Y. Bourgin, T. Käsebier, and U. D. Zeitner, “250 nm period grating transferred by proximity i-line mask-aligner lithography,” Opt. Lett. 39(6), 1665–1668 (2014).
[Crossref]
[PubMed]
T. Siefke, D. Lehr, T. Weber, D. Voigt, E.-B. Kley, and A. Tünnermann, “Fabrication influences on deep-ultraviolet tungsten wire grid polarizers manufactured by double patterning,” Opt. Lett. 39(22), 6434–6437 (2014).
[Crossref]
[PubMed]
E.-B. Kley, H. Schmidt, U. Zeitner, M. Banasch, and B. Schnabel, “Enhanced e-beam pattern writing for nano-optics based on character projection,” Proc. SPIE 8352, 83520M (2012).
T. Weber, T. Käsebier, A. Szeghalmi, M. Knez, E.-B. Kley, and A. Tünnermann, “Iridium wire grid polarizer fabricated using atomic layer deposition,” Nanoscale Res. Lett. 6(1), 558 (2011).
[Crossref]
[PubMed]
T. Weber, T. Käsebier, E.-B. Kley, and A. Tünnermann, “Broadband iridium wire grid polarizer for UV applications,” Opt. Lett. 36(4), 445–447 (2011).
[Crossref]
[PubMed]
Y. M. Song, J. S. Yu, and Y. T. Lee, “Antireflective submicrometer gratings on thin-film silicon solar cells for light-absorption enhancement,” Opt. Lett. 35(3), 276–278 (2010).
[Crossref]
[PubMed]
Y. Bourgin, Y. Jourlin, O. Parriaux, A. Talneau, S. Tonchev, C. Veillas, P. Karvinen, N. Passilly, A. R. Md Zain, R. M. De La Rue, J. Van Erps, and D. Troadec, “100 nm period grating by high-index phase-mask immersion lithography,” Opt. Express 18(10), 10557–10566 (2010).
[Crossref]
[PubMed]
R. Voelkel, U. Vogler, A. Bich, P. Pernet, K. J. Weible, M. Hornung, R. Zoberbier, E. Cullmann, L. Stuerzebecher, T. Harzendorf, and U. D. Zeitner, “Advanced mask aligner lithography: new illumination system,” Opt. Express 18(20), 20968–20978 (2010).
[Crossref]
[PubMed]
M. Ahn, R. K. Heilmann, and M. L. Schattenburg, “Fabrication of 200 nm period blazed transmission gratings on silicon-on-insulator wafers,” J. Vac. Sci. Technol. B 26, 2179 (2008).
L. Chen, J. J. Wang, F. Walters, X. Deng, M. Buonanno, S. Tai, and X. Liu, “Large flexible nanowire grid visible polarizer made by nanoimprint lithography,” Appl. Phys. Lett. 90(6), 063111 (2007).
[Crossref]
J. J. Wang, F. Walters, X. Liu, P. Sciortino, and X. Deng, “High-performance, large area, deep ultraviolet to infrared polarizers based on 40 nm line/78 nm space nanowire grids,” Appl. Phys. Lett. 90(6), 061104 (2007).
[Crossref]
E. Gamet, A. V. Tishchenko, and O. Parriaux, “Cancellation of the zeroth order in a phase mask by mode interplay in a high index contrast binary grating,” Appl. Opt. 46(27), 6719–6726 (2007).
[Crossref]
[PubMed]
P. Laakkonen, M. Kuittinen, and J. Turunen, “Coated phase masks for proximity printing of Bragg gratings,” Opt. Commun. 192(3-6), 153–159 (2001).
[Crossref]
D. M. Tennant, K. Feder, K. F. Dreyer, R. P. Gnall, T. L. Koch, U. Koren, B. I. Miller, and M. G. Young, “Phase grating masks for photonic integrated circuits fabricated by e-beam writing and dry etching: Challenges to commercial applications,” Microelectron. Eng. 27(1-4), 427–434 (1995).
[Crossref]
D. Strickland and G. Mourou, “Compression of amplified chirped optical pulses,” Opt. Commun. 56(3), 219–221 (1985).
[Crossref]
N. Cabrera and N. F. Mott, “Theory of the oxidation of metals,” Rep. Prog. Phys. 12(1), 163–184 (1949).
[Crossref]
M. Ahn, R. K. Heilmann, and M. L. Schattenburg, “Fabrication of 200 nm period blazed transmission gratings on silicon-on-insulator wafers,” J. Vac. Sci. Technol. B 26, 2179 (2008).
E.-B. Kley, H. Schmidt, U. Zeitner, M. Banasch, and B. Schnabel, “Enhanced e-beam pattern writing for nano-optics based on character projection,” Proc. SPIE 8352, 83520M (2012).
R. Voelkel, U. Vogler, A. Bich, P. Pernet, K. J. Weible, M. Hornung, R. Zoberbier, E. Cullmann, L. Stuerzebecher, T. Harzendorf, and U. D. Zeitner, “Advanced mask aligner lithography: new illumination system,” Opt. Express 18(20), 20968–20978 (2010).
[Crossref]
[PubMed]
Y. Bourgin, T. Käsebier, and U. D. Zeitner, “250 nm period grating transferred by proximity i-line mask-aligner lithography,” Opt. Lett. 39(6), 1665–1668 (2014).
[Crossref]
[PubMed]
Y. Bourgin, Y. Jourlin, O. Parriaux, A. Talneau, S. Tonchev, C. Veillas, P. Karvinen, N. Passilly, A. R. Md Zain, R. M. De La Rue, J. Van Erps, and D. Troadec, “100 nm period grating by high-index phase-mask immersion lithography,” Opt. Express 18(10), 10557–10566 (2010).
[Crossref]
[PubMed]
L. Chen, J. J. Wang, F. Walters, X. Deng, M. Buonanno, S. Tai, and X. Liu, “Large flexible nanowire grid visible polarizer made by nanoimprint lithography,” Appl. Phys. Lett. 90(6), 063111 (2007).
[Crossref]
N. Cabrera and N. F. Mott, “Theory of the oxidation of metals,” Rep. Prog. Phys. 12(1), 163–184 (1949).
[Crossref]
Y. Ye, Y. Zhou, and L. Chen, “Color filter based on a two-dimensional submicrometer metal grating,” Appl. Opt. 48(27), 5035–5039 (2009).
[PubMed]
L. Chen, J. J. Wang, F. Walters, X. Deng, M. Buonanno, S. Tai, and X. Liu, “Large flexible nanowire grid visible polarizer made by nanoimprint lithography,” Appl. Phys. Lett. 90(6), 063111 (2007).
[Crossref]
R. Voelkel, U. Vogler, A. Bich, P. Pernet, K. J. Weible, M. Hornung, R. Zoberbier, E. Cullmann, L. Stuerzebecher, T. Harzendorf, and U. D. Zeitner, “Advanced mask aligner lithography: new illumination system,” Opt. Express 18(20), 20968–20978 (2010).
[Crossref]
[PubMed]
Y. Bourgin, Y. Jourlin, O. Parriaux, A. Talneau, S. Tonchev, C. Veillas, P. Karvinen, N. Passilly, A. R. Md Zain, R. M. De La Rue, J. Van Erps, and D. Troadec, “100 nm period grating by high-index phase-mask immersion lithography,” Opt. Express 18(10), 10557–10566 (2010).
[Crossref]
[PubMed]
L. Chen, J. J. Wang, F. Walters, X. Deng, M. Buonanno, S. Tai, and X. Liu, “Large flexible nanowire grid visible polarizer made by nanoimprint lithography,” Appl. Phys. Lett. 90(6), 063111 (2007).
[Crossref]
J. J. Wang, F. Walters, X. Liu, P. Sciortino, and X. Deng, “High-performance, large area, deep ultraviolet to infrared polarizers based on 40 nm line/78 nm space nanowire grids,” Appl. Phys. Lett. 90(6), 061104 (2007).
[Crossref]
D. M. Tennant, K. Feder, K. F. Dreyer, R. P. Gnall, T. L. Koch, U. Koren, B. I. Miller, and M. G. Young, “Phase grating masks for photonic integrated circuits fabricated by e-beam writing and dry etching: Challenges to commercial applications,” Microelectron. Eng. 27(1-4), 427–434 (1995).
[Crossref]
D. M. Tennant, K. Feder, K. F. Dreyer, R. P. Gnall, T. L. Koch, U. Koren, B. I. Miller, and M. G. Young, “Phase grating masks for photonic integrated circuits fabricated by e-beam writing and dry etching: Challenges to commercial applications,” Microelectron. Eng. 27(1-4), 427–434 (1995).
[Crossref]
D. M. Tennant, K. Feder, K. F. Dreyer, R. P. Gnall, T. L. Koch, U. Koren, B. I. Miller, and M. G. Young, “Phase grating masks for photonic integrated circuits fabricated by e-beam writing and dry etching: Challenges to commercial applications,” Microelectron. Eng. 27(1-4), 427–434 (1995).
[Crossref]
R. Voelkel, U. Vogler, A. Bich, P. Pernet, K. J. Weible, M. Hornung, R. Zoberbier, E. Cullmann, L. Stuerzebecher, T. Harzendorf, and U. D. Zeitner, “Advanced mask aligner lithography: new illumination system,” Opt. Express 18(20), 20968–20978 (2010).
[Crossref]
[PubMed]
M. Ahn, R. K. Heilmann, and M. L. Schattenburg, “Fabrication of 200 nm period blazed transmission gratings on silicon-on-insulator wafers,” J. Vac. Sci. Technol. B 26, 2179 (2008).
R. Voelkel, U. Vogler, A. Bich, P. Pernet, K. J. Weible, M. Hornung, R. Zoberbier, E. Cullmann, L. Stuerzebecher, T. Harzendorf, and U. D. Zeitner, “Advanced mask aligner lithography: new illumination system,” Opt. Express 18(20), 20968–20978 (2010).
[Crossref]
[PubMed]
Y. Bourgin, Y. Jourlin, O. Parriaux, A. Talneau, S. Tonchev, C. Veillas, P. Karvinen, N. Passilly, A. R. Md Zain, R. M. De La Rue, J. Van Erps, and D. Troadec, “100 nm period grating by high-index phase-mask immersion lithography,” Opt. Express 18(10), 10557–10566 (2010).
[Crossref]
[PubMed]
Y. Bourgin, Y. Jourlin, O. Parriaux, A. Talneau, S. Tonchev, C. Veillas, P. Karvinen, N. Passilly, A. R. Md Zain, R. M. De La Rue, J. Van Erps, and D. Troadec, “100 nm period grating by high-index phase-mask immersion lithography,” Opt. Express 18(10), 10557–10566 (2010).
[Crossref]
[PubMed]
Y. Bourgin, T. Käsebier, and U. D. Zeitner, “250 nm period grating transferred by proximity i-line mask-aligner lithography,” Opt. Lett. 39(6), 1665–1668 (2014).
[Crossref]
[PubMed]
T. Weber, T. Käsebier, E.-B. Kley, and A. Tünnermann, “Broadband iridium wire grid polarizer for UV applications,” Opt. Lett. 36(4), 445–447 (2011).
[Crossref]
[PubMed]
T. Weber, T. Käsebier, A. Szeghalmi, M. Knez, E.-B. Kley, and A. Tünnermann, “Iridium wire grid polarizer fabricated using atomic layer deposition,” Nanoscale Res. Lett. 6(1), 558 (2011).
[Crossref]
[PubMed]
T. Siefke, D. Lehr, T. Weber, D. Voigt, E.-B. Kley, and A. Tünnermann, “Fabrication influences on deep-ultraviolet tungsten wire grid polarizers manufactured by double patterning,” Opt. Lett. 39(22), 6434–6437 (2014).
[Crossref]
[PubMed]
E.-B. Kley, H. Schmidt, U. Zeitner, M. Banasch, and B. Schnabel, “Enhanced e-beam pattern writing for nano-optics based on character projection,” Proc. SPIE 8352, 83520M (2012).
T. Weber, T. Käsebier, A. Szeghalmi, M. Knez, E.-B. Kley, and A. Tünnermann, “Iridium wire grid polarizer fabricated using atomic layer deposition,” Nanoscale Res. Lett. 6(1), 558 (2011).
[Crossref]
[PubMed]
T. Weber, T. Käsebier, E.-B. Kley, and A. Tünnermann, “Broadband iridium wire grid polarizer for UV applications,” Opt. Lett. 36(4), 445–447 (2011).
[Crossref]
[PubMed]
T. Weber, T. Käsebier, A. Szeghalmi, M. Knez, E.-B. Kley, and A. Tünnermann, “Iridium wire grid polarizer fabricated using atomic layer deposition,” Nanoscale Res. Lett. 6(1), 558 (2011).
[Crossref]
[PubMed]
D. M. Tennant, K. Feder, K. F. Dreyer, R. P. Gnall, T. L. Koch, U. Koren, B. I. Miller, and M. G. Young, “Phase grating masks for photonic integrated circuits fabricated by e-beam writing and dry etching: Challenges to commercial applications,” Microelectron. Eng. 27(1-4), 427–434 (1995).
[Crossref]
D. M. Tennant, K. Feder, K. F. Dreyer, R. P. Gnall, T. L. Koch, U. Koren, B. I. Miller, and M. G. Young, “Phase grating masks for photonic integrated circuits fabricated by e-beam writing and dry etching: Challenges to commercial applications,” Microelectron. Eng. 27(1-4), 427–434 (1995).
[Crossref]
P. Laakkonen, M. Kuittinen, and J. Turunen, “Coated phase masks for proximity printing of Bragg gratings,” Opt. Commun. 192(3-6), 153–159 (2001).
[Crossref]
P. Laakkonen, M. Kuittinen, and J. Turunen, “Coated phase masks for proximity printing of Bragg gratings,” Opt. Commun. 192(3-6), 153–159 (2001).
[Crossref]
J. J. Wang, F. Walters, X. Liu, P. Sciortino, and X. Deng, “High-performance, large area, deep ultraviolet to infrared polarizers based on 40 nm line/78 nm space nanowire grids,” Appl. Phys. Lett. 90(6), 061104 (2007).
[Crossref]
L. Chen, J. J. Wang, F. Walters, X. Deng, M. Buonanno, S. Tai, and X. Liu, “Large flexible nanowire grid visible polarizer made by nanoimprint lithography,” Appl. Phys. Lett. 90(6), 063111 (2007).
[Crossref]
Y. Bourgin, Y. Jourlin, O. Parriaux, A. Talneau, S. Tonchev, C. Veillas, P. Karvinen, N. Passilly, A. R. Md Zain, R. M. De La Rue, J. Van Erps, and D. Troadec, “100 nm period grating by high-index phase-mask immersion lithography,” Opt. Express 18(10), 10557–10566 (2010).
[Crossref]
[PubMed]
D. M. Tennant, K. Feder, K. F. Dreyer, R. P. Gnall, T. L. Koch, U. Koren, B. I. Miller, and M. G. Young, “Phase grating masks for photonic integrated circuits fabricated by e-beam writing and dry etching: Challenges to commercial applications,” Microelectron. Eng. 27(1-4), 427–434 (1995).
[Crossref]
N. Cabrera and N. F. Mott, “Theory of the oxidation of metals,” Rep. Prog. Phys. 12(1), 163–184 (1949).
[Crossref]
D. Strickland and G. Mourou, “Compression of amplified chirped optical pulses,” Opt. Commun. 56(3), 219–221 (1985).
[Crossref]
Y. Bourgin, Y. Jourlin, O. Parriaux, A. Talneau, S. Tonchev, C. Veillas, P. Karvinen, N. Passilly, A. R. Md Zain, R. M. De La Rue, J. Van Erps, and D. Troadec, “100 nm period grating by high-index phase-mask immersion lithography,” Opt. Express 18(10), 10557–10566 (2010).
[Crossref]
[PubMed]
E. Gamet, A. V. Tishchenko, and O. Parriaux, “Cancellation of the zeroth order in a phase mask by mode interplay in a high index contrast binary grating,” Appl. Opt. 46(27), 6719–6726 (2007).
[Crossref]
[PubMed]
Y. Bourgin, Y. Jourlin, O. Parriaux, A. Talneau, S. Tonchev, C. Veillas, P. Karvinen, N. Passilly, A. R. Md Zain, R. M. De La Rue, J. Van Erps, and D. Troadec, “100 nm period grating by high-index phase-mask immersion lithography,” Opt. Express 18(10), 10557–10566 (2010).
[Crossref]
[PubMed]
R. Voelkel, U. Vogler, A. Bich, P. Pernet, K. J. Weible, M. Hornung, R. Zoberbier, E. Cullmann, L. Stuerzebecher, T. Harzendorf, and U. D. Zeitner, “Advanced mask aligner lithography: new illumination system,” Opt. Express 18(20), 20968–20978 (2010).
[Crossref]
[PubMed]
M. Ahn, R. K. Heilmann, and M. L. Schattenburg, “Fabrication of 200 nm period blazed transmission gratings on silicon-on-insulator wafers,” J. Vac. Sci. Technol. B 26, 2179 (2008).
E.-B. Kley, H. Schmidt, U. Zeitner, M. Banasch, and B. Schnabel, “Enhanced e-beam pattern writing for nano-optics based on character projection,” Proc. SPIE 8352, 83520M (2012).
E.-B. Kley, H. Schmidt, U. Zeitner, M. Banasch, and B. Schnabel, “Enhanced e-beam pattern writing for nano-optics based on character projection,” Proc. SPIE 8352, 83520M (2012).
J. J. Wang, F. Walters, X. Liu, P. Sciortino, and X. Deng, “High-performance, large area, deep ultraviolet to infrared polarizers based on 40 nm line/78 nm space nanowire grids,” Appl. Phys. Lett. 90(6), 061104 (2007).
[Crossref]
D. Strickland and G. Mourou, “Compression of amplified chirped optical pulses,” Opt. Commun. 56(3), 219–221 (1985).
[Crossref]
R. Voelkel, U. Vogler, A. Bich, P. Pernet, K. J. Weible, M. Hornung, R. Zoberbier, E. Cullmann, L. Stuerzebecher, T. Harzendorf, and U. D. Zeitner, “Advanced mask aligner lithography: new illumination system,” Opt. Express 18(20), 20968–20978 (2010).
[Crossref]
[PubMed]
T. Weber, T. Käsebier, A. Szeghalmi, M. Knez, E.-B. Kley, and A. Tünnermann, “Iridium wire grid polarizer fabricated using atomic layer deposition,” Nanoscale Res. Lett. 6(1), 558 (2011).
[Crossref]
[PubMed]
L. Chen, J. J. Wang, F. Walters, X. Deng, M. Buonanno, S. Tai, and X. Liu, “Large flexible nanowire grid visible polarizer made by nanoimprint lithography,” Appl. Phys. Lett. 90(6), 063111 (2007).
[Crossref]
Y. Bourgin, Y. Jourlin, O. Parriaux, A. Talneau, S. Tonchev, C. Veillas, P. Karvinen, N. Passilly, A. R. Md Zain, R. M. De La Rue, J. Van Erps, and D. Troadec, “100 nm period grating by high-index phase-mask immersion lithography,” Opt. Express 18(10), 10557–10566 (2010).
[Crossref]
[PubMed]
D. M. Tennant, K. Feder, K. F. Dreyer, R. P. Gnall, T. L. Koch, U. Koren, B. I. Miller, and M. G. Young, “Phase grating masks for photonic integrated circuits fabricated by e-beam writing and dry etching: Challenges to commercial applications,” Microelectron. Eng. 27(1-4), 427–434 (1995).
[Crossref]
Y. Bourgin, Y. Jourlin, O. Parriaux, A. Talneau, S. Tonchev, C. Veillas, P. Karvinen, N. Passilly, A. R. Md Zain, R. M. De La Rue, J. Van Erps, and D. Troadec, “100 nm period grating by high-index phase-mask immersion lithography,” Opt. Express 18(10), 10557–10566 (2010).
[Crossref]
[PubMed]
Y. Bourgin, Y. Jourlin, O. Parriaux, A. Talneau, S. Tonchev, C. Veillas, P. Karvinen, N. Passilly, A. R. Md Zain, R. M. De La Rue, J. Van Erps, and D. Troadec, “100 nm period grating by high-index phase-mask immersion lithography,” Opt. Express 18(10), 10557–10566 (2010).
[Crossref]
[PubMed]
T. Siefke, D. Lehr, T. Weber, D. Voigt, E.-B. Kley, and A. Tünnermann, “Fabrication influences on deep-ultraviolet tungsten wire grid polarizers manufactured by double patterning,” Opt. Lett. 39(22), 6434–6437 (2014).
[Crossref]
[PubMed]
T. Weber, T. Käsebier, E.-B. Kley, and A. Tünnermann, “Broadband iridium wire grid polarizer for UV applications,” Opt. Lett. 36(4), 445–447 (2011).
[Crossref]
[PubMed]
T. Weber, T. Käsebier, A. Szeghalmi, M. Knez, E.-B. Kley, and A. Tünnermann, “Iridium wire grid polarizer fabricated using atomic layer deposition,” Nanoscale Res. Lett. 6(1), 558 (2011).
[Crossref]
[PubMed]
P. Laakkonen, M. Kuittinen, and J. Turunen, “Coated phase masks for proximity printing of Bragg gratings,” Opt. Commun. 192(3-6), 153–159 (2001).
[Crossref]
Y. Bourgin, Y. Jourlin, O. Parriaux, A. Talneau, S. Tonchev, C. Veillas, P. Karvinen, N. Passilly, A. R. Md Zain, R. M. De La Rue, J. Van Erps, and D. Troadec, “100 nm period grating by high-index phase-mask immersion lithography,” Opt. Express 18(10), 10557–10566 (2010).
[Crossref]
[PubMed]
Y. Bourgin, Y. Jourlin, O. Parriaux, A. Talneau, S. Tonchev, C. Veillas, P. Karvinen, N. Passilly, A. R. Md Zain, R. M. De La Rue, J. Van Erps, and D. Troadec, “100 nm period grating by high-index phase-mask immersion lithography,” Opt. Express 18(10), 10557–10566 (2010).
[Crossref]
[PubMed]
R. Voelkel, U. Vogler, A. Bich, P. Pernet, K. J. Weible, M. Hornung, R. Zoberbier, E. Cullmann, L. Stuerzebecher, T. Harzendorf, and U. D. Zeitner, “Advanced mask aligner lithography: new illumination system,” Opt. Express 18(20), 20968–20978 (2010).
[Crossref]
[PubMed]
R. Voelkel, U. Vogler, A. Bich, P. Pernet, K. J. Weible, M. Hornung, R. Zoberbier, E. Cullmann, L. Stuerzebecher, T. Harzendorf, and U. D. Zeitner, “Advanced mask aligner lithography: new illumination system,” Opt. Express 18(20), 20968–20978 (2010).
[Crossref]
[PubMed]
J. J. Wang, F. Walters, X. Liu, P. Sciortino, and X. Deng, “High-performance, large area, deep ultraviolet to infrared polarizers based on 40 nm line/78 nm space nanowire grids,” Appl. Phys. Lett. 90(6), 061104 (2007).
[Crossref]
L. Chen, J. J. Wang, F. Walters, X. Deng, M. Buonanno, S. Tai, and X. Liu, “Large flexible nanowire grid visible polarizer made by nanoimprint lithography,” Appl. Phys. Lett. 90(6), 063111 (2007).
[Crossref]
L. Chen, J. J. Wang, F. Walters, X. Deng, M. Buonanno, S. Tai, and X. Liu, “Large flexible nanowire grid visible polarizer made by nanoimprint lithography,” Appl. Phys. Lett. 90(6), 063111 (2007).
[Crossref]
J. J. Wang, F. Walters, X. Liu, P. Sciortino, and X. Deng, “High-performance, large area, deep ultraviolet to infrared polarizers based on 40 nm line/78 nm space nanowire grids,” Appl. Phys. Lett. 90(6), 061104 (2007).
[Crossref]
T. Siefke, D. Lehr, T. Weber, D. Voigt, E.-B. Kley, and A. Tünnermann, “Fabrication influences on deep-ultraviolet tungsten wire grid polarizers manufactured by double patterning,” Opt. Lett. 39(22), 6434–6437 (2014).
[Crossref]
[PubMed]
T. Weber, T. Käsebier, E.-B. Kley, and A. Tünnermann, “Broadband iridium wire grid polarizer for UV applications,” Opt. Lett. 36(4), 445–447 (2011).
[Crossref]
[PubMed]
T. Weber, T. Käsebier, A. Szeghalmi, M. Knez, E.-B. Kley, and A. Tünnermann, “Iridium wire grid polarizer fabricated using atomic layer deposition,” Nanoscale Res. Lett. 6(1), 558 (2011).
[Crossref]
[PubMed]
R. Voelkel, U. Vogler, A. Bich, P. Pernet, K. J. Weible, M. Hornung, R. Zoberbier, E. Cullmann, L. Stuerzebecher, T. Harzendorf, and U. D. Zeitner, “Advanced mask aligner lithography: new illumination system,” Opt. Express 18(20), 20968–20978 (2010).
[Crossref]
[PubMed]
D. M. Tennant, K. Feder, K. F. Dreyer, R. P. Gnall, T. L. Koch, U. Koren, B. I. Miller, and M. G. Young, “Phase grating masks for photonic integrated circuits fabricated by e-beam writing and dry etching: Challenges to commercial applications,” Microelectron. Eng. 27(1-4), 427–434 (1995).
[Crossref]
E.-B. Kley, H. Schmidt, U. Zeitner, M. Banasch, and B. Schnabel, “Enhanced e-beam pattern writing for nano-optics based on character projection,” Proc. SPIE 8352, 83520M (2012).
Y. Bourgin, T. Käsebier, and U. D. Zeitner, “250 nm period grating transferred by proximity i-line mask-aligner lithography,” Opt. Lett. 39(6), 1665–1668 (2014).
[Crossref]
[PubMed]
R. Voelkel, U. Vogler, A. Bich, P. Pernet, K. J. Weible, M. Hornung, R. Zoberbier, E. Cullmann, L. Stuerzebecher, T. Harzendorf, and U. D. Zeitner, “Advanced mask aligner lithography: new illumination system,” Opt. Express 18(20), 20968–20978 (2010).
[Crossref]
[PubMed]
R. Voelkel, U. Vogler, A. Bich, P. Pernet, K. J. Weible, M. Hornung, R. Zoberbier, E. Cullmann, L. Stuerzebecher, T. Harzendorf, and U. D. Zeitner, “Advanced mask aligner lithography: new illumination system,” Opt. Express 18(20), 20968–20978 (2010).
[Crossref]
[PubMed]
Y. Ye, Y. Zhou, and L. Chen, “Color filter based on a two-dimensional submicrometer metal grating,” Appl. Opt. 48(27), 5035–5039 (2009).
[PubMed]
E. Gamet, A. V. Tishchenko, and O. Parriaux, “Cancellation of the zeroth order in a phase mask by mode interplay in a high index contrast binary grating,” Appl. Opt. 46(27), 6719–6726 (2007).
[Crossref]
[PubMed]
J. J. Wang, F. Walters, X. Liu, P. Sciortino, and X. Deng, “High-performance, large area, deep ultraviolet to infrared polarizers based on 40 nm line/78 nm space nanowire grids,” Appl. Phys. Lett. 90(6), 061104 (2007).
[Crossref]
L. Chen, J. J. Wang, F. Walters, X. Deng, M. Buonanno, S. Tai, and X. Liu, “Large flexible nanowire grid visible polarizer made by nanoimprint lithography,” Appl. Phys. Lett. 90(6), 063111 (2007).
[Crossref]
M. Ahn, R. K. Heilmann, and M. L. Schattenburg, “Fabrication of 200 nm period blazed transmission gratings on silicon-on-insulator wafers,” J. Vac. Sci. Technol. B 26, 2179 (2008).
D. M. Tennant, K. Feder, K. F. Dreyer, R. P. Gnall, T. L. Koch, U. Koren, B. I. Miller, and M. G. Young, “Phase grating masks for photonic integrated circuits fabricated by e-beam writing and dry etching: Challenges to commercial applications,” Microelectron. Eng. 27(1-4), 427–434 (1995).
[Crossref]
T. Weber, T. Käsebier, A. Szeghalmi, M. Knez, E.-B. Kley, and A. Tünnermann, “Iridium wire grid polarizer fabricated using atomic layer deposition,” Nanoscale Res. Lett. 6(1), 558 (2011).
[Crossref]
[PubMed]
P. Laakkonen, M. Kuittinen, and J. Turunen, “Coated phase masks for proximity printing of Bragg gratings,” Opt. Commun. 192(3-6), 153–159 (2001).
[Crossref]
D. Strickland and G. Mourou, “Compression of amplified chirped optical pulses,” Opt. Commun. 56(3), 219–221 (1985).
[Crossref]
Y. Bourgin, Y. Jourlin, O. Parriaux, A. Talneau, S. Tonchev, C. Veillas, P. Karvinen, N. Passilly, A. R. Md Zain, R. M. De La Rue, J. Van Erps, and D. Troadec, “100 nm period grating by high-index phase-mask immersion lithography,” Opt. Express 18(10), 10557–10566 (2010).
[Crossref]
[PubMed]
R. Voelkel, U. Vogler, A. Bich, P. Pernet, K. J. Weible, M. Hornung, R. Zoberbier, E. Cullmann, L. Stuerzebecher, T. Harzendorf, and U. D. Zeitner, “Advanced mask aligner lithography: new illumination system,” Opt. Express 18(20), 20968–20978 (2010).
[Crossref]
[PubMed]
T. Siefke, D. Lehr, T. Weber, D. Voigt, E.-B. Kley, and A. Tünnermann, “Fabrication influences on deep-ultraviolet tungsten wire grid polarizers manufactured by double patterning,” Opt. Lett. 39(22), 6434–6437 (2014).
[Crossref]
[PubMed]
Y. M. Song, J. S. Yu, and Y. T. Lee, “Antireflective submicrometer gratings on thin-film silicon solar cells for light-absorption enhancement,” Opt. Lett. 35(3), 276–278 (2010).
[Crossref]
[PubMed]
T. Weber, T. Käsebier, E.-B. Kley, and A. Tünnermann, “Broadband iridium wire grid polarizer for UV applications,” Opt. Lett. 36(4), 445–447 (2011).
[Crossref]
[PubMed]
Y. Bourgin, T. Käsebier, and U. D. Zeitner, “250 nm period grating transferred by proximity i-line mask-aligner lithography,” Opt. Lett. 39(6), 1665–1668 (2014).
[Crossref]
[PubMed]
T. J. Suleski, B. Baggett, W. F. Delaney, C. Koehler, and E. G. Johnson, “Fabrication of high-spatial-frequency gratings through computer-generated near-field holography,” Opt. Lett. 24(9), 602–604 (1999).
[Crossref]
[PubMed]
E.-B. Kley, H. Schmidt, U. Zeitner, M. Banasch, and B. Schnabel, “Enhanced e-beam pattern writing for nano-optics based on character projection,” Proc. SPIE 8352, 83520M (2012).
N. Cabrera and N. F. Mott, “Theory of the oxidation of metals,” Rep. Prog. Phys. 12(1), 163–184 (1949).
[Crossref]