Abstract

We report on the development of a hybrid mirror realized by integrating an EUV-reflecting multilayer coating with a lamellar grating substrate. This hybrid mirror acts as an efficient Bragg reflector for extreme ultraviolet (EUV) radiation at a given wavelength while simultaneously providing spectral-selective suppression of the specular reflectance for unwanted longer-wavelength radiation due to the grating phase-shift resonance. The test structures, designed to suppress infrared (IR) radiation, were fabricated by masked deposition of a Si grating substrate followed by coating of the grating with a Mo/Si multilayer. To give the proof of principle, we developed such a hybrid mirror for the specific case of reflecting 13.5 nm radiation while suppressing 10 μm light, resulting in 61% reflectance at the wavelength of 13.5 nm together with the 70 × suppression rate of the specular reflection at the wavelength of 10 μm, but the considered filtering principle can be used for a variety of applications that are based on utilization of broadband radiation sources.

© 2013 OSA

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  30. D. L. Voronov, P. Gawlitza, R. Cambie, S. Dhuey, E. M. Gullikson, T. Warwick, S. Braun, V. V. Yashchuk, and H. A. Padmore, “Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering,” J. Appl. Phys.111(9), 093521 (2012).
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2012 (9)

A. J. R. van den Boogaard, F. A. van Goor, E. Louis, and F. Bijkerk, “Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection,” Opt. Lett.37(2), 160–162 (2012).
[CrossRef] [PubMed]

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012).
[CrossRef]

J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, and H. Mizoguchi, “Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021111 (2012).
[CrossRef]

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE8332, 83220F, 83220F-13 (2012).
[CrossRef]

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021115 (2012).
[CrossRef]

V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, and F. Bijkerk, “Infrared antireflective filtering for extreme ultraviolet multilayer Bragg reflectors,” Opt. Lett.37(7), 1169–1171 (2012).
[CrossRef] [PubMed]

C. Mbanaso, A. Antohe, H. Bull, F. Goodwin, A. Hershcovitch, and G. Denbeaux, “Out-of-band radiation mitigation at 10.6 mm by molecular absorbers in laser-produced plasma extreme ultraviolet sources,” J. Micro/Nanolith. MEMS MOEMS11(2), 021116 (2012).
[CrossRef]

K. N. Koshelev, V. V. Ivanov, V. G. Novikov, V. Medvedev, A. S. Grushin, and V. M. Krivtsun, “RZLINE code modeling of distributed tin targets for laser-produced plasma sources of extreme ultraviolet radiation,” J. Micro/Nanolith. MEMS MOEMS11(2), 021112 (2012).
[CrossRef]

D. L. Voronov, P. Gawlitza, R. Cambie, S. Dhuey, E. M. Gullikson, T. Warwick, S. Braun, V. V. Yashchuk, and H. A. Padmore, “Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering,” J. Appl. Phys.111(9), 093521 (2012).
[CrossRef]

2011 (5)

A. J. R. van den Boogaard, E. Louis, E. Zoethout, K. A. Goldberg, and F. Bijkerk, “Characterization of Mo/Si multilayer growth on stepped topographies,” J. Vac. Sci. Technol. B29(5), 051803 (2011).
[CrossRef]

V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, and F. Bijkerk, “Infrared suppression by hybrid EUV multilayer - IR etalon structures,” Opt. Lett.36(17), 3344–3346 (2011).
[CrossRef] [PubMed]

E. Louis, A. E. Yakshin, T. Tsarfati, and F. Bijkerk, “Nanometer interface and materials control for multilayer EUV-optical applications,” Prog. Surf. Sci.86(11-12), 255–294 (2011).
[CrossRef]

V. Y. Banine, K. N. Koshelev, and G. H. P. M. Swinkels, “Physical processes in EUV sources for microlithography,” J. Phys. D Appl. Phys.44(25), 253001 (2011).
[CrossRef]

D. L. Voronov, E. H. Anderson, R. Cambie, S. Cabrini, S. D. Dhuey, L. I. Goray, E. M. Gullikson, F. Salmassi, T. Warwick, V. V. Yashchuk, and H. A. Padmore, “A 10,000 groove/mm multilayer coated grating for EUV spectroscopy,” Opt. Express19(7), 6320–6325 (2011).
[CrossRef] [PubMed]

2010 (3)

2009 (3)

A. J. R. van den Boogaard, E. Louis, F. A. van Goor, and F. Bijkerk, “Optical element for full spectral purity from IR-generated EUV light sources,” Proc. SPIE7271, 72713B, 72713B-6 (2009).
[CrossRef]

W. A. Soer, M. J. J. Jak, A. M. Yakunin, M. M. J. W. van Herpen, and V. Y. Banine, “Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources,” Proc. SPIE7271, 72712Y, 72712Y-9 (2009).
[CrossRef]

W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, M. J. J. Jak, S. Braun, P. Muys, and V. Y. Banine, “Extreme ultraviolet multilayer mirror with near-zero IR reflectance,” Opt. Lett.34(23), 3680–3682 (2009).
[CrossRef] [PubMed]

2008 (2)

2007 (1)

V. P. Belik, Y. M. Zadiranov, N. D. Il’inskaya, A. V. Korlyakov, V. V. Luchinin, M. A. Markosov, R. P. Seisyan, and E. M. Sher, “Free-standing optical filters for a nanolithography source operating in the 12-15 nm wavelength range,” Tech. Phys. Lett.33(6), 508–511 (2007).
[CrossRef]

2006 (1)

N. R. Böwering, A. I. Ershov, W. F. Marx, O. V. Khodykin, B. A. M. Hansson, E. L. Vargas, J. A. Chavez, I. V. Fomenkov, D. W. Myers, and D. C. Brandt, “EUV source collector,” Proc. SPIE6151, 61513R (2006).

2005 (1)

R. Benbalagh, J.-M. Andre, R. Barchewitz, P. Jonnard, G. Julie, L. Mollard, G. Rolland, C. Remond, P. Troussel, R. Marmoret, and E. O. Filatova, “Lamellar multilayer amplitude grating as soft-X-ray Bragg monochromator,” Nucl. Instrum. Methods Phys. Res. A541(3), 590–597 (2005).
[CrossRef]

2003 (2)

A. R. Giehl, M. Kessler, A. Grosse, N. Herhammer, and H. Fouckhardt, “Deep reactive ion etching of GaSb in Cl2/Ar-plasma discharges using single-layer soft mask technologies,” J. Micromech. Microeng.13(2), 238–245 (2003).
[CrossRef]

A. Barbara, P. Quémerais, E. Bustarret, T. López-Rios, and T. Fournier, “Electromagnetic resonances of sub-wavelength rectangular metallic gratings,” Eur. Phys. J. D23, 143–154 (2003).
[CrossRef]

2001 (1)

J.-M. André, R. Benbalagh, R. Barchewitz, M.-F. Ravet, A. Raynal, F. Delmotte, F. Bridou, G. Julie, A. Bosseboeuf, R. Laval, G. Soullié, C. Rémond, and M. Fialin, “Soft x-ray multilayer monochromator with improved resolution and low specular background,” XRay Spectrom.30, 212–215 (2001).
[CrossRef]

1986 (1)

Abe, T.

J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, and H. Mizoguchi, “Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021111 (2012).
[CrossRef]

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE8332, 83220F, 83220F-13 (2012).
[CrossRef]

Ahmad, I.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012).
[CrossRef]

Ahn, M.

Anderson, E. H.

Andre, J.-M.

R. Benbalagh, J.-M. Andre, R. Barchewitz, P. Jonnard, G. Julie, L. Mollard, G. Rolland, C. Remond, P. Troussel, R. Marmoret, and E. O. Filatova, “Lamellar multilayer amplitude grating as soft-X-ray Bragg monochromator,” Nucl. Instrum. Methods Phys. Res. A541(3), 590–597 (2005).
[CrossRef]

André, J.-M.

J.-M. André, R. Benbalagh, R. Barchewitz, M.-F. Ravet, A. Raynal, F. Delmotte, F. Bridou, G. Julie, A. Bosseboeuf, R. Laval, G. Soullié, C. Rémond, and M. Fialin, “Soft x-ray multilayer monochromator with improved resolution and low specular background,” XRay Spectrom.30, 212–215 (2001).
[CrossRef]

Antohe, A.

C. Mbanaso, A. Antohe, H. Bull, F. Goodwin, A. Hershcovitch, and G. Denbeaux, “Out-of-band radiation mitigation at 10.6 mm by molecular absorbers in laser-produced plasma extreme ultraviolet sources,” J. Micro/Nanolith. MEMS MOEMS11(2), 021116 (2012).
[CrossRef]

Banine, V.

Banine, V. E.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021115 (2012).
[CrossRef]

Banine, V. Y.

V. Y. Banine, K. N. Koshelev, and G. H. P. M. Swinkels, “Physical processes in EUV sources for microlithography,” J. Phys. D Appl. Phys.44(25), 253001 (2011).
[CrossRef]

W. A. Soer, M. J. J. Jak, A. M. Yakunin, M. M. J. W. van Herpen, and V. Y. Banine, “Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources,” Proc. SPIE7271, 72712Y, 72712Y-9 (2009).
[CrossRef]

W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, M. J. J. Jak, S. Braun, P. Muys, and V. Y. Banine, “Extreme ultraviolet multilayer mirror with near-zero IR reflectance,” Opt. Lett.34(23), 3680–3682 (2009).
[CrossRef] [PubMed]

Barbara, A.

A. Barbara, P. Quémerais, E. Bustarret, T. López-Rios, and T. Fournier, “Electromagnetic resonances of sub-wavelength rectangular metallic gratings,” Eur. Phys. J. D23, 143–154 (2003).
[CrossRef]

Barchewitz, R.

R. Benbalagh, J.-M. Andre, R. Barchewitz, P. Jonnard, G. Julie, L. Mollard, G. Rolland, C. Remond, P. Troussel, R. Marmoret, and E. O. Filatova, “Lamellar multilayer amplitude grating as soft-X-ray Bragg monochromator,” Nucl. Instrum. Methods Phys. Res. A541(3), 590–597 (2005).
[CrossRef]

J.-M. André, R. Benbalagh, R. Barchewitz, M.-F. Ravet, A. Raynal, F. Delmotte, F. Bridou, G. Julie, A. Bosseboeuf, R. Laval, G. Soullié, C. Rémond, and M. Fialin, “Soft x-ray multilayer monochromator with improved resolution and low specular background,” XRay Spectrom.30, 212–215 (2001).
[CrossRef]

Bastiaens, H. M. J.

Baumgart, P.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012).
[CrossRef]

Belik, V. P.

V. P. Belik, Y. M. Zadiranov, N. D. Il’inskaya, A. V. Korlyakov, V. V. Luchinin, M. A. Markosov, R. P. Seisyan, and E. M. Sher, “Free-standing optical filters for a nanolithography source operating in the 12-15 nm wavelength range,” Tech. Phys. Lett.33(6), 508–511 (2007).
[CrossRef]

Benbalagh, R.

R. Benbalagh, J.-M. Andre, R. Barchewitz, P. Jonnard, G. Julie, L. Mollard, G. Rolland, C. Remond, P. Troussel, R. Marmoret, and E. O. Filatova, “Lamellar multilayer amplitude grating as soft-X-ray Bragg monochromator,” Nucl. Instrum. Methods Phys. Res. A541(3), 590–597 (2005).
[CrossRef]

J.-M. André, R. Benbalagh, R. Barchewitz, M.-F. Ravet, A. Raynal, F. Delmotte, F. Bridou, G. Julie, A. Bosseboeuf, R. Laval, G. Soullié, C. Rémond, and M. Fialin, “Soft x-ray multilayer monochromator with improved resolution and low specular background,” XRay Spectrom.30, 212–215 (2001).
[CrossRef]

Benschop, J.

J. Benschop, V. Banine, S. Lok, and E. Loopstra, “Extreme ultraviolet lithography: status and prospects,” J. Vac. Sci. Technol. B26(6), 2204–2207 (2008).
[CrossRef]

Bijkerk, F.

A. J. R. van den Boogaard, F. A. van Goor, E. Louis, and F. Bijkerk, “Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection,” Opt. Lett.37(2), 160–162 (2012).
[CrossRef] [PubMed]

V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, and F. Bijkerk, “Infrared antireflective filtering for extreme ultraviolet multilayer Bragg reflectors,” Opt. Lett.37(7), 1169–1171 (2012).
[CrossRef] [PubMed]

E. Louis, A. E. Yakshin, T. Tsarfati, and F. Bijkerk, “Nanometer interface and materials control for multilayer EUV-optical applications,” Prog. Surf. Sci.86(11-12), 255–294 (2011).
[CrossRef]

A. J. R. van den Boogaard, E. Louis, E. Zoethout, K. A. Goldberg, and F. Bijkerk, “Characterization of Mo/Si multilayer growth on stepped topographies,” J. Vac. Sci. Technol. B29(5), 051803 (2011).
[CrossRef]

V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, and F. Bijkerk, “Infrared suppression by hybrid EUV multilayer - IR etalon structures,” Opt. Lett.36(17), 3344–3346 (2011).
[CrossRef] [PubMed]

I. V. Kozhevnikov, R. van der Meer, H. M. J. Bastiaens, K. J. Boller, and F. Bijkerk, “High-resolution, high-reflectivity operation of lamellar multilayer amplitude gratings: identification of the single-order regime,” Opt. Express18(15), 16234–16242 (2010).
[CrossRef] [PubMed]

A. J. R. van den Boogaard, E. Louis, E. Zoethout, S. Müllender, and F. Bijkerk, “Surface morphology of Kr+-polished amorphous Si layers,” J. Vac. Sci. Technol. A28(4), 552 (2010).
[CrossRef]

A. J. R. van den Boogaard, E. Louis, F. A. van Goor, and F. Bijkerk, “Optical element for full spectral purity from IR-generated EUV light sources,” Proc. SPIE7271, 72713B, 72713B-6 (2009).
[CrossRef]

M. M. J. W. van Herpen, R. W. E. van de Kruijs, D. J. W. Klunder, E. Louis, A. E. Yakshin, S. A. van der Westen, F. Bijkerk, and V. Banine, “Spectral-purity-enhancing layer for multilayer mirrors,” Opt. Lett.33(6), 560–562 (2008).
[CrossRef] [PubMed]

Boller, K. J.

Bosseboeuf, A.

J.-M. André, R. Benbalagh, R. Barchewitz, M.-F. Ravet, A. Raynal, F. Delmotte, F. Bridou, G. Julie, A. Bosseboeuf, R. Laval, G. Soullié, C. Rémond, and M. Fialin, “Soft x-ray multilayer monochromator with improved resolution and low specular background,” XRay Spectrom.30, 212–215 (2001).
[CrossRef]

Böwering, N. R.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012).
[CrossRef]

N. R. Böwering, A. I. Ershov, W. F. Marx, O. V. Khodykin, B. A. M. Hansson, E. L. Vargas, J. A. Chavez, I. V. Fomenkov, D. W. Myers, and D. C. Brandt, “EUV source collector,” Proc. SPIE6151, 61513R (2006).

Brandt, D. C.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012).
[CrossRef]

N. R. Böwering, A. I. Ershov, W. F. Marx, O. V. Khodykin, B. A. M. Hansson, E. L. Vargas, J. A. Chavez, I. V. Fomenkov, D. W. Myers, and D. C. Brandt, “EUV source collector,” Proc. SPIE6151, 61513R (2006).

Braun, S.

D. L. Voronov, P. Gawlitza, R. Cambie, S. Dhuey, E. M. Gullikson, T. Warwick, S. Braun, V. V. Yashchuk, and H. A. Padmore, “Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering,” J. Appl. Phys.111(9), 093521 (2012).
[CrossRef]

W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, M. J. J. Jak, S. Braun, P. Muys, and V. Y. Banine, “Extreme ultraviolet multilayer mirror with near-zero IR reflectance,” Opt. Lett.34(23), 3680–3682 (2009).
[CrossRef] [PubMed]

Bridou, F.

J.-M. André, R. Benbalagh, R. Barchewitz, M.-F. Ravet, A. Raynal, F. Delmotte, F. Bridou, G. Julie, A. Bosseboeuf, R. Laval, G. Soullié, C. Rémond, and M. Fialin, “Soft x-ray multilayer monochromator with improved resolution and low specular background,” XRay Spectrom.30, 212–215 (2001).
[CrossRef]

Brown, D.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012).
[CrossRef]

Bull, H.

C. Mbanaso, A. Antohe, H. Bull, F. Goodwin, A. Hershcovitch, and G. Denbeaux, “Out-of-band radiation mitigation at 10.6 mm by molecular absorbers in laser-produced plasma extreme ultraviolet sources,” J. Micro/Nanolith. MEMS MOEMS11(2), 021116 (2012).
[CrossRef]

Bustarret, E.

A. Barbara, P. Quémerais, E. Bustarret, T. López-Rios, and T. Fournier, “Electromagnetic resonances of sub-wavelength rectangular metallic gratings,” Eur. Phys. J. D23, 143–154 (2003).
[CrossRef]

Bykanov, A. N.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012).
[CrossRef]

Cabrini, S.

Cambie, R.

Chang, C.-H.

Chavez, J. A.

N. R. Böwering, A. I. Ershov, W. F. Marx, O. V. Khodykin, B. A. M. Hansson, E. L. Vargas, J. A. Chavez, I. V. Fomenkov, D. W. Myers, and D. C. Brandt, “EUV source collector,” Proc. SPIE6151, 61513R (2006).

Chkhalo, N. I.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021115 (2012).
[CrossRef]

De Dea, S.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012).
[CrossRef]

Delmotte, F.

J.-M. André, R. Benbalagh, R. Barchewitz, M.-F. Ravet, A. Raynal, F. Delmotte, F. Bridou, G. Julie, A. Bosseboeuf, R. Laval, G. Soullié, C. Rémond, and M. Fialin, “Soft x-ray multilayer monochromator with improved resolution and low specular background,” XRay Spectrom.30, 212–215 (2001).
[CrossRef]

Denbeaux, G.

C. Mbanaso, A. Antohe, H. Bull, F. Goodwin, A. Hershcovitch, and G. Denbeaux, “Out-of-band radiation mitigation at 10.6 mm by molecular absorbers in laser-produced plasma extreme ultraviolet sources,” J. Micro/Nanolith. MEMS MOEMS11(2), 021116 (2012).
[CrossRef]

Dhuey, S.

D. L. Voronov, P. Gawlitza, R. Cambie, S. Dhuey, E. M. Gullikson, T. Warwick, S. Braun, V. V. Yashchuk, and H. A. Padmore, “Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering,” J. Appl. Phys.111(9), 093521 (2012).
[CrossRef]

Dhuey, S. D.

Drozdov, M. N.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021115 (2012).
[CrossRef]

Ershov, A. I.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012).
[CrossRef]

N. R. Böwering, A. I. Ershov, W. F. Marx, O. V. Khodykin, B. A. M. Hansson, E. L. Vargas, J. A. Chavez, I. V. Fomenkov, D. W. Myers, and D. C. Brandt, “EUV source collector,” Proc. SPIE6151, 61513R (2006).

Farrar, N. R.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012).
[CrossRef]

Fialin, M.

J.-M. André, R. Benbalagh, R. Barchewitz, M.-F. Ravet, A. Raynal, F. Delmotte, F. Bridou, G. Julie, A. Bosseboeuf, R. Laval, G. Soullié, C. Rémond, and M. Fialin, “Soft x-ray multilayer monochromator with improved resolution and low specular background,” XRay Spectrom.30, 212–215 (2001).
[CrossRef]

Filatova, E. O.

R. Benbalagh, J.-M. Andre, R. Barchewitz, P. Jonnard, G. Julie, L. Mollard, G. Rolland, C. Remond, P. Troussel, R. Marmoret, and E. O. Filatova, “Lamellar multilayer amplitude grating as soft-X-ray Bragg monochromator,” Nucl. Instrum. Methods Phys. Res. A541(3), 590–597 (2005).
[CrossRef]

Fomenkov, I. V.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012).
[CrossRef]

N. R. Böwering, A. I. Ershov, W. F. Marx, O. V. Khodykin, B. A. M. Hansson, E. L. Vargas, J. A. Chavez, I. V. Fomenkov, D. W. Myers, and D. C. Brandt, “EUV source collector,” Proc. SPIE6151, 61513R (2006).

Fouckhardt, H.

A. R. Giehl, M. Kessler, A. Grosse, N. Herhammer, and H. Fouckhardt, “Deep reactive ion etching of GaSb in Cl2/Ar-plasma discharges using single-layer soft mask technologies,” J. Micromech. Microeng.13(2), 238–245 (2003).
[CrossRef]

Fournier, T.

A. Barbara, P. Quémerais, E. Bustarret, T. López-Rios, and T. Fournier, “Electromagnetic resonances of sub-wavelength rectangular metallic gratings,” Eur. Phys. J. D23, 143–154 (2003).
[CrossRef]

Fujimoto, J.

J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, and H. Mizoguchi, “Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021111 (2012).
[CrossRef]

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE8332, 83220F, 83220F-13 (2012).
[CrossRef]

Gawlitza, P.

D. L. Voronov, P. Gawlitza, R. Cambie, S. Dhuey, E. M. Gullikson, T. Warwick, S. Braun, V. V. Yashchuk, and H. A. Padmore, “Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering,” J. Appl. Phys.111(9), 093521 (2012).
[CrossRef]

W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, M. J. J. Jak, S. Braun, P. Muys, and V. Y. Banine, “Extreme ultraviolet multilayer mirror with near-zero IR reflectance,” Opt. Lett.34(23), 3680–3682 (2009).
[CrossRef] [PubMed]

Gaylord, T. K.

Giehl, A. R.

A. R. Giehl, M. Kessler, A. Grosse, N. Herhammer, and H. Fouckhardt, “Deep reactive ion etching of GaSb in Cl2/Ar-plasma discharges using single-layer soft mask technologies,” J. Micromech. Microeng.13(2), 238–245 (2003).
[CrossRef]

Goldberg, K. A.

A. J. R. van den Boogaard, E. Louis, E. Zoethout, K. A. Goldberg, and F. Bijkerk, “Characterization of Mo/Si multilayer growth on stepped topographies,” J. Vac. Sci. Technol. B29(5), 051803 (2011).
[CrossRef]

Golich, D. J.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012).
[CrossRef]

Goodwin, F.

C. Mbanaso, A. Antohe, H. Bull, F. Goodwin, A. Hershcovitch, and G. Denbeaux, “Out-of-band radiation mitigation at 10.6 mm by molecular absorbers in laser-produced plasma extreme ultraviolet sources,” J. Micro/Nanolith. MEMS MOEMS11(2), 021116 (2012).
[CrossRef]

Goray, L. I.

Grosse, A.

A. R. Giehl, M. Kessler, A. Grosse, N. Herhammer, and H. Fouckhardt, “Deep reactive ion etching of GaSb in Cl2/Ar-plasma discharges using single-layer soft mask technologies,” J. Micromech. Microeng.13(2), 238–245 (2003).
[CrossRef]

Grushin, A. S.

K. N. Koshelev, V. V. Ivanov, V. G. Novikov, V. Medvedev, A. S. Grushin, and V. M. Krivtsun, “RZLINE code modeling of distributed tin targets for laser-produced plasma sources of extreme ultraviolet radiation,” J. Micro/Nanolith. MEMS MOEMS11(2), 021112 (2012).
[CrossRef]

Gullikson, E. M.

Hansson, B. A. M.

N. R. Böwering, A. I. Ershov, W. F. Marx, O. V. Khodykin, B. A. M. Hansson, E. L. Vargas, J. A. Chavez, I. V. Fomenkov, D. W. Myers, and D. C. Brandt, “EUV source collector,” Proc. SPIE6151, 61513R (2006).

Heilmann, R. K.

Herhammer, N.

A. R. Giehl, M. Kessler, A. Grosse, N. Herhammer, and H. Fouckhardt, “Deep reactive ion etching of GaSb in Cl2/Ar-plasma discharges using single-layer soft mask technologies,” J. Micromech. Microeng.13(2), 238–245 (2003).
[CrossRef]

Hershcovitch, A.

C. Mbanaso, A. Antohe, H. Bull, F. Goodwin, A. Hershcovitch, and G. Denbeaux, “Out-of-band radiation mitigation at 10.6 mm by molecular absorbers in laser-produced plasma extreme ultraviolet sources,” J. Micro/Nanolith. MEMS MOEMS11(2), 021116 (2012).
[CrossRef]

Hori, T.

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE8332, 83220F, 83220F-13 (2012).
[CrossRef]

J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, and H. Mizoguchi, “Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021111 (2012).
[CrossRef]

Il’inskaya, N. D.

V. P. Belik, Y. M. Zadiranov, N. D. Il’inskaya, A. V. Korlyakov, V. V. Luchinin, M. A. Markosov, R. P. Seisyan, and E. M. Sher, “Free-standing optical filters for a nanolithography source operating in the 12-15 nm wavelength range,” Tech. Phys. Lett.33(6), 508–511 (2007).
[CrossRef]

Ivanov, V. V.

K. N. Koshelev, V. V. Ivanov, V. G. Novikov, V. Medvedev, A. S. Grushin, and V. M. Krivtsun, “RZLINE code modeling of distributed tin targets for laser-produced plasma sources of extreme ultraviolet radiation,” J. Micro/Nanolith. MEMS MOEMS11(2), 021112 (2012).
[CrossRef]

Jak, M. J. J.

W. A. Soer, M. J. J. Jak, A. M. Yakunin, M. M. J. W. van Herpen, and V. Y. Banine, “Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources,” Proc. SPIE7271, 72712Y, 72712Y-9 (2009).
[CrossRef]

W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, M. J. J. Jak, S. Braun, P. Muys, and V. Y. Banine, “Extreme ultraviolet multilayer mirror with near-zero IR reflectance,” Opt. Lett.34(23), 3680–3682 (2009).
[CrossRef] [PubMed]

Jonnard, P.

R. Benbalagh, J.-M. Andre, R. Barchewitz, P. Jonnard, G. Julie, L. Mollard, G. Rolland, C. Remond, P. Troussel, R. Marmoret, and E. O. Filatova, “Lamellar multilayer amplitude grating as soft-X-ray Bragg monochromator,” Nucl. Instrum. Methods Phys. Res. A541(3), 590–597 (2005).
[CrossRef]

Julie, G.

R. Benbalagh, J.-M. Andre, R. Barchewitz, P. Jonnard, G. Julie, L. Mollard, G. Rolland, C. Remond, P. Troussel, R. Marmoret, and E. O. Filatova, “Lamellar multilayer amplitude grating as soft-X-ray Bragg monochromator,” Nucl. Instrum. Methods Phys. Res. A541(3), 590–597 (2005).
[CrossRef]

J.-M. André, R. Benbalagh, R. Barchewitz, M.-F. Ravet, A. Raynal, F. Delmotte, F. Bridou, G. Julie, A. Bosseboeuf, R. Laval, G. Soullié, C. Rémond, and M. Fialin, “Soft x-ray multilayer monochromator with improved resolution and low specular background,” XRay Spectrom.30, 212–215 (2001).
[CrossRef]

Kawasuji, Y.

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE8332, 83220F, 83220F-13 (2012).
[CrossRef]

Kessler, M.

A. R. Giehl, M. Kessler, A. Grosse, N. Herhammer, and H. Fouckhardt, “Deep reactive ion etching of GaSb in Cl2/Ar-plasma discharges using single-layer soft mask technologies,” J. Micromech. Microeng.13(2), 238–245 (2003).
[CrossRef]

Khodykin, O. V.

N. R. Böwering, A. I. Ershov, W. F. Marx, O. V. Khodykin, B. A. M. Hansson, E. L. Vargas, J. A. Chavez, I. V. Fomenkov, D. W. Myers, and D. C. Brandt, “EUV source collector,” Proc. SPIE6151, 61513R (2006).

Kluenkov, E. B.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021115 (2012).
[CrossRef]

Klunder, D. J. W.

Kodama, T.

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE8332, 83220F, 83220F-13 (2012).
[CrossRef]

Korlyakov, A. V.

V. P. Belik, Y. M. Zadiranov, N. D. Il’inskaya, A. V. Korlyakov, V. V. Luchinin, M. A. Markosov, R. P. Seisyan, and E. M. Sher, “Free-standing optical filters for a nanolithography source operating in the 12-15 nm wavelength range,” Tech. Phys. Lett.33(6), 508–511 (2007).
[CrossRef]

Koshelev, K. N.

K. N. Koshelev, V. V. Ivanov, V. G. Novikov, V. Medvedev, A. S. Grushin, and V. M. Krivtsun, “RZLINE code modeling of distributed tin targets for laser-produced plasma sources of extreme ultraviolet radiation,” J. Micro/Nanolith. MEMS MOEMS11(2), 021112 (2012).
[CrossRef]

V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, and F. Bijkerk, “Infrared antireflective filtering for extreme ultraviolet multilayer Bragg reflectors,” Opt. Lett.37(7), 1169–1171 (2012).
[CrossRef] [PubMed]

V. Y. Banine, K. N. Koshelev, and G. H. P. M. Swinkels, “Physical processes in EUV sources for microlithography,” J. Phys. D Appl. Phys.44(25), 253001 (2011).
[CrossRef]

V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, and F. Bijkerk, “Infrared suppression by hybrid EUV multilayer - IR etalon structures,” Opt. Lett.36(17), 3344–3346 (2011).
[CrossRef] [PubMed]

Kozhevnikov, I. V.

Krivtsun, V. M.

La Fontaine, B.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012).
[CrossRef]

Laval, R.

J.-M. André, R. Benbalagh, R. Barchewitz, M.-F. Ravet, A. Raynal, F. Delmotte, F. Bridou, G. Julie, A. Bosseboeuf, R. Laval, G. Soullié, C. Rémond, and M. Fialin, “Soft x-ray multilayer monochromator with improved resolution and low specular background,” XRay Spectrom.30, 212–215 (2001).
[CrossRef]

Lercel, M. J.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012).
[CrossRef]

Lok, S.

J. Benschop, V. Banine, S. Lok, and E. Loopstra, “Extreme ultraviolet lithography: status and prospects,” J. Vac. Sci. Technol. B26(6), 2204–2207 (2008).
[CrossRef]

Loopstra, E.

J. Benschop, V. Banine, S. Lok, and E. Loopstra, “Extreme ultraviolet lithography: status and prospects,” J. Vac. Sci. Technol. B26(6), 2204–2207 (2008).
[CrossRef]

Lopatin, A. Y.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021115 (2012).
[CrossRef]

López-Rios, T.

A. Barbara, P. Quémerais, E. Bustarret, T. López-Rios, and T. Fournier, “Electromagnetic resonances of sub-wavelength rectangular metallic gratings,” Eur. Phys. J. D23, 143–154 (2003).
[CrossRef]

Louis, E.

A. J. R. van den Boogaard, F. A. van Goor, E. Louis, and F. Bijkerk, “Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection,” Opt. Lett.37(2), 160–162 (2012).
[CrossRef] [PubMed]

E. Louis, A. E. Yakshin, T. Tsarfati, and F. Bijkerk, “Nanometer interface and materials control for multilayer EUV-optical applications,” Prog. Surf. Sci.86(11-12), 255–294 (2011).
[CrossRef]

A. J. R. van den Boogaard, E. Louis, E. Zoethout, K. A. Goldberg, and F. Bijkerk, “Characterization of Mo/Si multilayer growth on stepped topographies,” J. Vac. Sci. Technol. B29(5), 051803 (2011).
[CrossRef]

A. J. R. van den Boogaard, E. Louis, E. Zoethout, S. Müllender, and F. Bijkerk, “Surface morphology of Kr+-polished amorphous Si layers,” J. Vac. Sci. Technol. A28(4), 552 (2010).
[CrossRef]

A. J. R. van den Boogaard, E. Louis, F. A. van Goor, and F. Bijkerk, “Optical element for full spectral purity from IR-generated EUV light sources,” Proc. SPIE7271, 72713B, 72713B-6 (2009).
[CrossRef]

M. M. J. W. van Herpen, R. W. E. van de Kruijs, D. J. W. Klunder, E. Louis, A. E. Yakshin, S. A. van der Westen, F. Bijkerk, and V. Banine, “Spectral-purity-enhancing layer for multilayer mirrors,” Opt. Lett.33(6), 560–562 (2008).
[CrossRef] [PubMed]

Luchin, V. I.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021115 (2012).
[CrossRef]

Luchinin, V. V.

V. P. Belik, Y. M. Zadiranov, N. D. Il’inskaya, A. V. Korlyakov, V. V. Luchinin, M. A. Markosov, R. P. Seisyan, and E. M. Sher, “Free-standing optical filters for a nanolithography source operating in the 12-15 nm wavelength range,” Tech. Phys. Lett.33(6), 508–511 (2007).
[CrossRef]

Markosov, M. A.

V. P. Belik, Y. M. Zadiranov, N. D. Il’inskaya, A. V. Korlyakov, V. V. Luchinin, M. A. Markosov, R. P. Seisyan, and E. M. Sher, “Free-standing optical filters for a nanolithography source operating in the 12-15 nm wavelength range,” Tech. Phys. Lett.33(6), 508–511 (2007).
[CrossRef]

Marmoret, R.

R. Benbalagh, J.-M. Andre, R. Barchewitz, P. Jonnard, G. Julie, L. Mollard, G. Rolland, C. Remond, P. Troussel, R. Marmoret, and E. O. Filatova, “Lamellar multilayer amplitude grating as soft-X-ray Bragg monochromator,” Nucl. Instrum. Methods Phys. Res. A541(3), 590–597 (2005).
[CrossRef]

Marx, W. F.

N. R. Böwering, A. I. Ershov, W. F. Marx, O. V. Khodykin, B. A. M. Hansson, E. L. Vargas, J. A. Chavez, I. V. Fomenkov, D. W. Myers, and D. C. Brandt, “EUV source collector,” Proc. SPIE6151, 61513R (2006).

Mbanaso, C.

C. Mbanaso, A. Antohe, H. Bull, F. Goodwin, A. Hershcovitch, and G. Denbeaux, “Out-of-band radiation mitigation at 10.6 mm by molecular absorbers in laser-produced plasma extreme ultraviolet sources,” J. Micro/Nanolith. MEMS MOEMS11(2), 021116 (2012).
[CrossRef]

Medvedev, V.

K. N. Koshelev, V. V. Ivanov, V. G. Novikov, V. Medvedev, A. S. Grushin, and V. M. Krivtsun, “RZLINE code modeling of distributed tin targets for laser-produced plasma sources of extreme ultraviolet radiation,” J. Micro/Nanolith. MEMS MOEMS11(2), 021112 (2012).
[CrossRef]

Medvedev, V. V.

Mizoguchi, H.

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE8332, 83220F, 83220F-13 (2012).
[CrossRef]

J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, and H. Mizoguchi, “Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021111 (2012).
[CrossRef]

Moharam, M. G.

Mollard, L.

R. Benbalagh, J.-M. Andre, R. Barchewitz, P. Jonnard, G. Julie, L. Mollard, G. Rolland, C. Remond, P. Troussel, R. Marmoret, and E. O. Filatova, “Lamellar multilayer amplitude grating as soft-X-ray Bragg monochromator,” Nucl. Instrum. Methods Phys. Res. A541(3), 590–597 (2005).
[CrossRef]

Müllender, S.

A. J. R. van den Boogaard, E. Louis, E. Zoethout, S. Müllender, and F. Bijkerk, “Surface morphology of Kr+-polished amorphous Si layers,” J. Vac. Sci. Technol. A28(4), 552 (2010).
[CrossRef]

Muys, P.

Myers, D. W.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012).
[CrossRef]

N. R. Böwering, A. I. Ershov, W. F. Marx, O. V. Khodykin, B. A. M. Hansson, E. L. Vargas, J. A. Chavez, I. V. Fomenkov, D. W. Myers, and D. C. Brandt, “EUV source collector,” Proc. SPIE6151, 61513R (2006).

Nakarai, H.

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE8332, 83220F, 83220F-13 (2012).
[CrossRef]

J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, and H. Mizoguchi, “Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021111 (2012).
[CrossRef]

Novikov, V. G.

K. N. Koshelev, V. V. Ivanov, V. G. Novikov, V. Medvedev, A. S. Grushin, and V. M. Krivtsun, “RZLINE code modeling of distributed tin targets for laser-produced plasma sources of extreme ultraviolet radiation,” J. Micro/Nanolith. MEMS MOEMS11(2), 021112 (2012).
[CrossRef]

Ohta, T.

J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, and H. Mizoguchi, “Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021111 (2012).
[CrossRef]

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE8332, 83220F, 83220F-13 (2012).
[CrossRef]

Padmore, H. A.

Quémerais, P.

A. Barbara, P. Quémerais, E. Bustarret, T. López-Rios, and T. Fournier, “Electromagnetic resonances of sub-wavelength rectangular metallic gratings,” Eur. Phys. J. D23, 143–154 (2003).
[CrossRef]

Rajyaguru, C.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012).
[CrossRef]

Ravet, M.-F.

J.-M. André, R. Benbalagh, R. Barchewitz, M.-F. Ravet, A. Raynal, F. Delmotte, F. Bridou, G. Julie, A. Bosseboeuf, R. Laval, G. Soullié, C. Rémond, and M. Fialin, “Soft x-ray multilayer monochromator with improved resolution and low specular background,” XRay Spectrom.30, 212–215 (2001).
[CrossRef]

Raynal, A.

J.-M. André, R. Benbalagh, R. Barchewitz, M.-F. Ravet, A. Raynal, F. Delmotte, F. Bridou, G. Julie, A. Bosseboeuf, R. Laval, G. Soullié, C. Rémond, and M. Fialin, “Soft x-ray multilayer monochromator with improved resolution and low specular background,” XRay Spectrom.30, 212–215 (2001).
[CrossRef]

Remond, C.

R. Benbalagh, J.-M. Andre, R. Barchewitz, P. Jonnard, G. Julie, L. Mollard, G. Rolland, C. Remond, P. Troussel, R. Marmoret, and E. O. Filatova, “Lamellar multilayer amplitude grating as soft-X-ray Bragg monochromator,” Nucl. Instrum. Methods Phys. Res. A541(3), 590–597 (2005).
[CrossRef]

Rémond, C.

J.-M. André, R. Benbalagh, R. Barchewitz, M.-F. Ravet, A. Raynal, F. Delmotte, F. Bridou, G. Julie, A. Bosseboeuf, R. Laval, G. Soullié, C. Rémond, and M. Fialin, “Soft x-ray multilayer monochromator with improved resolution and low specular background,” XRay Spectrom.30, 212–215 (2001).
[CrossRef]

Rolland, G.

R. Benbalagh, J.-M. Andre, R. Barchewitz, P. Jonnard, G. Julie, L. Mollard, G. Rolland, C. Remond, P. Troussel, R. Marmoret, and E. O. Filatova, “Lamellar multilayer amplitude grating as soft-X-ray Bragg monochromator,” Nucl. Instrum. Methods Phys. Res. A541(3), 590–597 (2005).
[CrossRef]

Salashchenko, N. N.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021115 (2012).
[CrossRef]

Salmassi, F.

Schattenburg, M. L.

Seisyan, R. P.

V. P. Belik, Y. M. Zadiranov, N. D. Il’inskaya, A. V. Korlyakov, V. V. Luchinin, M. A. Markosov, R. P. Seisyan, and E. M. Sher, “Free-standing optical filters for a nanolithography source operating in the 12-15 nm wavelength range,” Tech. Phys. Lett.33(6), 508–511 (2007).
[CrossRef]

Sher, E. M.

V. P. Belik, Y. M. Zadiranov, N. D. Il’inskaya, A. V. Korlyakov, V. V. Luchinin, M. A. Markosov, R. P. Seisyan, and E. M. Sher, “Free-standing optical filters for a nanolithography source operating in the 12-15 nm wavelength range,” Tech. Phys. Lett.33(6), 508–511 (2007).
[CrossRef]

Shiraishi, Y.

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE8332, 83220F, 83220F-13 (2012).
[CrossRef]

Sjmaenok, L. A.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021115 (2012).
[CrossRef]

Soer, W. A.

W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, M. J. J. Jak, S. Braun, P. Muys, and V. Y. Banine, “Extreme ultraviolet multilayer mirror with near-zero IR reflectance,” Opt. Lett.34(23), 3680–3682 (2009).
[CrossRef] [PubMed]

W. A. Soer, M. J. J. Jak, A. M. Yakunin, M. M. J. W. van Herpen, and V. Y. Banine, “Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources,” Proc. SPIE7271, 72712Y, 72712Y-9 (2009).
[CrossRef]

Soullié, G.

J.-M. André, R. Benbalagh, R. Barchewitz, M.-F. Ravet, A. Raynal, F. Delmotte, F. Bridou, G. Julie, A. Bosseboeuf, R. Laval, G. Soullié, C. Rémond, and M. Fialin, “Soft x-ray multilayer monochromator with improved resolution and low specular background,” XRay Spectrom.30, 212–215 (2001).
[CrossRef]

Srivastava, S. N.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012).
[CrossRef]

Swinkels, G. H. P. M.

V. Y. Banine, K. N. Koshelev, and G. H. P. M. Swinkels, “Physical processes in EUV sources for microlithography,” J. Phys. D Appl. Phys.44(25), 253001 (2011).
[CrossRef]

Tanaka, S.

J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, and H. Mizoguchi, “Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021111 (2012).
[CrossRef]

Tao, Y.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012).
[CrossRef]

Troussel, P.

R. Benbalagh, J.-M. Andre, R. Barchewitz, P. Jonnard, G. Julie, L. Mollard, G. Rolland, C. Remond, P. Troussel, R. Marmoret, and E. O. Filatova, “Lamellar multilayer amplitude grating as soft-X-ray Bragg monochromator,” Nucl. Instrum. Methods Phys. Res. A541(3), 590–597 (2005).
[CrossRef]

Tsarfati, T.

E. Louis, A. E. Yakshin, T. Tsarfati, and F. Bijkerk, “Nanometer interface and materials control for multilayer EUV-optical applications,” Prog. Surf. Sci.86(11-12), 255–294 (2011).
[CrossRef]

Tsybin, N. N.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021115 (2012).
[CrossRef]

van de Kruijs, R. W. E.

van den Boogaard, A. J. R.

A. J. R. van den Boogaard, F. A. van Goor, E. Louis, and F. Bijkerk, “Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection,” Opt. Lett.37(2), 160–162 (2012).
[CrossRef] [PubMed]

A. J. R. van den Boogaard, E. Louis, E. Zoethout, K. A. Goldberg, and F. Bijkerk, “Characterization of Mo/Si multilayer growth on stepped topographies,” J. Vac. Sci. Technol. B29(5), 051803 (2011).
[CrossRef]

A. J. R. van den Boogaard, E. Louis, E. Zoethout, S. Müllender, and F. Bijkerk, “Surface morphology of Kr+-polished amorphous Si layers,” J. Vac. Sci. Technol. A28(4), 552 (2010).
[CrossRef]

A. J. R. van den Boogaard, E. Louis, F. A. van Goor, and F. Bijkerk, “Optical element for full spectral purity from IR-generated EUV light sources,” Proc. SPIE7271, 72713B, 72713B-6 (2009).
[CrossRef]

van der Meer, R.

van der Westen, S. A.

van Goor, F. A.

A. J. R. van den Boogaard, F. A. van Goor, E. Louis, and F. Bijkerk, “Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection,” Opt. Lett.37(2), 160–162 (2012).
[CrossRef] [PubMed]

A. J. R. van den Boogaard, E. Louis, F. A. van Goor, and F. Bijkerk, “Optical element for full spectral purity from IR-generated EUV light sources,” Proc. SPIE7271, 72713B, 72713B-6 (2009).
[CrossRef]

van Herpen, M. M. J. W.

Vargas, E. L.

N. R. Böwering, A. I. Ershov, W. F. Marx, O. V. Khodykin, B. A. M. Hansson, E. L. Vargas, J. A. Chavez, I. V. Fomenkov, D. W. Myers, and D. C. Brandt, “EUV source collector,” Proc. SPIE6151, 61513R (2006).

Vaschenko, G. O.

I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012).
[CrossRef]

Voronov, D. L.

Warwick, T.

Yakshin, A. E.

Yakunin, A. M.

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021115 (2012).
[CrossRef]

V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, and F. Bijkerk, “Infrared antireflective filtering for extreme ultraviolet multilayer Bragg reflectors,” Opt. Lett.37(7), 1169–1171 (2012).
[CrossRef] [PubMed]

V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, and F. Bijkerk, “Infrared suppression by hybrid EUV multilayer - IR etalon structures,” Opt. Lett.36(17), 3344–3346 (2011).
[CrossRef] [PubMed]

W. A. Soer, M. J. J. Jak, A. M. Yakunin, M. M. J. W. van Herpen, and V. Y. Banine, “Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources,” Proc. SPIE7271, 72712Y, 72712Y-9 (2009).
[CrossRef]

Yamazaki, T.

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE8332, 83220F, 83220F-13 (2012).
[CrossRef]

Yanagida, T.

J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, and H. Mizoguchi, “Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021111 (2012).
[CrossRef]

J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE8332, 83220F, 83220F-13 (2012).
[CrossRef]

Yashchuk, V. V.

Zadiranov, Y. M.

V. P. Belik, Y. M. Zadiranov, N. D. Il’inskaya, A. V. Korlyakov, V. V. Luchinin, M. A. Markosov, R. P. Seisyan, and E. M. Sher, “Free-standing optical filters for a nanolithography source operating in the 12-15 nm wavelength range,” Tech. Phys. Lett.33(6), 508–511 (2007).
[CrossRef]

Zipp, L.

Zoethout, E.

A. J. R. van den Boogaard, E. Louis, E. Zoethout, K. A. Goldberg, and F. Bijkerk, “Characterization of Mo/Si multilayer growth on stepped topographies,” J. Vac. Sci. Technol. B29(5), 051803 (2011).
[CrossRef]

A. J. R. van den Boogaard, E. Louis, E. Zoethout, S. Müllender, and F. Bijkerk, “Surface morphology of Kr+-polished amorphous Si layers,” J. Vac. Sci. Technol. A28(4), 552 (2010).
[CrossRef]

Eur. Phys. J. D (1)

A. Barbara, P. Quémerais, E. Bustarret, T. López-Rios, and T. Fournier, “Electromagnetic resonances of sub-wavelength rectangular metallic gratings,” Eur. Phys. J. D23, 143–154 (2003).
[CrossRef]

J. Appl. Phys. (1)

D. L. Voronov, P. Gawlitza, R. Cambie, S. Dhuey, E. M. Gullikson, T. Warwick, S. Braun, V. V. Yashchuk, and H. A. Padmore, “Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering,” J. Appl. Phys.111(9), 093521 (2012).
[CrossRef]

J. Micro/Nanolith. MEMS MOEMS (5)

N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021115 (2012).
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J. Vac. Sci. Technol. B (2)

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Figures (8)

Fig. 1
Fig. 1

Schematic design of EUV filtering system based on the rectangular multilayer grating. Colors: grey – grating substrate; blue/yellow – Mo/Si multilayer deposited on top; red arrows – IR radiation; violet arrows – EUV radiation.

Fig. 2
Fig. 2

Calculated (Eq. (2)) diffraction efficiencies of the first three diffraction orders as function of the h/λ ratio for the case Γ = 0.5.

Fig. 3
Fig. 3

The calculated 0th order reflectance (R0) from a perfectly conducting rectangular grating as a function of p/λ for the case of h = λ/4 and Γ = 0.5.

Fig. 4
Fig. 4

The calculated 0th order reflectance (R0) from a perfectly conducting rectangular grating as a function of θ. Grating parameters h and Γ are fixed at λ/4 and 0.5 respectively, p/λ ratio is varied.

Fig. 5
Fig. 5

Calculated dependencies of the coherence radius on the distance z between grating and source. ρ IR - coherence radius for 10.6 μm wavelength, ρ EUV - for 13.5 nm wavelength.

Fig. 6
Fig. 6

Step by step process description of the lift-off UV contact lithography procedure.

Fig. 7
Fig. 7

Blue squares – the measured EUV reflectance of the Mo/Si multilayer deposited onto the fabricated Si grating. Grey circles – the measured EUV reflectance of the reference Mo/Si multilayer on a super-polished Si substrate, co-deposited during the multilayer deposition onto the Si grating.

Fig. 8
Fig. 8

FT-IR reflectance measurements for the multilayer grating fabricated using a line pattern with a pitch of 100 μm.

Equations (5)

Equations on this page are rendered with MathJax. Learn more.

p( sinϑ+sinθ )=mλ ,
R n = R tot | sinc( πn )+A Γsinc( Γπn ) | 2 ,
A=exp( i 4πh λ )1.
R 0 = R tot { 1+2Γ( Γ1 )( 1cos[ 4πh λ ] ) }.
ρ= λ b z ,

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