S. V. Pham, M. Dijkstra, A. J. F. Hollink, L. J. Kauppinen, R. M. de Ridder, M. Pollnau, P. V. Lambeck, and H. J. W. M. Hoekstra, “On-chip bulk index concentration and direct label-free protein sensing utilizing an optical grated-waveguide cavity,” Sens. Actuator B 174, 602–608 (2012).
[Crossref]
B. I. Akca, L. Chang, G. Sengo, K. Wörhoff, R. M. de Ridder, and M. Pollnau, “Polarization independent enhanced-resolution arrayed waveguide grating used in spectral domain optical low coherence reflectometry,” IEEE Photon. Technol. Lett. 24, 848–850 (2012).
B. Chmielak, M. Waldow, C. Matheisen, C. Ripperda, J. Bolten, T. Wahlbrink, M. Nagel, F. Merget, and H. Kurz, “Pockels effect based fully integrated, strained silicon electro-optic modulator,” Opt. Express 19(18), 17212–17219 (2011).
[Crossref]
[PubMed]
N. Ismail, L. P. Choo-Smith, K. Wörhoff, A. Driessen, A. C. Baclig, P. J. Caspers, G. J. Puppels, R. M. de Ridder, and M. Pollnau, “Raman spectroscopy with an integrated arrayed-waveguide grating,” Opt. Lett. 36(23), 4629–4631 (2011).
[Crossref]
[PubMed]
K. Watanabe, J. Schrauwen, A. Leinse, D. Van Thourhout, R. Heideman, and R. Baets, “Total reflection mirrors fabricated on silica waveguides with focused ion beam,” Electron. Lett. 45(17), 883–884 (2009).
[Crossref]
D. Resnik, D. Vrtacnik, U. Aljancic, M. Mozek, and S. Amon, “The role of triton surfactant in anisotropic etching of {110} reflective planes on (100) silicon,” J. Micromech. Microeng. 15(6), 1174–1183 (2005).
[Crossref]
D. O. Ouma, D. S. Boning, J. E. Chung, W. G. Easter, V. Saxena, S. Misra, and A. Crevasse, “Characterization and modeling of oxide chemical-mechanical polishing using planarization length and pattern density concepts,” IEEE Trans. Semicond. Manuf. 15(2), 232–244 (2002).
[Crossref]
M. V. Bazylenko, M. Gross, E. Gauja, and P. L. Chu, “Fabrication of light-turning mirrors in buried-channel silica waveguides for monolithic and hybrid integration,” J. Lightwave Technol. 15(1), 148–153 (1997).
[Crossref]
K. R. Williams and R. S. Muller, “Etch rates for micromachining processing,” J. Micromech. Syst. 5(4), 256–269 (1996).
[Crossref]
T. Suhara and H. Nishihara, “Integrated optics components and devices using periodic structures,” IEEE J. Quantum Electron. 22(6), 845–867 (1986).
[Crossref]
B. I. Akca, L. Chang, G. Sengo, K. Wörhoff, R. M. de Ridder, and M. Pollnau, “Polarization independent enhanced-resolution arrayed waveguide grating used in spectral domain optical low coherence reflectometry,” IEEE Photon. Technol. Lett. 24, 848–850 (2012).
D. Resnik, D. Vrtacnik, U. Aljancic, M. Mozek, and S. Amon, “The role of triton surfactant in anisotropic etching of {110} reflective planes on (100) silicon,” J. Micromech. Microeng. 15(6), 1174–1183 (2005).
[Crossref]
D. Resnik, D. Vrtacnik, U. Aljancic, M. Mozek, and S. Amon, “The role of triton surfactant in anisotropic etching of {110} reflective planes on (100) silicon,” J. Micromech. Microeng. 15(6), 1174–1183 (2005).
[Crossref]
N. Ismail, L. P. Choo-Smith, K. Wörhoff, A. Driessen, A. C. Baclig, P. J. Caspers, G. J. Puppels, R. M. de Ridder, and M. Pollnau, “Raman spectroscopy with an integrated arrayed-waveguide grating,” Opt. Lett. 36(23), 4629–4631 (2011).
[Crossref]
[PubMed]
K. Watanabe, J. Schrauwen, A. Leinse, D. Van Thourhout, R. Heideman, and R. Baets, “Total reflection mirrors fabricated on silica waveguides with focused ion beam,” Electron. Lett. 45(17), 883–884 (2009).
[Crossref]
M. V. Bazylenko, M. Gross, E. Gauja, and P. L. Chu, “Fabrication of light-turning mirrors in buried-channel silica waveguides for monolithic and hybrid integration,” J. Lightwave Technol. 15(1), 148–153 (1997).
[Crossref]
B. Chmielak, M. Waldow, C. Matheisen, C. Ripperda, J. Bolten, T. Wahlbrink, M. Nagel, F. Merget, and H. Kurz, “Pockels effect based fully integrated, strained silicon electro-optic modulator,” Opt. Express 19(18), 17212–17219 (2011).
[Crossref]
[PubMed]
D. O. Ouma, D. S. Boning, J. E. Chung, W. G. Easter, V. Saxena, S. Misra, and A. Crevasse, “Characterization and modeling of oxide chemical-mechanical polishing using planarization length and pattern density concepts,” IEEE Trans. Semicond. Manuf. 15(2), 232–244 (2002).
[Crossref]
N. Ismail, L. P. Choo-Smith, K. Wörhoff, A. Driessen, A. C. Baclig, P. J. Caspers, G. J. Puppels, R. M. de Ridder, and M. Pollnau, “Raman spectroscopy with an integrated arrayed-waveguide grating,” Opt. Lett. 36(23), 4629–4631 (2011).
[Crossref]
[PubMed]
B. I. Akca, L. Chang, G. Sengo, K. Wörhoff, R. M. de Ridder, and M. Pollnau, “Polarization independent enhanced-resolution arrayed waveguide grating used in spectral domain optical low coherence reflectometry,” IEEE Photon. Technol. Lett. 24, 848–850 (2012).
B. Chmielak, M. Waldow, C. Matheisen, C. Ripperda, J. Bolten, T. Wahlbrink, M. Nagel, F. Merget, and H. Kurz, “Pockels effect based fully integrated, strained silicon electro-optic modulator,” Opt. Express 19(18), 17212–17219 (2011).
[Crossref]
[PubMed]
N. Ismail, L. P. Choo-Smith, K. Wörhoff, A. Driessen, A. C. Baclig, P. J. Caspers, G. J. Puppels, R. M. de Ridder, and M. Pollnau, “Raman spectroscopy with an integrated arrayed-waveguide grating,” Opt. Lett. 36(23), 4629–4631 (2011).
[Crossref]
[PubMed]
M. V. Bazylenko, M. Gross, E. Gauja, and P. L. Chu, “Fabrication of light-turning mirrors in buried-channel silica waveguides for monolithic and hybrid integration,” J. Lightwave Technol. 15(1), 148–153 (1997).
[Crossref]
D. O. Ouma, D. S. Boning, J. E. Chung, W. G. Easter, V. Saxena, S. Misra, and A. Crevasse, “Characterization and modeling of oxide chemical-mechanical polishing using planarization length and pattern density concepts,” IEEE Trans. Semicond. Manuf. 15(2), 232–244 (2002).
[Crossref]
D. O. Ouma, D. S. Boning, J. E. Chung, W. G. Easter, V. Saxena, S. Misra, and A. Crevasse, “Characterization and modeling of oxide chemical-mechanical polishing using planarization length and pattern density concepts,” IEEE Trans. Semicond. Manuf. 15(2), 232–244 (2002).
[Crossref]
B. I. Akca, L. Chang, G. Sengo, K. Wörhoff, R. M. de Ridder, and M. Pollnau, “Polarization independent enhanced-resolution arrayed waveguide grating used in spectral domain optical low coherence reflectometry,” IEEE Photon. Technol. Lett. 24, 848–850 (2012).
S. V. Pham, M. Dijkstra, A. J. F. Hollink, L. J. Kauppinen, R. M. de Ridder, M. Pollnau, P. V. Lambeck, and H. J. W. M. Hoekstra, “On-chip bulk index concentration and direct label-free protein sensing utilizing an optical grated-waveguide cavity,” Sens. Actuator B 174, 602–608 (2012).
[Crossref]
N. Ismail, L. P. Choo-Smith, K. Wörhoff, A. Driessen, A. C. Baclig, P. J. Caspers, G. J. Puppels, R. M. de Ridder, and M. Pollnau, “Raman spectroscopy with an integrated arrayed-waveguide grating,” Opt. Lett. 36(23), 4629–4631 (2011).
[Crossref]
[PubMed]
S. V. Pham, M. Dijkstra, A. J. F. Hollink, L. J. Kauppinen, R. M. de Ridder, M. Pollnau, P. V. Lambeck, and H. J. W. M. Hoekstra, “On-chip bulk index concentration and direct label-free protein sensing utilizing an optical grated-waveguide cavity,” Sens. Actuator B 174, 602–608 (2012).
[Crossref]
N. Ismail, L. P. Choo-Smith, K. Wörhoff, A. Driessen, A. C. Baclig, P. J. Caspers, G. J. Puppels, R. M. de Ridder, and M. Pollnau, “Raman spectroscopy with an integrated arrayed-waveguide grating,” Opt. Lett. 36(23), 4629–4631 (2011).
[Crossref]
[PubMed]
K. Wörhoff, P. V. Lambeck, and A. Driessen, “Design, tolerance analysis, and fabrication of silicon oxynitride based planar optical waveguides for communication devices,” J. Lightwave Technol. 17(8), 1401–1407 (1999).
[Crossref]
D. O. Ouma, D. S. Boning, J. E. Chung, W. G. Easter, V. Saxena, S. Misra, and A. Crevasse, “Characterization and modeling of oxide chemical-mechanical polishing using planarization length and pattern density concepts,” IEEE Trans. Semicond. Manuf. 15(2), 232–244 (2002).
[Crossref]
M. V. Bazylenko, M. Gross, E. Gauja, and P. L. Chu, “Fabrication of light-turning mirrors in buried-channel silica waveguides for monolithic and hybrid integration,” J. Lightwave Technol. 15(1), 148–153 (1997).
[Crossref]
M. V. Bazylenko, M. Gross, E. Gauja, and P. L. Chu, “Fabrication of light-turning mirrors in buried-channel silica waveguides for monolithic and hybrid integration,” J. Lightwave Technol. 15(1), 148–153 (1997).
[Crossref]
K. Watanabe, J. Schrauwen, A. Leinse, D. Van Thourhout, R. Heideman, and R. Baets, “Total reflection mirrors fabricated on silica waveguides with focused ion beam,” Electron. Lett. 45(17), 883–884 (2009).
[Crossref]
S. V. Pham, M. Dijkstra, A. J. F. Hollink, L. J. Kauppinen, R. M. de Ridder, M. Pollnau, P. V. Lambeck, and H. J. W. M. Hoekstra, “On-chip bulk index concentration and direct label-free protein sensing utilizing an optical grated-waveguide cavity,” Sens. Actuator B 174, 602–608 (2012).
[Crossref]
S. V. Pham, M. Dijkstra, A. J. F. Hollink, L. J. Kauppinen, R. M. de Ridder, M. Pollnau, P. V. Lambeck, and H. J. W. M. Hoekstra, “On-chip bulk index concentration and direct label-free protein sensing utilizing an optical grated-waveguide cavity,” Sens. Actuator B 174, 602–608 (2012).
[Crossref]
N. Ismail, L. P. Choo-Smith, K. Wörhoff, A. Driessen, A. C. Baclig, P. J. Caspers, G. J. Puppels, R. M. de Ridder, and M. Pollnau, “Raman spectroscopy with an integrated arrayed-waveguide grating,” Opt. Lett. 36(23), 4629–4631 (2011).
[Crossref]
[PubMed]
S. V. Pham, M. Dijkstra, A. J. F. Hollink, L. J. Kauppinen, R. M. de Ridder, M. Pollnau, P. V. Lambeck, and H. J. W. M. Hoekstra, “On-chip bulk index concentration and direct label-free protein sensing utilizing an optical grated-waveguide cavity,” Sens. Actuator B 174, 602–608 (2012).
[Crossref]
B. Chmielak, M. Waldow, C. Matheisen, C. Ripperda, J. Bolten, T. Wahlbrink, M. Nagel, F. Merget, and H. Kurz, “Pockels effect based fully integrated, strained silicon electro-optic modulator,” Opt. Express 19(18), 17212–17219 (2011).
[Crossref]
[PubMed]
S. V. Pham, M. Dijkstra, A. J. F. Hollink, L. J. Kauppinen, R. M. de Ridder, M. Pollnau, P. V. Lambeck, and H. J. W. M. Hoekstra, “On-chip bulk index concentration and direct label-free protein sensing utilizing an optical grated-waveguide cavity,” Sens. Actuator B 174, 602–608 (2012).
[Crossref]
K. Wörhoff, P. V. Lambeck, and A. Driessen, “Design, tolerance analysis, and fabrication of silicon oxynitride based planar optical waveguides for communication devices,” J. Lightwave Technol. 17(8), 1401–1407 (1999).
[Crossref]
K. Watanabe, J. Schrauwen, A. Leinse, D. Van Thourhout, R. Heideman, and R. Baets, “Total reflection mirrors fabricated on silica waveguides with focused ion beam,” Electron. Lett. 45(17), 883–884 (2009).
[Crossref]
B. Chmielak, M. Waldow, C. Matheisen, C. Ripperda, J. Bolten, T. Wahlbrink, M. Nagel, F. Merget, and H. Kurz, “Pockels effect based fully integrated, strained silicon electro-optic modulator,” Opt. Express 19(18), 17212–17219 (2011).
[Crossref]
[PubMed]
B. Chmielak, M. Waldow, C. Matheisen, C. Ripperda, J. Bolten, T. Wahlbrink, M. Nagel, F. Merget, and H. Kurz, “Pockels effect based fully integrated, strained silicon electro-optic modulator,” Opt. Express 19(18), 17212–17219 (2011).
[Crossref]
[PubMed]
D. O. Ouma, D. S. Boning, J. E. Chung, W. G. Easter, V. Saxena, S. Misra, and A. Crevasse, “Characterization and modeling of oxide chemical-mechanical polishing using planarization length and pattern density concepts,” IEEE Trans. Semicond. Manuf. 15(2), 232–244 (2002).
[Crossref]
D. Resnik, D. Vrtacnik, U. Aljancic, M. Mozek, and S. Amon, “The role of triton surfactant in anisotropic etching of {110} reflective planes on (100) silicon,” J. Micromech. Microeng. 15(6), 1174–1183 (2005).
[Crossref]
K. R. Williams and R. S. Muller, “Etch rates for micromachining processing,” J. Micromech. Syst. 5(4), 256–269 (1996).
[Crossref]
B. Chmielak, M. Waldow, C. Matheisen, C. Ripperda, J. Bolten, T. Wahlbrink, M. Nagel, F. Merget, and H. Kurz, “Pockels effect based fully integrated, strained silicon electro-optic modulator,” Opt. Express 19(18), 17212–17219 (2011).
[Crossref]
[PubMed]
T. Suhara and H. Nishihara, “Integrated optics components and devices using periodic structures,” IEEE J. Quantum Electron. 22(6), 845–867 (1986).
[Crossref]
D. O. Ouma, D. S. Boning, J. E. Chung, W. G. Easter, V. Saxena, S. Misra, and A. Crevasse, “Characterization and modeling of oxide chemical-mechanical polishing using planarization length and pattern density concepts,” IEEE Trans. Semicond. Manuf. 15(2), 232–244 (2002).
[Crossref]
S. V. Pham, M. Dijkstra, A. J. F. Hollink, L. J. Kauppinen, R. M. de Ridder, M. Pollnau, P. V. Lambeck, and H. J. W. M. Hoekstra, “On-chip bulk index concentration and direct label-free protein sensing utilizing an optical grated-waveguide cavity,” Sens. Actuator B 174, 602–608 (2012).
[Crossref]
S. V. Pham, M. Dijkstra, A. J. F. Hollink, L. J. Kauppinen, R. M. de Ridder, M. Pollnau, P. V. Lambeck, and H. J. W. M. Hoekstra, “On-chip bulk index concentration and direct label-free protein sensing utilizing an optical grated-waveguide cavity,” Sens. Actuator B 174, 602–608 (2012).
[Crossref]
B. I. Akca, L. Chang, G. Sengo, K. Wörhoff, R. M. de Ridder, and M. Pollnau, “Polarization independent enhanced-resolution arrayed waveguide grating used in spectral domain optical low coherence reflectometry,” IEEE Photon. Technol. Lett. 24, 848–850 (2012).
N. Ismail, L. P. Choo-Smith, K. Wörhoff, A. Driessen, A. C. Baclig, P. J. Caspers, G. J. Puppels, R. M. de Ridder, and M. Pollnau, “Raman spectroscopy with an integrated arrayed-waveguide grating,” Opt. Lett. 36(23), 4629–4631 (2011).
[Crossref]
[PubMed]
N. Ismail, L. P. Choo-Smith, K. Wörhoff, A. Driessen, A. C. Baclig, P. J. Caspers, G. J. Puppels, R. M. de Ridder, and M. Pollnau, “Raman spectroscopy with an integrated arrayed-waveguide grating,” Opt. Lett. 36(23), 4629–4631 (2011).
[Crossref]
[PubMed]
D. Resnik, D. Vrtacnik, U. Aljancic, M. Mozek, and S. Amon, “The role of triton surfactant in anisotropic etching of {110} reflective planes on (100) silicon,” J. Micromech. Microeng. 15(6), 1174–1183 (2005).
[Crossref]
B. Chmielak, M. Waldow, C. Matheisen, C. Ripperda, J. Bolten, T. Wahlbrink, M. Nagel, F. Merget, and H. Kurz, “Pockels effect based fully integrated, strained silicon electro-optic modulator,” Opt. Express 19(18), 17212–17219 (2011).
[Crossref]
[PubMed]
D. O. Ouma, D. S. Boning, J. E. Chung, W. G. Easter, V. Saxena, S. Misra, and A. Crevasse, “Characterization and modeling of oxide chemical-mechanical polishing using planarization length and pattern density concepts,” IEEE Trans. Semicond. Manuf. 15(2), 232–244 (2002).
[Crossref]
K. Watanabe, J. Schrauwen, A. Leinse, D. Van Thourhout, R. Heideman, and R. Baets, “Total reflection mirrors fabricated on silica waveguides with focused ion beam,” Electron. Lett. 45(17), 883–884 (2009).
[Crossref]
B. I. Akca, L. Chang, G. Sengo, K. Wörhoff, R. M. de Ridder, and M. Pollnau, “Polarization independent enhanced-resolution arrayed waveguide grating used in spectral domain optical low coherence reflectometry,” IEEE Photon. Technol. Lett. 24, 848–850 (2012).
T. Suhara and H. Nishihara, “Integrated optics components and devices using periodic structures,” IEEE J. Quantum Electron. 22(6), 845–867 (1986).
[Crossref]
K. Watanabe, J. Schrauwen, A. Leinse, D. Van Thourhout, R. Heideman, and R. Baets, “Total reflection mirrors fabricated on silica waveguides with focused ion beam,” Electron. Lett. 45(17), 883–884 (2009).
[Crossref]
D. Resnik, D. Vrtacnik, U. Aljancic, M. Mozek, and S. Amon, “The role of triton surfactant in anisotropic etching of {110} reflective planes on (100) silicon,” J. Micromech. Microeng. 15(6), 1174–1183 (2005).
[Crossref]
B. Chmielak, M. Waldow, C. Matheisen, C. Ripperda, J. Bolten, T. Wahlbrink, M. Nagel, F. Merget, and H. Kurz, “Pockels effect based fully integrated, strained silicon electro-optic modulator,” Opt. Express 19(18), 17212–17219 (2011).
[Crossref]
[PubMed]
B. Chmielak, M. Waldow, C. Matheisen, C. Ripperda, J. Bolten, T. Wahlbrink, M. Nagel, F. Merget, and H. Kurz, “Pockels effect based fully integrated, strained silicon electro-optic modulator,” Opt. Express 19(18), 17212–17219 (2011).
[Crossref]
[PubMed]
K. Watanabe, J. Schrauwen, A. Leinse, D. Van Thourhout, R. Heideman, and R. Baets, “Total reflection mirrors fabricated on silica waveguides with focused ion beam,” Electron. Lett. 45(17), 883–884 (2009).
[Crossref]
K. R. Williams and R. S. Muller, “Etch rates for micromachining processing,” J. Micromech. Syst. 5(4), 256–269 (1996).
[Crossref]
B. I. Akca, L. Chang, G. Sengo, K. Wörhoff, R. M. de Ridder, and M. Pollnau, “Polarization independent enhanced-resolution arrayed waveguide grating used in spectral domain optical low coherence reflectometry,” IEEE Photon. Technol. Lett. 24, 848–850 (2012).
N. Ismail, L. P. Choo-Smith, K. Wörhoff, A. Driessen, A. C. Baclig, P. J. Caspers, G. J. Puppels, R. M. de Ridder, and M. Pollnau, “Raman spectroscopy with an integrated arrayed-waveguide grating,” Opt. Lett. 36(23), 4629–4631 (2011).
[Crossref]
[PubMed]
K. Wörhoff, P. V. Lambeck, and A. Driessen, “Design, tolerance analysis, and fabrication of silicon oxynitride based planar optical waveguides for communication devices,” J. Lightwave Technol. 17(8), 1401–1407 (1999).
[Crossref]
K. Watanabe, J. Schrauwen, A. Leinse, D. Van Thourhout, R. Heideman, and R. Baets, “Total reflection mirrors fabricated on silica waveguides with focused ion beam,” Electron. Lett. 45(17), 883–884 (2009).
[Crossref]
T. Suhara and H. Nishihara, “Integrated optics components and devices using periodic structures,” IEEE J. Quantum Electron. 22(6), 845–867 (1986).
[Crossref]
B. I. Akca, L. Chang, G. Sengo, K. Wörhoff, R. M. de Ridder, and M. Pollnau, “Polarization independent enhanced-resolution arrayed waveguide grating used in spectral domain optical low coherence reflectometry,” IEEE Photon. Technol. Lett. 24, 848–850 (2012).
D. O. Ouma, D. S. Boning, J. E. Chung, W. G. Easter, V. Saxena, S. Misra, and A. Crevasse, “Characterization and modeling of oxide chemical-mechanical polishing using planarization length and pattern density concepts,” IEEE Trans. Semicond. Manuf. 15(2), 232–244 (2002).
[Crossref]
K. Wörhoff, P. V. Lambeck, and A. Driessen, “Design, tolerance analysis, and fabrication of silicon oxynitride based planar optical waveguides for communication devices,” J. Lightwave Technol. 17(8), 1401–1407 (1999).
[Crossref]
M. V. Bazylenko, M. Gross, E. Gauja, and P. L. Chu, “Fabrication of light-turning mirrors in buried-channel silica waveguides for monolithic and hybrid integration,” J. Lightwave Technol. 15(1), 148–153 (1997).
[Crossref]
D. Resnik, D. Vrtacnik, U. Aljancic, M. Mozek, and S. Amon, “The role of triton surfactant in anisotropic etching of {110} reflective planes on (100) silicon,” J. Micromech. Microeng. 15(6), 1174–1183 (2005).
[Crossref]
K. R. Williams and R. S. Muller, “Etch rates for micromachining processing,” J. Micromech. Syst. 5(4), 256–269 (1996).
[Crossref]
B. Chmielak, M. Waldow, C. Matheisen, C. Ripperda, J. Bolten, T. Wahlbrink, M. Nagel, F. Merget, and H. Kurz, “Pockels effect based fully integrated, strained silicon electro-optic modulator,” Opt. Express 19(18), 17212–17219 (2011).
[Crossref]
[PubMed]
N. Ismail, L. P. Choo-Smith, K. Wörhoff, A. Driessen, A. C. Baclig, P. J. Caspers, G. J. Puppels, R. M. de Ridder, and M. Pollnau, “Raman spectroscopy with an integrated arrayed-waveguide grating,” Opt. Lett. 36(23), 4629–4631 (2011).
[Crossref]
[PubMed]
S. V. Pham, M. Dijkstra, A. J. F. Hollink, L. J. Kauppinen, R. M. de Ridder, M. Pollnau, P. V. Lambeck, and H. J. W. M. Hoekstra, “On-chip bulk index concentration and direct label-free protein sensing utilizing an optical grated-waveguide cavity,” Sens. Actuator B 174, 602–608 (2012).
[Crossref]
F. Civitci, A. Driessen, and H. J. Hoekstra, “Light turning mirrors for hybrid integration of optical waveguides in SiON technology and CMOS based photo-detectors,” in Proceedings of The European Conference on Lasers and Electro-Optics, (European Physical Society, Mulhouse, 2011), paper: CE8_2.
[Crossref]
F. Civitci, G. Sengo, M. Pollnau, A. Driessen, and W. Hoekstra, “Light Turning Mirrors in SiON Optical Waveguides for Hybrid Integration with CMOS Photo-detectors,” in Proceedings of the Annual Symposium of the IEEE Photonics Benelux Chapter, (Department of Information Technology, Ghent University, 2011), pp. 105–108.
[Crossref]
F. Civitci, G. Sengo, A. Driessen, M. Pollnau, A.-J. Annema, and H. J. W. M. Hoekstra, ” 45° light turning mirrors for hybrid integration of silica optical waveguides and photo-detectors,” in Proceedings of 16th European Conference on Integrated Optic, (Insitut de Ciències Fotòniques, Barcelona, 2012), paper: 151.
F. Sun, M. G. Hussein, K. Wörhoff, G. Sengo, and A. Driessen, “B/P doping in application of silicon oxynitride based integrated optics,” in Proceedings of The European Conference on Lasers and Electro-Optics 2009, (European Physical Society, Mulhouse, 2009), paper: CE5_1.
[Crossref]