A matrix approach is formulated to describe third-harmonic (TH) generation in stacked materials in the small signal limit, in both transmission and reflection geometries. The model takes into account the contribution from the substrate to the total generated TH, interference of fundamental and nonlinear fields inside the stack, the nonlinear signal generation in forward and backward direction, the beam profile of the focused incident beam in the substrate, and the finite spectrum associated with short laser pulses. The model is applied to design stacks of thin films for efficient TH generation.
© 2014 Optical Society of America
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