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[Crossref]
[PubMed]
A. Emboras, R. M. Briggs, A. Najar, S. Nambiar, C. Delacour, P. Grosse, E. Augendre, J. M. Fedeli, B. de Salvo, H. A. Atwater, and R. Espiau de Lamaestre, “Efficient coupler between silicon photonic and metal-insulator-silicon-metal plasmonic waveguides,” Appl. Phys. Lett. 101(25), 251117 (2012).
[Crossref]
J. A. Dionne and H. A. Atwater, “Plasmonics: metal-worthy methods and materials in nanophotonics,” MRS Bull. 37(08), 717–724 (2012).
[Crossref]
A. Boltasseva and H. A. Atwater, “Low-loss plasmonic metamaterials,” Science 331(6015), 290–291 (2011).
[Crossref]
[PubMed]
E. Feigenbaum, K. Diest, and H. A. Atwater, “Unity-order index change in transparent conducting oxides at visible frequencies,” Nano Lett. 10(6), 2111–2116 (2010).
[Crossref]
[PubMed]
J. A. Dionne, K. Diest, L. A. Sweatlock, and H. A. Atwater, “PlasMOStor: a metal-oxide-Si field effect plasmonic modulator,” Nano Lett. 9(2), 897–902 (2009).
[Crossref]
[PubMed]
A. Emboras, A. Najar, S. Nambiar, P. Grosse, E. Augendre, C. Leroux, B. de Salvo, and R. E. de Lamaestre, “MNOS stack for reliable, low optical loss, Cu based CMOS plasmonic devices,” Opt. Express 20(13), 13612–13621 (2012).
[Crossref]
[PubMed]
A. Emboras, R. M. Briggs, A. Najar, S. Nambiar, C. Delacour, P. Grosse, E. Augendre, J. M. Fedeli, B. de Salvo, H. A. Atwater, and R. Espiau de Lamaestre, “Efficient coupler between silicon photonic and metal-insulator-silicon-metal plasmonic waveguides,” Appl. Phys. Lett. 101(25), 251117 (2012).
[Crossref]
B. Lamprecht, J. R. Krenn, G. Schider, H. Ditlbacher, M. Salerno, N. Felidj, A. Leitner, F. R. Aussenegg, and J. C. Weeber, “Surface plasmon propagation in microscale metal stripes,” Appl. Phys. Lett. 79(1), 51–53 (2001).
[Crossref]
V. Babicheva and A. Lavrinenko, “Plasmonic modulator optimized by patterning of active layer and tuning permittivity,” Opt. Commun. 285(24), 5500–5507 (2012).
[Crossref]
V. E. Babicheva, I. V. Kulkova, R. Malureanu, K. Yvind, and A. V. Lavrinenko, “Plasmonic modulator based on gain-assisted metal–semiconductor–metal waveguide,” Photon. Nanostructures 10(4), 389–399 (2012).
[Crossref]
M. A. Noginov, L. Gu, J. Livenere, G. Zhu, A. K. Pradhan, R. Mundle, M. Bahoura, Y. A. Barnakov, and V. A. Podolskiy, “Transparent conductive oxides: plasmonic materials for telecom wavelengths,” Appl. Phys. Lett. 99(2), 021101 (2011).
[Crossref]
M. A. Noginov, L. Gu, J. Livenere, G. Zhu, A. K. Pradhan, R. Mundle, M. Bahoura, Y. A. Barnakov, and V. A. Podolskiy, “Transparent conductive oxides: plasmonic materials for telecom wavelengths,” Appl. Phys. Lett. 99(2), 021101 (2011).
[Crossref]
V. J. Sorger, Z. Ye, R. F. Oulton, Y. Wang, G. Bartal, X. Yin, and X. Zhang, “Experimental demonstration of low-loss optical waveguiding at deep sub-wavelength scales,” Nat. Commun. 2, 331 (2011).
[Crossref]
P. Berini, “Long-range surface plasmon polaritons,” Adv. Opt. Photon. 1(3), 484–588 (2009).
[Crossref]
R. Charbonneau, C. Scales, I. Breukelaar, S. Fafard, N. Lahoud, G. Mattiussi, and P. Berini, “Passive integrated optics elements based on long-range surface plasmon polaritons,” J. Lightwave Technol. 24(1), 477–494 (2006).
[Crossref]
R. Charbonneau, N. Lahoud, G. Mattiussi, and P. Berini, “Demonstration of integrated optics elements based on long-ranging surface plasmon polaritons,” Opt. Express 13(3), 977–984 (2005).
[Crossref]
[PubMed]
C. Delacour, S. Blaize, P. Grosse, J. M. Fedeli, A. Bruyant, R. Salas-Montiel, G. Lerondel, and A. Chelnokov, “Efficient directional coupling between silicon and copper plasmonic nanoslot waveguides: toward metal-oxide-silicon nanophotonics,” Nano Lett. 10(8), 2922–2926 (2010).
[Crossref]
[PubMed]
G. V. Naik, V. M. Shalaev, and A. Boltasseva, “Alternative plasmonic materials: beyond gold and silver,” Adv. Mater. 25(24), 3264–3294 (2013).
[Crossref]
[PubMed]
G. Naik, J. L. Schroeder, X. Ni, A. V. Kildishev, T. D. Sands, and A. Boltasseva, “Titanium nitride as a plasmonic material for visible and near-infrared wavelengths,” Opt. Mater. Express 2(4), 478–489 (2012).
[Crossref]
J. Kim, G. Naik, N. Emani, U. Guler, and A. Boltasseva, “Plasmonic resonances in nanostructured transparent conducting oxide films,” IEEE J. Sel. Top. Quantum Electron. 19, 4601907 (2012).
G. V. Naik, J. Liu, A. V. Kildishev, V. M. Shalaev, and A. Boltasseva, “Demonstration of Al:ZnO as a plasmonic component for near-infrared metamaterials,” Proc. Natl. Acad. Sci. U.S.A. 109(23), 8834–8838 (2012).
[Crossref]
[PubMed]
J. B. Khurgin and A. Boltasseva, “Reflecting upon the losses in plasmonics and metamaterials,” MRS Bull. 37(08), 768–779 (2012).
[Crossref]
G. V. Naik and A. Boltasseva, “A comparative study of semiconductor-based plasmonic metamaterials,” Metamaterials (Amst.) 5(1), 1–7 (2011).
[Crossref]
A. Boltasseva and H. A. Atwater, “Low-loss plasmonic metamaterials,” Science 331(6015), 290–291 (2011).
[Crossref]
[PubMed]
G. Naik, J. Kim, and A. Boltasseva, “Oxides and nitrides as alternative plasmonic materials in the optical range,” Opt. Mater. Express 4(6), 1090–1099 (2011).
[Crossref]
P. R. West, S. Ishii, G. V. Naik, N. K. Emani, V. M. Shalaev, and A. Boltasseva, “Searching for better plasmonic materials,” Laser Photon. Rev. 4(6), 795–808 (2010).
[Crossref]
G. V. Naik and A. Boltasseva, “Semiconductors for plasmonics and metamaterials,” Phys. Status Solidi RRL 4(10), 295–297 (2010).
[Crossref]
A. Boltasseva, T. Nikolajsen, K. Leosson, K. Kjaer, M. S. Larsen, and S. I. Bozhevolnyi, “Integrated optical components utilizing long-range surface plasmon polaritons,” J. Lightwave Technol. 23(1), 413–422 (2005).
[Crossref]
V. S. Volkov, Z. Han, M. G. Nielsen, K. Leosson, H. Keshmiri, J. Gosciniak, O. Albrektsen, and S. I. Bozhevolnyi, “Long-range dielectric-loaded surface plasmon polariton waveguides operating at telecommunication wavelengths,” Opt. Lett. 36(21), 4278–4280 (2011).
[Crossref]
[PubMed]
A. Boltasseva, T. Nikolajsen, K. Leosson, K. Kjaer, M. S. Larsen, and S. I. Bozhevolnyi, “Integrated optical components utilizing long-range surface plasmon polaritons,” J. Lightwave Technol. 23(1), 413–422 (2005).
[Crossref]
T. Nikolajsen, K. Leosson, and S. I. Bozhevolnyi, “In-line extinction modulator based on long-range surface plasmon polaritons,” Opt. Commun. 244(1-6), 455–459 (2005).
[Crossref]
T. Nikolajsen, K. Leosson, and S. I. Bozhevolnyi, “Surface plasmon polariton based modulators and switches operating at telecom wavelengths,” Appl. Phys. Lett. 85(24), 5833–5835 (2004).
[Crossref]
A. Emboras, R. M. Briggs, A. Najar, S. Nambiar, C. Delacour, P. Grosse, E. Augendre, J. M. Fedeli, B. de Salvo, H. A. Atwater, and R. Espiau de Lamaestre, “Efficient coupler between silicon photonic and metal-insulator-silicon-metal plasmonic waveguides,” Appl. Phys. Lett. 101(25), 251117 (2012).
[Crossref]
M. L. Brongersma and V. M. Shalaev, “Applied physics. the case for plasmonics,” Science 328(5977), 440–441 (2010).
[Crossref]
[PubMed]
W. Cai, J. S. White, and M. L. Brongersma, “Compact, high-speed and power-efficient electrooptic plasmonic modulators,” Nano Lett. 9(12), 4403–4411 (2009).
[Crossref]
[PubMed]
C. Delacour, S. Blaize, P. Grosse, J. M. Fedeli, A. Bruyant, R. Salas-Montiel, G. Lerondel, and A. Chelnokov, “Efficient directional coupling between silicon and copper plasmonic nanoslot waveguides: toward metal-oxide-silicon nanophotonics,” Nano Lett. 10(8), 2922–2926 (2010).
[Crossref]
[PubMed]
W. Cai, J. S. White, and M. L. Brongersma, “Compact, high-speed and power-efficient electrooptic plasmonic modulators,” Nano Lett. 9(12), 4403–4411 (2009).
[Crossref]
[PubMed]
A. Kerber and E. A. Cartier, “Reliability challenges for CMOS technology qualifications with Hafnium Oxide/Titanium Nitride gate stacks,” IEEE Trans. Device Mater. Reliab. 9(2), 147–162 (2009).
[Crossref]
D. C. Look, T. C. Droubay, and S. A. Chambers, “Stable highly conductive ZnO via reduction of Zn vacancies,” Appl. Phys. Lett. 101(10), 102101 (2012).
[Crossref]
R. Charbonneau, C. Scales, I. Breukelaar, S. Fafard, N. Lahoud, G. Mattiussi, and P. Berini, “Passive integrated optics elements based on long-range surface plasmon polaritons,” J. Lightwave Technol. 24(1), 477–494 (2006).
[Crossref]
R. Charbonneau, N. Lahoud, G. Mattiussi, and P. Berini, “Demonstration of integrated optics elements based on long-ranging surface plasmon polaritons,” Opt. Express 13(3), 977–984 (2005).
[Crossref]
[PubMed]
C. Delacour, S. Blaize, P. Grosse, J. M. Fedeli, A. Bruyant, R. Salas-Montiel, G. Lerondel, and A. Chelnokov, “Efficient directional coupling between silicon and copper plasmonic nanoslot waveguides: toward metal-oxide-silicon nanophotonics,” Nano Lett. 10(8), 2922–2926 (2010).
[Crossref]
[PubMed]
J. Narayan, P. Tiwari, X. Chen, J. Singh, R. Chowdhury, and T. Zheleva, “Epitaxial growth of TiN films on (100) silicon substrates by laser physical vapor deposition,” Appl. Phys. Lett. 61(11), 1290–1292 (1992).
[Crossref]
J. Narayan, P. Tiwari, X. Chen, J. Singh, R. Chowdhury, and T. Zheleva, “Epitaxial growth of TiN films on (100) silicon substrates by laser physical vapor deposition,” Appl. Phys. Lett. 61(11), 1290–1292 (1992).
[Crossref]
M. Ferrera, L. Razzari, D. Duchesne, R. Morandotti, Z. Yang, M. Liscidini, J. E. Sipe, S. Chu, B. E. Little, and D. J. Moss, “Low-power continuous-wave nonlinear optics in doped silica glass integrated waveguide structures,” Nat. Photonics 2(12), 737–740 (2008).
[Crossref]
A. Emboras, A. Najar, S. Nambiar, P. Grosse, E. Augendre, C. Leroux, B. de Salvo, and R. E. de Lamaestre, “MNOS stack for reliable, low optical loss, Cu based CMOS plasmonic devices,” Opt. Express 20(13), 13612–13621 (2012).
[Crossref]
[PubMed]
A. Emboras, A. Najar, S. Nambiar, P. Grosse, E. Augendre, C. Leroux, B. de Salvo, and R. E. de Lamaestre, “MNOS stack for reliable, low optical loss, Cu based CMOS plasmonic devices,” Opt. Express 20(13), 13612–13621 (2012).
[Crossref]
[PubMed]
A. Emboras, R. M. Briggs, A. Najar, S. Nambiar, C. Delacour, P. Grosse, E. Augendre, J. M. Fedeli, B. de Salvo, H. A. Atwater, and R. Espiau de Lamaestre, “Efficient coupler between silicon photonic and metal-insulator-silicon-metal plasmonic waveguides,” Appl. Phys. Lett. 101(25), 251117 (2012).
[Crossref]
A. Emboras, R. M. Briggs, A. Najar, S. Nambiar, C. Delacour, P. Grosse, E. Augendre, J. M. Fedeli, B. de Salvo, H. A. Atwater, and R. Espiau de Lamaestre, “Efficient coupler between silicon photonic and metal-insulator-silicon-metal plasmonic waveguides,” Appl. Phys. Lett. 101(25), 251117 (2012).
[Crossref]
C. Delacour, S. Blaize, P. Grosse, J. M. Fedeli, A. Bruyant, R. Salas-Montiel, G. Lerondel, and A. Chelnokov, “Efficient directional coupling between silicon and copper plasmonic nanoslot waveguides: toward metal-oxide-silicon nanophotonics,” Nano Lett. 10(8), 2922–2926 (2010).
[Crossref]
[PubMed]
E. Feigenbaum, K. Diest, and H. A. Atwater, “Unity-order index change in transparent conducting oxides at visible frequencies,” Nano Lett. 10(6), 2111–2116 (2010).
[Crossref]
[PubMed]
J. A. Dionne, K. Diest, L. A. Sweatlock, and H. A. Atwater, “PlasMOStor: a metal-oxide-Si field effect plasmonic modulator,” Nano Lett. 9(2), 897–902 (2009).
[Crossref]
[PubMed]
J. A. Dionne and H. A. Atwater, “Plasmonics: metal-worthy methods and materials in nanophotonics,” MRS Bull. 37(08), 717–724 (2012).
[Crossref]
J. A. Dionne, K. Diest, L. A. Sweatlock, and H. A. Atwater, “PlasMOStor: a metal-oxide-Si field effect plasmonic modulator,” Nano Lett. 9(2), 897–902 (2009).
[Crossref]
[PubMed]
B. Lamprecht, J. R. Krenn, G. Schider, H. Ditlbacher, M. Salerno, N. Felidj, A. Leitner, F. R. Aussenegg, and J. C. Weeber, “Surface plasmon propagation in microscale metal stripes,” Appl. Phys. Lett. 79(1), 51–53 (2001).
[Crossref]
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H. Kim, M. Osofsky, S. M. Prokes, O. J. Glembocki, and A. Piqué, “Optimization of Al-doped ZnO films for low loss plasmonic materials at telecommunication wavelengths,” Appl. Phys. Lett. 102(17), 171103 (2013).
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[Crossref]
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[Crossref]
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[Crossref]
V. J. Sorger, R. F. Oulton, R.-M. Ma, and X. Zhang, “Toward integrated plasmonic circuits,” MRS Bull. 37(08), 728–738 (2012).
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V. J. Sorger, Z. Ye, R. F. Oulton, Y. Wang, G. Bartal, X. Yin, and X. Zhang, “Experimental demonstration of low-loss optical waveguiding at deep sub-wavelength scales,” Nat. Commun. 2, 331 (2011).
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[Crossref]
C. Rhodes, S. Franzen, J.-P. Maria, M. Losego, D. N. Leonard, B. Laughlin, G. Duscher, and S. Weibel, “Surface plasmon resonance in conducting metal oxides,” J. Appl. Phys. 100(5), 054905 (2006).
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[Crossref]
A. Melikyan, N. Lindenmann, S. Walheim, P. M. Leufke, S. Ulrich, J. Ye, P. Vincze, H. Hahn, T. Schimmel, C. Koos, W. Freude, and J. Leuthold, “Surface plasmon polariton absorption modulator,” Opt. Express 19(9), 8855–8869 (2011).
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V. J. Sorger, N. D. Lanzillotti-Kimura, R.-M. Ma, and X. Zhang, “Ultra-compact silicon nanophotonic modulator with broadband response,” Nanophotonics 1(1), 1–6 (2012).
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V. J. Sorger, R. F. Oulton, R.-M. Ma, and X. Zhang, “Toward integrated plasmonic circuits,” MRS Bull. 37(08), 728–738 (2012).
[Crossref]
V. J. Sorger, Z. Ye, R. F. Oulton, Y. Wang, G. Bartal, X. Yin, and X. Zhang, “Experimental demonstration of low-loss optical waveguiding at deep sub-wavelength scales,” Nat. Commun. 2, 331 (2011).
[Crossref]
Z. Lu, W. Zhao, and K. Shi, “Ultracompact electroabsorption modulators based on tunable epsilon-near-zero-slot waveguides,” IEEE Photon. J. 4(3), 735–740 (2012).
[Crossref]
J. Narayan, P. Tiwari, X. Chen, J. Singh, R. Chowdhury, and T. Zheleva, “Epitaxial growth of TiN films on (100) silicon substrates by laser physical vapor deposition,” Appl. Phys. Lett. 61(11), 1290–1292 (1992).
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K. F. MacDonald and N. I. Zheludev, “Active plasmonics: current status,” Laser Photon. Rev. 4(4), 562–567 (2010).
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M. A. Noginov, L. Gu, J. Livenere, G. Zhu, A. K. Pradhan, R. Mundle, M. Bahoura, Y. A. Barnakov, and V. A. Podolskiy, “Transparent conductive oxides: plasmonic materials for telecom wavelengths,” Appl. Phys. Lett. 99(2), 021101 (2011).
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S. Zhu, G. Q. Lo, and D. L. Kwong, “Components for silicon plasmonic nanocircuits on horizontal Cu-SiO2-Si-SiO2-Cu nanoplasmonic waveguides,” Opt. Express 20, 1896–1898 (2012).
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[Crossref]
H. Kim, M. Osofsky, S. M. Prokes, O. J. Glembocki, and A. Piqué, “Optimization of Al-doped ZnO films for low loss plasmonic materials at telecommunication wavelengths,” Appl. Phys. Lett. 102(17), 171103 (2013).
[Crossref]
B. Lamprecht, J. R. Krenn, G. Schider, H. Ditlbacher, M. Salerno, N. Felidj, A. Leitner, F. R. Aussenegg, and J. C. Weeber, “Surface plasmon propagation in microscale metal stripes,” Appl. Phys. Lett. 79(1), 51–53 (2001).
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G. V. Naik and A. Boltasseva, “A comparative study of semiconductor-based plasmonic metamaterials,” Metamaterials (Amst.) 5(1), 1–7 (2011).
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