J. P. Zhu, S. Hu, J. S. Yu, Y. Tang, F. Xu, Y. He, S. L. Zhou, and L. L. Li, “Influence of tilt moiré fringe on alignment accuracy in proximity lithography,” Opt. Laser. Eng.371–381 (2013).
J. P. Zhu, S. Hu, J. S. Yu, and Y. Tang, “Alignment method based on matched dual-grating moiré fringe for proximity lithography,” Opt. Eng. 51(11), 113603 (2012).
[Crossref]
G. H. Yuan, Q. Wang, and X. Yuan, “Dynamic generation of plasmonic Moiré fringes using phase-engineered optical vortex beam,” Opt. Lett. 37(13), 2715–2717 (2012).
[Crossref]
[PubMed]
M. C. Leibovici, G. M. Burrow, and T. K. Gaylord, “Pattern-Integrated interference lithography: prospects for nano- and microelectronics,” Opt. Express 20(21), 23643–23652 (2012).
[Crossref]
[PubMed]
K. S. Yen and M. M. Ratnam, “Simultaneous measurement of 3-D displacement components from circular moiré fringes: An experimental approach,” Opt. Lasers Eng. 50(6), 887–899 (2012).
[Crossref]
M. S. Robert-H., “Ultra-precision engineering in lithographic exposure equipment for the semiconductor industry,” Phil. Trans. Roy. Soc. A 370(1973), 3951–3952 (2012).
J. Y. Shao, Y. C. Ding, H. M. Tian, X. Li, and H. Z. Liu, “Digital moiré fringe measurement method for alignment in imprint lithography,” Opt. Laser Technol. 44(2), 446–451 (2012).
[Crossref]
Y. Morimoto, M. Fujigaki, A. Masaya, K. Shimo, R. Hanada, and H. Seto, “Shape and strain measurement of rotating tire by sampling moiré fringes method,” SAE Int J. Masetr Manuf. 4(1), 1107–1113 (2011).
K. S. Yen and M. M. Ratnam, “In-plane displacement sensing from circular gratings moiré fringes using graphic analysis approach,” Sensor Rev. 31(4), 358–367 (2011).
[Crossref]
L. Huang and X. Y. Su, “Method for acquiring the characteristic parameter of the dual-spiral moiré fringes,” Opt. Lett. 33(8), 872–874 (2008).
[Crossref]
[PubMed]
S. Zhou, Y. Fu, X. Tang, S. Hu, W. Chen, and Y. Yang, “Fourier-based analysis of moiré fringe patterns of superposed gratings in alignment of nanolithography,” Opt. Express 16(11), 7869–7880 (2008).
[Crossref]
[PubMed]
J. Y. Shao, H. Z. Liu, Y. C. Ding, L. Wang, and B. H. Lu, “Alignment measurement method for imprint lithography using moiré fringe pattern,” Opt. Eng. 47(11), 113604 (2008).
[Crossref]
X. L. Li, Y. L. Kang, W. Qiu, Q. H. Qin, and X. Xiao, “A study on the digital moiré technique with circular and radial gratings,” Opt. Lasers Eng. 45(7), 783–788 (2007).
[Crossref]
N. Li, W. Wu, and S. Y. Chou, “Sub-20-nm alignment in Nanoimprint lithography using moiré fringe,” Nano Lett. 6(11), 2626–2629 (2006).
[Crossref]
[PubMed]
E. E. Moon, M. K. Mondol, P. N. Everett, and H. I. Smith, “Dynamic alignment control for fluid-immersion lithographies using interferometric-spatial-phase imaging,” J. Vac. Sci. Technol. B 23(6), 2607–2610 (2005).
[Crossref]
J. S. Song, Y. H. Lee, J. H. Jo, S. Chang, and K. C. Yuk, “Moiré patterns of two different elongated circular gratings for the fine visual measurement of linear displacements,” Opt. Commun. 154(1–3), 100–108 (1998).
[Crossref]
T. Miyatake, M. Hirose, T. Shoki, R. Ohkubo, and K. Yamazaki, “Nanometer scattered-light alignment system using SiC X-ray masks with low optical transparency,” J. Vac. Sci. Technol. B 16(6), 3471–3475 (1998).
[Crossref]
A. Moel, E. E. Moon, R. D. Frankel, and H. I. Smith, “Novel on-axis interferometric alignment method with sub-10 nm precision,” J. Vac. Sci. Technol. B 11(6), 2191–2194 (1993).
[Crossref]
A. Une and M. Suzuki, “An optical-heterodyne alignment technique for quarter-micron X-ray lithography,” J. Vac. Sci. Technol. B 7(6), 1971–1976 (1989).
[Crossref]
Y. Uchida, S. Hattori, and T. Nomura, “An automatic mask alignment technique using moiré interference,” J. Vac. Sci. Technol. B 5(1), 244–247 (1987).
[Crossref]
B. Fay, J. Trotel, and A. Frichet, “Optical alignment system for submicron X-ray lithography,” J. Vac. Sci. Technol. 16(6), 1954–1958 (1979).
[Crossref]
D. C. Flanders, H. I. Smith, and S. Austin, “A new interferometric alignment technique,” Appl. Phys. Lett. 31(7), 426–428 (1977).
[Crossref]
L. Raleigh, “On the manufacture and theory of diffraction gratings,” Philos. Mag. 4(310–311), 81–93 (1874).
T. Kanayama, J. Itoh, N. Atoda, and K. Hoh, “An alignment system for synchrotron radiation X-ray lithography,” J. Vac. Sci. Technol. B 6(1), 409–412 (1988).
[Crossref]
D. C. Flanders, H. I. Smith, and S. Austin, “A new interferometric alignment technique,” Appl. Phys. Lett. 31(7), 426–428 (1977).
[Crossref]
J. S. Song, Y. H. Lee, J. H. Jo, S. Chang, and K. C. Yuk, “Moiré patterns of two different elongated circular gratings for the fine visual measurement of linear displacements,” Opt. Commun. 154(1–3), 100–108 (1998).
[Crossref]
N. Li, W. Wu, and S. Y. Chou, “Sub-20-nm alignment in Nanoimprint lithography using moiré fringe,” Nano Lett. 6(11), 2626–2629 (2006).
[Crossref]
[PubMed]
J. Y. Shao, Y. C. Ding, H. M. Tian, X. Li, and H. Z. Liu, “Digital moiré fringe measurement method for alignment in imprint lithography,” Opt. Laser Technol. 44(2), 446–451 (2012).
[Crossref]
J. Y. Shao, H. Z. Liu, Y. C. Ding, L. Wang, and B. H. Lu, “Alignment measurement method for imprint lithography using moiré fringe pattern,” Opt. Eng. 47(11), 113604 (2008).
[Crossref]
E. E. Moon, M. K. Mondol, P. N. Everett, and H. I. Smith, “Dynamic alignment control for fluid-immersion lithographies using interferometric-spatial-phase imaging,” J. Vac. Sci. Technol. B 23(6), 2607–2610 (2005).
[Crossref]
B. Fay, J. Trotel, and A. Frichet, “Optical alignment system for submicron X-ray lithography,” J. Vac. Sci. Technol. 16(6), 1954–1958 (1979).
[Crossref]
D. C. Flanders, H. I. Smith, and S. Austin, “A new interferometric alignment technique,” Appl. Phys. Lett. 31(7), 426–428 (1977).
[Crossref]
A. Moel, E. E. Moon, R. D. Frankel, and H. I. Smith, “Novel on-axis interferometric alignment method with sub-10 nm precision,” J. Vac. Sci. Technol. B 11(6), 2191–2194 (1993).
[Crossref]
B. Fay, J. Trotel, and A. Frichet, “Optical alignment system for submicron X-ray lithography,” J. Vac. Sci. Technol. 16(6), 1954–1958 (1979).
[Crossref]
Y. Morimoto, M. Fujigaki, A. Masaya, K. Shimo, R. Hanada, and H. Seto, “Shape and strain measurement of rotating tire by sampling moiré fringes method,” SAE Int J. Masetr Manuf. 4(1), 1107–1113 (2011).
Y. Morimoto, M. Fujigaki, A. Masaya, K. Shimo, R. Hanada, and H. Seto, “Shape and strain measurement of rotating tire by sampling moiré fringes method,” SAE Int J. Masetr Manuf. 4(1), 1107–1113 (2011).
C. Wagner and N. Harned, “EUV lithography: Lithography gets extreme,” Nat. Photonics 4(1), 24–26 (2010).
[Crossref]
Y. Uchida, S. Hattori, and T. Nomura, “An automatic mask alignment technique using moiré interference,” J. Vac. Sci. Technol. B 5(1), 244–247 (1987).
[Crossref]
J. P. Zhu, S. Hu, J. S. Yu, Y. Tang, F. Xu, Y. He, S. L. Zhou, and L. L. Li, “Influence of tilt moiré fringe on alignment accuracy in proximity lithography,” Opt. Laser. Eng.371–381 (2013).
T. Miyatake, M. Hirose, T. Shoki, R. Ohkubo, and K. Yamazaki, “Nanometer scattered-light alignment system using SiC X-ray masks with low optical transparency,” J. Vac. Sci. Technol. B 16(6), 3471–3475 (1998).
[Crossref]
T. Kanayama, J. Itoh, N. Atoda, and K. Hoh, “An alignment system for synchrotron radiation X-ray lithography,” J. Vac. Sci. Technol. B 6(1), 409–412 (1988).
[Crossref]
J. P. Zhu, S. Hu, J. S. Yu, Y. Tang, F. Xu, Y. He, S. L. Zhou, and L. L. Li, “Influence of tilt moiré fringe on alignment accuracy in proximity lithography,” Opt. Laser. Eng.371–381 (2013).
J. P. Zhu, S. Hu, J. S. Yu, and Y. Tang, “Alignment method based on matched dual-grating moiré fringe for proximity lithography,” Opt. Eng. 51(11), 113603 (2012).
[Crossref]
S. Zhou, Y. Yang, L. Zhao, and S. Hu, “Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography,” Opt. Lett. 35(18), 3132–3134 (2010).
[Crossref]
[PubMed]
S. Zhou, Y. Fu, X. Tang, S. Hu, W. Chen, and Y. Yang, “Fourier-based analysis of moiré fringe patterns of superposed gratings in alignment of nanolithography,” Opt. Express 16(11), 7869–7880 (2008).
[Crossref]
[PubMed]
T. Kanayama, J. Itoh, N. Atoda, and K. Hoh, “An alignment system for synchrotron radiation X-ray lithography,” J. Vac. Sci. Technol. B 6(1), 409–412 (1988).
[Crossref]
J. S. Song, Y. H. Lee, J. H. Jo, S. Chang, and K. C. Yuk, “Moiré patterns of two different elongated circular gratings for the fine visual measurement of linear displacements,” Opt. Commun. 154(1–3), 100–108 (1998).
[Crossref]
T. Kanayama, J. Itoh, N. Atoda, and K. Hoh, “An alignment system for synchrotron radiation X-ray lithography,” J. Vac. Sci. Technol. B 6(1), 409–412 (1988).
[Crossref]
X. L. Li, Y. L. Kang, W. Qiu, Q. H. Qin, and X. Xiao, “A study on the digital moiré technique with circular and radial gratings,” Opt. Lasers Eng. 45(7), 783–788 (2007).
[Crossref]
J. S. Song, Y. H. Lee, J. H. Jo, S. Chang, and K. C. Yuk, “Moiré patterns of two different elongated circular gratings for the fine visual measurement of linear displacements,” Opt. Commun. 154(1–3), 100–108 (1998).
[Crossref]
J. P. Zhu, S. Hu, J. S. Yu, Y. Tang, F. Xu, Y. He, S. L. Zhou, and L. L. Li, “Influence of tilt moiré fringe on alignment accuracy in proximity lithography,” Opt. Laser. Eng.371–381 (2013).
N. Li, W. Wu, and S. Y. Chou, “Sub-20-nm alignment in Nanoimprint lithography using moiré fringe,” Nano Lett. 6(11), 2626–2629 (2006).
[Crossref]
[PubMed]
J. Y. Shao, Y. C. Ding, H. M. Tian, X. Li, and H. Z. Liu, “Digital moiré fringe measurement method for alignment in imprint lithography,” Opt. Laser Technol. 44(2), 446–451 (2012).
[Crossref]
X. L. Li, Y. L. Kang, W. Qiu, Q. H. Qin, and X. Xiao, “A study on the digital moiré technique with circular and radial gratings,” Opt. Lasers Eng. 45(7), 783–788 (2007).
[Crossref]
J. Y. Shao, Y. C. Ding, H. M. Tian, X. Li, and H. Z. Liu, “Digital moiré fringe measurement method for alignment in imprint lithography,” Opt. Laser Technol. 44(2), 446–451 (2012).
[Crossref]
J. Y. Shao, H. Z. Liu, Y. C. Ding, L. Wang, and B. H. Lu, “Alignment measurement method for imprint lithography using moiré fringe pattern,” Opt. Eng. 47(11), 113604 (2008).
[Crossref]
J. Y. Shao, H. Z. Liu, Y. C. Ding, L. Wang, and B. H. Lu, “Alignment measurement method for imprint lithography using moiré fringe pattern,” Opt. Eng. 47(11), 113604 (2008).
[Crossref]
Y. Morimoto, M. Fujigaki, A. Masaya, K. Shimo, R. Hanada, and H. Seto, “Shape and strain measurement of rotating tire by sampling moiré fringes method,” SAE Int J. Masetr Manuf. 4(1), 1107–1113 (2011).
T. Miyatake, M. Hirose, T. Shoki, R. Ohkubo, and K. Yamazaki, “Nanometer scattered-light alignment system using SiC X-ray masks with low optical transparency,” J. Vac. Sci. Technol. B 16(6), 3471–3475 (1998).
[Crossref]
A. Moel, E. E. Moon, R. D. Frankel, and H. I. Smith, “Novel on-axis interferometric alignment method with sub-10 nm precision,” J. Vac. Sci. Technol. B 11(6), 2191–2194 (1993).
[Crossref]
E. E. Moon, M. K. Mondol, P. N. Everett, and H. I. Smith, “Dynamic alignment control for fluid-immersion lithographies using interferometric-spatial-phase imaging,” J. Vac. Sci. Technol. B 23(6), 2607–2610 (2005).
[Crossref]
E. E. Moon, M. K. Mondol, P. N. Everett, and H. I. Smith, “Dynamic alignment control for fluid-immersion lithographies using interferometric-spatial-phase imaging,” J. Vac. Sci. Technol. B 23(6), 2607–2610 (2005).
[Crossref]
A. Moel, E. E. Moon, R. D. Frankel, and H. I. Smith, “Novel on-axis interferometric alignment method with sub-10 nm precision,” J. Vac. Sci. Technol. B 11(6), 2191–2194 (1993).
[Crossref]
Y. Morimoto, M. Fujigaki, A. Masaya, K. Shimo, R. Hanada, and H. Seto, “Shape and strain measurement of rotating tire by sampling moiré fringes method,” SAE Int J. Masetr Manuf. 4(1), 1107–1113 (2011).
Y. Uchida, S. Hattori, and T. Nomura, “An automatic mask alignment technique using moiré interference,” J. Vac. Sci. Technol. B 5(1), 244–247 (1987).
[Crossref]
T. Miyatake, M. Hirose, T. Shoki, R. Ohkubo, and K. Yamazaki, “Nanometer scattered-light alignment system using SiC X-ray masks with low optical transparency,” J. Vac. Sci. Technol. B 16(6), 3471–3475 (1998).
[Crossref]
X. L. Li, Y. L. Kang, W. Qiu, Q. H. Qin, and X. Xiao, “A study on the digital moiré technique with circular and radial gratings,” Opt. Lasers Eng. 45(7), 783–788 (2007).
[Crossref]
X. L. Li, Y. L. Kang, W. Qiu, Q. H. Qin, and X. Xiao, “A study on the digital moiré technique with circular and radial gratings,” Opt. Lasers Eng. 45(7), 783–788 (2007).
[Crossref]
L. Raleigh, “On the manufacture and theory of diffraction gratings,” Philos. Mag. 4(310–311), 81–93 (1874).
K. S. Yen and M. M. Ratnam, “Simultaneous measurement of 3-D displacement components from circular moiré fringes: An experimental approach,” Opt. Lasers Eng. 50(6), 887–899 (2012).
[Crossref]
K. S. Yen and M. M. Ratnam, “In-plane displacement sensing from circular gratings moiré fringes using graphic analysis approach,” Sensor Rev. 31(4), 358–367 (2011).
[Crossref]
M. S. Robert-H., “Ultra-precision engineering in lithographic exposure equipment for the semiconductor industry,” Phil. Trans. Roy. Soc. A 370(1973), 3951–3952 (2012).
Y. Morimoto, M. Fujigaki, A. Masaya, K. Shimo, R. Hanada, and H. Seto, “Shape and strain measurement of rotating tire by sampling moiré fringes method,” SAE Int J. Masetr Manuf. 4(1), 1107–1113 (2011).
J. Y. Shao, Y. C. Ding, H. M. Tian, X. Li, and H. Z. Liu, “Digital moiré fringe measurement method for alignment in imprint lithography,” Opt. Laser Technol. 44(2), 446–451 (2012).
[Crossref]
J. Y. Shao, H. Z. Liu, Y. C. Ding, L. Wang, and B. H. Lu, “Alignment measurement method for imprint lithography using moiré fringe pattern,” Opt. Eng. 47(11), 113604 (2008).
[Crossref]
Y. Morimoto, M. Fujigaki, A. Masaya, K. Shimo, R. Hanada, and H. Seto, “Shape and strain measurement of rotating tire by sampling moiré fringes method,” SAE Int J. Masetr Manuf. 4(1), 1107–1113 (2011).
T. Miyatake, M. Hirose, T. Shoki, R. Ohkubo, and K. Yamazaki, “Nanometer scattered-light alignment system using SiC X-ray masks with low optical transparency,” J. Vac. Sci. Technol. B 16(6), 3471–3475 (1998).
[Crossref]
E. E. Moon, M. K. Mondol, P. N. Everett, and H. I. Smith, “Dynamic alignment control for fluid-immersion lithographies using interferometric-spatial-phase imaging,” J. Vac. Sci. Technol. B 23(6), 2607–2610 (2005).
[Crossref]
A. Moel, E. E. Moon, R. D. Frankel, and H. I. Smith, “Novel on-axis interferometric alignment method with sub-10 nm precision,” J. Vac. Sci. Technol. B 11(6), 2191–2194 (1993).
[Crossref]
D. C. Flanders, H. I. Smith, and S. Austin, “A new interferometric alignment technique,” Appl. Phys. Lett. 31(7), 426–428 (1977).
[Crossref]
J. S. Song, Y. H. Lee, J. H. Jo, S. Chang, and K. C. Yuk, “Moiré patterns of two different elongated circular gratings for the fine visual measurement of linear displacements,” Opt. Commun. 154(1–3), 100–108 (1998).
[Crossref]
A. Une and M. Suzuki, “An optical-heterodyne alignment technique for quarter-micron X-ray lithography,” J. Vac. Sci. Technol. B 7(6), 1971–1976 (1989).
[Crossref]
J. P. Zhu, S. Hu, J. S. Yu, Y. Tang, F. Xu, Y. He, S. L. Zhou, and L. L. Li, “Influence of tilt moiré fringe on alignment accuracy in proximity lithography,” Opt. Laser. Eng.371–381 (2013).
J. P. Zhu, S. Hu, J. S. Yu, and Y. Tang, “Alignment method based on matched dual-grating moiré fringe for proximity lithography,” Opt. Eng. 51(11), 113603 (2012).
[Crossref]
J. Y. Shao, Y. C. Ding, H. M. Tian, X. Li, and H. Z. Liu, “Digital moiré fringe measurement method for alignment in imprint lithography,” Opt. Laser Technol. 44(2), 446–451 (2012).
[Crossref]
B. Fay, J. Trotel, and A. Frichet, “Optical alignment system for submicron X-ray lithography,” J. Vac. Sci. Technol. 16(6), 1954–1958 (1979).
[Crossref]
Y. Uchida, S. Hattori, and T. Nomura, “An automatic mask alignment technique using moiré interference,” J. Vac. Sci. Technol. B 5(1), 244–247 (1987).
[Crossref]
A. Une and M. Suzuki, “An optical-heterodyne alignment technique for quarter-micron X-ray lithography,” J. Vac. Sci. Technol. B 7(6), 1971–1976 (1989).
[Crossref]
C. Wagner and N. Harned, “EUV lithography: Lithography gets extreme,” Nat. Photonics 4(1), 24–26 (2010).
[Crossref]
J. Y. Shao, H. Z. Liu, Y. C. Ding, L. Wang, and B. H. Lu, “Alignment measurement method for imprint lithography using moiré fringe pattern,” Opt. Eng. 47(11), 113604 (2008).
[Crossref]
N. Li, W. Wu, and S. Y. Chou, “Sub-20-nm alignment in Nanoimprint lithography using moiré fringe,” Nano Lett. 6(11), 2626–2629 (2006).
[Crossref]
[PubMed]
X. L. Li, Y. L. Kang, W. Qiu, Q. H. Qin, and X. Xiao, “A study on the digital moiré technique with circular and radial gratings,” Opt. Lasers Eng. 45(7), 783–788 (2007).
[Crossref]
J. P. Zhu, S. Hu, J. S. Yu, Y. Tang, F. Xu, Y. He, S. L. Zhou, and L. L. Li, “Influence of tilt moiré fringe on alignment accuracy in proximity lithography,” Opt. Laser. Eng.371–381 (2013).
T. Miyatake, M. Hirose, T. Shoki, R. Ohkubo, and K. Yamazaki, “Nanometer scattered-light alignment system using SiC X-ray masks with low optical transparency,” J. Vac. Sci. Technol. B 16(6), 3471–3475 (1998).
[Crossref]
S. Zhou, Y. Yang, L. Zhao, and S. Hu, “Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography,” Opt. Lett. 35(18), 3132–3134 (2010).
[Crossref]
[PubMed]
S. Zhou, Y. Fu, X. Tang, S. Hu, W. Chen, and Y. Yang, “Fourier-based analysis of moiré fringe patterns of superposed gratings in alignment of nanolithography,” Opt. Express 16(11), 7869–7880 (2008).
[Crossref]
[PubMed]
K. S. Yen and M. M. Ratnam, “Simultaneous measurement of 3-D displacement components from circular moiré fringes: An experimental approach,” Opt. Lasers Eng. 50(6), 887–899 (2012).
[Crossref]
K. S. Yen and M. M. Ratnam, “In-plane displacement sensing from circular gratings moiré fringes using graphic analysis approach,” Sensor Rev. 31(4), 358–367 (2011).
[Crossref]
J. P. Zhu, S. Hu, J. S. Yu, Y. Tang, F. Xu, Y. He, S. L. Zhou, and L. L. Li, “Influence of tilt moiré fringe on alignment accuracy in proximity lithography,” Opt. Laser. Eng.371–381 (2013).
J. P. Zhu, S. Hu, J. S. Yu, and Y. Tang, “Alignment method based on matched dual-grating moiré fringe for proximity lithography,” Opt. Eng. 51(11), 113603 (2012).
[Crossref]
J. S. Song, Y. H. Lee, J. H. Jo, S. Chang, and K. C. Yuk, “Moiré patterns of two different elongated circular gratings for the fine visual measurement of linear displacements,” Opt. Commun. 154(1–3), 100–108 (1998).
[Crossref]
S. Zhou, Y. Yang, L. Zhao, and S. Hu, “Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography,” Opt. Lett. 35(18), 3132–3134 (2010).
[Crossref]
[PubMed]
S. Zhou, Y. Fu, X. Tang, S. Hu, W. Chen, and Y. Yang, “Fourier-based analysis of moiré fringe patterns of superposed gratings in alignment of nanolithography,” Opt. Express 16(11), 7869–7880 (2008).
[Crossref]
[PubMed]
J. P. Zhu, S. Hu, J. S. Yu, Y. Tang, F. Xu, Y. He, S. L. Zhou, and L. L. Li, “Influence of tilt moiré fringe on alignment accuracy in proximity lithography,” Opt. Laser. Eng.371–381 (2013).
J. P. Zhu, S. Hu, J. S. Yu, Y. Tang, F. Xu, Y. He, S. L. Zhou, and L. L. Li, “Influence of tilt moiré fringe on alignment accuracy in proximity lithography,” Opt. Laser. Eng.371–381 (2013).
J. P. Zhu, S. Hu, J. S. Yu, and Y. Tang, “Alignment method based on matched dual-grating moiré fringe for proximity lithography,” Opt. Eng. 51(11), 113603 (2012).
[Crossref]
D. C. Flanders, H. I. Smith, and S. Austin, “A new interferometric alignment technique,” Appl. Phys. Lett. 31(7), 426–428 (1977).
[Crossref]
B. Fay, J. Trotel, and A. Frichet, “Optical alignment system for submicron X-ray lithography,” J. Vac. Sci. Technol. 16(6), 1954–1958 (1979).
[Crossref]
T. Kanayama, J. Itoh, N. Atoda, and K. Hoh, “An alignment system for synchrotron radiation X-ray lithography,” J. Vac. Sci. Technol. B 6(1), 409–412 (1988).
[Crossref]
A. Une and M. Suzuki, “An optical-heterodyne alignment technique for quarter-micron X-ray lithography,” J. Vac. Sci. Technol. B 7(6), 1971–1976 (1989).
[Crossref]
T. Miyatake, M. Hirose, T. Shoki, R. Ohkubo, and K. Yamazaki, “Nanometer scattered-light alignment system using SiC X-ray masks with low optical transparency,” J. Vac. Sci. Technol. B 16(6), 3471–3475 (1998).
[Crossref]
A. Moel, E. E. Moon, R. D. Frankel, and H. I. Smith, “Novel on-axis interferometric alignment method with sub-10 nm precision,” J. Vac. Sci. Technol. B 11(6), 2191–2194 (1993).
[Crossref]
E. E. Moon, M. K. Mondol, P. N. Everett, and H. I. Smith, “Dynamic alignment control for fluid-immersion lithographies using interferometric-spatial-phase imaging,” J. Vac. Sci. Technol. B 23(6), 2607–2610 (2005).
[Crossref]
Y. Uchida, S. Hattori, and T. Nomura, “An automatic mask alignment technique using moiré interference,” J. Vac. Sci. Technol. B 5(1), 244–247 (1987).
[Crossref]
N. Li, W. Wu, and S. Y. Chou, “Sub-20-nm alignment in Nanoimprint lithography using moiré fringe,” Nano Lett. 6(11), 2626–2629 (2006).
[Crossref]
[PubMed]
C. Wagner and N. Harned, “EUV lithography: Lithography gets extreme,” Nat. Photonics 4(1), 24–26 (2010).
[Crossref]
J. S. Song, Y. H. Lee, J. H. Jo, S. Chang, and K. C. Yuk, “Moiré patterns of two different elongated circular gratings for the fine visual measurement of linear displacements,” Opt. Commun. 154(1–3), 100–108 (1998).
[Crossref]
J. Y. Shao, H. Z. Liu, Y. C. Ding, L. Wang, and B. H. Lu, “Alignment measurement method for imprint lithography using moiré fringe pattern,” Opt. Eng. 47(11), 113604 (2008).
[Crossref]
J. P. Zhu, S. Hu, J. S. Yu, and Y. Tang, “Alignment method based on matched dual-grating moiré fringe for proximity lithography,” Opt. Eng. 51(11), 113603 (2012).
[Crossref]
M. C. Leibovici, G. M. Burrow, and T. K. Gaylord, “Pattern-Integrated interference lithography: prospects for nano- and microelectronics,” Opt. Express 20(21), 23643–23652 (2012).
[Crossref]
[PubMed]
S. Zhou, Y. Fu, X. Tang, S. Hu, W. Chen, and Y. Yang, “Fourier-based analysis of moiré fringe patterns of superposed gratings in alignment of nanolithography,” Opt. Express 16(11), 7869–7880 (2008).
[Crossref]
[PubMed]
J. Y. Shao, Y. C. Ding, H. M. Tian, X. Li, and H. Z. Liu, “Digital moiré fringe measurement method for alignment in imprint lithography,” Opt. Laser Technol. 44(2), 446–451 (2012).
[Crossref]
J. P. Zhu, S. Hu, J. S. Yu, Y. Tang, F. Xu, Y. He, S. L. Zhou, and L. L. Li, “Influence of tilt moiré fringe on alignment accuracy in proximity lithography,” Opt. Laser. Eng.371–381 (2013).
K. S. Yen and M. M. Ratnam, “Simultaneous measurement of 3-D displacement components from circular moiré fringes: An experimental approach,” Opt. Lasers Eng. 50(6), 887–899 (2012).
[Crossref]
X. L. Li, Y. L. Kang, W. Qiu, Q. H. Qin, and X. Xiao, “A study on the digital moiré technique with circular and radial gratings,” Opt. Lasers Eng. 45(7), 783–788 (2007).
[Crossref]
S. Zhou, Y. Yang, L. Zhao, and S. Hu, “Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography,” Opt. Lett. 35(18), 3132–3134 (2010).
[Crossref]
[PubMed]
G. H. Yuan, Q. Wang, and X. Yuan, “Dynamic generation of plasmonic Moiré fringes using phase-engineered optical vortex beam,” Opt. Lett. 37(13), 2715–2717 (2012).
[Crossref]
[PubMed]
L. Huang and X. Y. Su, “Method for acquiring the characteristic parameter of the dual-spiral moiré fringes,” Opt. Lett. 33(8), 872–874 (2008).
[Crossref]
[PubMed]
M. S. Robert-H., “Ultra-precision engineering in lithographic exposure equipment for the semiconductor industry,” Phil. Trans. Roy. Soc. A 370(1973), 3951–3952 (2012).
L. Raleigh, “On the manufacture and theory of diffraction gratings,” Philos. Mag. 4(310–311), 81–93 (1874).
Y. Morimoto, M. Fujigaki, A. Masaya, K. Shimo, R. Hanada, and H. Seto, “Shape and strain measurement of rotating tire by sampling moiré fringes method,” SAE Int J. Masetr Manuf. 4(1), 1107–1113 (2011).
K. S. Yen and M. M. Ratnam, “In-plane displacement sensing from circular gratings moiré fringes using graphic analysis approach,” Sensor Rev. 31(4), 358–367 (2011).
[Crossref]