Abstract

High spectral purity at longer wavelength side is demanded in many extreme ultraviolet (EUV) and soft X-ray (together also referred to as XUV) optical systems. It is usually obtained at the expense of a high loss of XUV efficiency. We proposed and developed a new method based on a periodic, tapered structure integrated with an EUV multilayer. The longer wavelength radiation is scattered/diffracted away by the tapered multilayer structure while the EUV light is reflected. The first proof-of-principle showed a broadband suppression from λ = 100-400 nm with an average factor of 14. Moreover, a high EUV reflectance of 64.7% was achieved, which corresponds to 94% of the efficiency of a regular EUV multilayer mirror.

© 2014 Optical Society of America

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2014

2013

I. V. Fomenkov, D. C. Brandt, N. R. Farrar, B. L. Fontaine, N. R. Böwering, D. J. Brown, A. I. Ershov, and D. W. Myers, “Laser produced plasma EUV light source for EUVL patterning at 20nm node and beyond,” Proc. SPIE 8679, 86792I (2013).
[CrossRef]

2012

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE 8332(83220F), 83220F (2012).
[CrossRef]

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS 11(2), 021115 (2012).
[CrossRef]

A. J. R. van den Boogaard, F. A. van Goor, E. Louis, and F. Bijkerk, “Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection,” Opt. Lett. 37(2), 160–162 (2012).
[CrossRef] [PubMed]

2011

V. Y. Banine, K. N. Koshelev, and G. H. P. M. Swinkels, “Physical processes in EUV sources for microlithography,” J. Phys. D Appl. Phys. 44(25), 253001 (2011).
[CrossRef]

E. Louis, A. E. Yakshin, T. Tsarfati, and F. Bijkerk, “Nanometer interface and materials control for multilayer EUV-optical applications,” Prog. Surf. Sci. 86(11-12), 255–294 (2011).
[CrossRef]

2008

M. M. J. W. van Herpen, R. W. E. van de Kruijs, D. J. W. Klunder, E. Louis, A. E. Yakshin, S. A. van der Westen, F. Bijkerk, and V. Banine, “Spectral-purity-enhancing layer for multilayer mirrors,” Opt. Lett. 33(6), 560–562 (2008).
[CrossRef] [PubMed]

J. Lilensten, T. Dudok de Wit, M. Kretzschmar, P.-O. Amblard, S. Moussaoui, J. Aboudarham, and F. Auchère, “Review on the solar spectral variability in the EUV for space weather purposes,” Ann. Geophys. 26(2), 269–279 (2008).
[CrossRef]

2006

Y. Teramoto, G. Niimi, D. Yamatani, Y. Joshima, K. Bessho, T. Shirai, T. Takemura, T. Yokota, H. Yabuta, K. C. Paul, K. Kabuki, K. Miyauchi, M. Ikeuchi, K. Hotta, M. Yoshioka, and H. Sato, “Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM,” Proc. SPIE 6151, 615147 (2006).
[CrossRef]

2004

H. Kierey, K. Heidemann, B. Kleemann, R. Winters, W. Egle, W. Singer, F. Melzer, R. Wevers, and M. Antoni, “EUV spectral purity filter: optical and mechanical design, gratings fabrication, and testing,” Proc. SPIE 5193, 70–78 (2004).
[CrossRef]

2003

F. Brandi, D. Neshev, and W. Ubachs, “High-order harmonic generation yielding tunable extreme-ultraviolet radiation of high spectral purity,” Phys. Rev. Lett. 91(16), 163901 (2003).
[CrossRef] [PubMed]

1993

I. A. Artyukov, A. I. Fedorenko, V. V. Kondratenko, S. A. Yulin, and A. V. Vinogradov, “Soft X-ray submicron imaging experiments with nanosecond exposure,” Opt. Commun. 102(5-6), 401–406 (1993).
[CrossRef]

1983

Abe, T.

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE 8332(83220F), 83220F (2012).
[CrossRef]

Aboudarham, J.

J. Lilensten, T. Dudok de Wit, M. Kretzschmar, P.-O. Amblard, S. Moussaoui, J. Aboudarham, and F. Auchère, “Review on the solar spectral variability in the EUV for space weather purposes,” Ann. Geophys. 26(2), 269–279 (2008).
[CrossRef]

Amblard, P.-O.

J. Lilensten, T. Dudok de Wit, M. Kretzschmar, P.-O. Amblard, S. Moussaoui, J. Aboudarham, and F. Auchère, “Review on the solar spectral variability in the EUV for space weather purposes,” Ann. Geophys. 26(2), 269–279 (2008).
[CrossRef]

Antoni, M.

H. Kierey, K. Heidemann, B. Kleemann, R. Winters, W. Egle, W. Singer, F. Melzer, R. Wevers, and M. Antoni, “EUV spectral purity filter: optical and mechanical design, gratings fabrication, and testing,” Proc. SPIE 5193, 70–78 (2004).
[CrossRef]

Artyukov, I. A.

I. A. Artyukov, A. I. Fedorenko, V. V. Kondratenko, S. A. Yulin, and A. V. Vinogradov, “Soft X-ray submicron imaging experiments with nanosecond exposure,” Opt. Commun. 102(5-6), 401–406 (1993).
[CrossRef]

Auchère, F.

J. Lilensten, T. Dudok de Wit, M. Kretzschmar, P.-O. Amblard, S. Moussaoui, J. Aboudarham, and F. Auchère, “Review on the solar spectral variability in the EUV for space weather purposes,” Ann. Geophys. 26(2), 269–279 (2008).
[CrossRef]

Banine, V.

Banine, V. E.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS 11(2), 021115 (2012).
[CrossRef]

Banine, V. Y.

V. Y. Banine, K. N. Koshelev, and G. H. P. M. Swinkels, “Physical processes in EUV sources for microlithography,” J. Phys. D Appl. Phys. 44(25), 253001 (2011).
[CrossRef]

Bessho, K.

Y. Teramoto, G. Niimi, D. Yamatani, Y. Joshima, K. Bessho, T. Shirai, T. Takemura, T. Yokota, H. Yabuta, K. C. Paul, K. Kabuki, K. Miyauchi, M. Ikeuchi, K. Hotta, M. Yoshioka, and H. Sato, “Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM,” Proc. SPIE 6151, 615147 (2006).
[CrossRef]

Bijkerk, F.

Boller, K.-J.

Bosgra, J.

Böwering, N. R.

I. V. Fomenkov, D. C. Brandt, N. R. Farrar, B. L. Fontaine, N. R. Böwering, D. J. Brown, A. I. Ershov, and D. W. Myers, “Laser produced plasma EUV light source for EUVL patterning at 20nm node and beyond,” Proc. SPIE 8679, 86792I (2013).
[CrossRef]

Brandi, F.

F. Brandi, D. Neshev, and W. Ubachs, “High-order harmonic generation yielding tunable extreme-ultraviolet radiation of high spectral purity,” Phys. Rev. Lett. 91(16), 163901 (2003).
[CrossRef] [PubMed]

Brandt, D. C.

I. V. Fomenkov, D. C. Brandt, N. R. Farrar, B. L. Fontaine, N. R. Böwering, D. J. Brown, A. I. Ershov, and D. W. Myers, “Laser produced plasma EUV light source for EUVL patterning at 20nm node and beyond,” Proc. SPIE 8679, 86792I (2013).
[CrossRef]

Brown, D. J.

I. V. Fomenkov, D. C. Brandt, N. R. Farrar, B. L. Fontaine, N. R. Böwering, D. J. Brown, A. I. Ershov, and D. W. Myers, “Laser produced plasma EUV light source for EUVL patterning at 20nm node and beyond,” Proc. SPIE 8679, 86792I (2013).
[CrossRef]

Chkhalo, N. I.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS 11(2), 021115 (2012).
[CrossRef]

Drozdov, M. N.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS 11(2), 021115 (2012).
[CrossRef]

Dudok de Wit, T.

J. Lilensten, T. Dudok de Wit, M. Kretzschmar, P.-O. Amblard, S. Moussaoui, J. Aboudarham, and F. Auchère, “Review on the solar spectral variability in the EUV for space weather purposes,” Ann. Geophys. 26(2), 269–279 (2008).
[CrossRef]

Egle, W.

H. Kierey, K. Heidemann, B. Kleemann, R. Winters, W. Egle, W. Singer, F. Melzer, R. Wevers, and M. Antoni, “EUV spectral purity filter: optical and mechanical design, gratings fabrication, and testing,” Proc. SPIE 5193, 70–78 (2004).
[CrossRef]

Ershov, A. I.

I. V. Fomenkov, D. C. Brandt, N. R. Farrar, B. L. Fontaine, N. R. Böwering, D. J. Brown, A. I. Ershov, and D. W. Myers, “Laser produced plasma EUV light source for EUVL patterning at 20nm node and beyond,” Proc. SPIE 8679, 86792I (2013).
[CrossRef]

Farrar, N. R.

I. V. Fomenkov, D. C. Brandt, N. R. Farrar, B. L. Fontaine, N. R. Böwering, D. J. Brown, A. I. Ershov, and D. W. Myers, “Laser produced plasma EUV light source for EUVL patterning at 20nm node and beyond,” Proc. SPIE 8679, 86792I (2013).
[CrossRef]

Fedorenko, A. I.

I. A. Artyukov, A. I. Fedorenko, V. V. Kondratenko, S. A. Yulin, and A. V. Vinogradov, “Soft X-ray submicron imaging experiments with nanosecond exposure,” Opt. Commun. 102(5-6), 401–406 (1993).
[CrossRef]

Fomenkov, I. V.

I. V. Fomenkov, D. C. Brandt, N. R. Farrar, B. L. Fontaine, N. R. Böwering, D. J. Brown, A. I. Ershov, and D. W. Myers, “Laser produced plasma EUV light source for EUVL patterning at 20nm node and beyond,” Proc. SPIE 8679, 86792I (2013).
[CrossRef]

Fontaine, B. L.

I. V. Fomenkov, D. C. Brandt, N. R. Farrar, B. L. Fontaine, N. R. Böwering, D. J. Brown, A. I. Ershov, and D. W. Myers, “Laser produced plasma EUV light source for EUVL patterning at 20nm node and beyond,” Proc. SPIE 8679, 86792I (2013).
[CrossRef]

Fujimoto, J.

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE 8332(83220F), 83220F (2012).
[CrossRef]

Gaylord, T. K.

Gullikson, E. M.

Heidemann, K.

H. Kierey, K. Heidemann, B. Kleemann, R. Winters, W. Egle, W. Singer, F. Melzer, R. Wevers, and M. Antoni, “EUV spectral purity filter: optical and mechanical design, gratings fabrication, and testing,” Proc. SPIE 5193, 70–78 (2004).
[CrossRef]

Hori, T.

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE 8332(83220F), 83220F (2012).
[CrossRef]

Hotta, K.

Y. Teramoto, G. Niimi, D. Yamatani, Y. Joshima, K. Bessho, T. Shirai, T. Takemura, T. Yokota, H. Yabuta, K. C. Paul, K. Kabuki, K. Miyauchi, M. Ikeuchi, K. Hotta, M. Yoshioka, and H. Sato, “Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM,” Proc. SPIE 6151, 615147 (2006).
[CrossRef]

Huang, Q.

Huber, S. P.

Ikeuchi, M.

Y. Teramoto, G. Niimi, D. Yamatani, Y. Joshima, K. Bessho, T. Shirai, T. Takemura, T. Yokota, H. Yabuta, K. C. Paul, K. Kabuki, K. Miyauchi, M. Ikeuchi, K. Hotta, M. Yoshioka, and H. Sato, “Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM,” Proc. SPIE 6151, 615147 (2006).
[CrossRef]

Joshima, Y.

Y. Teramoto, G. Niimi, D. Yamatani, Y. Joshima, K. Bessho, T. Shirai, T. Takemura, T. Yokota, H. Yabuta, K. C. Paul, K. Kabuki, K. Miyauchi, M. Ikeuchi, K. Hotta, M. Yoshioka, and H. Sato, “Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM,” Proc. SPIE 6151, 615147 (2006).
[CrossRef]

Kabuki, K.

Y. Teramoto, G. Niimi, D. Yamatani, Y. Joshima, K. Bessho, T. Shirai, T. Takemura, T. Yokota, H. Yabuta, K. C. Paul, K. Kabuki, K. Miyauchi, M. Ikeuchi, K. Hotta, M. Yoshioka, and H. Sato, “Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM,” Proc. SPIE 6151, 615147 (2006).
[CrossRef]

Kawasuji, Y.

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE 8332(83220F), 83220F (2012).
[CrossRef]

Kierey, H.

H. Kierey, K. Heidemann, B. Kleemann, R. Winters, W. Egle, W. Singer, F. Melzer, R. Wevers, and M. Antoni, “EUV spectral purity filter: optical and mechanical design, gratings fabrication, and testing,” Proc. SPIE 5193, 70–78 (2004).
[CrossRef]

Kleemann, B.

H. Kierey, K. Heidemann, B. Kleemann, R. Winters, W. Egle, W. Singer, F. Melzer, R. Wevers, and M. Antoni, “EUV spectral purity filter: optical and mechanical design, gratings fabrication, and testing,” Proc. SPIE 5193, 70–78 (2004).
[CrossRef]

Kluenkov, E. B.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS 11(2), 021115 (2012).
[CrossRef]

Klunder, D. J. W.

Kodama, T.

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE 8332(83220F), 83220F (2012).
[CrossRef]

Kondratenko, V. V.

I. A. Artyukov, A. I. Fedorenko, V. V. Kondratenko, S. A. Yulin, and A. V. Vinogradov, “Soft X-ray submicron imaging experiments with nanosecond exposure,” Opt. Commun. 102(5-6), 401–406 (1993).
[CrossRef]

Koshelev, K. N.

V. Y. Banine, K. N. Koshelev, and G. H. P. M. Swinkels, “Physical processes in EUV sources for microlithography,” J. Phys. D Appl. Phys. 44(25), 253001 (2011).
[CrossRef]

Kretzschmar, M.

J. Lilensten, T. Dudok de Wit, M. Kretzschmar, P.-O. Amblard, S. Moussaoui, J. Aboudarham, and F. Auchère, “Review on the solar spectral variability in the EUV for space weather purposes,” Ann. Geophys. 26(2), 269–279 (2008).
[CrossRef]

Lilensten, J.

J. Lilensten, T. Dudok de Wit, M. Kretzschmar, P.-O. Amblard, S. Moussaoui, J. Aboudarham, and F. Auchère, “Review on the solar spectral variability in the EUV for space weather purposes,” Ann. Geophys. 26(2), 269–279 (2008).
[CrossRef]

Lopatin, A. Y.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS 11(2), 021115 (2012).
[CrossRef]

Louis, E.

Luchin, V. I.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS 11(2), 021115 (2012).
[CrossRef]

Medvedev, V. V.

Melzer, F.

H. Kierey, K. Heidemann, B. Kleemann, R. Winters, W. Egle, W. Singer, F. Melzer, R. Wevers, and M. Antoni, “EUV spectral purity filter: optical and mechanical design, gratings fabrication, and testing,” Proc. SPIE 5193, 70–78 (2004).
[CrossRef]

Miyauchi, K.

Y. Teramoto, G. Niimi, D. Yamatani, Y. Joshima, K. Bessho, T. Shirai, T. Takemura, T. Yokota, H. Yabuta, K. C. Paul, K. Kabuki, K. Miyauchi, M. Ikeuchi, K. Hotta, M. Yoshioka, and H. Sato, “Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM,” Proc. SPIE 6151, 615147 (2006).
[CrossRef]

Mizoguchi, H.

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE 8332(83220F), 83220F (2012).
[CrossRef]

Moharam, M. G.

Moussaoui, S.

J. Lilensten, T. Dudok de Wit, M. Kretzschmar, P.-O. Amblard, S. Moussaoui, J. Aboudarham, and F. Auchère, “Review on the solar spectral variability in the EUV for space weather purposes,” Ann. Geophys. 26(2), 269–279 (2008).
[CrossRef]

Myers, D. W.

I. V. Fomenkov, D. C. Brandt, N. R. Farrar, B. L. Fontaine, N. R. Böwering, D. J. Brown, A. I. Ershov, and D. W. Myers, “Laser produced plasma EUV light source for EUVL patterning at 20nm node and beyond,” Proc. SPIE 8679, 86792I (2013).
[CrossRef]

Nakarai, H.

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE 8332(83220F), 83220F (2012).
[CrossRef]

Neshev, D.

F. Brandi, D. Neshev, and W. Ubachs, “High-order harmonic generation yielding tunable extreme-ultraviolet radiation of high spectral purity,” Phys. Rev. Lett. 91(16), 163901 (2003).
[CrossRef] [PubMed]

Niimi, G.

Y. Teramoto, G. Niimi, D. Yamatani, Y. Joshima, K. Bessho, T. Shirai, T. Takemura, T. Yokota, H. Yabuta, K. C. Paul, K. Kabuki, K. Miyauchi, M. Ikeuchi, K. Hotta, M. Yoshioka, and H. Sato, “Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM,” Proc. SPIE 6151, 615147 (2006).
[CrossRef]

Ohta, T.

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE 8332(83220F), 83220F (2012).
[CrossRef]

Paardekooper, D. M.

Padmore, H. A.

Paul, K. C.

Y. Teramoto, G. Niimi, D. Yamatani, Y. Joshima, K. Bessho, T. Shirai, T. Takemura, T. Yokota, H. Yabuta, K. C. Paul, K. Kabuki, K. Miyauchi, M. Ikeuchi, K. Hotta, M. Yoshioka, and H. Sato, “Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM,” Proc. SPIE 6151, 615147 (2006).
[CrossRef]

Salashchenko, N. N.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS 11(2), 021115 (2012).
[CrossRef]

Salmassi, F.

Sato, H.

Y. Teramoto, G. Niimi, D. Yamatani, Y. Joshima, K. Bessho, T. Shirai, T. Takemura, T. Yokota, H. Yabuta, K. C. Paul, K. Kabuki, K. Miyauchi, M. Ikeuchi, K. Hotta, M. Yoshioka, and H. Sato, “Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM,” Proc. SPIE 6151, 615147 (2006).
[CrossRef]

Shirai, T.

Y. Teramoto, G. Niimi, D. Yamatani, Y. Joshima, K. Bessho, T. Shirai, T. Takemura, T. Yokota, H. Yabuta, K. C. Paul, K. Kabuki, K. Miyauchi, M. Ikeuchi, K. Hotta, M. Yoshioka, and H. Sato, “Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM,” Proc. SPIE 6151, 615147 (2006).
[CrossRef]

Shiraishi, Y.

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE 8332(83220F), 83220F (2012).
[CrossRef]

Singer, W.

H. Kierey, K. Heidemann, B. Kleemann, R. Winters, W. Egle, W. Singer, F. Melzer, R. Wevers, and M. Antoni, “EUV spectral purity filter: optical and mechanical design, gratings fabrication, and testing,” Proc. SPIE 5193, 70–78 (2004).
[CrossRef]

Sjmaenok, L. A.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS 11(2), 021115 (2012).
[CrossRef]

Swinkels, G. H. P. M.

V. Y. Banine, K. N. Koshelev, and G. H. P. M. Swinkels, “Physical processes in EUV sources for microlithography,” J. Phys. D Appl. Phys. 44(25), 253001 (2011).
[CrossRef]

Takemura, T.

Y. Teramoto, G. Niimi, D. Yamatani, Y. Joshima, K. Bessho, T. Shirai, T. Takemura, T. Yokota, H. Yabuta, K. C. Paul, K. Kabuki, K. Miyauchi, M. Ikeuchi, K. Hotta, M. Yoshioka, and H. Sato, “Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM,” Proc. SPIE 6151, 615147 (2006).
[CrossRef]

Teramoto, Y.

Y. Teramoto, G. Niimi, D. Yamatani, Y. Joshima, K. Bessho, T. Shirai, T. Takemura, T. Yokota, H. Yabuta, K. C. Paul, K. Kabuki, K. Miyauchi, M. Ikeuchi, K. Hotta, M. Yoshioka, and H. Sato, “Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM,” Proc. SPIE 6151, 615147 (2006).
[CrossRef]

Tsarfati, T.

E. Louis, A. E. Yakshin, T. Tsarfati, and F. Bijkerk, “Nanometer interface and materials control for multilayer EUV-optical applications,” Prog. Surf. Sci. 86(11-12), 255–294 (2011).
[CrossRef]

Tsybin, N. N.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS 11(2), 021115 (2012).
[CrossRef]

Ubachs, W.

F. Brandi, D. Neshev, and W. Ubachs, “High-order harmonic generation yielding tunable extreme-ultraviolet radiation of high spectral purity,” Phys. Rev. Lett. 91(16), 163901 (2003).
[CrossRef] [PubMed]

van de Kruijs, R. W. E.

van den Boogaard, A. J. R.

van der Westen, S. A.

van Goor, F. A.

van Herpen, M. M. J. W.

Vinogradov, A. V.

I. A. Artyukov, A. I. Fedorenko, V. V. Kondratenko, S. A. Yulin, and A. V. Vinogradov, “Soft X-ray submicron imaging experiments with nanosecond exposure,” Opt. Commun. 102(5-6), 401–406 (1993).
[CrossRef]

Voronov, D. L.

Warwick, T.

Wevers, R.

H. Kierey, K. Heidemann, B. Kleemann, R. Winters, W. Egle, W. Singer, F. Melzer, R. Wevers, and M. Antoni, “EUV spectral purity filter: optical and mechanical design, gratings fabrication, and testing,” Proc. SPIE 5193, 70–78 (2004).
[CrossRef]

Winters, R.

H. Kierey, K. Heidemann, B. Kleemann, R. Winters, W. Egle, W. Singer, F. Melzer, R. Wevers, and M. Antoni, “EUV spectral purity filter: optical and mechanical design, gratings fabrication, and testing,” Proc. SPIE 5193, 70–78 (2004).
[CrossRef]

Yabuta, H.

Y. Teramoto, G. Niimi, D. Yamatani, Y. Joshima, K. Bessho, T. Shirai, T. Takemura, T. Yokota, H. Yabuta, K. C. Paul, K. Kabuki, K. Miyauchi, M. Ikeuchi, K. Hotta, M. Yoshioka, and H. Sato, “Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM,” Proc. SPIE 6151, 615147 (2006).
[CrossRef]

Yakshin, A. E.

Yakunin, A. M.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS 11(2), 021115 (2012).
[CrossRef]

Yamatani, D.

Y. Teramoto, G. Niimi, D. Yamatani, Y. Joshima, K. Bessho, T. Shirai, T. Takemura, T. Yokota, H. Yabuta, K. C. Paul, K. Kabuki, K. Miyauchi, M. Ikeuchi, K. Hotta, M. Yoshioka, and H. Sato, “Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM,” Proc. SPIE 6151, 615147 (2006).
[CrossRef]

Yamazaki, T.

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE 8332(83220F), 83220F (2012).
[CrossRef]

Yanagida, T.

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE 8332(83220F), 83220F (2012).
[CrossRef]

Yokota, T.

Y. Teramoto, G. Niimi, D. Yamatani, Y. Joshima, K. Bessho, T. Shirai, T. Takemura, T. Yokota, H. Yabuta, K. C. Paul, K. Kabuki, K. Miyauchi, M. Ikeuchi, K. Hotta, M. Yoshioka, and H. Sato, “Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM,” Proc. SPIE 6151, 615147 (2006).
[CrossRef]

Yoshioka, M.

Y. Teramoto, G. Niimi, D. Yamatani, Y. Joshima, K. Bessho, T. Shirai, T. Takemura, T. Yokota, H. Yabuta, K. C. Paul, K. Kabuki, K. Miyauchi, M. Ikeuchi, K. Hotta, M. Yoshioka, and H. Sato, “Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM,” Proc. SPIE 6151, 615147 (2006).
[CrossRef]

Yulin, S. A.

I. A. Artyukov, A. I. Fedorenko, V. V. Kondratenko, S. A. Yulin, and A. V. Vinogradov, “Soft X-ray submicron imaging experiments with nanosecond exposure,” Opt. Commun. 102(5-6), 401–406 (1993).
[CrossRef]

Zoethout, E.

Ann. Geophys.

J. Lilensten, T. Dudok de Wit, M. Kretzschmar, P.-O. Amblard, S. Moussaoui, J. Aboudarham, and F. Auchère, “Review on the solar spectral variability in the EUV for space weather purposes,” Ann. Geophys. 26(2), 269–279 (2008).
[CrossRef]

J. Micro/Nanolith. MEMS MOEMS

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS 11(2), 021115 (2012).
[CrossRef]

J. Opt. Soc. Am.

J. Phys. D Appl. Phys.

V. Y. Banine, K. N. Koshelev, and G. H. P. M. Swinkels, “Physical processes in EUV sources for microlithography,” J. Phys. D Appl. Phys. 44(25), 253001 (2011).
[CrossRef]

Opt. Commun.

I. A. Artyukov, A. I. Fedorenko, V. V. Kondratenko, S. A. Yulin, and A. V. Vinogradov, “Soft X-ray submicron imaging experiments with nanosecond exposure,” Opt. Commun. 102(5-6), 401–406 (1993).
[CrossRef]

Opt. Express

Opt. Lett.

Phys. Rev. Lett.

F. Brandi, D. Neshev, and W. Ubachs, “High-order harmonic generation yielding tunable extreme-ultraviolet radiation of high spectral purity,” Phys. Rev. Lett. 91(16), 163901 (2003).
[CrossRef] [PubMed]

Proc. SPIE

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE 8332(83220F), 83220F (2012).
[CrossRef]

I. V. Fomenkov, D. C. Brandt, N. R. Farrar, B. L. Fontaine, N. R. Böwering, D. J. Brown, A. I. Ershov, and D. W. Myers, “Laser produced plasma EUV light source for EUVL patterning at 20nm node and beyond,” Proc. SPIE 8679, 86792I (2013).
[CrossRef]

Y. Teramoto, G. Niimi, D. Yamatani, Y. Joshima, K. Bessho, T. Shirai, T. Takemura, T. Yokota, H. Yabuta, K. C. Paul, K. Kabuki, K. Miyauchi, M. Ikeuchi, K. Hotta, M. Yoshioka, and H. Sato, “Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM,” Proc. SPIE 6151, 615147 (2006).
[CrossRef]

H. Kierey, K. Heidemann, B. Kleemann, R. Winters, W. Egle, W. Singer, F. Melzer, R. Wevers, and M. Antoni, “EUV spectral purity filter: optical and mechanical design, gratings fabrication, and testing,” Proc. SPIE 5193, 70–78 (2004).
[CrossRef]

Prog. Surf. Sci.

E. Louis, A. E. Yakshin, T. Tsarfati, and F. Bijkerk, “Nanometer interface and materials control for multilayer EUV-optical applications,” Prog. Surf. Sci. 86(11-12), 255–294 (2011).
[CrossRef]

Other

Website of the Rosft, http://optics.synopsys.com/rsoft/rsoft-passive-device-diffractMOD.html

D. Attwood, Soft X-rays and Extreme Ultraviolet Radiation, Principles and Applications (Cambridge University, 1999), pp 304–306.

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Figures (9)

Fig. 1
Fig. 1

Schematic of the 2D ML pyramids (a) and 1D ML pyramids structure (b).

Fig. 2
Fig. 2

Calculated 0th order and total diffraction efficiency of 2D and 1D ML pyramids on top of a Mo/Si multilayer mirror (MLM).

Fig. 3
Fig. 3

Calculated UV diffraction efficiency of 2D ML pyramids on a MLM with different periods.

Fig. 4
Fig. 4

Calculated UV diffraction efficiency of 1D ML pyramids on MLM, with different incident angle and polarization, the out-of-plane angle is set as θ = 0° for all cases. The left axis corresponds to the 0th order reflectance, and the right axis is the total diffraction efficiency (DE).

Fig. 5
Fig. 5

Calculated EUV reflectance of 2D ML pyramids on MLM, with h = 105nm (containing 15 bilayers), p = a = 26µm, top width w = 0.34p, the incidence is φ = 5deg, θ = 0°.

Fig. 6
Fig. 6

AFM image of the fabricated 2D Mo/Si ML pyramids on MLM.

Fig. 7
Fig. 7

Measured UV reflectance of the fabricated Mo/Si MLM and ML pyramids on a MLM. The calculated reflectance curve of the ML pyramids is also shown.

Fig. 8
Fig. 8

Measured EUV reflectance of the fabricated Mo/Si MLM, ML pyramids on a MLM, and Si pyramids on a MLM. The curve of Si pyramids was shifted in wavelength position by 0.065nm for comparison.

Fig. 9
Fig. 9

A CCD image of the reflected EUV intensity of the ML pyramids sample. The intensity is shown in logarithmic scale.

Tables (1)

Tables Icon

Table 1 Structural Parameters of the 2D ML Pyramids

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