Abstract

Material removal rate has greatly relied on the distribution of shear stress and dynamic pressure on the workpiece surface in hydrodynamic effect polishing (HEP). Fluid dynamic simulation results demonstrate that the higher rotation speed and smaller clearance will cause the larger material removal rate. Molecular dynamic (MD) calculations show the bonding energy of Si-O in the silicon-oxide nanoparticle is stronger than that in the quartz glass, and therefore the atoms can be dragged away from the quartz glass surface by the adsorbed silicon-oxide nanoparticle. The deep subsurface damage cannot be efficiently removed by HEP due to its extremely low removal rate. However, the subsurface damaged layer can be quickly removed by ion beam figuring (IBF), and a thinner layer containing the passivated scratches and pits will be left on the surface. The passivated layer is so thin that can be easily removed by HEP process with a low material rate under the large wheel-workpiece clearance. Combined with the IBF process, the subsurface damage and surface scratches have been efficiently removed after the HEP process. Meanwhile there are not obvious duplicated marks on the processed surface and the surface roughness has been improved to 0.130nm rms, 0.103nm Ra.

© 2014 Optical Society of America

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2013

W. Q. Peng, S. Y. Li, C. L. Guan, X. M. Shen, Y. F. Dai, Z. Wang, “Improvement of magnetorheological finishing surface quality by nanoparticle jet polishing,” Opt. Eng. 52(4), 043401 (2013).
[CrossRef]

M. K. Kim, B. Y. Jang, J. S. Lee, J. S. Kim, S. Nahm, “Microstructures and electrochemical performances of nano-sized SiOx (1.18≤x≤1.83) as an anode material for a lithium(Li)-ion battery,” J. Power Sources 244, 115–121 (2013).
[CrossRef]

W. Q. Peng, C. L. Guan, S. Y. Li, “Ultrasmooth surface polishing based on the hydrodynamic effect,” Appl. Opt. 52(25), 6411–6416 (2013).
[CrossRef] [PubMed]

2012

J. L. Wang, “Supersmooth Polishing with Sub-angstron Roughness,” Proc. SPIE 8416, 841609 (2012).
[CrossRef]

2011

2010

T. Arnold, G. Bohm, R. Fechner, J. Meister, A. Nickel, F. Frost, T. Hansel, A. Schindler, “Ultra-precision surface finishing by ion beam and plasma jet techniques-status and outlook,” Nucl. Instrum. Methods Phys. Res. A 616(2-3), 147–156 (2010).
[CrossRef]

2009

F. H. Zhang, X. Z. Song, Y. Zhang, D. R. Luan, “Figuring of an ultra-smooth surface in nanoparticle colloid jet machining,” J. Micromech. Microeng. 19(5), 054009 (2009).
[CrossRef]

2008

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, K. Yamauchi, “Processing efficiency of elastic emission machining for low-thermal-expansion material,” Surf. Interface Anal. 40(6-7), 1002–1006 (2008).
[CrossRef]

2007

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, H. Mimura, K. Yamauchi, Y. Mori, “Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics,” J. Vac. Sci. Technol. B 25(6), 2110–2113 (2007).
[CrossRef]

2005

J. Shen, S. Liu, K. Yi, H. He, J. Shao, Z. Fan, “Subsurface damage in optical substrates,” Optik (Stuttg.) 116(6), 288–294 (2005).
[CrossRef]

2004

U. Dinger, G. Seitz, S. Schulte, F. Eisert, C. Muenster, S. Burkart, S. Stacklies, C. Bustaus, H. Hoefer, M. Mayer, B. Fellner, O. Hocky, M. Rupp, K. Riedelsheimer, P. Kuerz, “Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography,” Proc. SPIE 5193, 18–28 (2004).
[CrossRef]

Y. Su, Y. H. Zhou, W. Huang, Z. N. Gu, “Study on reaction kinetics between silica glasses and hydrofluoric acid,” J. Chinese Ceram. Soc. 32, 287–293 (2004), in Chinese.

2003

L. Dan, X. L. Wu, “Optical emission from SiOx(x=1.2–1.6) nanoparticles irradiated by ultraviolet ozone,” J. Appl. Phys. 94(11), 7288–7290 (2003).
[CrossRef]

2002

V. A. Bakaev, T. I. Bakaeva, C. G. Pantano, “A study of glass surface heterogeneity and silylation by inverse gas chromatography,” J. Phys. Chem. B 106(47), 12231–12238 (2002).
[CrossRef]

1999

K. Yamauchi, K. Hirose, H. Goto, K. Sugiyama, K. Inagaki, K. Yamamura, Y. Sano, Y. Mori, “First-principles simulations of removal process in EEM (elastic emission machining),” Comput. Mater. Sci. 14(1-4), 232–235 (1999).
[CrossRef]

1998

1995

M. Ando, M. Negishi, M. Takimoto, A. Deguchi, N. Nakamura, “Super-smooth polishing on aspherical surfaces,” Nanotechnology 6(4), 111–120 (1995).
[CrossRef]

1994

1990

L. M. Cook, “Chemical processes in glass polishing,” J. Non-Cryst. Solids 120(1-3), 152–171 (1990).
[CrossRef]

1987

Ando, M.

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, K. Yamauchi, “Processing efficiency of elastic emission machining for low-thermal-expansion material,” Surf. Interface Anal. 40(6-7), 1002–1006 (2008).
[CrossRef]

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, H. Mimura, K. Yamauchi, Y. Mori, “Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics,” J. Vac. Sci. Technol. B 25(6), 2110–2113 (2007).
[CrossRef]

M. Ando, M. Negishi, M. Takimoto, A. Deguchi, N. Nakamura, “Super-smooth polishing on aspherical surfaces,” Nanotechnology 6(4), 111–120 (1995).
[CrossRef]

Arnold, T.

T. Arnold, G. Bohm, R. Fechner, J. Meister, A. Nickel, F. Frost, T. Hansel, A. Schindler, “Ultra-precision surface finishing by ion beam and plasma jet techniques-status and outlook,” Nucl. Instrum. Methods Phys. Res. A 616(2-3), 147–156 (2010).
[CrossRef]

Bakaev, V. A.

V. A. Bakaev, T. I. Bakaeva, C. G. Pantano, “A study of glass surface heterogeneity and silylation by inverse gas chromatography,” J. Phys. Chem. B 106(47), 12231–12238 (2002).
[CrossRef]

Bakaeva, T. I.

V. A. Bakaev, T. I. Bakaeva, C. G. Pantano, “A study of glass surface heterogeneity and silylation by inverse gas chromatography,” J. Phys. Chem. B 106(47), 12231–12238 (2002).
[CrossRef]

Baselt, D. R.

Bennett, J. M.

Black, J. P.

Bohm, G.

T. Arnold, G. Bohm, R. Fechner, J. Meister, A. Nickel, F. Frost, T. Hansel, A. Schindler, “Ultra-precision surface finishing by ion beam and plasma jet techniques-status and outlook,” Nucl. Instrum. Methods Phys. Res. A 616(2-3), 147–156 (2010).
[CrossRef]

Burkart, S.

U. Dinger, G. Seitz, S. Schulte, F. Eisert, C. Muenster, S. Burkart, S. Stacklies, C. Bustaus, H. Hoefer, M. Mayer, B. Fellner, O. Hocky, M. Rupp, K. Riedelsheimer, P. Kuerz, “Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography,” Proc. SPIE 5193, 18–28 (2004).
[CrossRef]

Bustaus, C.

U. Dinger, G. Seitz, S. Schulte, F. Eisert, C. Muenster, S. Burkart, S. Stacklies, C. Bustaus, H. Hoefer, M. Mayer, B. Fellner, O. Hocky, M. Rupp, K. Riedelsheimer, P. Kuerz, “Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography,” Proc. SPIE 5193, 18–28 (2004).
[CrossRef]

Cook, L. M.

L. M. Cook, “Chemical processes in glass polishing,” J. Non-Cryst. Solids 120(1-3), 152–171 (1990).
[CrossRef]

Dai, Y.

Dai, Y. F.

W. Q. Peng, S. Y. Li, C. L. Guan, X. M. Shen, Y. F. Dai, Z. Wang, “Improvement of magnetorheological finishing surface quality by nanoparticle jet polishing,” Opt. Eng. 52(4), 043401 (2013).
[CrossRef]

Dan, L.

L. Dan, X. L. Wu, “Optical emission from SiOx(x=1.2–1.6) nanoparticles irradiated by ultraviolet ozone,” J. Appl. Phys. 94(11), 7288–7290 (2003).
[CrossRef]

Deguchi, A.

M. Ando, M. Negishi, M. Takimoto, A. Deguchi, N. Nakamura, “Super-smooth polishing on aspherical surfaces,” Nanotechnology 6(4), 111–120 (1995).
[CrossRef]

Dinger, U.

U. Dinger, G. Seitz, S. Schulte, F. Eisert, C. Muenster, S. Burkart, S. Stacklies, C. Bustaus, H. Hoefer, M. Mayer, B. Fellner, O. Hocky, M. Rupp, K. Riedelsheimer, P. Kuerz, “Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography,” Proc. SPIE 5193, 18–28 (2004).
[CrossRef]

Eisert, F.

U. Dinger, G. Seitz, S. Schulte, F. Eisert, C. Muenster, S. Burkart, S. Stacklies, C. Bustaus, H. Hoefer, M. Mayer, B. Fellner, O. Hocky, M. Rupp, K. Riedelsheimer, P. Kuerz, “Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography,” Proc. SPIE 5193, 18–28 (2004).
[CrossRef]

Endo, K.

Y. Mori, K. Yamauchi, K. Endo, “Elastic emission machining,” Precis. Eng. 9(3), 123–128 (1987).
[CrossRef]

Fan, Z.

J. Shen, S. Liu, K. Yi, H. He, J. Shao, Z. Fan, “Subsurface damage in optical substrates,” Optik (Stuttg.) 116(6), 288–294 (2005).
[CrossRef]

Fechner, R.

T. Arnold, G. Bohm, R. Fechner, J. Meister, A. Nickel, F. Frost, T. Hansel, A. Schindler, “Ultra-precision surface finishing by ion beam and plasma jet techniques-status and outlook,” Nucl. Instrum. Methods Phys. Res. A 616(2-3), 147–156 (2010).
[CrossRef]

Fellner, B.

U. Dinger, G. Seitz, S. Schulte, F. Eisert, C. Muenster, S. Burkart, S. Stacklies, C. Bustaus, H. Hoefer, M. Mayer, B. Fellner, O. Hocky, M. Rupp, K. Riedelsheimer, P. Kuerz, “Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography,” Proc. SPIE 5193, 18–28 (2004).
[CrossRef]

Frost, F.

T. Arnold, G. Bohm, R. Fechner, J. Meister, A. Nickel, F. Frost, T. Hansel, A. Schindler, “Ultra-precision surface finishing by ion beam and plasma jet techniques-status and outlook,” Nucl. Instrum. Methods Phys. Res. A 616(2-3), 147–156 (2010).
[CrossRef]

Fukuda, Y.

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, K. Yamauchi, “Processing efficiency of elastic emission machining for low-thermal-expansion material,” Surf. Interface Anal. 40(6-7), 1002–1006 (2008).
[CrossRef]

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, H. Mimura, K. Yamauchi, Y. Mori, “Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics,” J. Vac. Sci. Technol. B 25(6), 2110–2113 (2007).
[CrossRef]

Goto, H.

K. Yamauchi, K. Hirose, H. Goto, K. Sugiyama, K. Inagaki, K. Yamamura, Y. Sano, Y. Mori, “First-principles simulations of removal process in EEM (elastic emission machining),” Comput. Mater. Sci. 14(1-4), 232–235 (1999).
[CrossRef]

Gu, Z. N.

Y. Su, Y. H. Zhou, W. Huang, Z. N. Gu, “Study on reaction kinetics between silica glasses and hydrofluoric acid,” J. Chinese Ceram. Soc. 32, 287–293 (2004), in Chinese.

Guan, C. L.

W. Q. Peng, C. L. Guan, S. Y. Li, “Ultrasmooth surface polishing based on the hydrodynamic effect,” Appl. Opt. 52(25), 6411–6416 (2013).
[CrossRef] [PubMed]

W. Q. Peng, S. Y. Li, C. L. Guan, X. M. Shen, Y. F. Dai, Z. Wang, “Improvement of magnetorheological finishing surface quality by nanoparticle jet polishing,” Opt. Eng. 52(4), 043401 (2013).
[CrossRef]

Hansel, T.

T. Arnold, G. Bohm, R. Fechner, J. Meister, A. Nickel, F. Frost, T. Hansel, A. Schindler, “Ultra-precision surface finishing by ion beam and plasma jet techniques-status and outlook,” Nucl. Instrum. Methods Phys. Res. A 616(2-3), 147–156 (2010).
[CrossRef]

He, H.

J. Shen, S. Liu, K. Yi, H. He, J. Shao, Z. Fan, “Subsurface damage in optical substrates,” Optik (Stuttg.) 116(6), 288–294 (2005).
[CrossRef]

He, P. F.

Hirose, K.

K. Yamauchi, K. Hirose, H. Goto, K. Sugiyama, K. Inagaki, K. Yamamura, Y. Sano, Y. Mori, “First-principles simulations of removal process in EEM (elastic emission machining),” Comput. Mater. Sci. 14(1-4), 232–235 (1999).
[CrossRef]

Hocky, O.

U. Dinger, G. Seitz, S. Schulte, F. Eisert, C. Muenster, S. Burkart, S. Stacklies, C. Bustaus, H. Hoefer, M. Mayer, B. Fellner, O. Hocky, M. Rupp, K. Riedelsheimer, P. Kuerz, “Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography,” Proc. SPIE 5193, 18–28 (2004).
[CrossRef]

Hoefer, H.

U. Dinger, G. Seitz, S. Schulte, F. Eisert, C. Muenster, S. Burkart, S. Stacklies, C. Bustaus, H. Hoefer, M. Mayer, B. Fellner, O. Hocky, M. Rupp, K. Riedelsheimer, P. Kuerz, “Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography,” Proc. SPIE 5193, 18–28 (2004).
[CrossRef]

Huang, W.

Y. Su, Y. H. Zhou, W. Huang, Z. N. Gu, “Study on reaction kinetics between silica glasses and hydrofluoric acid,” J. Chinese Ceram. Soc. 32, 287–293 (2004), in Chinese.

Inagaki, K.

K. Yamauchi, K. Hirose, H. Goto, K. Sugiyama, K. Inagaki, K. Yamamura, Y. Sano, Y. Mori, “First-principles simulations of removal process in EEM (elastic emission machining),” Comput. Mater. Sci. 14(1-4), 232–235 (1999).
[CrossRef]

Jang, B. Y.

M. K. Kim, B. Y. Jang, J. S. Lee, J. S. Kim, S. Nahm, “Microstructures and electrochemical performances of nano-sized SiOx (1.18≤x≤1.83) as an anode material for a lithium(Li)-ion battery,” J. Power Sources 244, 115–121 (2013).
[CrossRef]

Ji, Y. Q.

Jungling, K. C.

Kanaoka, M.

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, K. Yamauchi, “Processing efficiency of elastic emission machining for low-thermal-expansion material,” Surf. Interface Anal. 40(6-7), 1002–1006 (2008).
[CrossRef]

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, H. Mimura, K. Yamauchi, Y. Mori, “Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics,” J. Vac. Sci. Technol. B 25(6), 2110–2113 (2007).
[CrossRef]

Kim, J. S.

M. K. Kim, B. Y. Jang, J. S. Lee, J. S. Kim, S. Nahm, “Microstructures and electrochemical performances of nano-sized SiOx (1.18≤x≤1.83) as an anode material for a lithium(Li)-ion battery,” J. Power Sources 244, 115–121 (2013).
[CrossRef]

Kim, M. K.

M. K. Kim, B. Y. Jang, J. S. Lee, J. S. Kim, S. Nahm, “Microstructures and electrochemical performances of nano-sized SiOx (1.18≤x≤1.83) as an anode material for a lithium(Li)-ion battery,” J. Power Sources 244, 115–121 (2013).
[CrossRef]

Kuerz, P.

U. Dinger, G. Seitz, S. Schulte, F. Eisert, C. Muenster, S. Burkart, S. Stacklies, C. Bustaus, H. Hoefer, M. Mayer, B. Fellner, O. Hocky, M. Rupp, K. Riedelsheimer, P. Kuerz, “Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography,” Proc. SPIE 5193, 18–28 (2004).
[CrossRef]

Kunieda, H.

Lee, J. S.

M. K. Kim, B. Y. Jang, J. S. Lee, J. S. Kim, S. Nahm, “Microstructures and electrochemical performances of nano-sized SiOx (1.18≤x≤1.83) as an anode material for a lithium(Li)-ion battery,” J. Power Sources 244, 115–121 (2013).
[CrossRef]

Li, S.

Li, S. Y.

W. Q. Peng, C. L. Guan, S. Y. Li, “Ultrasmooth surface polishing based on the hydrodynamic effect,” Appl. Opt. 52(25), 6411–6416 (2013).
[CrossRef] [PubMed]

W. Q. Peng, S. Y. Li, C. L. Guan, X. M. Shen, Y. F. Dai, Z. Wang, “Improvement of magnetorheological finishing surface quality by nanoparticle jet polishing,” Opt. Eng. 52(4), 043401 (2013).
[CrossRef]

Li, W. H.

Liu, C.

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, K. Yamauchi, “Processing efficiency of elastic emission machining for low-thermal-expansion material,” Surf. Interface Anal. 40(6-7), 1002–1006 (2008).
[CrossRef]

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, H. Mimura, K. Yamauchi, Y. Mori, “Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics,” J. Vac. Sci. Technol. B 25(6), 2110–2113 (2007).
[CrossRef]

Liu, H. S.

Liu, S.

J. Shen, S. Liu, K. Yi, H. He, J. Shao, Z. Fan, “Subsurface damage in optical substrates,” Optik (Stuttg.) 116(6), 288–294 (2005).
[CrossRef]

Lodha, G. S.

Luan, D. R.

F. H. Zhang, X. Z. Song, Y. Zhang, D. R. Luan, “Figuring of an ultra-smooth surface in nanoparticle colloid jet machining,” J. Micromech. Microeng. 19(5), 054009 (2009).
[CrossRef]

Ma, B.

Mayer, M.

U. Dinger, G. Seitz, S. Schulte, F. Eisert, C. Muenster, S. Burkart, S. Stacklies, C. Bustaus, H. Hoefer, M. Mayer, B. Fellner, O. Hocky, M. Rupp, K. Riedelsheimer, P. Kuerz, “Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography,” Proc. SPIE 5193, 18–28 (2004).
[CrossRef]

Meister, J.

T. Arnold, G. Bohm, R. Fechner, J. Meister, A. Nickel, F. Frost, T. Hansel, A. Schindler, “Ultra-precision surface finishing by ion beam and plasma jet techniques-status and outlook,” Nucl. Instrum. Methods Phys. Res. A 616(2-3), 147–156 (2010).
[CrossRef]

Mimura, H.

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, K. Yamauchi, “Processing efficiency of elastic emission machining for low-thermal-expansion material,” Surf. Interface Anal. 40(6-7), 1002–1006 (2008).
[CrossRef]

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, H. Mimura, K. Yamauchi, Y. Mori, “Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics,” J. Vac. Sci. Technol. B 25(6), 2110–2113 (2007).
[CrossRef]

Mori, Y.

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, K. Yamauchi, “Processing efficiency of elastic emission machining for low-thermal-expansion material,” Surf. Interface Anal. 40(6-7), 1002–1006 (2008).
[CrossRef]

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, H. Mimura, K. Yamauchi, Y. Mori, “Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics,” J. Vac. Sci. Technol. B 25(6), 2110–2113 (2007).
[CrossRef]

K. Yamauchi, K. Hirose, H. Goto, K. Sugiyama, K. Inagaki, K. Yamamura, Y. Sano, Y. Mori, “First-principles simulations of removal process in EEM (elastic emission machining),” Comput. Mater. Sci. 14(1-4), 232–235 (1999).
[CrossRef]

Y. Mori, K. Yamauchi, K. Endo, “Elastic emission machining,” Precis. Eng. 9(3), 123–128 (1987).
[CrossRef]

Muenster, C.

U. Dinger, G. Seitz, S. Schulte, F. Eisert, C. Muenster, S. Burkart, S. Stacklies, C. Bustaus, H. Hoefer, M. Mayer, B. Fellner, O. Hocky, M. Rupp, K. Riedelsheimer, P. Kuerz, “Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography,” Proc. SPIE 5193, 18–28 (2004).
[CrossRef]

Nahm, S.

M. K. Kim, B. Y. Jang, J. S. Lee, J. S. Kim, S. Nahm, “Microstructures and electrochemical performances of nano-sized SiOx (1.18≤x≤1.83) as an anode material for a lithium(Li)-ion battery,” J. Power Sources 244, 115–121 (2013).
[CrossRef]

Nakamura, N.

M. Ando, M. Negishi, M. Takimoto, A. Deguchi, N. Nakamura, “Super-smooth polishing on aspherical surfaces,” Nanotechnology 6(4), 111–120 (1995).
[CrossRef]

Namba, Y.

Negishi, M.

M. Ando, M. Negishi, M. Takimoto, A. Deguchi, N. Nakamura, “Super-smooth polishing on aspherical surfaces,” Nanotechnology 6(4), 111–120 (1995).
[CrossRef]

Nickel, A.

T. Arnold, G. Bohm, R. Fechner, J. Meister, A. Nickel, F. Frost, T. Hansel, A. Schindler, “Ultra-precision surface finishing by ion beam and plasma jet techniques-status and outlook,” Nucl. Instrum. Methods Phys. Res. A 616(2-3), 147–156 (2010).
[CrossRef]

Nomura, K.

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, K. Yamauchi, “Processing efficiency of elastic emission machining for low-thermal-expansion material,” Surf. Interface Anal. 40(6-7), 1002–1006 (2008).
[CrossRef]

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, H. Mimura, K. Yamauchi, Y. Mori, “Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics,” J. Vac. Sci. Technol. B 25(6), 2110–2113 (2007).
[CrossRef]

Pantano, C. G.

V. A. Bakaev, T. I. Bakaeva, C. G. Pantano, “A study of glass surface heterogeneity and silylation by inverse gas chromatography,” J. Phys. Chem. B 106(47), 12231–12238 (2002).
[CrossRef]

Peng, W. Q.

W. Q. Peng, S. Y. Li, C. L. Guan, X. M. Shen, Y. F. Dai, Z. Wang, “Improvement of magnetorheological finishing surface quality by nanoparticle jet polishing,” Opt. Eng. 52(4), 043401 (2013).
[CrossRef]

W. Q. Peng, C. L. Guan, S. Y. Li, “Ultrasmooth surface polishing based on the hydrodynamic effect,” Appl. Opt. 52(25), 6411–6416 (2013).
[CrossRef] [PubMed]

Riedelsheimer, K.

U. Dinger, G. Seitz, S. Schulte, F. Eisert, C. Muenster, S. Burkart, S. Stacklies, C. Bustaus, H. Hoefer, M. Mayer, B. Fellner, O. Hocky, M. Rupp, K. Riedelsheimer, P. Kuerz, “Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography,” Proc. SPIE 5193, 18–28 (2004).
[CrossRef]

Rupp, M.

U. Dinger, G. Seitz, S. Schulte, F. Eisert, C. Muenster, S. Burkart, S. Stacklies, C. Bustaus, H. Hoefer, M. Mayer, B. Fellner, O. Hocky, M. Rupp, K. Riedelsheimer, P. Kuerz, “Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography,” Proc. SPIE 5193, 18–28 (2004).
[CrossRef]

Sano, Y.

K. Yamauchi, K. Hirose, H. Goto, K. Sugiyama, K. Inagaki, K. Yamamura, Y. Sano, Y. Mori, “First-principles simulations of removal process in EEM (elastic emission machining),” Comput. Mater. Sci. 14(1-4), 232–235 (1999).
[CrossRef]

Schindler, A.

T. Arnold, G. Bohm, R. Fechner, J. Meister, A. Nickel, F. Frost, T. Hansel, A. Schindler, “Ultra-precision surface finishing by ion beam and plasma jet techniques-status and outlook,” Nucl. Instrum. Methods Phys. Res. A 616(2-3), 147–156 (2010).
[CrossRef]

Schulte, S.

U. Dinger, G. Seitz, S. Schulte, F. Eisert, C. Muenster, S. Burkart, S. Stacklies, C. Bustaus, H. Hoefer, M. Mayer, B. Fellner, O. Hocky, M. Rupp, K. Riedelsheimer, P. Kuerz, “Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography,” Proc. SPIE 5193, 18–28 (2004).
[CrossRef]

Seitz, G.

U. Dinger, G. Seitz, S. Schulte, F. Eisert, C. Muenster, S. Burkart, S. Stacklies, C. Bustaus, H. Hoefer, M. Mayer, B. Fellner, O. Hocky, M. Rupp, K. Riedelsheimer, P. Kuerz, “Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography,” Proc. SPIE 5193, 18–28 (2004).
[CrossRef]

Sha, F.

Shaffer, J. J.

Shao, J.

J. Shen, S. Liu, K. Yi, H. He, J. Shao, Z. Fan, “Subsurface damage in optical substrates,” Optik (Stuttg.) 116(6), 288–294 (2005).
[CrossRef]

Shen, J.

J. Shen, S. Liu, K. Yi, H. He, J. Shao, Z. Fan, “Subsurface damage in optical substrates,” Optik (Stuttg.) 116(6), 288–294 (2005).
[CrossRef]

Shen, X. M.

W. Q. Peng, S. Y. Li, C. L. Guan, X. M. Shen, Y. F. Dai, Z. Wang, “Improvement of magnetorheological finishing surface quality by nanoparticle jet polishing,” Opt. Eng. 52(4), 043401 (2013).
[CrossRef]

Shen, Z. X.

Shibano, Y.

Soares, S. F.

Song, X. Z.

F. H. Zhang, X. Z. Song, Y. Zhang, D. R. Luan, “Figuring of an ultra-smooth surface in nanoparticle colloid jet machining,” J. Micromech. Microeng. 19(5), 054009 (2009).
[CrossRef]

Stacklies, S.

U. Dinger, G. Seitz, S. Schulte, F. Eisert, C. Muenster, S. Burkart, S. Stacklies, C. Bustaus, H. Hoefer, M. Mayer, B. Fellner, O. Hocky, M. Rupp, K. Riedelsheimer, P. Kuerz, “Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography,” Proc. SPIE 5193, 18–28 (2004).
[CrossRef]

Stowell, W. K.

Su, Y.

Y. Su, Y. H. Zhou, W. Huang, Z. N. Gu, “Study on reaction kinetics between silica glasses and hydrofluoric acid,” J. Chinese Ceram. Soc. 32, 287–293 (2004), in Chinese.

Sugiyama, K.

K. Yamauchi, K. Hirose, H. Goto, K. Sugiyama, K. Inagaki, K. Yamamura, Y. Sano, Y. Mori, “First-principles simulations of removal process in EEM (elastic emission machining),” Comput. Mater. Sci. 14(1-4), 232–235 (1999).
[CrossRef]

Takimoto, M.

M. Ando, M. Negishi, M. Takimoto, A. Deguchi, N. Nakamura, “Super-smooth polishing on aspherical surfaces,” Nanotechnology 6(4), 111–120 (1995).
[CrossRef]

Takino, H.

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, K. Yamauchi, “Processing efficiency of elastic emission machining for low-thermal-expansion material,” Surf. Interface Anal. 40(6-7), 1002–1006 (2008).
[CrossRef]

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, H. Mimura, K. Yamauchi, Y. Mori, “Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics,” J. Vac. Sci. Technol. B 25(6), 2110–2113 (2007).
[CrossRef]

Tawara, Y.

Wang, B.

Wang, C. L.

Wang, J. L.

J. L. Wang, “Supersmooth Polishing with Sub-angstron Roughness,” Proc. SPIE 8416, 841609 (2012).
[CrossRef]

Wang, Z.

W. Q. Peng, S. Y. Li, C. L. Guan, X. M. Shen, Y. F. Dai, Z. Wang, “Improvement of magnetorheological finishing surface quality by nanoparticle jet polishing,” Opt. Eng. 52(4), 043401 (2013).
[CrossRef]

Wang, Z. S.

Wu, X. L.

L. Dan, X. L. Wu, “Optical emission from SiOx(x=1.2–1.6) nanoparticles irradiated by ultraviolet ozone,” J. Appl. Phys. 94(11), 7288–7290 (2003).
[CrossRef]

Xie, X.

Yamamura, K.

K. Yamauchi, K. Hirose, H. Goto, K. Sugiyama, K. Inagaki, K. Yamamura, Y. Sano, Y. Mori, “First-principles simulations of removal process in EEM (elastic emission machining),” Comput. Mater. Sci. 14(1-4), 232–235 (1999).
[CrossRef]

Yamashita, K.

Yamauchi, K.

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, K. Yamauchi, “Processing efficiency of elastic emission machining for low-thermal-expansion material,” Surf. Interface Anal. 40(6-7), 1002–1006 (2008).
[CrossRef]

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, H. Mimura, K. Yamauchi, Y. Mori, “Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics,” J. Vac. Sci. Technol. B 25(6), 2110–2113 (2007).
[CrossRef]

K. Yamauchi, K. Hirose, H. Goto, K. Sugiyama, K. Inagaki, K. Yamamura, Y. Sano, Y. Mori, “First-principles simulations of removal process in EEM (elastic emission machining),” Comput. Mater. Sci. 14(1-4), 232–235 (1999).
[CrossRef]

Y. Mori, K. Yamauchi, K. Endo, “Elastic emission machining,” Precis. Eng. 9(3), 123–128 (1987).
[CrossRef]

Yi, K.

J. Shen, S. Liu, K. Yi, H. He, J. Shao, Z. Fan, “Subsurface damage in optical substrates,” Optik (Stuttg.) 116(6), 288–294 (2005).
[CrossRef]

Yu, J.

Zhang, F. H.

F. H. Zhang, X. Z. Song, Y. Zhang, D. R. Luan, “Figuring of an ultra-smooth surface in nanoparticle colloid jet machining,” J. Micromech. Microeng. 19(5), 054009 (2009).
[CrossRef]

Zhang, Y.

F. H. Zhang, X. Z. Song, Y. Zhang, D. R. Luan, “Figuring of an ultra-smooth surface in nanoparticle colloid jet machining,” J. Micromech. Microeng. 19(5), 054009 (2009).
[CrossRef]

Zhou, L.

Zhou, Y. H.

Y. Su, Y. H. Zhou, W. Huang, Z. N. Gu, “Study on reaction kinetics between silica glasses and hydrofluoric acid,” J. Chinese Ceram. Soc. 32, 287–293 (2004), in Chinese.

Appl. Opt.

Comput. Mater. Sci.

K. Yamauchi, K. Hirose, H. Goto, K. Sugiyama, K. Inagaki, K. Yamamura, Y. Sano, Y. Mori, “First-principles simulations of removal process in EEM (elastic emission machining),” Comput. Mater. Sci. 14(1-4), 232–235 (1999).
[CrossRef]

J. Appl. Phys.

L. Dan, X. L. Wu, “Optical emission from SiOx(x=1.2–1.6) nanoparticles irradiated by ultraviolet ozone,” J. Appl. Phys. 94(11), 7288–7290 (2003).
[CrossRef]

J. Chinese Ceram. Soc.

Y. Su, Y. H. Zhou, W. Huang, Z. N. Gu, “Study on reaction kinetics between silica glasses and hydrofluoric acid,” J. Chinese Ceram. Soc. 32, 287–293 (2004), in Chinese.

J. Micromech. Microeng.

F. H. Zhang, X. Z. Song, Y. Zhang, D. R. Luan, “Figuring of an ultra-smooth surface in nanoparticle colloid jet machining,” J. Micromech. Microeng. 19(5), 054009 (2009).
[CrossRef]

J. Non-Cryst. Solids

L. M. Cook, “Chemical processes in glass polishing,” J. Non-Cryst. Solids 120(1-3), 152–171 (1990).
[CrossRef]

J. Phys. Chem. B

V. A. Bakaev, T. I. Bakaeva, C. G. Pantano, “A study of glass surface heterogeneity and silylation by inverse gas chromatography,” J. Phys. Chem. B 106(47), 12231–12238 (2002).
[CrossRef]

J. Power Sources

M. K. Kim, B. Y. Jang, J. S. Lee, J. S. Kim, S. Nahm, “Microstructures and electrochemical performances of nano-sized SiOx (1.18≤x≤1.83) as an anode material for a lithium(Li)-ion battery,” J. Power Sources 244, 115–121 (2013).
[CrossRef]

J. Vac. Sci. Technol. B

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, H. Mimura, K. Yamauchi, Y. Mori, “Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics,” J. Vac. Sci. Technol. B 25(6), 2110–2113 (2007).
[CrossRef]

Nanotechnology

M. Ando, M. Negishi, M. Takimoto, A. Deguchi, N. Nakamura, “Super-smooth polishing on aspherical surfaces,” Nanotechnology 6(4), 111–120 (1995).
[CrossRef]

Nucl. Instrum. Methods Phys. Res. A

T. Arnold, G. Bohm, R. Fechner, J. Meister, A. Nickel, F. Frost, T. Hansel, A. Schindler, “Ultra-precision surface finishing by ion beam and plasma jet techniques-status and outlook,” Nucl. Instrum. Methods Phys. Res. A 616(2-3), 147–156 (2010).
[CrossRef]

Opt. Eng.

W. Q. Peng, S. Y. Li, C. L. Guan, X. M. Shen, Y. F. Dai, Z. Wang, “Improvement of magnetorheological finishing surface quality by nanoparticle jet polishing,” Opt. Eng. 52(4), 043401 (2013).
[CrossRef]

Optik (Stuttg.)

J. Shen, S. Liu, K. Yi, H. He, J. Shao, Z. Fan, “Subsurface damage in optical substrates,” Optik (Stuttg.) 116(6), 288–294 (2005).
[CrossRef]

Precis. Eng.

Y. Mori, K. Yamauchi, K. Endo, “Elastic emission machining,” Precis. Eng. 9(3), 123–128 (1987).
[CrossRef]

Proc. SPIE

J. L. Wang, “Supersmooth Polishing with Sub-angstron Roughness,” Proc. SPIE 8416, 841609 (2012).
[CrossRef]

U. Dinger, G. Seitz, S. Schulte, F. Eisert, C. Muenster, S. Burkart, S. Stacklies, C. Bustaus, H. Hoefer, M. Mayer, B. Fellner, O. Hocky, M. Rupp, K. Riedelsheimer, P. Kuerz, “Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography,” Proc. SPIE 5193, 18–28 (2004).
[CrossRef]

Surf. Interface Anal.

M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, Y. Mori, H. Mimura, K. Yamauchi, “Processing efficiency of elastic emission machining for low-thermal-expansion material,” Surf. Interface Anal. 40(6-7), 1002–1006 (2008).
[CrossRef]

Other

Z. Wang, “Study on the detection and control techniques of subsurface damage in optical fabrication,” Ph.D. dissertation (National University of Defense Technology, 2008), in Chinese.

X. Z. Song, “Research on mechanism and experiments of nanoparticle colloid jet polishing,” Ph.D. dissertation (Harbin Institute of Technology, 2010), in Chinese.

L. Zhou, “Study on theory and technology in ion beam figuring for optical surfaces,” Ph.D. dissertation (National University of Defense Technology, 2008), in Chinese.

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Figures (10)

Fig. 1
Fig. 1

Model of HEP (a) Schematic diagram of the system (b) 3D-fluid dynamic simulation.

Fig. 2
Fig. 2

Shear stress and dynamic pressure affected by the rotation speed (a) Relationship between rotation speed and shear stress (b) Relationship between rotation speed and dynamic pressure.

Fig. 3
Fig. 3

Shear stress and dynamic pressure affected by the clearance (a) Relationship between the clearance and shear stress (b) Relationship between the clearance and dynamic pressure.

Fig. 4
Fig. 4

MD caclulation results for different strutctures (a) (OH)3Si-O-Si(OH)3 (b) (OH)3Si-O-Si(OH)2 (c) (OH)3Si-O-Si(OH)1.

Fig. 5
Fig. 5

Material removal rate of the silicon-oxide nanoparticle affected by the clearance.

Fig. 6
Fig. 6

Lap prepolished surface machined by HEP process in experiment #1 (a) Initial surface (b) After HEP process.

Fig. 7
Fig. 7

IBF prepolished surface machined by HEP process (a) IBF prepolished surface (b) Surface processed by HEP with clearance of 10μm (c) Surface processed by HEP with clearance of 25μm (d) Surface processed by HEP with clearance of 30μm.

Fig. 8
Fig. 8

The isotropic 2D-PSD comparison at different processed stages.

Fig. 9
Fig. 9

Schematic diagram of ultrasmooth and defect-free surface fabricated by HEP combined with IBF process (a) Initial lap polished surface (b) IBF prepolished surface (c) Surface polished by HEP.

Fig. 10
Fig. 10

Schematic of polishing wheel on the rough surface.

Tables (3)

Tables Icon

Table 1 Angle of Si-O-Si and Strength of Si-O Bond in Different Structures

Tables Icon

Table 2 Process Parameters of HEP

Tables Icon

Table 3 Roughness of the Surface for Different Points before and after Polishing (rms: nm)

Equations (2)

Equations on this page are rendered with MathJax. Learn more.

M R ={ Cτ+ C 1 P+e τ τ min 0 τ< τ min
E= ( 1.605 0.156260.0068secφ ) 4

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