Abstract

We present the design of a novel collector mirror for laser produced plasma (LPP) light sources to be used in extreme ultraviolet (EUV) lithography. The design prevents undesired infrared (IR) drive laser light, reflected from the plasma, from reaching the exit of the light source. This results in a strong purification of the EUV light, while the reflected IR light becomes refocused into the plasma for enhancing the IR-to-EUV conversion. The dual advantage of EUV purification and conversion enhancement is achieved by incorporating an IR Fresnel zone plate pattern into the EUV reflective multilayer coating of the collector mirror. Calculations using Fresnel-Kirchhoff’s diffraction theory for a typical collector design show that the IR light at the EUV exit is suppressed by four orders of magnitude. Simultaneously, 37% of the reflected IR light is refocused back the plasma.

© 2014 Optical Society of America

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2012 (10)

T. Tomie, ““Tin laser-produced plasma as the light source for extreme ultraviolet lithography high-volume manufacturing: history, ideal plasma, present status, and prospects,” J. Micro-Nanolith,” Mem. 11, 021109 (2012).

G. O’Sullivan, B. Li, ““Development of laser-produced plasma sources for extreme ultraviolet lithography,” J. Micro-Nanolith,” Mem. 11, 021108 (2012).

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).

J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, H. Mizoguchi, ““Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro-Nanolith,” Mem. 11, 021111 (2012).

R. S. Abhari, B. Rollinger, A. Z. Giovannini, O. Morris, I. Henderson, S. S. Ellwi, ““Laser-produced plasma light source for extreme-ultraviolet lithography applications,” J. Micro-Nanolith,” Mem. 11, 021114 (2012).

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,”J. Micro. Nanolith. 11(2), 021115 (2012).

C. Mbanaso, A. Antohe, H. Bull, F. Goodwin, A. Hershcovitch, G. Denbeaux, “Out-of-band radiation mitigation at 10.6 mm by molecular absorbers in laser-produced plasma extreme ultraviolet sources,” J. Micro. Nanolith. 11(2), 021116 (2012).

D. L. Voronov, P. Gawlitza, R. Cambie, S. Dhuey, E. M. Gullikson, T. Warwick, S. Braun, V. V. Yashchuk, H. A. Padmore, “Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering,” J. Appl. Phys. 111(9), 093521 (2012).

A. J. R. van den Boogaard, F. A. van Goor, E. Louis, F. Bijkerk, “Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection,” Opt. Lett. 37(2), 160–162 (2012).

V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, F. Bijkerk, “Infrared antireflective filtering for extreme ultraviolet multilayer Bragg reflectors,” Opt. Lett. 37(7), 1169–1171 (2012).

2011 (3)

V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, F. Bijkerk, “Infrared suppression by hybrid EUV multilayer--IR etalon structures,” Opt. Lett. 36(17), 3344–3346 (2011).

V. Y. Banine, K. N. Koshelev, G. H. P. M. Swinkels, “Physical processes in EUV sources for microlithography,” J. Phys. D Appl. Phys. 44(25), 253001 (2011).

A. J. R. van den Boogaard, E. Louis, E. Zoethout, K. A. Goldberg, F. Bijkerk, “Characterization of Mo/Si multilayer growth on stepped topographies,” J. Vac. Sci. Technol. B 29(5), 051803 (2011).

2010 (2)

C. Wagner, N. Harned, “EUV lithography: Lithography gets extreme,” Nat. Photonics 4(1), 24–26 (2010).

G. Tallents, E. Wagenaars, G. Pert, “Optical lithography: Lithography at EUV wavelengths,” Nat. Photonics 4(12), 809–811 (2010).

2009 (3)

W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, M. J. J. Jak, S. Braun, P. Muys, V. Y. Banine, “Extreme ultraviolet multilayer mirror with near-zero IR reflectance,” Opt. Lett. 34(23), 3680–3682 (2009).

A. J. R. van den Boogaard, E. Louis, F. A. van Goor, F. Bijkerk, “Optical element for full spectral purity from IR-generated EUV light sources,” Proc. SPIE 7271(72713B), 72713B (2009).

W. A. Soer, M. J. J. Jak, A. M. Yakunin, M. M. J. W. van Herpen, V. Y. Banine, “Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources,” Proc. SPIE 7271(72712Y), 72712Y (2009).

2008 (1)

2007 (2)

D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. L. Vargas, R. D. Simmons, J. A. Chavez, C. P. Chrobak, “LPP EUV source development for HVM,” Proc. SPIE 6517, 65170Q (2007).

V. P. Belik, Y. M. Zadiranov, N. D. Il’inskaya, A. V. Korlyakov, V. V. Luchinin, M. A. Markosov, R. P. Seisyan, E. M. Sher, “Free-standing optical filters for a nanolithography source operating in the 12-15 nm wavelength range,” Tech. Phys. Lett. 33(6), 508–511 (2007).

1990 (1)

Abe, T.

J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, H. Mizoguchi, ““Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro-Nanolith,” Mem. 11, 021111 (2012).

Abhari, R. S.

R. S. Abhari, B. Rollinger, A. Z. Giovannini, O. Morris, I. Henderson, S. S. Ellwi, ““Laser-produced plasma light source for extreme-ultraviolet lithography applications,” J. Micro-Nanolith,” Mem. 11, 021114 (2012).

Ahmad, I.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).

Antohe, A.

C. Mbanaso, A. Antohe, H. Bull, F. Goodwin, A. Hershcovitch, G. Denbeaux, “Out-of-band radiation mitigation at 10.6 mm by molecular absorbers in laser-produced plasma extreme ultraviolet sources,” J. Micro. Nanolith. 11(2), 021116 (2012).

Banine, V.

Banine, V. E.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,”J. Micro. Nanolith. 11(2), 021115 (2012).

Banine, V. Y.

V. Y. Banine, K. N. Koshelev, G. H. P. M. Swinkels, “Physical processes in EUV sources for microlithography,” J. Phys. D Appl. Phys. 44(25), 253001 (2011).

W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, M. J. J. Jak, S. Braun, P. Muys, V. Y. Banine, “Extreme ultraviolet multilayer mirror with near-zero IR reflectance,” Opt. Lett. 34(23), 3680–3682 (2009).

W. A. Soer, M. J. J. Jak, A. M. Yakunin, M. M. J. W. van Herpen, V. Y. Banine, “Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources,” Proc. SPIE 7271(72712Y), 72712Y (2009).

Baumgart, P.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).

Belik, V. P.

V. P. Belik, Y. M. Zadiranov, N. D. Il’inskaya, A. V. Korlyakov, V. V. Luchinin, M. A. Markosov, R. P. Seisyan, E. M. Sher, “Free-standing optical filters for a nanolithography source operating in the 12-15 nm wavelength range,” Tech. Phys. Lett. 33(6), 508–511 (2007).

Bijkerk, F.

Böwering, N. R.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).

D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. L. Vargas, R. D. Simmons, J. A. Chavez, C. P. Chrobak, “LPP EUV source development for HVM,” Proc. SPIE 6517, 65170Q (2007).

Brandt, D. C.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).

D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. L. Vargas, R. D. Simmons, J. A. Chavez, C. P. Chrobak, “LPP EUV source development for HVM,” Proc. SPIE 6517, 65170Q (2007).

Braun, S.

D. L. Voronov, P. Gawlitza, R. Cambie, S. Dhuey, E. M. Gullikson, T. Warwick, S. Braun, V. V. Yashchuk, H. A. Padmore, “Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering,” J. Appl. Phys. 111(9), 093521 (2012).

W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, M. J. J. Jak, S. Braun, P. Muys, V. Y. Banine, “Extreme ultraviolet multilayer mirror with near-zero IR reflectance,” Opt. Lett. 34(23), 3680–3682 (2009).

Brown, D.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).

Bull, H.

C. Mbanaso, A. Antohe, H. Bull, F. Goodwin, A. Hershcovitch, G. Denbeaux, “Out-of-band radiation mitigation at 10.6 mm by molecular absorbers in laser-produced plasma extreme ultraviolet sources,” J. Micro. Nanolith. 11(2), 021116 (2012).

Bykanov, A. N.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).

D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. L. Vargas, R. D. Simmons, J. A. Chavez, C. P. Chrobak, “LPP EUV source development for HVM,” Proc. SPIE 6517, 65170Q (2007).

Cambie, R.

D. L. Voronov, P. Gawlitza, R. Cambie, S. Dhuey, E. M. Gullikson, T. Warwick, S. Braun, V. V. Yashchuk, H. A. Padmore, “Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering,” J. Appl. Phys. 111(9), 093521 (2012).

Chavez, J. A.

D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. L. Vargas, R. D. Simmons, J. A. Chavez, C. P. Chrobak, “LPP EUV source development for HVM,” Proc. SPIE 6517, 65170Q (2007).

Chkhalo, N. I.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,”J. Micro. Nanolith. 11(2), 021115 (2012).

Chrobak, C. P.

D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. L. Vargas, R. D. Simmons, J. A. Chavez, C. P. Chrobak, “LPP EUV source development for HVM,” Proc. SPIE 6517, 65170Q (2007).

De Dea, S.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).

Denbeaux, G.

C. Mbanaso, A. Antohe, H. Bull, F. Goodwin, A. Hershcovitch, G. Denbeaux, “Out-of-band radiation mitigation at 10.6 mm by molecular absorbers in laser-produced plasma extreme ultraviolet sources,” J. Micro. Nanolith. 11(2), 021116 (2012).

Dhuey, S.

D. L. Voronov, P. Gawlitza, R. Cambie, S. Dhuey, E. M. Gullikson, T. Warwick, S. Braun, V. V. Yashchuk, H. A. Padmore, “Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering,” J. Appl. Phys. 111(9), 093521 (2012).

Drozdov, M. N.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,”J. Micro. Nanolith. 11(2), 021115 (2012).

Ellwi, S. S.

R. S. Abhari, B. Rollinger, A. Z. Giovannini, O. Morris, I. Henderson, S. S. Ellwi, ““Laser-produced plasma light source for extreme-ultraviolet lithography applications,” J. Micro-Nanolith,” Mem. 11, 021114 (2012).

Ershov, A. I.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).

D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. L. Vargas, R. D. Simmons, J. A. Chavez, C. P. Chrobak, “LPP EUV source development for HVM,” Proc. SPIE 6517, 65170Q (2007).

Farrar, N. R.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).

Fomenkov, I. V.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).

D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. L. Vargas, R. D. Simmons, J. A. Chavez, C. P. Chrobak, “LPP EUV source development for HVM,” Proc. SPIE 6517, 65170Q (2007).

Fujimoto, J.

J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, H. Mizoguchi, ““Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro-Nanolith,” Mem. 11, 021111 (2012).

Gawlitza, P.

D. L. Voronov, P. Gawlitza, R. Cambie, S. Dhuey, E. M. Gullikson, T. Warwick, S. Braun, V. V. Yashchuk, H. A. Padmore, “Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering,” J. Appl. Phys. 111(9), 093521 (2012).

W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, M. J. J. Jak, S. Braun, P. Muys, V. Y. Banine, “Extreme ultraviolet multilayer mirror with near-zero IR reflectance,” Opt. Lett. 34(23), 3680–3682 (2009).

Giovannini, A. Z.

R. S. Abhari, B. Rollinger, A. Z. Giovannini, O. Morris, I. Henderson, S. S. Ellwi, ““Laser-produced plasma light source for extreme-ultraviolet lithography applications,” J. Micro-Nanolith,” Mem. 11, 021114 (2012).

Goldberg, K. A.

A. J. R. van den Boogaard, E. Louis, E. Zoethout, K. A. Goldberg, F. Bijkerk, “Characterization of Mo/Si multilayer growth on stepped topographies,” J. Vac. Sci. Technol. B 29(5), 051803 (2011).

Golich, D. J.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).

Goodwin, F.

C. Mbanaso, A. Antohe, H. Bull, F. Goodwin, A. Hershcovitch, G. Denbeaux, “Out-of-band radiation mitigation at 10.6 mm by molecular absorbers in laser-produced plasma extreme ultraviolet sources,” J. Micro. Nanolith. 11(2), 021116 (2012).

Gullikson, E. M.

D. L. Voronov, P. Gawlitza, R. Cambie, S. Dhuey, E. M. Gullikson, T. Warwick, S. Braun, V. V. Yashchuk, H. A. Padmore, “Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering,” J. Appl. Phys. 111(9), 093521 (2012).

Harned, N.

C. Wagner, N. Harned, “EUV lithography: Lithography gets extreme,” Nat. Photonics 4(1), 24–26 (2010).

Henderson, I.

R. S. Abhari, B. Rollinger, A. Z. Giovannini, O. Morris, I. Henderson, S. S. Ellwi, ““Laser-produced plasma light source for extreme-ultraviolet lithography applications,” J. Micro-Nanolith,” Mem. 11, 021114 (2012).

Hershcovitch, A.

C. Mbanaso, A. Antohe, H. Bull, F. Goodwin, A. Hershcovitch, G. Denbeaux, “Out-of-band radiation mitigation at 10.6 mm by molecular absorbers in laser-produced plasma extreme ultraviolet sources,” J. Micro. Nanolith. 11(2), 021116 (2012).

Hoffman, J. R.

D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. L. Vargas, R. D. Simmons, J. A. Chavez, C. P. Chrobak, “LPP EUV source development for HVM,” Proc. SPIE 6517, 65170Q (2007).

Hori, T.

J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, H. Mizoguchi, ““Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro-Nanolith,” Mem. 11, 021111 (2012).

Il’inskaya, N. D.

V. P. Belik, Y. M. Zadiranov, N. D. Il’inskaya, A. V. Korlyakov, V. V. Luchinin, M. A. Markosov, R. P. Seisyan, E. M. Sher, “Free-standing optical filters for a nanolithography source operating in the 12-15 nm wavelength range,” Tech. Phys. Lett. 33(6), 508–511 (2007).

Jahns, J.

Jak, M. J. J.

W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, M. J. J. Jak, S. Braun, P. Muys, V. Y. Banine, “Extreme ultraviolet multilayer mirror with near-zero IR reflectance,” Opt. Lett. 34(23), 3680–3682 (2009).

W. A. Soer, M. J. J. Jak, A. M. Yakunin, M. M. J. W. van Herpen, V. Y. Banine, “Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources,” Proc. SPIE 7271(72712Y), 72712Y (2009).

Khodykin, O. V.

D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. L. Vargas, R. D. Simmons, J. A. Chavez, C. P. Chrobak, “LPP EUV source development for HVM,” Proc. SPIE 6517, 65170Q (2007).

Kluenkov, E. B.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,”J. Micro. Nanolith. 11(2), 021115 (2012).

Klunder, D. J. W.

Korlyakov, A. V.

V. P. Belik, Y. M. Zadiranov, N. D. Il’inskaya, A. V. Korlyakov, V. V. Luchinin, M. A. Markosov, R. P. Seisyan, E. M. Sher, “Free-standing optical filters for a nanolithography source operating in the 12-15 nm wavelength range,” Tech. Phys. Lett. 33(6), 508–511 (2007).

Koshelev, K. N.

Krivtsun, V. M.

La Fontaine, B.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).

Lercel, M. J.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).

Li, B.

G. O’Sullivan, B. Li, ““Development of laser-produced plasma sources for extreme ultraviolet lithography,” J. Micro-Nanolith,” Mem. 11, 021108 (2012).

Lopatin, A. Y.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,”J. Micro. Nanolith. 11(2), 021115 (2012).

Louis, E.

A. J. R. van den Boogaard, F. A. van Goor, E. Louis, F. Bijkerk, “Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection,” Opt. Lett. 37(2), 160–162 (2012).

A. J. R. van den Boogaard, E. Louis, E. Zoethout, K. A. Goldberg, F. Bijkerk, “Characterization of Mo/Si multilayer growth on stepped topographies,” J. Vac. Sci. Technol. B 29(5), 051803 (2011).

A. J. R. van den Boogaard, E. Louis, F. A. van Goor, F. Bijkerk, “Optical element for full spectral purity from IR-generated EUV light sources,” Proc. SPIE 7271(72713B), 72713B (2009).

M. M. J. W. van Herpen, R. W. E. van de Kruijs, D. J. W. Klunder, E. Louis, A. E. Yakshin, S. A. van der Westen, F. Bijkerk, V. Banine, “Spectral-purity-enhancing layer for multilayer mirrors,” Opt. Lett. 33(6), 560–562 (2008).

Luchin, V. I.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,”J. Micro. Nanolith. 11(2), 021115 (2012).

Luchinin, V. V.

V. P. Belik, Y. M. Zadiranov, N. D. Il’inskaya, A. V. Korlyakov, V. V. Luchinin, M. A. Markosov, R. P. Seisyan, E. M. Sher, “Free-standing optical filters for a nanolithography source operating in the 12-15 nm wavelength range,” Tech. Phys. Lett. 33(6), 508–511 (2007).

Markosov, M. A.

V. P. Belik, Y. M. Zadiranov, N. D. Il’inskaya, A. V. Korlyakov, V. V. Luchinin, M. A. Markosov, R. P. Seisyan, E. M. Sher, “Free-standing optical filters for a nanolithography source operating in the 12-15 nm wavelength range,” Tech. Phys. Lett. 33(6), 508–511 (2007).

Mbanaso, C.

C. Mbanaso, A. Antohe, H. Bull, F. Goodwin, A. Hershcovitch, G. Denbeaux, “Out-of-band radiation mitigation at 10.6 mm by molecular absorbers in laser-produced plasma extreme ultraviolet sources,” J. Micro. Nanolith. 11(2), 021116 (2012).

Medvedev, V. V.

Mizoguchi, H.

J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, H. Mizoguchi, ““Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro-Nanolith,” Mem. 11, 021111 (2012).

Morris, O.

R. S. Abhari, B. Rollinger, A. Z. Giovannini, O. Morris, I. Henderson, S. S. Ellwi, ““Laser-produced plasma light source for extreme-ultraviolet lithography applications,” J. Micro-Nanolith,” Mem. 11, 021114 (2012).

Muys, P.

Myers, D. W.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).

D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. L. Vargas, R. D. Simmons, J. A. Chavez, C. P. Chrobak, “LPP EUV source development for HVM,” Proc. SPIE 6517, 65170Q (2007).

Nakarai, H.

J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, H. Mizoguchi, ““Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro-Nanolith,” Mem. 11, 021111 (2012).

O’Sullivan, G.

G. O’Sullivan, B. Li, ““Development of laser-produced plasma sources for extreme ultraviolet lithography,” J. Micro-Nanolith,” Mem. 11, 021108 (2012).

Ohta, T.

J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, H. Mizoguchi, ““Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro-Nanolith,” Mem. 11, 021111 (2012).

Padmore, H. A.

D. L. Voronov, P. Gawlitza, R. Cambie, S. Dhuey, E. M. Gullikson, T. Warwick, S. Braun, V. V. Yashchuk, H. A. Padmore, “Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering,” J. Appl. Phys. 111(9), 093521 (2012).

Partlo, W. N.

D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. L. Vargas, R. D. Simmons, J. A. Chavez, C. P. Chrobak, “LPP EUV source development for HVM,” Proc. SPIE 6517, 65170Q (2007).

Pert, G.

G. Tallents, E. Wagenaars, G. Pert, “Optical lithography: Lithography at EUV wavelengths,” Nat. Photonics 4(12), 809–811 (2010).

Rajyaguru, C.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).

Rollinger, B.

R. S. Abhari, B. Rollinger, A. Z. Giovannini, O. Morris, I. Henderson, S. S. Ellwi, ““Laser-produced plasma light source for extreme-ultraviolet lithography applications,” J. Micro-Nanolith,” Mem. 11, 021114 (2012).

Salashchenko, N. N.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,”J. Micro. Nanolith. 11(2), 021115 (2012).

Seisyan, R. P.

V. P. Belik, Y. M. Zadiranov, N. D. Il’inskaya, A. V. Korlyakov, V. V. Luchinin, M. A. Markosov, R. P. Seisyan, E. M. Sher, “Free-standing optical filters for a nanolithography source operating in the 12-15 nm wavelength range,” Tech. Phys. Lett. 33(6), 508–511 (2007).

Sher, E. M.

V. P. Belik, Y. M. Zadiranov, N. D. Il’inskaya, A. V. Korlyakov, V. V. Luchinin, M. A. Markosov, R. P. Seisyan, E. M. Sher, “Free-standing optical filters for a nanolithography source operating in the 12-15 nm wavelength range,” Tech. Phys. Lett. 33(6), 508–511 (2007).

Simmons, R. D.

D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. L. Vargas, R. D. Simmons, J. A. Chavez, C. P. Chrobak, “LPP EUV source development for HVM,” Proc. SPIE 6517, 65170Q (2007).

Sjmaenok, L. A.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,”J. Micro. Nanolith. 11(2), 021115 (2012).

Soer, W. A.

W. A. Soer, M. J. J. Jak, A. M. Yakunin, M. M. J. W. van Herpen, V. Y. Banine, “Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources,” Proc. SPIE 7271(72712Y), 72712Y (2009).

W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, M. J. J. Jak, S. Braun, P. Muys, V. Y. Banine, “Extreme ultraviolet multilayer mirror with near-zero IR reflectance,” Opt. Lett. 34(23), 3680–3682 (2009).

Srivastava, S. N.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).

Swinkels, G. H. P. M.

V. Y. Banine, K. N. Koshelev, G. H. P. M. Swinkels, “Physical processes in EUV sources for microlithography,” J. Phys. D Appl. Phys. 44(25), 253001 (2011).

Tallents, G.

G. Tallents, E. Wagenaars, G. Pert, “Optical lithography: Lithography at EUV wavelengths,” Nat. Photonics 4(12), 809–811 (2010).

Tanaka, S.

J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, H. Mizoguchi, ““Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro-Nanolith,” Mem. 11, 021111 (2012).

Tao, Y.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).

Tomie, T.

T. Tomie, ““Tin laser-produced plasma as the light source for extreme ultraviolet lithography high-volume manufacturing: history, ideal plasma, present status, and prospects,” J. Micro-Nanolith,” Mem. 11, 021109 (2012).

Tsybin, N. N.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,”J. Micro. Nanolith. 11(2), 021115 (2012).

van de Kruijs, R. W. E.

van den Boogaard, A. J. R.

A. J. R. van den Boogaard, F. A. van Goor, E. Louis, F. Bijkerk, “Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection,” Opt. Lett. 37(2), 160–162 (2012).

A. J. R. van den Boogaard, E. Louis, E. Zoethout, K. A. Goldberg, F. Bijkerk, “Characterization of Mo/Si multilayer growth on stepped topographies,” J. Vac. Sci. Technol. B 29(5), 051803 (2011).

A. J. R. van den Boogaard, E. Louis, F. A. van Goor, F. Bijkerk, “Optical element for full spectral purity from IR-generated EUV light sources,” Proc. SPIE 7271(72713B), 72713B (2009).

van der Westen, S. A.

van Goor, F. A.

A. J. R. van den Boogaard, F. A. van Goor, E. Louis, F. Bijkerk, “Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection,” Opt. Lett. 37(2), 160–162 (2012).

A. J. R. van den Boogaard, E. Louis, F. A. van Goor, F. Bijkerk, “Optical element for full spectral purity from IR-generated EUV light sources,” Proc. SPIE 7271(72713B), 72713B (2009).

van Herpen, M. M. J. W.

Vargas, E. L.

D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. L. Vargas, R. D. Simmons, J. A. Chavez, C. P. Chrobak, “LPP EUV source development for HVM,” Proc. SPIE 6517, 65170Q (2007).

Vaschenko, G. O.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).

D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. L. Vargas, R. D. Simmons, J. A. Chavez, C. P. Chrobak, “LPP EUV source development for HVM,” Proc. SPIE 6517, 65170Q (2007).

Voronov, D. L.

D. L. Voronov, P. Gawlitza, R. Cambie, S. Dhuey, E. M. Gullikson, T. Warwick, S. Braun, V. V. Yashchuk, H. A. Padmore, “Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering,” J. Appl. Phys. 111(9), 093521 (2012).

Wagenaars, E.

G. Tallents, E. Wagenaars, G. Pert, “Optical lithography: Lithography at EUV wavelengths,” Nat. Photonics 4(12), 809–811 (2010).

Wagner, C.

C. Wagner, N. Harned, “EUV lithography: Lithography gets extreme,” Nat. Photonics 4(1), 24–26 (2010).

Walker, S. J.

Warwick, T.

D. L. Voronov, P. Gawlitza, R. Cambie, S. Dhuey, E. M. Gullikson, T. Warwick, S. Braun, V. V. Yashchuk, H. A. Padmore, “Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering,” J. Appl. Phys. 111(9), 093521 (2012).

Yakshin, A. E.

Yakunin, A. M.

V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, F. Bijkerk, “Infrared antireflective filtering for extreme ultraviolet multilayer Bragg reflectors,” Opt. Lett. 37(7), 1169–1171 (2012).

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,”J. Micro. Nanolith. 11(2), 021115 (2012).

V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, F. Bijkerk, “Infrared suppression by hybrid EUV multilayer--IR etalon structures,” Opt. Lett. 36(17), 3344–3346 (2011).

W. A. Soer, M. J. J. Jak, A. M. Yakunin, M. M. J. W. van Herpen, V. Y. Banine, “Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources,” Proc. SPIE 7271(72712Y), 72712Y (2009).

Yanagida, T.

J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, H. Mizoguchi, ““Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro-Nanolith,” Mem. 11, 021111 (2012).

Yashchuk, V. V.

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Figures (5)

Fig. 1
Fig. 1

Schematic drawing of (a) a typical EUV source based on laser produce plasma (LPP). The reflected IR and generated EUV light both follow the same path through the exit (red-blue area). (b) The same source using a Fresnel zone plate on the collector mirror. Only the EUV passes through the exit aperture (blue), while reflected IR (red) is refocused into the plasma.

Fig. 2
Fig. 2

Fresnel zone pattern at the surface of an ellipsoidal collector with focus point F.

Fig. 3
Fig. 3

Decrease of the focus diameter (FWHM) generated by the Fresnel zone pattern in the plasma plane versus the number of contributing Fresnel zones. Currently used plasma sources have a diameter between 300 and 100 μm which is indicated by the light and dark shaded areas.

Fig. 4
Fig. 4

Intensity distribution at the first focal plane of the collector where plasma is positioned (a) with and (b) without the zone plate on the collector, zoomed version is shown in the inset.

Fig. 5
Fig. 5

Intensity distribution at the intermediate focal plane of the collector which is also the exit of the source (a) with and (b) without the Fresnel zone plate on the collector. Exit apertures with 900 μm diameter are shown in the zoomed insets.

Equations (4)

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2( d n 2 + r n 2 )2 d 0 =nλ/2
2( d n 2 + r n 2 )2( a a 2 b 2 )=nλ/2
( d n + a 2 b 2 a ) 2 + ( r n b ) 2 =1
w n = r n r n1 with r n =b ( b 2 + t 2 2at a 2 b 2 )

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