P. Miller, and R. Steele, “The effect of HF/NH4F etching on the morphology of surface fractures on fused silica,” J. Non-Cryst. Solids 355(13), 797–810 (2009).
[Crossref]

M. Feit, T. Suratwala, L. Wong, W. Steele, P. Miller, and J. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

P. Miller, T. Suratwala, J. Bude, T. Laurence, N. Shen, W. Steele, M. Feit, J. Menapace, and L. Wong, “Laser damage precursors in fused silica,” Proc. SPIE 7504, 75040X (2009).
[Crossref]

T. Suratwala, L. Wong, P. Miller, M. Feit, J. Menapace, R. Steele, P. Davis, and D. Walmer, “Sub-surface mechanical damage distributions during grinding of fused silica,” J. Non-Cryst. Solids 352(52-54), 5601–5617 (2006).
[Crossref]

Feit, M. D.

T. I. Suratwala, P. E. Miller, J. D. Bude, W. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

P. E. Miller, J. D. Bude, T. I. Suratwala, N. Shen, T. A. Laurence, W. A. Steele, J. Menapace, M. D. Feit, and L. L. Wong, “Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces,” Opt. Lett. 35(16), 2702–2704 (2010).
[Crossref] [PubMed]

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

Fengrui, W.

Fernandez, M. C. P.

L. Lallement, A. Rhallabi, C. Cardinaud, and M. C. P. Fernandez, “Modelling of fluorine based high density plasma for the etching of silica glasses,” J. Vac. Sci. Technol. A 29(5), 0513041 (2011).
[Crossref]

Flamm, D.

F. Frost, R. Fechner, D. Flamm, B. Ziberi, W. Frank, and A. Schindler, “Ion beam assisted smoothing of optical surfaces,” Appl. Phys., A Mater. Sci. Process. 78(5), 651–654 (2004).
[Crossref]

D. Flamm, F. Frost, and D. Hirsch, “Evolution of surface topography of fused silica by ion beam sputtering,” Appl. Surf. Sci. 179(1-4), 95–101 (2001).
[Crossref]

Frank, W.

F. Frost, R. Fechner, D. Flamm, B. Ziberi, W. Frank, and A. Schindler, “Ion beam assisted smoothing of optical surfaces,” Appl. Phys., A Mater. Sci. Process. 78(5), 651–654 (2004).
[Crossref]

Frost, F.

F. Frost, R. Fechner, D. Flamm, B. Ziberi, W. Frank, and A. Schindler, “Ion beam assisted smoothing of optical surfaces,” Appl. Phys., A Mater. Sci. Process. 78(5), 651–654 (2004).
[Crossref]

D. Flamm, F. Frost, and D. Hirsch, “Evolution of surface topography of fused silica by ion beam sputtering,” Appl. Surf. Sci. 179(1-4), 95–101 (2001).
[Crossref]

Fu, Y. Q.

H.-B. Lü, S.-Z. Xu, H.-J. Wang, X.-D. Yuan, C. Zhao, and Y. Q. Fu, “Evolution of oxygen deficiency center on fused silica surface irradiated by ultraviolet laser and posttreatment,” Adv. Condens. Matter Phys. 2014, 1–4 (2014).
[Crossref]

Garrec, P.

J. Hue, P. Garrec, J. Dijon, and P. Lyan, “R-on-1 automatic mapping: a new tool for laser damage testing,” Proc. SPIE 2714, 90–101 (1996).
[Crossref]

Geng, F.

X. Ye, X. Jiang, J. Huang, F. Geng, L. Sun, X. Zu, W. Wu, and W. Zheng, “Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching,” Sci. Rep. 5, 13023 (2015).

Gosse, C.

L. Lallement, C. Gosse, C. Cardinaud, M.-C. Peignon-Fernandez, and A. Rhallabi, “Etching studies of silica glasses in SF6/Ar inductively coupled plasmas: implications for microfluidic devices fabrication,” J. Vac. Sci. Technol. A 28(2), 277–286 (2010).
[Crossref]

Govindan, T.

D. Bose, M. Rao, T. Govindan, and M. Meyyappan, “Uncertainty and sensitivity analysis of gas-phase chemistry in a CHF3 plasma,” Plasma Sources Sci. Technol. 12(2), 225–234 (2003).
[Crossref]

Grundler, W.

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

Guenther, A. H.

R. House, J. R. Bettis, and A. H. Guenther, “Surface roughness and laser damage threshold,” IEEE. J. Quantum Electron. 13(5), 361–363 (1977).
[Crossref]

Hackel, L. A.

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

Hill, R.

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

Hirsch, D.

D. Flamm, F. Frost, and D. Hirsch, “Evolution of surface topography of fused silica by ion beam sputtering,” Appl. Surf. Sci. 179(1-4), 95–101 (2001).
[Crossref]

Hongjie, L.

Horibe, H.

T. Kamimura, S. Akamatsu, H. Horibe, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jitsuno, T. Okamato, and K. Yoshida, “Enhancement of surface-damage resistance by removing subsurface damage in fused silica and its dependence on wavelength,” Jap. J Appl. Phys. 43(No. 9A/B), L1229–L1231 (2004).
[Crossref]

House, R.

R. House, J. R. Bettis, and A. H. Guenther, “Surface roughness and laser damage threshold,” IEEE. J. Quantum Electron. 13(5), 361–363 (1977).
[Crossref]

Hrubesh, L. W.

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

Huang, J.

X. Ye, X. Jiang, J. Huang, F. Geng, L. Sun, X. Zu, W. Wu, and W. Zheng, “Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching,” Sci. Rep. 5, 13023 (2015).

H. Liu, X. Ye, X. Zhou, J. Huang, F. Wang, X. Zhou, W. Wu, X. Jiang, Z. Sui, and W. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

J. Huang, X. Zhou, H. Liu, F. Wang, X. Jiang, W. Wu, Y. Tang, and W. Zheng, “Influence of subsurface defects on damage performance of fused silica in ultraviolet laser,” Opt. Eng. 52(2), 024203 (2013).
[Crossref]

Hue, J.

J. Hue, P. Garrec, J. Dijon, and P. Lyan, “R-on-1 automatic mapping: a new tool for laser damage testing,” Proc. SPIE 2714, 90–101 (1996).
[Crossref]

Hutcheon, I. D.

M. R. Kozlowski, J. Carr, I. D. Hutcheon, R. A. Torres, L. M. Sheehan, D. W. Camp, and M. Yan, “Depth profile of polishing-induced contamination on fused silica surface,” Proc. SPIE 3244, 365–375 (1998).
[Crossref]

Iordanoff, I.

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
[Crossref]

Jiang, X.

X. Ye, X. Jiang, J. Huang, F. Geng, L. Sun, X. Zu, W. Wu, and W. Zheng, “Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching,” Sci. Rep. 5, 13023 (2015).

H. Liu, X. Ye, X. Zhou, J. Huang, F. Wang, X. Zhou, W. Wu, X. Jiang, Z. Sui, and W. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

J. Huang, X. Zhou, H. Liu, F. Wang, X. Jiang, W. Wu, Y. Tang, and W. Zheng, “Influence of subsurface defects on damage performance of fused silica in ultraviolet laser,” Opt. Eng. 52(2), 024203 (2013).
[Crossref]

Jin, H.

Jitsuno, T.

T. Kamimura, S. Akamatsu, H. Horibe, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jitsuno, T. Okamato, and K. Yoshida, “Enhancement of surface-damage resistance by removing subsurface damage in fused silica and its dependence on wavelength,” Jap. J Appl. Phys. 43(No. 9A/B), L1229–L1231 (2004).
[Crossref]

Kamimura, T.

T. Kamimura, S. Akamatsu, H. Horibe, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jitsuno, T. Okamato, and K. Yoshida, “Enhancement of surface-damage resistance by removing subsurface damage in fused silica and its dependence on wavelength,” Jap. J Appl. Phys. 43(No. 9A/B), L1229–L1231 (2004).
[Crossref]

Key, M. H.

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

Klopovskiy, K. S.

D. G. Voloshin, K. S. Klopovskiy, Y. A. Mankelevich, N. A. Popov, T. V. Rakhimova, and A. T. Rakhimov, “Simulation of gas-phase kinetics in CHF3: H2: O2 mixtures,” IEEE Trans. Plasma Sci. 35(6), 1691–1703 (2007).
[Crossref]

Kozlowski, M. R.

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

M. R. Kozlowski, J. Carr, I. D. Hutcheon, R. A. Torres, L. M. Sheehan, D. W. Camp, and M. Yan, “Depth profile of polishing-induced contamination on fused silica surface,” Proc. SPIE 3244, 365–375 (1998).
[Crossref]

Kucheyev, S.

S. Kucheyev and S. Demos, “Optical defects produced in fused silica during laser-induced breakdown,” Appl. Phys. Lett. 82(19), 3230–3232 (2003).
[Crossref]

Laheurte, R.

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
[Crossref]

Laixi, S.

Lallement, L.

L. Lallement, A. Rhallabi, C. Cardinaud, and M. C. P. Fernandez, “Modelling of fluorine based high density plasma for the etching of silica glasses,” J. Vac. Sci. Technol. A 29(5), 0513041 (2011).
[Crossref]

L. Lallement, C. Gosse, C. Cardinaud, M.-C. Peignon-Fernandez, and A. Rhallabi, “Etching studies of silica glasses in SF6/Ar inductively coupled plasmas: implications for microfluidic devices fabrication,” J. Vac. Sci. Technol. A 28(2), 277–286 (2010).
[Crossref]

Lamaignere, L.

Lamaignère, L.

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
[Crossref]

Laurence, T.

Laurence, T. A.

T. I. Suratwala, P. E. Miller, J. D. Bude, W. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

P. E. Miller, J. D. Bude, T. I. Suratwala, N. Shen, T. A. Laurence, W. A. Steele, J. Menapace, M. D. Feit, and L. L. Wong, “Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces,” Opt. Lett. 35(16), 2702–2704 (2010).
[Crossref] [PubMed]

Legros, P.

J. Neauport, P. Cormont, P. Legros, C. Ambard, and J. Destribats, “Imaging subsurface damage of grinded fused silica optics by confocal fluorescence microscopy,” Opt. Express 17(5), 3543–3554 (2009).
[Crossref] [PubMed]

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
[Crossref]

Lehmann, H.

H. Lehmann and R. Widmer, “Profile control by reactive sputter etching,” J. Vac. Sci. Technol. 15(2), 319–326 (1978).
[Crossref]

Leymarie, C.

A. During, P. Bouchut, J.-G. Coutard, C. Leymarie, and H. Bercegol, “Mitigation of laser damage on fused silica surfaces with a variable profile CO2 laser beam,” Proc. SPIE 6403, 640323 (2006).
[Crossref]

Liu, H.

H. Liu, X. Ye, X. Zhou, J. Huang, F. Wang, X. Zhou, W. Wu, X. Jiang, Z. Sui, and W. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

J. Huang, X. Zhou, H. Liu, F. Wang, X. Jiang, W. Wu, Y. Tang, and W. Zheng, “Influence of subsurface defects on damage performance of fused silica in ultraviolet laser,” Opt. Eng. 52(2), 024203 (2013).
[Crossref]

Lü, H.-B.

H.-B. Lü, S.-Z. Xu, H.-J. Wang, X.-D. Yuan, C. Zhao, and Y. Q. Fu, “Evolution of oxygen deficiency center on fused silica surface irradiated by ultraviolet laser and posttreatment,” Adv. Condens. Matter Phys. 2014, 1–4 (2014).
[Crossref]

Luitot, C.

Lunk, A.

J. P. Barz, C. Oehr, and A. Lunk, “Analysis and modeling of gas‐phase processes in a CHF3/Ar discharge,” Plasma Process. Polym. 8(5), 409–423 (2011).
[Crossref]

Lyan, P.

J. Hue, P. Garrec, J. Dijon, and P. Lyan, “R-on-1 automatic mapping: a new tool for laser damage testing,” Proc. SPIE 2714, 90–101 (1996).
[Crossref]

Manenkov, A. A.

A. A. Manenkov, “Fundamental mechanisms of laser-induced damage in optical materials: today’s state of understanding and problems,” Opt. Eng. 53(1), 010901 (2014).
[Crossref]

Mankelevich, Y. A.

D. G. Voloshin, K. S. Klopovskiy, Y. A. Mankelevich, N. A. Popov, T. V. Rakhimova, and A. T. Rakhimov, “Simulation of gas-phase kinetics in CHF3: H2: O2 mixtures,” IEEE Trans. Plasma Sci. 35(6), 1691–1703 (2007).
[Crossref]

Maricle, S. M.

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

Menapace, J.

P. E. Miller, J. D. Bude, T. I. Suratwala, N. Shen, T. A. Laurence, W. A. Steele, J. Menapace, M. D. Feit, and L. L. Wong, “Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces,” Opt. Lett. 35(16), 2702–2704 (2010).
[Crossref] [PubMed]

P. Miller, T. Suratwala, J. Bude, T. Laurence, N. Shen, W. Steele, M. Feit, J. Menapace, and L. Wong, “Laser damage precursors in fused silica,” Proc. SPIE 7504, 75040X (2009).
[Crossref]

T. Suratwala, L. Wong, P. Miller, M. Feit, J. Menapace, R. Steele, P. Davis, and D. Walmer, “Sub-surface mechanical damage distributions during grinding of fused silica,” J. Non-Cryst. Solids 352(52-54), 5601–5617 (2006).
[Crossref]

Mercier, R.

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
[Crossref]

Meyyappan, M.

D. Bose, M. Rao, T. Govindan, and M. Meyyappan, “Uncertainty and sensitivity analysis of gas-phase chemistry in a CHF3 plasma,” Plasma Sources Sci. Technol. 12(2), 225–234 (2003).
[Crossref]

Miller, P.

J. Bude, P. Miller, S. Baxamusa, N. Shen, T. Laurence, W. Steele, T. Suratwala, L. Wong, W. Carr, D. Cross, and M. Monticelli, “High fluence laser damage precursors and their mitigation in fused silica,” Opt. Express 22(5), 5839–5851 (2014).
[Crossref] [PubMed]

P. Miller, T. Suratwala, J. Bude, T. Laurence, N. Shen, W. Steele, M. Feit, J. Menapace, and L. Wong, “Laser damage precursors in fused silica,” Proc. SPIE 7504, 75040X (2009).
[Crossref]

L. Wong, T. Suratwala, M. Feit, P. Miller, and R. Steele, “The effect of HF/NH4F etching on the morphology of surface fractures on fused silica,” J. Non-Cryst. Solids 355(13), 797–810 (2009).
[Crossref]

M. Feit, T. Suratwala, L. Wong, W. Steele, P. Miller, and J. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

T. Suratwala, L. Wong, P. Miller, M. Feit, J. Menapace, R. Steele, P. Davis, and D. Walmer, “Sub-surface mechanical damage distributions during grinding of fused silica,” J. Non-Cryst. Solids 352(52-54), 5601–5617 (2006).
[Crossref]

Miller, P. E.

T. I. Suratwala, P. E. Miller, J. D. Bude, W. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

P. E. Miller, J. D. Bude, T. I. Suratwala, N. Shen, T. A. Laurence, W. A. Steele, J. Menapace, M. D. Feit, and L. L. Wong, “Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces,” Opt. Lett. 35(16), 2702–2704 (2010).
[Crossref] [PubMed]

Mohan, S.

A. K. Paul, A. K. Dimri, and S. Mohan, “Fabrication of micromechanical structures in silicon using SF6/O2 gas mixtures,” Proc. SPIE 3903, 2–8 (1999).
[Crossref]

Molander, W. A.

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

Monticelli, M.

Monticelli, M. V.

T. I. Suratwala, P. E. Miller, J. D. Bude, W. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

Motokoshi, S.

T. Kamimura, S. Akamatsu, H. Horibe, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jitsuno, T. Okamato, and K. Yoshida, “Enhancement of surface-damage resistance by removing subsurface damage in fused silica and its dependence on wavelength,” Jap. J Appl. Phys. 43(No. 9A/B), L1229–L1231 (2004).
[Crossref]

Neauport, J.

Néauport, J.

J. Néauport, C. Ambard, P. Cormont, N. Darbois, J. Destribats, C. Luitot, and O. Rondeau, “Subsurface damage measurement of ground fused silica parts by HF etching techniques,” Opt. Express 17(22), 20448–20456 (2009).
[Crossref] [PubMed]

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
[Crossref]

Norström, H.

H. Norström, R. Buchta, F. Runovc, and P. Wiklund, “RIE of SiO2 in doped and undoped fluorocarbon plasmas,” Vacuum 32(12), 737–745 (1982).
[Crossref]

Norton, M. A.

T. I. Suratwala, P. E. Miller, J. D. Bude, W. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

Oehr, C.

J. P. Barz, C. Oehr, and A. Lunk, “Analysis and modeling of gas‐phase processes in a CHF3/Ar discharge,” Plasma Process. Polym. 8(5), 409–423 (2011).
[Crossref]

Okamato, T.

T. Kamimura, S. Akamatsu, H. Horibe, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jitsuno, T. Okamato, and K. Yoshida, “Enhancement of surface-damage resistance by removing subsurface damage in fused silica and its dependence on wavelength,” Jap. J Appl. Phys. 43(No. 9A/B), L1229–L1231 (2004).
[Crossref]

Paul, A.

A. Paul, A. Dimri, and R. Bajpai, “Plasma etching processes for the realization of micromechanical structures for MEMS. (MoO3) x thin films,” J. Indian I. Sci. 81, 669–674 (2013).

Paul, A. K.

A. K. Paul, A. K. Dimri, and S. Mohan, “Fabrication of micromechanical structures in silicon using SF6/O2 gas mixtures,” Proc. SPIE 3903, 2–8 (1999).
[Crossref]

Peignon-Fernandez, M.-C.

L. Lallement, C. Gosse, C. Cardinaud, M.-C. Peignon-Fernandez, and A. Rhallabi, “Etching studies of silica glasses in SF6/Ar inductively coupled plasmas: implications for microfluidic devices fabrication,” J. Vac. Sci. Technol. A 28(2), 277–286 (2010).
[Crossref]

Penetrante, B.

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

Peng, X.

Pilon, F.

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
[Crossref]

J. Neauport, L. Lamaignere, H. Bercegol, F. Pilon, and J. C. Birolleau, “Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm,” Opt. Express 13(25), 10163–10171 (2005).
[Crossref] [PubMed]

Popov, N. A.

D. G. Voloshin, K. S. Klopovskiy, Y. A. Mankelevich, N. A. Popov, T. V. Rakhimova, and A. T. Rakhimov, “Simulation of gas-phase kinetics in CHF3: H2: O2 mixtures,” IEEE Trans. Plasma Sci. 35(6), 1691–1703 (2007).
[Crossref]

Radzig, V.

L. Vaccaro, M. Cannas, V. Radzig, and R. Boscaino, “Luminescence of the surface nonbridging oxygen hole center in silica: Spectral and decay properties,” Phys. Rev. B 78(7), 075421 (2008).
[Crossref]

Rakhimov, A. T.

D. G. Voloshin, K. S. Klopovskiy, Y. A. Mankelevich, N. A. Popov, T. V. Rakhimova, and A. T. Rakhimov, “Simulation of gas-phase kinetics in CHF3: H2: O2 mixtures,” IEEE Trans. Plasma Sci. 35(6), 1691–1703 (2007).
[Crossref]

Rakhimova, T. V.

D. G. Voloshin, K. S. Klopovskiy, Y. A. Mankelevich, N. A. Popov, T. V. Rakhimova, and A. T. Rakhimov, “Simulation of gas-phase kinetics in CHF3: H2: O2 mixtures,” IEEE Trans. Plasma Sci. 35(6), 1691–1703 (2007).
[Crossref]

Rao, M.

D. Bose, M. Rao, T. Govindan, and M. Meyyappan, “Uncertainty and sensitivity analysis of gas-phase chemistry in a CHF3 plasma,” Plasma Sources Sci. Technol. 12(2), 225–234 (2003).
[Crossref]

Rhallabi, A.

L. Lallement, A. Rhallabi, C. Cardinaud, and M. C. P. Fernandez, “Modelling of fluorine based high density plasma for the etching of silica glasses,” J. Vac. Sci. Technol. A 29(5), 0513041 (2011).
[Crossref]

L. Lallement, C. Gosse, C. Cardinaud, M.-C. Peignon-Fernandez, and A. Rhallabi, “Etching studies of silica glasses in SF6/Ar inductively coupled plasmas: implications for microfluidic devices fabrication,” J. Vac. Sci. Technol. A 28(2), 277–286 (2010).
[Crossref]

Rondeau, O.

Rubenchik, A. M.

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

Runovc, F.

H. Norström, R. Buchta, F. Runovc, and P. Wiklund, “RIE of SiO2 in doped and undoped fluorocarbon plasmas,” Vacuum 32(12), 737–745 (1982).
[Crossref]

Sakamoto, T.

T. Kamimura, S. Akamatsu, H. Horibe, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jitsuno, T. Okamato, and K. Yoshida, “Enhancement of surface-damage resistance by removing subsurface damage in fused silica and its dependence on wavelength,” Jap. J Appl. Phys. 43(No. 9A/B), L1229–L1231 (2004).
[Crossref]

Savvides, N.

N. Savvides, “Surface microroughness of ion-beam etched optical surfaces,” J. Appl. Phys. 97(5), 053517 (2005).
[Crossref]

Schindler, A.

F. Frost, R. Fechner, D. Flamm, B. Ziberi, W. Frank, and A. Schindler, “Ion beam assisted smoothing of optical surfaces,” Appl. Phys., A Mater. Sci. Process. 78(5), 651–654 (2004).
[Crossref]

Sheehan, L. M.

M. R. Kozlowski, J. Carr, I. D. Hutcheon, R. A. Torres, L. M. Sheehan, D. W. Camp, and M. Yan, “Depth profile of polishing-induced contamination on fused silica surface,” Proc. SPIE 3244, 365–375 (1998).
[Crossref]

Shen, N.

Shi, F.

Shiba, H.

T. Kamimura, S. Akamatsu, H. Horibe, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jitsuno, T. Okamato, and K. Yoshida, “Enhancement of surface-damage resistance by removing subsurface damage in fused silica and its dependence on wavelength,” Jap. J Appl. Phys. 43(No. 9A/B), L1229–L1231 (2004).
[Crossref]

Steele, R.

L. Wong, T. Suratwala, M. Feit, P. Miller, and R. Steele, “The effect of HF/NH4F etching on the morphology of surface fractures on fused silica,” J. Non-Cryst. Solids 355(13), 797–810 (2009).
[Crossref]

T. Suratwala, L. Wong, P. Miller, M. Feit, J. Menapace, R. Steele, P. Davis, and D. Walmer, “Sub-surface mechanical damage distributions during grinding of fused silica,” J. Non-Cryst. Solids 352(52-54), 5601–5617 (2006).
[Crossref]

Steele, W.

J. Bude, P. Miller, S. Baxamusa, N. Shen, T. Laurence, W. Steele, T. Suratwala, L. Wong, W. Carr, D. Cross, and M. Monticelli, “High fluence laser damage precursors and their mitigation in fused silica,” Opt. Express 22(5), 5839–5851 (2014).
[Crossref] [PubMed]

P. Miller, T. Suratwala, J. Bude, T. Laurence, N. Shen, W. Steele, M. Feit, J. Menapace, and L. Wong, “Laser damage precursors in fused silica,” Proc. SPIE 7504, 75040X (2009).
[Crossref]

M. Feit, T. Suratwala, L. Wong, W. Steele, P. Miller, and J. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

Steele, W. A.

T. I. Suratwala, P. E. Miller, J. D. Bude, W. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

P. E. Miller, J. D. Bude, T. I. Suratwala, N. Shen, T. A. Laurence, W. A. Steele, J. Menapace, M. D. Feit, and L. L. Wong, “Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces,” Opt. Lett. 35(16), 2702–2704 (2010).
[Crossref] [PubMed]

Sui, Z.

H. Liu, X. Ye, X. Zhou, J. Huang, F. Wang, X. Zhou, W. Wu, X. Jiang, Z. Sui, and W. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

Summers, L. J.

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

Sun, L.

X. Ye, X. Jiang, J. Huang, F. Geng, L. Sun, X. Zu, W. Wu, and W. Zheng, “Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching,” Sci. Rep. 5, 13023 (2015).

Suratwala, T.

J. Bude, P. Miller, S. Baxamusa, N. Shen, T. Laurence, W. Steele, T. Suratwala, L. Wong, W. Carr, D. Cross, and M. Monticelli, “High fluence laser damage precursors and their mitigation in fused silica,” Opt. Express 22(5), 5839–5851 (2014).
[Crossref] [PubMed]

P. Miller, T. Suratwala, J. Bude, T. Laurence, N. Shen, W. Steele, M. Feit, J. Menapace, and L. Wong, “Laser damage precursors in fused silica,” Proc. SPIE 7504, 75040X (2009).
[Crossref]

M. Feit, T. Suratwala, L. Wong, W. Steele, P. Miller, and J. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

L. Wong, T. Suratwala, M. Feit, P. Miller, and R. Steele, “The effect of HF/NH4F etching on the morphology of surface fractures on fused silica,” J. Non-Cryst. Solids 355(13), 797–810 (2009).
[Crossref]

T. Suratwala, L. Wong, P. Miller, M. Feit, J. Menapace, R. Steele, P. Davis, and D. Walmer, “Sub-surface mechanical damage distributions during grinding of fused silica,” J. Non-Cryst. Solids 352(52-54), 5601–5617 (2006).
[Crossref]

Suratwala, T. I.

T. I. Suratwala, P. E. Miller, J. D. Bude, W. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

P. E. Miller, J. D. Bude, T. I. Suratwala, N. Shen, T. A. Laurence, W. A. Steele, J. Menapace, M. D. Feit, and L. L. Wong, “Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces,” Opt. Lett. 35(16), 2702–2704 (2010).
[Crossref] [PubMed]

Suzuki, T.

Y. Tanizawa and T. Suzuki, “Effects of silicate ions on the formation and transformation of calcium phosphates in neutral aqueous solutions,” J. Chem. Soc., Faraday Trans. 91(19), 3499–3503 (1995).
[Crossref]

Tang, Y.

J. Huang, X. Zhou, H. Liu, F. Wang, X. Jiang, W. Wu, Y. Tang, and W. Zheng, “Influence of subsurface defects on damage performance of fused silica in ultraviolet laser,” Opt. Eng. 52(2), 024203 (2013).
[Crossref]

Tanizawa, Y.

Y. Tanizawa and T. Suzuki, “Effects of silicate ions on the formation and transformation of calcium phosphates in neutral aqueous solutions,” J. Chem. Soc., Faraday Trans. 91(19), 3499–3503 (1995).
[Crossref]

Tian, Y.

Torres, R. A.

M. R. Kozlowski, J. Carr, I. D. Hutcheon, R. A. Torres, L. M. Sheehan, D. W. Camp, and M. Yan, “Depth profile of polishing-induced contamination on fused silica surface,” Proc. SPIE 3244, 365–375 (1998).
[Crossref]

Vaccaro, L.

L. Vaccaro, M. Cannas, V. Radzig, and R. Boscaino, “Luminescence of the surface nonbridging oxygen hole center in silica: Spectral and decay properties,” Phys. Rev. B 78(7), 075421 (2008).
[Crossref]

Voloshin, D. G.

D. G. Voloshin, K. S. Klopovskiy, Y. A. Mankelevich, N. A. Popov, T. V. Rakhimova, and A. T. Rakhimov, “Simulation of gas-phase kinetics in CHF3: H2: O2 mixtures,” IEEE Trans. Plasma Sci. 35(6), 1691–1703 (2007).
[Crossref]

Walmer, D.

T. Suratwala, L. Wong, P. Miller, M. Feit, J. Menapace, R. Steele, P. Davis, and D. Walmer, “Sub-surface mechanical damage distributions during grinding of fused silica,” J. Non-Cryst. Solids 352(52-54), 5601–5617 (2006).
[Crossref]

Wang, F.

H. Liu, X. Ye, X. Zhou, J. Huang, F. Wang, X. Zhou, W. Wu, X. Jiang, Z. Sui, and W. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

J. Huang, X. Zhou, H. Liu, F. Wang, X. Jiang, W. Wu, Y. Tang, and W. Zheng, “Influence of subsurface defects on damage performance of fused silica in ultraviolet laser,” Opt. Eng. 52(2), 024203 (2013).
[Crossref]

Wang, H.-J.

H.-B. Lü, S.-Z. Xu, H.-J. Wang, X.-D. Yuan, C. Zhao, and Y. Q. Fu, “Evolution of oxygen deficiency center on fused silica surface irradiated by ultraviolet laser and posttreatment,” Adv. Condens. Matter Phys. 2014, 1–4 (2014).
[Crossref]

Wanguo, Z.

Wegner, P. J.

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

Widmer, R.

H. Lehmann and R. Widmer, “Profile control by reactive sputter etching,” J. Vac. Sci. Technol. 15(2), 319–326 (1978).
[Crossref]

Wiklund, P.

H. Norström, R. Buchta, F. Runovc, and P. Wiklund, “RIE of SiO2 in doped and undoped fluorocarbon plasmas,” Vacuum 32(12), 737–745 (1982).
[Crossref]

Wong, L.

J. Bude, P. Miller, S. Baxamusa, N. Shen, T. Laurence, W. Steele, T. Suratwala, L. Wong, W. Carr, D. Cross, and M. Monticelli, “High fluence laser damage precursors and their mitigation in fused silica,” Opt. Express 22(5), 5839–5851 (2014).
[Crossref] [PubMed]

L. Wong, T. Suratwala, M. Feit, P. Miller, and R. Steele, “The effect of HF/NH4F etching on the morphology of surface fractures on fused silica,” J. Non-Cryst. Solids 355(13), 797–810 (2009).
[Crossref]

M. Feit, T. Suratwala, L. Wong, W. Steele, P. Miller, and J. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

P. Miller, T. Suratwala, J. Bude, T. Laurence, N. Shen, W. Steele, M. Feit, J. Menapace, and L. Wong, “Laser damage precursors in fused silica,” Proc. SPIE 7504, 75040X (2009).
[Crossref]

T. Suratwala, L. Wong, P. Miller, M. Feit, J. Menapace, R. Steele, P. Davis, and D. Walmer, “Sub-surface mechanical damage distributions during grinding of fused silica,” J. Non-Cryst. Solids 352(52-54), 5601–5617 (2006).
[Crossref]

Wong, L. L.

T. I. Suratwala, P. E. Miller, J. D. Bude, W. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

P. E. Miller, J. D. Bude, T. I. Suratwala, N. Shen, T. A. Laurence, W. A. Steele, J. Menapace, M. D. Feit, and L. L. Wong, “Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces,” Opt. Lett. 35(16), 2702–2704 (2010).
[Crossref] [PubMed]

Wu, W.

X. Ye, X. Jiang, J. Huang, F. Geng, L. Sun, X. Zu, W. Wu, and W. Zheng, “Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching,” Sci. Rep. 5, 13023 (2015).

H. Liu, X. Ye, X. Zhou, J. Huang, F. Wang, X. Zhou, W. Wu, X. Jiang, Z. Sui, and W. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

J. Huang, X. Zhou, H. Liu, F. Wang, X. Jiang, W. Wu, Y. Tang, and W. Zheng, “Influence of subsurface defects on damage performance of fused silica in ultraviolet laser,” Opt. Eng. 52(2), 024203 (2013).
[Crossref]

Xiaodong, J.

Xiaoyan, Z.

Xin, Y.

Xinda, Z.

Xu, S.-Z.

H.-B. Lü, S.-Z. Xu, H.-J. Wang, X.-D. Yuan, C. Zhao, and Y. Q. Fu, “Evolution of oxygen deficiency center on fused silica surface irradiated by ultraviolet laser and posttreatment,” Adv. Condens. Matter Phys. 2014, 1–4 (2014).
[Crossref]

Yan, M.

M. R. Kozlowski, J. Carr, I. D. Hutcheon, R. A. Torres, L. M. Sheehan, D. W. Camp, and M. Yan, “Depth profile of polishing-induced contamination on fused silica surface,” Proc. SPIE 3244, 365–375 (1998).
[Crossref]

Ye, X.

X. Ye, X. Jiang, J. Huang, F. Geng, L. Sun, X. Zu, W. Wu, and W. Zheng, “Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching,” Sci. Rep. 5, 13023 (2015).

H. Liu, X. Ye, X. Zhou, J. Huang, F. Wang, X. Zhou, W. Wu, X. Jiang, Z. Sui, and W. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

Yoshida, K.

T. Kamimura, S. Akamatsu, H. Horibe, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jitsuno, T. Okamato, and K. Yoshida, “Enhancement of surface-damage resistance by removing subsurface damage in fused silica and its dependence on wavelength,” Jap. J Appl. Phys. 43(No. 9A/B), L1229–L1231 (2004).
[Crossref]

Yuan, X.-D.

H.-B. Lü, S.-Z. Xu, H.-J. Wang, X.-D. Yuan, C. Zhao, and Y. Q. Fu, “Evolution of oxygen deficiency center on fused silica surface irradiated by ultraviolet laser and posttreatment,” Adv. Condens. Matter Phys. 2014, 1–4 (2014).
[Crossref]

Zhan, S.

Zhao, C.

H.-B. Lü, S.-Z. Xu, H.-J. Wang, X.-D. Yuan, C. Zhao, and Y. Q. Fu, “Evolution of oxygen deficiency center on fused silica surface irradiated by ultraviolet laser and posttreatment,” Adv. Condens. Matter Phys. 2014, 1–4 (2014).
[Crossref]

Zheng, W.

X. Ye, X. Jiang, J. Huang, F. Geng, L. Sun, X. Zu, W. Wu, and W. Zheng, “Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching,” Sci. Rep. 5, 13023 (2015).

H. Liu, X. Ye, X. Zhou, J. Huang, F. Wang, X. Zhou, W. Wu, X. Jiang, Z. Sui, and W. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

J. Huang, X. Zhou, H. Liu, F. Wang, X. Jiang, W. Wu, Y. Tang, and W. Zheng, “Influence of subsurface defects on damage performance of fused silica in ultraviolet laser,” Opt. Eng. 52(2), 024203 (2013).
[Crossref]

Zhou, X.

H. Liu, X. Ye, X. Zhou, J. Huang, F. Wang, X. Zhou, W. Wu, X. Jiang, Z. Sui, and W. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

H. Liu, X. Ye, X. Zhou, J. Huang, F. Wang, X. Zhou, W. Wu, X. Jiang, Z. Sui, and W. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

J. Huang, X. Zhou, H. Liu, F. Wang, X. Jiang, W. Wu, Y. Tang, and W. Zheng, “Influence of subsurface defects on damage performance of fused silica in ultraviolet laser,” Opt. Eng. 52(2), 024203 (2013).
[Crossref]

Ziberi, B.

F. Frost, R. Fechner, D. Flamm, B. Ziberi, W. Frank, and A. Schindler, “Ion beam assisted smoothing of optical surfaces,” Appl. Phys., A Mater. Sci. Process. 78(5), 651–654 (2004).
[Crossref]

Zu, X.

X. Ye, X. Jiang, J. Huang, F. Geng, L. Sun, X. Zu, W. Wu, and W. Zheng, “Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching,” Sci. Rep. 5, 13023 (2015).

Adv. Condens. Matter Phys. (1)

H.-B. Lü, S.-Z. Xu, H.-J. Wang, X.-D. Yuan, C. Zhao, and Y. Q. Fu, “Evolution of oxygen deficiency center on fused silica surface irradiated by ultraviolet laser and posttreatment,” Adv. Condens. Matter Phys. 2014, 1–4 (2014).
[Crossref]

Appl. Opt. (1)

Appl. Phys. Lett. (1)

S. Kucheyev and S. Demos, “Optical defects produced in fused silica during laser-induced breakdown,” Appl. Phys. Lett. 82(19), 3230–3232 (2003).
[Crossref]

Appl. Phys., A Mater. Sci. Process. (1)

F. Frost, R. Fechner, D. Flamm, B. Ziberi, W. Frank, and A. Schindler, “Ion beam assisted smoothing of optical surfaces,” Appl. Phys., A Mater. Sci. Process. 78(5), 651–654 (2004).
[Crossref]

Appl. Surf. Sci. (2)

D. Flamm, F. Frost, and D. Hirsch, “Evolution of surface topography of fused silica by ion beam sputtering,” Appl. Surf. Sci. 179(1-4), 95–101 (2001).
[Crossref]

M. Edgell, D. Baer, and J. Castle, “Biased referencing experiments for the XPS analysis of non-conducting materials,” Appl. Surf. Sci. 26(2), 129–149 (1986).
[Crossref]

IEEE Trans. Plasma Sci. (1)

D. G. Voloshin, K. S. Klopovskiy, Y. A. Mankelevich, N. A. Popov, T. V. Rakhimova, and A. T. Rakhimov, “Simulation of gas-phase kinetics in CHF3: H2: O2 mixtures,” IEEE Trans. Plasma Sci. 35(6), 1691–1703 (2007).
[Crossref]

IEEE. J. Quantum Electron. (1)

R. House, J. R. Bettis, and A. H. Guenther, “Surface roughness and laser damage threshold,” IEEE. J. Quantum Electron. 13(5), 361–363 (1977).
[Crossref]

J. Am. Ceram. Soc. (1)

T. I. Suratwala, P. E. Miller, J. D. Bude, W. A. Steele, N. Shen, M. V. Monticelli, M. D. Feit, T. A. Laurence, M. A. Norton, C. W. Carr, and L. L. Wong, “HF-based etching processes for improving laser damage resistance of fused silica optical surfaces,” J. Am. Ceram. Soc. 94(2), 416–428 (2011).
[Crossref]

J. Appl. Phys. (1)

N. Savvides, “Surface microroughness of ion-beam etched optical surfaces,” J. Appl. Phys. 97(5), 053517 (2005).
[Crossref]

J. Chem. Soc., Faraday Trans. (1)

Y. Tanizawa and T. Suzuki, “Effects of silicate ions on the formation and transformation of calcium phosphates in neutral aqueous solutions,” J. Chem. Soc., Faraday Trans. 91(19), 3499–3503 (1995).
[Crossref]

J. Indian I. Sci. (1)

A. Paul, A. Dimri, and R. Bajpai, “Plasma etching processes for the realization of micromechanical structures for MEMS. (MoO3) x thin films,” J. Indian I. Sci. 81, 669–674 (2013).

J. Non-Cryst. Solids (2)

L. Wong, T. Suratwala, M. Feit, P. Miller, and R. Steele, “The effect of HF/NH4F etching on the morphology of surface fractures on fused silica,” J. Non-Cryst. Solids 355(13), 797–810 (2009).
[Crossref]

T. Suratwala, L. Wong, P. Miller, M. Feit, J. Menapace, R. Steele, P. Davis, and D. Walmer, “Sub-surface mechanical damage distributions during grinding of fused silica,” J. Non-Cryst. Solids 352(52-54), 5601–5617 (2006).
[Crossref]

J. Vac. Sci. Technol. (1)

H. Lehmann and R. Widmer, “Profile control by reactive sputter etching,” J. Vac. Sci. Technol. 15(2), 319–326 (1978).
[Crossref]

J. Vac. Sci. Technol. A (3)

L. Lallement, A. Rhallabi, C. Cardinaud, and M. C. P. Fernandez, “Modelling of fluorine based high density plasma for the etching of silica glasses,” J. Vac. Sci. Technol. A 29(5), 0513041 (2011).
[Crossref]

L. Lallement, C. Gosse, C. Cardinaud, M.-C. Peignon-Fernandez, and A. Rhallabi, “Etching studies of silica glasses in SF6/Ar inductively coupled plasmas: implications for microfluidic devices fabrication,” J. Vac. Sci. Technol. A 28(2), 277–286 (2010).
[Crossref]

J. Chang and J. Coburn, “Plasma–surface interactions,” J. Vac. Sci. Technol. A 21(5), S145–S151 (2003).
[Crossref]

Jap. J Appl. Phys. (1)

T. Kamimura, S. Akamatsu, H. Horibe, H. Shiba, S. Motokoshi, T. Sakamoto, T. Jitsuno, T. Okamato, and K. Yoshida, “Enhancement of surface-damage resistance by removing subsurface damage in fused silica and its dependence on wavelength,” Jap. J Appl. Phys. 43(No. 9A/B), L1229–L1231 (2004).
[Crossref]

Opt. Eng. (2)

A. A. Manenkov, “Fundamental mechanisms of laser-induced damage in optical materials: today’s state of understanding and problems,” Opt. Eng. 53(1), 010901 (2014).
[Crossref]

J. Huang, X. Zhou, H. Liu, F. Wang, X. Jiang, W. Wu, Y. Tang, and W. Zheng, “Influence of subsurface defects on damage performance of fused silica in ultraviolet laser,” Opt. Eng. 52(2), 024203 (2013).
[Crossref]

Opt. Express (6)

Opt. Lett. (1)

Opt. Mater. (1)

H. Liu, X. Ye, X. Zhou, J. Huang, F. Wang, X. Zhou, W. Wu, X. Jiang, Z. Sui, and W. Zheng, “Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process,” Opt. Mater. 36(5), 855–860 (2014).
[Crossref]

Phys. Rev. B (1)

L. Vaccaro, M. Cannas, V. Radzig, and R. Boscaino, “Luminescence of the surface nonbridging oxygen hole center in silica: Spectral and decay properties,” Phys. Rev. B 78(7), 075421 (2008).
[Crossref]

Plasma Process. Polym. (1)

J. P. Barz, C. Oehr, and A. Lunk, “Analysis and modeling of gas‐phase processes in a CHF3/Ar discharge,” Plasma Process. Polym. 8(5), 409–423 (2011).
[Crossref]

Plasma Sources Sci. Technol. (1)

D. Bose, M. Rao, T. Govindan, and M. Meyyappan, “Uncertainty and sensitivity analysis of gas-phase chemistry in a CHF3 plasma,” Plasma Sources Sci. Technol. 12(2), 225–234 (2003).
[Crossref]

Proc. SPIE (8)

J. Hue, P. Garrec, J. Dijon, and P. Lyan, “R-on-1 automatic mapping: a new tool for laser damage testing,” Proc. SPIE 2714, 90–101 (1996).
[Crossref]

L. W. Hrubesh, M. A. Norton, W. A. Molander, E. E. Donohue, S. M. Maricle, B. Penetrante, R. M. Brusasco, W. Grundler, J. A. Butler, J. Carr, R. Hill, L. J. Summers, M. D. Feit, A. M. Rubenchik, M. H. Key, P. J. Wegner, A. K. Burnham, L. A. Hackel, and M. R. Kozlowski, “Methods for mitigating surface damage growth in NIF final optics,” Proc. SPIE 4679, 23–33 (2002).
[Crossref]

A. K. Paul, A. K. Dimri, and S. Mohan, “Fabrication of micromechanical structures in silicon using SF6/O2 gas mixtures,” Proc. SPIE 3903, 2–8 (1999).
[Crossref]

M. Feit, T. Suratwala, L. Wong, W. Steele, P. Miller, and J. Bude, “Modeling wet chemical etching of surface flaws on fused silica,” Proc. SPIE 7504, 75040L (2009).
[Crossref]

J. Néauport, C. Ambard, H. Bercegol, O. Cahuc, J. Champreux, J. Charles, P. Cormont, N. Darbois, P. Darnis, J. Destribats, E. Fargin, I. Iordanoff, R. Laheurte, L. Lamaignère, P. Legros, R. Mercier, and F. Pilon, “Optimizing fused silica polishing processes for 351nm high-power laser application,” Proc. SPIE 7132, 71321I (2008).
[Crossref]

A. During, P. Bouchut, J.-G. Coutard, C. Leymarie, and H. Bercegol, “Mitigation of laser damage on fused silica surfaces with a variable profile CO2 laser beam,” Proc. SPIE 6403, 640323 (2006).
[Crossref]

P. Miller, T. Suratwala, J. Bude, T. Laurence, N. Shen, W. Steele, M. Feit, J. Menapace, and L. Wong, “Laser damage precursors in fused silica,” Proc. SPIE 7504, 75040X (2009).
[Crossref]

M. R. Kozlowski, J. Carr, I. D. Hutcheon, R. A. Torres, L. M. Sheehan, D. W. Camp, and M. Yan, “Depth profile of polishing-induced contamination on fused silica surface,” Proc. SPIE 3244, 365–375 (1998).
[Crossref]

Sci. Rep. (1)

X. Ye, X. Jiang, J. Huang, F. Geng, L. Sun, X. Zu, W. Wu, and W. Zheng, “Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching,” Sci. Rep. 5, 13023 (2015).

Vacuum (1)

H. Norström, R. Buchta, F. Runovc, and P. Wiklund, “RIE of SiO2 in doped and undoped fluorocarbon plasmas,” Vacuum 32(12), 737–745 (1982).
[Crossref]

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Figures (8)

Fig. 1
Fig. 1 Damage probability and surface morphology of the fused silica samples.
Fig. 2
Fig. 2 Depth profiles of impuritie elements detected in fused silica surface by TOF-SMIS: (a) sample 1; (b) sample 2; (c) sample 3; (d) sample 4.
Fig. 3
Fig. 3 Fluorescence images detected on fused silica subsurface by confocal fluorescence microscope: (a) sample 1; (b) sample 2; (c) sample 3; (d) sample 4.
Fig. 4
Fig. 4 Density of SSD with respect to different defect area ranges.
Fig. 5
Fig. 5 Roughness of the sample surfaces with different etching depths.
Fig. 6
Fig. 6 Microscopy of the sample surfaces detected by white light interferometer: (a) sample 1; (b) sample 2; (c) sample 3; (d) sample 4.
Fig. 7
Fig. 7 XPS spectra of Si 2p on the sample surfaces.
Fig. 8
Fig. 8 FL intensity of the sample surfaces with different etching depths.

Tables (5)

Tables Icon

Table 1 Sample preparation methods

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Table 2 Damage probabilities of fused silica samples

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Table 3 The total amount (0-12nm) of each impurity element in the subsurface layer of the samples

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Table 4 SSD area percentage of fused silica samples

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Table 5 Atomic concentration of C 1s on the sample surfaces

Metrics