Abstract

A self-contained electro-optical module for scanning extreme ultraviolet (EUV) reflection microscopy at 13.5 nm wavelength has been developed. The system has been designed to work with stand-alone commercially available EUV high harmonic generation (HHG) sources through the implementation of narrowband harmonic selecting multilayers and off-axis elliptical short focal length zoneplates. The module has been successfully integrated into an EUV mask scanning microscope achieving diffraction limited imaging performance (84 nm point spread function).

© 2014 Optical Society of America

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References

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2014 (2)

S. Lee, M. Guizar-Sicairos, and Y. Ekinci, “A novel concept for actinic EUV mask review tool using a scanning lensless imaging method at the Swiss Light Source,” Proc. SPIE 9048, 904811 (2014).
[Crossref]

K. Goldberg, M. Benk, A. Wojdyla, I. Mochi, S. Rekawa, A. Allezy, M. Dickinson, C. Cork, W. Chao, D. Zehm, J. Macdougall, P. Naulleau, and A. Rudack, “Actinic mask imaging: Recent results and future directions from the SHARP EUV Microscope,” SPIE 9048, 90480Y (2014).

2012 (1)

2011 (2)

K. Midorikawa, “High-order harmonic generation and attosecond science,” Jpn. J. Appl. Phys. 50(9R), 090001 (2011).
[Crossref]

P. P. Naulleau, I. Mochi, and K. A. Goldberg, “Optical modeling of Fresnel zoneplate microscopes,” Appl. Opt. 50(20), 3678–3684 (2011).
[Crossref] [PubMed]

2010 (1)

2009 (1)

T. Harada, J. Kishimoto, T. Watanabe, H. Kinoshita, and D. G. Lee, “Mask observation results using a coherent extreme ultraviolet scattering microscope at NewSUBARU,” J. Vac. Sci. Technol. B 27(6), 3203 (2009).
[Crossref]

2007 (1)

K. Goldberg, P. Naulleau, A. Barty, S. Rekawa, D. Kemp, R. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, and H.-S. Han, “Performance of actinic EUVL mask imaging using a zoneplate microscope,” Proc. SPIE 6730, 67305E (2007).
[Crossref]

2006 (1)

E. H. Anderson, “Specialized electron beam nano-lithography for EUV and x-ray diffractive optics,” IEEE J. Quantum Electron. 42(1), 27–35 (2006).
[Crossref]

2005 (3)

Y. Liu, A. Barty, E. Gullikson, J. S. Taylor, J. A. Liddle, and O. Wood, “A dual-mode actinic EUV mask inspection tool,” Proc. SPIE 5751, 660–669 (2005).
[Crossref]

K. Hamamoto, Y. Tanaka, S. Y. Lee, N. Hosokawa, N. Sakaya, M. Hosoya, T. Shoki, T. Watanabe, and H. Kinoshita, “Mask defect inspection using EUV microscope,” J. Vac. Sci. Technol. B 23(6), 2852 (2005).
[Crossref]

V. Tosa, H. T. Kim, I. J. Kim, and C. H. Nam, “High-order harmonic generation by chirped and self-guided femtosecond laser pulses. I. Spatial and spectral analysis,” Phys. Rev. A 71(6), 063807 (2005).
[Crossref]

2004 (2)

X. Zhang, A. R. Libertun, A. Paul, E. Gagnon, S. Backus, I. P. Christov, M. M. Murnane, H. C. Kapteyn, R. A. Bartels, Y. Liu, and D. T. Attwood, “Highly coherent light at 13 nm generated by use of quasi-phase-matched high-harmonic generation,” Opt. Lett. 29(12), 1357–1359 (2004).
[Crossref] [PubMed]

T. Tyliszczak, T. Warwick, A. L. D. Kilcoyne, S. Fakra, D. K. Shuh, T. H. Yoon, J. G. E. Brown, S. Andrews, V. Chembrolu, J. Strachan, and Y. Acremann, “Soft x-ray scanning transmission microscope working in an extended energy range at the advanced light source,” AIP Conf. Proc. 705, 1356–1359 (2004).
[Crossref]

2003 (1)

P. Naulleau, “The role of temporal coherence in imaging with extreme ultraviolet lithography optics,” Opt. Commun. 219(1-6), 57–63 (2003).
[Crossref]

2000 (1)

T. Haga, H. Takenaka, and M. Fukuda, “At-wavelength extreme ultraviolet lithography mask inspection using a Mirau interferometric microscope,” J. Vac. Sci. Technol. B 18(6), 2916 (2000).
[Crossref]

1998 (1)

S. Jeong, M. Idir, Y. Lin, L. Johnson, S. Rekawa, M. Jones, P. Denham, P. Batson, R. Levesque, P. Kearney, P. Yan, E. Gullikson, J. Underwood, and J. Bokor, “At-wavelength detection of extreme ultraviolet lithography mask blank defects,” J. Vac. Sci. Technol. B 16(6), 3430 (1998).
[Crossref]

1991 (1)

C. Jacobsen, S. Williams, E. Anderson, M.T. Browne, C. J. Buckleyc, D. Kern, J. Kira, M. Rivers, and X. Zhang, “Diffraction-limited imaging in a scanning transmission x-ray microscope,” Opt. Comm.  86, 351 (1991).

1977 (1)

C. J. R. Sheppard and A. Choudhury, “Image formation in the scanning microscope,” Opt. Acta (Lond.) 24(10), 1051–1073 (1977).
[Crossref]

Acremann, Y.

T. Tyliszczak, T. Warwick, A. L. D. Kilcoyne, S. Fakra, D. K. Shuh, T. H. Yoon, J. G. E. Brown, S. Andrews, V. Chembrolu, J. Strachan, and Y. Acremann, “Soft x-ray scanning transmission microscope working in an extended energy range at the advanced light source,” AIP Conf. Proc. 705, 1356–1359 (2004).
[Crossref]

Alessi, D.

Allezy, A.

K. Goldberg, M. Benk, A. Wojdyla, I. Mochi, S. Rekawa, A. Allezy, M. Dickinson, C. Cork, W. Chao, D. Zehm, J. Macdougall, P. Naulleau, and A. Rudack, “Actinic mask imaging: Recent results and future directions from the SHARP EUV Microscope,” SPIE 9048, 90480Y (2014).

Anderson, E.

C. Jacobsen, S. Williams, E. Anderson, M.T. Browne, C. J. Buckleyc, D. Kern, J. Kira, M. Rivers, and X. Zhang, “Diffraction-limited imaging in a scanning transmission x-ray microscope,” Opt. Comm.  86, 351 (1991).

Anderson, E. H.

K. Goldberg, P. Naulleau, A. Barty, S. Rekawa, D. Kemp, R. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, and H.-S. Han, “Performance of actinic EUVL mask imaging using a zoneplate microscope,” Proc. SPIE 6730, 67305E (2007).
[Crossref]

E. H. Anderson, “Specialized electron beam nano-lithography for EUV and x-ray diffractive optics,” IEEE J. Quantum Electron. 42(1), 27–35 (2006).
[Crossref]

Andrews, S.

T. Tyliszczak, T. Warwick, A. L. D. Kilcoyne, S. Fakra, D. K. Shuh, T. H. Yoon, J. G. E. Brown, S. Andrews, V. Chembrolu, J. Strachan, and Y. Acremann, “Soft x-ray scanning transmission microscope working in an extended energy range at the advanced light source,” AIP Conf. Proc. 705, 1356–1359 (2004).
[Crossref]

Attwood, D. T.

Backus, S.

Bartels, R. A.

Barty, A.

K. Goldberg, P. Naulleau, A. Barty, S. Rekawa, D. Kemp, R. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, and H.-S. Han, “Performance of actinic EUVL mask imaging using a zoneplate microscope,” Proc. SPIE 6730, 67305E (2007).
[Crossref]

Y. Liu, A. Barty, E. Gullikson, J. S. Taylor, J. A. Liddle, and O. Wood, “A dual-mode actinic EUV mask inspection tool,” Proc. SPIE 5751, 660–669 (2005).
[Crossref]

Batson, P.

S. Jeong, M. Idir, Y. Lin, L. Johnson, S. Rekawa, M. Jones, P. Denham, P. Batson, R. Levesque, P. Kearney, P. Yan, E. Gullikson, J. Underwood, and J. Bokor, “At-wavelength detection of extreme ultraviolet lithography mask blank defects,” J. Vac. Sci. Technol. B 16(6), 3430 (1998).
[Crossref]

Benk, M.

K. Goldberg, M. Benk, A. Wojdyla, I. Mochi, S. Rekawa, A. Allezy, M. Dickinson, C. Cork, W. Chao, D. Zehm, J. Macdougall, P. Naulleau, and A. Rudack, “Actinic mask imaging: Recent results and future directions from the SHARP EUV Microscope,” SPIE 9048, 90480Y (2014).

Bokor, J.

S. Jeong, M. Idir, Y. Lin, L. Johnson, S. Rekawa, M. Jones, P. Denham, P. Batson, R. Levesque, P. Kearney, P. Yan, E. Gullikson, J. Underwood, and J. Bokor, “At-wavelength detection of extreme ultraviolet lithography mask blank defects,” J. Vac. Sci. Technol. B 16(6), 3430 (1998).
[Crossref]

Brizuela, F.

Brown, J. G. E.

T. Tyliszczak, T. Warwick, A. L. D. Kilcoyne, S. Fakra, D. K. Shuh, T. H. Yoon, J. G. E. Brown, S. Andrews, V. Chembrolu, J. Strachan, and Y. Acremann, “Soft x-ray scanning transmission microscope working in an extended energy range at the advanced light source,” AIP Conf. Proc. 705, 1356–1359 (2004).
[Crossref]

Browne, M.T.

C. Jacobsen, S. Williams, E. Anderson, M.T. Browne, C. J. Buckleyc, D. Kern, J. Kira, M. Rivers, and X. Zhang, “Diffraction-limited imaging in a scanning transmission x-ray microscope,” Opt. Comm.  86, 351 (1991).

Buckleyc, C. J.

C. Jacobsen, S. Williams, E. Anderson, M.T. Browne, C. J. Buckleyc, D. Kern, J. Kira, M. Rivers, and X. Zhang, “Diffraction-limited imaging in a scanning transmission x-ray microscope,” Opt. Comm.  86, 351 (1991).

Carbajo, S.

Chao, W.

K. Goldberg, M. Benk, A. Wojdyla, I. Mochi, S. Rekawa, A. Allezy, M. Dickinson, C. Cork, W. Chao, D. Zehm, J. Macdougall, P. Naulleau, and A. Rudack, “Actinic mask imaging: Recent results and future directions from the SHARP EUV Microscope,” SPIE 9048, 90480Y (2014).

Chembrolu, V.

T. Tyliszczak, T. Warwick, A. L. D. Kilcoyne, S. Fakra, D. K. Shuh, T. H. Yoon, J. G. E. Brown, S. Andrews, V. Chembrolu, J. Strachan, and Y. Acremann, “Soft x-ray scanning transmission microscope working in an extended energy range at the advanced light source,” AIP Conf. Proc. 705, 1356–1359 (2004).
[Crossref]

Choudhury, A.

C. J. R. Sheppard and A. Choudhury, “Image formation in the scanning microscope,” Opt. Acta (Lond.) 24(10), 1051–1073 (1977).
[Crossref]

Christov, I. P.

Cork, C.

K. Goldberg, M. Benk, A. Wojdyla, I. Mochi, S. Rekawa, A. Allezy, M. Dickinson, C. Cork, W. Chao, D. Zehm, J. Macdougall, P. Naulleau, and A. Rudack, “Actinic mask imaging: Recent results and future directions from the SHARP EUV Microscope,” SPIE 9048, 90480Y (2014).

Curtis, A. H.

Denham, P.

S. Jeong, M. Idir, Y. Lin, L. Johnson, S. Rekawa, M. Jones, P. Denham, P. Batson, R. Levesque, P. Kearney, P. Yan, E. Gullikson, J. Underwood, and J. Bokor, “At-wavelength detection of extreme ultraviolet lithography mask blank defects,” J. Vac. Sci. Technol. B 16(6), 3430 (1998).
[Crossref]

Dickinson, M.

K. Goldberg, M. Benk, A. Wojdyla, I. Mochi, S. Rekawa, A. Allezy, M. Dickinson, C. Cork, W. Chao, D. Zehm, J. Macdougall, P. Naulleau, and A. Rudack, “Actinic mask imaging: Recent results and future directions from the SHARP EUV Microscope,” SPIE 9048, 90480Y (2014).

Ekinci, Y.

S. Lee, M. Guizar-Sicairos, and Y. Ekinci, “A novel concept for actinic EUV mask review tool using a scanning lensless imaging method at the Swiss Light Source,” Proc. SPIE 9048, 904811 (2014).
[Crossref]

Fakra, S.

T. Tyliszczak, T. Warwick, A. L. D. Kilcoyne, S. Fakra, D. K. Shuh, T. H. Yoon, J. G. E. Brown, S. Andrews, V. Chembrolu, J. Strachan, and Y. Acremann, “Soft x-ray scanning transmission microscope working in an extended energy range at the advanced light source,” AIP Conf. Proc. 705, 1356–1359 (2004).
[Crossref]

Fukuda, M.

T. Haga, H. Takenaka, and M. Fukuda, “At-wavelength extreme ultraviolet lithography mask inspection using a Mirau interferometric microscope,” J. Vac. Sci. Technol. B 18(6), 2916 (2000).
[Crossref]

Furch, F. J.

Gagnon, E.

Goldberg, K.

K. Goldberg, M. Benk, A. Wojdyla, I. Mochi, S. Rekawa, A. Allezy, M. Dickinson, C. Cork, W. Chao, D. Zehm, J. Macdougall, P. Naulleau, and A. Rudack, “Actinic mask imaging: Recent results and future directions from the SHARP EUV Microscope,” SPIE 9048, 90480Y (2014).

K. Goldberg, P. Naulleau, A. Barty, S. Rekawa, D. Kemp, R. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, and H.-S. Han, “Performance of actinic EUVL mask imaging using a zoneplate microscope,” Proc. SPIE 6730, 67305E (2007).
[Crossref]

Goldberg, K. A.

Guizar-Sicairos, M.

S. Lee, M. Guizar-Sicairos, and Y. Ekinci, “A novel concept for actinic EUV mask review tool using a scanning lensless imaging method at the Swiss Light Source,” Proc. SPIE 9048, 904811 (2014).
[Crossref]

Gullikson, E.

Y. Liu, A. Barty, E. Gullikson, J. S. Taylor, J. A. Liddle, and O. Wood, “A dual-mode actinic EUV mask inspection tool,” Proc. SPIE 5751, 660–669 (2005).
[Crossref]

S. Jeong, M. Idir, Y. Lin, L. Johnson, S. Rekawa, M. Jones, P. Denham, P. Batson, R. Levesque, P. Kearney, P. Yan, E. Gullikson, J. Underwood, and J. Bokor, “At-wavelength detection of extreme ultraviolet lithography mask blank defects,” J. Vac. Sci. Technol. B 16(6), 3430 (1998).
[Crossref]

Gullikson, E. M.

K. Goldberg, P. Naulleau, A. Barty, S. Rekawa, D. Kemp, R. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, and H.-S. Han, “Performance of actinic EUVL mask imaging using a zoneplate microscope,” Proc. SPIE 6730, 67305E (2007).
[Crossref]

Gunion, R.

K. Goldberg, P. Naulleau, A. Barty, S. Rekawa, D. Kemp, R. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, and H.-S. Han, “Performance of actinic EUVL mask imaging using a zoneplate microscope,” Proc. SPIE 6730, 67305E (2007).
[Crossref]

Haga, T.

T. Haga, H. Takenaka, and M. Fukuda, “At-wavelength extreme ultraviolet lithography mask inspection using a Mirau interferometric microscope,” J. Vac. Sci. Technol. B 18(6), 2916 (2000).
[Crossref]

Hamamoto, K.

K. Hamamoto, Y. Tanaka, S. Y. Lee, N. Hosokawa, N. Sakaya, M. Hosoya, T. Shoki, T. Watanabe, and H. Kinoshita, “Mask defect inspection using EUV microscope,” J. Vac. Sci. Technol. B 23(6), 2852 (2005).
[Crossref]

Han, H.-S.

K. Goldberg, P. Naulleau, A. Barty, S. Rekawa, D. Kemp, R. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, and H.-S. Han, “Performance of actinic EUVL mask imaging using a zoneplate microscope,” Proc. SPIE 6730, 67305E (2007).
[Crossref]

Harada, T.

T. Harada, J. Kishimoto, T. Watanabe, H. Kinoshita, and D. G. Lee, “Mask observation results using a coherent extreme ultraviolet scattering microscope at NewSUBARU,” J. Vac. Sci. Technol. B 27(6), 3203 (2009).
[Crossref]

Hosokawa, N.

K. Hamamoto, Y. Tanaka, S. Y. Lee, N. Hosokawa, N. Sakaya, M. Hosoya, T. Shoki, T. Watanabe, and H. Kinoshita, “Mask defect inspection using EUV microscope,” J. Vac. Sci. Technol. B 23(6), 2852 (2005).
[Crossref]

Hosoya, M.

K. Hamamoto, Y. Tanaka, S. Y. Lee, N. Hosokawa, N. Sakaya, M. Hosoya, T. Shoki, T. Watanabe, and H. Kinoshita, “Mask defect inspection using EUV microscope,” J. Vac. Sci. Technol. B 23(6), 2852 (2005).
[Crossref]

Idir, M.

S. Jeong, M. Idir, Y. Lin, L. Johnson, S. Rekawa, M. Jones, P. Denham, P. Batson, R. Levesque, P. Kearney, P. Yan, E. Gullikson, J. Underwood, and J. Bokor, “At-wavelength detection of extreme ultraviolet lithography mask blank defects,” J. Vac. Sci. Technol. B 16(6), 3430 (1998).
[Crossref]

Jacobsen, C.

C. Jacobsen, S. Williams, E. Anderson, M.T. Browne, C. J. Buckleyc, D. Kern, J. Kira, M. Rivers, and X. Zhang, “Diffraction-limited imaging in a scanning transmission x-ray microscope,” Opt. Comm.  86, 351 (1991).

Jeong, S.

S. Jeong, M. Idir, Y. Lin, L. Johnson, S. Rekawa, M. Jones, P. Denham, P. Batson, R. Levesque, P. Kearney, P. Yan, E. Gullikson, J. Underwood, and J. Bokor, “At-wavelength detection of extreme ultraviolet lithography mask blank defects,” J. Vac. Sci. Technol. B 16(6), 3430 (1998).
[Crossref]

Johnson, L.

S. Jeong, M. Idir, Y. Lin, L. Johnson, S. Rekawa, M. Jones, P. Denham, P. Batson, R. Levesque, P. Kearney, P. Yan, E. Gullikson, J. Underwood, and J. Bokor, “At-wavelength detection of extreme ultraviolet lithography mask blank defects,” J. Vac. Sci. Technol. B 16(6), 3430 (1998).
[Crossref]

Jones, M.

S. Jeong, M. Idir, Y. Lin, L. Johnson, S. Rekawa, M. Jones, P. Denham, P. Batson, R. Levesque, P. Kearney, P. Yan, E. Gullikson, J. Underwood, and J. Bokor, “At-wavelength detection of extreme ultraviolet lithography mask blank defects,” J. Vac. Sci. Technol. B 16(6), 3430 (1998).
[Crossref]

Kapteyn, H. C.

Kearney, P.

S. Jeong, M. Idir, Y. Lin, L. Johnson, S. Rekawa, M. Jones, P. Denham, P. Batson, R. Levesque, P. Kearney, P. Yan, E. Gullikson, J. Underwood, and J. Bokor, “At-wavelength detection of extreme ultraviolet lithography mask blank defects,” J. Vac. Sci. Technol. B 16(6), 3430 (1998).
[Crossref]

Kemp, D.

K. Goldberg, P. Naulleau, A. Barty, S. Rekawa, D. Kemp, R. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, and H.-S. Han, “Performance of actinic EUVL mask imaging using a zoneplate microscope,” Proc. SPIE 6730, 67305E (2007).
[Crossref]

Kern, D.

C. Jacobsen, S. Williams, E. Anderson, M.T. Browne, C. J. Buckleyc, D. Kern, J. Kira, M. Rivers, and X. Zhang, “Diffraction-limited imaging in a scanning transmission x-ray microscope,” Opt. Comm.  86, 351 (1991).

Kilcoyne, A. L. D.

T. Tyliszczak, T. Warwick, A. L. D. Kilcoyne, S. Fakra, D. K. Shuh, T. H. Yoon, J. G. E. Brown, S. Andrews, V. Chembrolu, J. Strachan, and Y. Acremann, “Soft x-ray scanning transmission microscope working in an extended energy range at the advanced light source,” AIP Conf. Proc. 705, 1356–1359 (2004).
[Crossref]

Kim, H. T.

V. Tosa, H. T. Kim, I. J. Kim, and C. H. Nam, “High-order harmonic generation by chirped and self-guided femtosecond laser pulses. I. Spatial and spectral analysis,” Phys. Rev. A 71(6), 063807 (2005).
[Crossref]

Kim, I. J.

V. Tosa, H. T. Kim, I. J. Kim, and C. H. Nam, “High-order harmonic generation by chirped and self-guided femtosecond laser pulses. I. Spatial and spectral analysis,” Phys. Rev. A 71(6), 063807 (2005).
[Crossref]

Kinoshita, H.

T. Harada, J. Kishimoto, T. Watanabe, H. Kinoshita, and D. G. Lee, “Mask observation results using a coherent extreme ultraviolet scattering microscope at NewSUBARU,” J. Vac. Sci. Technol. B 27(6), 3203 (2009).
[Crossref]

K. Hamamoto, Y. Tanaka, S. Y. Lee, N. Hosokawa, N. Sakaya, M. Hosoya, T. Shoki, T. Watanabe, and H. Kinoshita, “Mask defect inspection using EUV microscope,” J. Vac. Sci. Technol. B 23(6), 2852 (2005).
[Crossref]

Kira, J.

C. Jacobsen, S. Williams, E. Anderson, M.T. Browne, C. J. Buckleyc, D. Kern, J. Kira, M. Rivers, and X. Zhang, “Diffraction-limited imaging in a scanning transmission x-ray microscope,” Opt. Comm.  86, 351 (1991).

Kishimoto, J.

T. Harada, J. Kishimoto, T. Watanabe, H. Kinoshita, and D. G. Lee, “Mask observation results using a coherent extreme ultraviolet scattering microscope at NewSUBARU,” J. Vac. Sci. Technol. B 27(6), 3203 (2009).
[Crossref]

La Fontaine, B.

Lee, D. G.

T. Harada, J. Kishimoto, T. Watanabe, H. Kinoshita, and D. G. Lee, “Mask observation results using a coherent extreme ultraviolet scattering microscope at NewSUBARU,” J. Vac. Sci. Technol. B 27(6), 3203 (2009).
[Crossref]

Lee, S.

S. Lee, M. Guizar-Sicairos, and Y. Ekinci, “A novel concept for actinic EUV mask review tool using a scanning lensless imaging method at the Swiss Light Source,” Proc. SPIE 9048, 904811 (2014).
[Crossref]

Lee, S. Y.

K. Hamamoto, Y. Tanaka, S. Y. Lee, N. Hosokawa, N. Sakaya, M. Hosoya, T. Shoki, T. Watanabe, and H. Kinoshita, “Mask defect inspection using EUV microscope,” J. Vac. Sci. Technol. B 23(6), 2852 (2005).
[Crossref]

Levesque, R.

S. Jeong, M. Idir, Y. Lin, L. Johnson, S. Rekawa, M. Jones, P. Denham, P. Batson, R. Levesque, P. Kearney, P. Yan, E. Gullikson, J. Underwood, and J. Bokor, “At-wavelength detection of extreme ultraviolet lithography mask blank defects,” J. Vac. Sci. Technol. B 16(6), 3430 (1998).
[Crossref]

Libertun, A. R.

Liddle, J. A.

Y. Liu, A. Barty, E. Gullikson, J. S. Taylor, J. A. Liddle, and O. Wood, “A dual-mode actinic EUV mask inspection tool,” Proc. SPIE 5751, 660–669 (2005).
[Crossref]

Lin, Y.

S. Jeong, M. Idir, Y. Lin, L. Johnson, S. Rekawa, M. Jones, P. Denham, P. Batson, R. Levesque, P. Kearney, P. Yan, E. Gullikson, J. Underwood, and J. Bokor, “At-wavelength detection of extreme ultraviolet lithography mask blank defects,” J. Vac. Sci. Technol. B 16(6), 3430 (1998).
[Crossref]

Liu, Y.

Luther, B.

Luther, B. M.

Macdougall, J.

K. Goldberg, M. Benk, A. Wojdyla, I. Mochi, S. Rekawa, A. Allezy, M. Dickinson, C. Cork, W. Chao, D. Zehm, J. Macdougall, P. Naulleau, and A. Rudack, “Actinic mask imaging: Recent results and future directions from the SHARP EUV Microscope,” SPIE 9048, 90480Y (2014).

Martz, D. H.

Menoni, C. S.

Midorikawa, K.

K. Midorikawa, “High-order harmonic generation and attosecond science,” Jpn. J. Appl. Phys. 50(9R), 090001 (2011).
[Crossref]

Mochi, I.

Murnane, M. M.

Nam, C. H.

V. Tosa, H. T. Kim, I. J. Kim, and C. H. Nam, “High-order harmonic generation by chirped and self-guided femtosecond laser pulses. I. Spatial and spectral analysis,” Phys. Rev. A 71(6), 063807 (2005).
[Crossref]

Naulleau, P.

K. Goldberg, M. Benk, A. Wojdyla, I. Mochi, S. Rekawa, A. Allezy, M. Dickinson, C. Cork, W. Chao, D. Zehm, J. Macdougall, P. Naulleau, and A. Rudack, “Actinic mask imaging: Recent results and future directions from the SHARP EUV Microscope,” SPIE 9048, 90480Y (2014).

K. Goldberg, P. Naulleau, A. Barty, S. Rekawa, D. Kemp, R. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, and H.-S. Han, “Performance of actinic EUVL mask imaging using a zoneplate microscope,” Proc. SPIE 6730, 67305E (2007).
[Crossref]

P. Naulleau, “The role of temporal coherence in imaging with extreme ultraviolet lithography optics,” Opt. Commun. 219(1-6), 57–63 (2003).
[Crossref]

Naulleau, P. P.

Patel, D.

Paul, A.

Reagan, B. A.

Rekawa, S.

K. Goldberg, M. Benk, A. Wojdyla, I. Mochi, S. Rekawa, A. Allezy, M. Dickinson, C. Cork, W. Chao, D. Zehm, J. Macdougall, P. Naulleau, and A. Rudack, “Actinic mask imaging: Recent results and future directions from the SHARP EUV Microscope,” SPIE 9048, 90480Y (2014).

K. Goldberg, P. Naulleau, A. Barty, S. Rekawa, D. Kemp, R. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, and H.-S. Han, “Performance of actinic EUVL mask imaging using a zoneplate microscope,” Proc. SPIE 6730, 67305E (2007).
[Crossref]

S. Jeong, M. Idir, Y. Lin, L. Johnson, S. Rekawa, M. Jones, P. Denham, P. Batson, R. Levesque, P. Kearney, P. Yan, E. Gullikson, J. Underwood, and J. Bokor, “At-wavelength detection of extreme ultraviolet lithography mask blank defects,” J. Vac. Sci. Technol. B 16(6), 3430 (1998).
[Crossref]

Rivers, M.

C. Jacobsen, S. Williams, E. Anderson, M.T. Browne, C. J. Buckleyc, D. Kern, J. Kira, M. Rivers, and X. Zhang, “Diffraction-limited imaging in a scanning transmission x-ray microscope,” Opt. Comm.  86, 351 (1991).

Rocca, J. J.

Rudack, A.

K. Goldberg, M. Benk, A. Wojdyla, I. Mochi, S. Rekawa, A. Allezy, M. Dickinson, C. Cork, W. Chao, D. Zehm, J. Macdougall, P. Naulleau, and A. Rudack, “Actinic mask imaging: Recent results and future directions from the SHARP EUV Microscope,” SPIE 9048, 90480Y (2014).

Sakaya, N.

K. Hamamoto, Y. Tanaka, S. Y. Lee, N. Hosokawa, N. Sakaya, M. Hosoya, T. Shoki, T. Watanabe, and H. Kinoshita, “Mask defect inspection using EUV microscope,” J. Vac. Sci. Technol. B 23(6), 2852 (2005).
[Crossref]

Sakdinawat, A.

Salmassi, F.

K. Goldberg, P. Naulleau, A. Barty, S. Rekawa, D. Kemp, R. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, and H.-S. Han, “Performance of actinic EUVL mask imaging using a zoneplate microscope,” Proc. SPIE 6730, 67305E (2007).
[Crossref]

Sheppard, C. J. R.

C. J. R. Sheppard and A. Choudhury, “Image formation in the scanning microscope,” Opt. Acta (Lond.) 24(10), 1051–1073 (1977).
[Crossref]

Shoki, T.

K. Hamamoto, Y. Tanaka, S. Y. Lee, N. Hosokawa, N. Sakaya, M. Hosoya, T. Shoki, T. Watanabe, and H. Kinoshita, “Mask defect inspection using EUV microscope,” J. Vac. Sci. Technol. B 23(6), 2852 (2005).
[Crossref]

Shuh, D. K.

T. Tyliszczak, T. Warwick, A. L. D. Kilcoyne, S. Fakra, D. K. Shuh, T. H. Yoon, J. G. E. Brown, S. Andrews, V. Chembrolu, J. Strachan, and Y. Acremann, “Soft x-ray scanning transmission microscope working in an extended energy range at the advanced light source,” AIP Conf. Proc. 705, 1356–1359 (2004).
[Crossref]

Strachan, J.

T. Tyliszczak, T. Warwick, A. L. D. Kilcoyne, S. Fakra, D. K. Shuh, T. H. Yoon, J. G. E. Brown, S. Andrews, V. Chembrolu, J. Strachan, and Y. Acremann, “Soft x-ray scanning transmission microscope working in an extended energy range at the advanced light source,” AIP Conf. Proc. 705, 1356–1359 (2004).
[Crossref]

Takenaka, H.

T. Haga, H. Takenaka, and M. Fukuda, “At-wavelength extreme ultraviolet lithography mask inspection using a Mirau interferometric microscope,” J. Vac. Sci. Technol. B 18(6), 2916 (2000).
[Crossref]

Tanaka, Y.

K. Hamamoto, Y. Tanaka, S. Y. Lee, N. Hosokawa, N. Sakaya, M. Hosoya, T. Shoki, T. Watanabe, and H. Kinoshita, “Mask defect inspection using EUV microscope,” J. Vac. Sci. Technol. B 23(6), 2852 (2005).
[Crossref]

Taylor, J. S.

Y. Liu, A. Barty, E. Gullikson, J. S. Taylor, J. A. Liddle, and O. Wood, “A dual-mode actinic EUV mask inspection tool,” Proc. SPIE 5751, 660–669 (2005).
[Crossref]

Tosa, V.

V. Tosa, H. T. Kim, I. J. Kim, and C. H. Nam, “High-order harmonic generation by chirped and self-guided femtosecond laser pulses. I. Spatial and spectral analysis,” Phys. Rev. A 71(6), 063807 (2005).
[Crossref]

Tyliszczak, T.

T. Tyliszczak, T. Warwick, A. L. D. Kilcoyne, S. Fakra, D. K. Shuh, T. H. Yoon, J. G. E. Brown, S. Andrews, V. Chembrolu, J. Strachan, and Y. Acremann, “Soft x-ray scanning transmission microscope working in an extended energy range at the advanced light source,” AIP Conf. Proc. 705, 1356–1359 (2004).
[Crossref]

Underwood, J.

S. Jeong, M. Idir, Y. Lin, L. Johnson, S. Rekawa, M. Jones, P. Denham, P. Batson, R. Levesque, P. Kearney, P. Yan, E. Gullikson, J. Underwood, and J. Bokor, “At-wavelength detection of extreme ultraviolet lithography mask blank defects,” J. Vac. Sci. Technol. B 16(6), 3430 (1998).
[Crossref]

Wang, Y.

Warwick, T.

T. Tyliszczak, T. Warwick, A. L. D. Kilcoyne, S. Fakra, D. K. Shuh, T. H. Yoon, J. G. E. Brown, S. Andrews, V. Chembrolu, J. Strachan, and Y. Acremann, “Soft x-ray scanning transmission microscope working in an extended energy range at the advanced light source,” AIP Conf. Proc. 705, 1356–1359 (2004).
[Crossref]

Watanabe, T.

T. Harada, J. Kishimoto, T. Watanabe, H. Kinoshita, and D. G. Lee, “Mask observation results using a coherent extreme ultraviolet scattering microscope at NewSUBARU,” J. Vac. Sci. Technol. B 27(6), 3203 (2009).
[Crossref]

K. Hamamoto, Y. Tanaka, S. Y. Lee, N. Hosokawa, N. Sakaya, M. Hosoya, T. Shoki, T. Watanabe, and H. Kinoshita, “Mask defect inspection using EUV microscope,” J. Vac. Sci. Technol. B 23(6), 2852 (2005).
[Crossref]

Wernsing, K. A.

Williams, S.

C. Jacobsen, S. Williams, E. Anderson, M.T. Browne, C. J. Buckleyc, D. Kern, J. Kira, M. Rivers, and X. Zhang, “Diffraction-limited imaging in a scanning transmission x-ray microscope,” Opt. Comm.  86, 351 (1991).

Wojdyla, A.

K. Goldberg, M. Benk, A. Wojdyla, I. Mochi, S. Rekawa, A. Allezy, M. Dickinson, C. Cork, W. Chao, D. Zehm, J. Macdougall, P. Naulleau, and A. Rudack, “Actinic mask imaging: Recent results and future directions from the SHARP EUV Microscope,” SPIE 9048, 90480Y (2014).

Wood, O.

Y. Liu, A. Barty, E. Gullikson, J. S. Taylor, J. A. Liddle, and O. Wood, “A dual-mode actinic EUV mask inspection tool,” Proc. SPIE 5751, 660–669 (2005).
[Crossref]

Yan, P.

S. Jeong, M. Idir, Y. Lin, L. Johnson, S. Rekawa, M. Jones, P. Denham, P. Batson, R. Levesque, P. Kearney, P. Yan, E. Gullikson, J. Underwood, and J. Bokor, “At-wavelength detection of extreme ultraviolet lithography mask blank defects,” J. Vac. Sci. Technol. B 16(6), 3430 (1998).
[Crossref]

Yoon, T. H.

T. Tyliszczak, T. Warwick, A. L. D. Kilcoyne, S. Fakra, D. K. Shuh, T. H. Yoon, J. G. E. Brown, S. Andrews, V. Chembrolu, J. Strachan, and Y. Acremann, “Soft x-ray scanning transmission microscope working in an extended energy range at the advanced light source,” AIP Conf. Proc. 705, 1356–1359 (2004).
[Crossref]

Zehm, D.

K. Goldberg, M. Benk, A. Wojdyla, I. Mochi, S. Rekawa, A. Allezy, M. Dickinson, C. Cork, W. Chao, D. Zehm, J. Macdougall, P. Naulleau, and A. Rudack, “Actinic mask imaging: Recent results and future directions from the SHARP EUV Microscope,” SPIE 9048, 90480Y (2014).

Zhang, X.

X. Zhang, A. R. Libertun, A. Paul, E. Gagnon, S. Backus, I. P. Christov, M. M. Murnane, H. C. Kapteyn, R. A. Bartels, Y. Liu, and D. T. Attwood, “Highly coherent light at 13 nm generated by use of quasi-phase-matched high-harmonic generation,” Opt. Lett. 29(12), 1357–1359 (2004).
[Crossref] [PubMed]

C. Jacobsen, S. Williams, E. Anderson, M.T. Browne, C. J. Buckleyc, D. Kern, J. Kira, M. Rivers, and X. Zhang, “Diffraction-limited imaging in a scanning transmission x-ray microscope,” Opt. Comm.  86, 351 (1991).

AIP Conf. Proc. (1)

T. Tyliszczak, T. Warwick, A. L. D. Kilcoyne, S. Fakra, D. K. Shuh, T. H. Yoon, J. G. E. Brown, S. Andrews, V. Chembrolu, J. Strachan, and Y. Acremann, “Soft x-ray scanning transmission microscope working in an extended energy range at the advanced light source,” AIP Conf. Proc. 705, 1356–1359 (2004).
[Crossref]

Appl. Opt. (1)

IEEE J. Quantum Electron. (1)

E. H. Anderson, “Specialized electron beam nano-lithography for EUV and x-ray diffractive optics,” IEEE J. Quantum Electron. 42(1), 27–35 (2006).
[Crossref]

J. Vac. Sci. Technol. B (4)

S. Jeong, M. Idir, Y. Lin, L. Johnson, S. Rekawa, M. Jones, P. Denham, P. Batson, R. Levesque, P. Kearney, P. Yan, E. Gullikson, J. Underwood, and J. Bokor, “At-wavelength detection of extreme ultraviolet lithography mask blank defects,” J. Vac. Sci. Technol. B 16(6), 3430 (1998).
[Crossref]

T. Haga, H. Takenaka, and M. Fukuda, “At-wavelength extreme ultraviolet lithography mask inspection using a Mirau interferometric microscope,” J. Vac. Sci. Technol. B 18(6), 2916 (2000).
[Crossref]

K. Hamamoto, Y. Tanaka, S. Y. Lee, N. Hosokawa, N. Sakaya, M. Hosoya, T. Shoki, T. Watanabe, and H. Kinoshita, “Mask defect inspection using EUV microscope,” J. Vac. Sci. Technol. B 23(6), 2852 (2005).
[Crossref]

T. Harada, J. Kishimoto, T. Watanabe, H. Kinoshita, and D. G. Lee, “Mask observation results using a coherent extreme ultraviolet scattering microscope at NewSUBARU,” J. Vac. Sci. Technol. B 27(6), 3203 (2009).
[Crossref]

Jpn. J. Appl. Phys. (1)

K. Midorikawa, “High-order harmonic generation and attosecond science,” Jpn. J. Appl. Phys. 50(9R), 090001 (2011).
[Crossref]

Opt. Acta (Lond.) (1)

C. J. R. Sheppard and A. Choudhury, “Image formation in the scanning microscope,” Opt. Acta (Lond.) 24(10), 1051–1073 (1977).
[Crossref]

Opt. Comm (1)

C. Jacobsen, S. Williams, E. Anderson, M.T. Browne, C. J. Buckleyc, D. Kern, J. Kira, M. Rivers, and X. Zhang, “Diffraction-limited imaging in a scanning transmission x-ray microscope,” Opt. Comm.  86, 351 (1991).

Opt. Commun. (1)

P. Naulleau, “The role of temporal coherence in imaging with extreme ultraviolet lithography optics,” Opt. Commun. 219(1-6), 57–63 (2003).
[Crossref]

Opt. Express (1)

Opt. Lett. (2)

Phys. Rev. A (1)

V. Tosa, H. T. Kim, I. J. Kim, and C. H. Nam, “High-order harmonic generation by chirped and self-guided femtosecond laser pulses. I. Spatial and spectral analysis,” Phys. Rev. A 71(6), 063807 (2005).
[Crossref]

Proc. SPIE (3)

S. Lee, M. Guizar-Sicairos, and Y. Ekinci, “A novel concept for actinic EUV mask review tool using a scanning lensless imaging method at the Swiss Light Source,” Proc. SPIE 9048, 904811 (2014).
[Crossref]

K. Goldberg, P. Naulleau, A. Barty, S. Rekawa, D. Kemp, R. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, and H.-S. Han, “Performance of actinic EUVL mask imaging using a zoneplate microscope,” Proc. SPIE 6730, 67305E (2007).
[Crossref]

Y. Liu, A. Barty, E. Gullikson, J. S. Taylor, J. A. Liddle, and O. Wood, “A dual-mode actinic EUV mask inspection tool,” Proc. SPIE 5751, 660–669 (2005).
[Crossref]

SPIE (1)

K. Goldberg, M. Benk, A. Wojdyla, I. Mochi, S. Rekawa, A. Allezy, M. Dickinson, C. Cork, W. Chao, D. Zehm, J. Macdougall, P. Naulleau, and A. Rudack, “Actinic mask imaging: Recent results and future directions from the SHARP EUV Microscope,” SPIE 9048, 90480Y (2014).

Other (8)

X-Ray Microscopy, Proceedings International Symposium, Goettingen, Germany, Sept, 14–16, 1983, edited by G. Schmahl and D. Rudolph Springer, Berlin, 1984, Vol. 43.

E.H. Anderson and D. Kern “Nanofabrication of Zone Plates for X-Ray Microscopy” X-Ray Microscopy III Eds A. Michette, G. Morrison, and C Buckley Springer Verlag, (1992)
[Crossref]

B. Yoo, “EUVO: EUV Light Generation System,” 2013 International Symposium on Extreme Ultraviolet Lithography, Toyama, Japan, October 6–10, 2013, proceedings available from SEMATECH, Albany, NY.

W. Chao, T. Tyliszczak, J. Kim, P. Fischer, S. Rekawa, E. H. Anderson, “Latest development of ultra-high resolution soft x-ray zone plate microscopy” X-Ray Microscopy X (2010).

H. Levinson, Principles of Lithography2nd Edition, Chapter 2 (SPIE Press, 2005).

S. Kim, D. Lee, J. Park, E. Kim, C. Jeon, H. Cho, B. Jeon, C. Choi, C. Anderson, R. Myakawa, and P. Naulleau, “EUV mask imaging system based on the scanning reflective microscopy,” 2013 International Symposium on Extreme Ultraviolet Lithography, Toyama, Japan, October 6–10, 2013, proceedings available from SEMATECH, Albany, NY.

H. Levinson, Principles of Lithography 2nd Edition, Chapter 8 (SPIE Press, 2005).

http://henke.lbl.gov/optical_constants/multi2.html

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Figures (14)

Fig. 1
Fig. 1

Schematic of a scanning microscope as could be implemented for the inspection of EUV masks.

Fig. 2
Fig. 2

Comparison of HHG harmonics and conventional turning mirror bandwidth.

Fig. 3
Fig. 3

Peak reflectance as a function of bandwidth. The dotted line shows predicted results for an ideal system and the blue circles show measured results for the magnetron coated samples.

Fig. 4
Fig. 4

Reflectivity vs wavelength for the chosen harmonic selecting mirror with a peak reflectivity of 42% and resolving power of 46.

Fig. 5
Fig. 5

Computed chromatic defocus range in Rayleigh units as a function of focal length assuming λ/Δλ of 280 and NA of 0.0825 (0.33/4).

Fig. 6
Fig. 6

Schematic showing the geometry of the zoneplate region. The incidence angle is exaggerated from actual value of 6° to 12° in schematic for improved visualization.

Fig. 7
Fig. 7

Computation geometry for tilted zoneplate.

Fig. 8
Fig. 8

Scanning electron micrograph of zoneplate along with adjacent return hole. The extra circular patterns observed in the zoneplate are Moire artifacts.

Fig. 9
Fig. 9

Photograph of zoneplate/OSA assembly. The OSA chip (top) seemingly floating above the zoneplate chip is actually supported by 3 sapphire balls.

Fig. 10
Fig. 10

Photograph of zirconium filter and zero-order stop assembly.

Fig. 11
Fig. 11

Photograph of complete assembly.

Fig. 12
Fig. 12

Photograph of fully integrated EUV scanning microscope.

Fig. 13
Fig. 13

EUV mask images recorded using the optical system described here and integrated into an EUV scanning microscope at Samsung Semiconductor. a) 100-nm lines and spaces on the mask corresponding to 25-nm wafer dimensions when mask is in use. b) 120-nm contacts corresponding to 30-nm features on wafer.

Fig. 14
Fig. 14

Images of EUV-specific defect on mask demonstrating importance of EUV metrology. a) Scanning electron microscope image of mask, b) Scanning electron microscope image of EUV wafer print using the mask, and c) EUV scanning microscope image.

Tables (2)

Tables Icon

Table 1 Example Zoneplate Optical Parameters

Tables Icon

Table 2 Angular Alignment Tolerances

Metrics