Abstract

The reflectivity of Al/Zr multilayers is enhanced by the use of a novel structure. The Al layers are divided by insertion of Si layers. In addition, Si barrier layers are inserted at the Al/Zr interfaces (Zr-on-Al and Al-on-Zr). As a result, crystallization of the Al layer is inhibited and that of Zr is enhanced. In grazing incidence x-ray reflectometry, x-ray diffraction, and extreme ultraviolet measurements, the novel multilayers exhibit lower interfacial roughness compared with traditional multilayer structures, and their reflectivity is increased from 48.2% to 50.0% at a 5° angle of incidence. These novel multilayers also have potential applications in other multilayer systems and the semiconductor industry.

© 2013 OSA

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  1. Q. Zhong, W. B. Li, Z. Zhang, J. T. Zhu, Q. S. Huang, H. Li, Z. S. Wang, P. Jonnard, K. Le Guen, J.-M. André, H. J. Zhou, and T. L. Huo, “Optical and structural performance of the Al/Zr reflection multilayers in the 17–19 nm region,” Opt. Express20(10), 10692–10700 (2012).
    [CrossRef] [PubMed]
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    [CrossRef]
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    [CrossRef]
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    [CrossRef]
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    [CrossRef] [PubMed]
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  21. M. S. Kumar, P. Böni, S. Tixier, and D. Clemens, “Stress minimization in sputtered Ni/Ti supermirrors,” Physica B241–243, 95–97 (1997).
    [CrossRef]
  22. K. MacArthur, B. Shi, R. Conley, and A. T. Macrander, “Periodic variation of stress in sputter deposited Si/WSi2 multilayers,” Appl. Phys. Lett.99(8), 081905 (2011).
    [CrossRef]
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    [CrossRef]
  24. Z. D. Popovic, S. Xie, N. Hu, A. Hor, D. Fork, G. Anderson, and C. Tripp, “Life extension of organic LEDs by doping of a hole transport layer,” Thin Solid Films363(1-2), 6–8 (2000).
    [CrossRef]

2013 (1)

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, K. Le Guen, J.-M. André, and P. Jonnard, “The transition from amorphous to crystalline in Al/Zr multilayers,” J. Appl. Phys.113(13), 133508 (2013).
[CrossRef]

2012 (3)

Q. Zhong, W. B. Li, Z. Zhang, J. T. Zhu, Q. S. Huang, H. Li, Z. S. Wang, P. Jonnard, K. Le Guen, J.-M. André, H. J. Zhou, and T. L. Huo, “Optical and structural performance of the Al/Zr reflection multilayers in the 17–19 nm region,” Opt. Express20(10), 10692–10700 (2012).
[CrossRef] [PubMed]

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, and J.-M. André, “The chemical characterization and reflectivity of the Al(1.0%wtSi)/Zr periodic multilayer,” Appl. Surf. Sci.259, 371–375 (2012).
[CrossRef]

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, Y. Y. Yuan, J.-M. André, H. J. Zhou, and T. L. Huo, “The thermal stability of Al(1%wtSi)/Zr EUV mirrors,” Appl. Phys. A: Mater. Sci. Process.109(1), 133–138 (2012).
[CrossRef]

2011 (1)

K. MacArthur, B. Shi, R. Conley, and A. T. Macrander, “Periodic variation of stress in sputter deposited Si/WSi2 multilayers,” Appl. Phys. Lett.99(8), 081905 (2011).
[CrossRef]

2010 (2)

E. Meltchakov, C. Hecquet, M. Roulliay, S. D. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys. A: Mater. Sci. Process.98(1), 111–117 (2010).
[CrossRef]

M.-H. Hu, K. Le Guen, J.-M. André, P. Jonnard, E. Meltchakov, F. Delmotte, and A. Galtayries, “Structural properties of Al/Mo/SiC multilayers with high reflectivity for extreme ultraviolet light,” Opt. Express18(19), 20019–20028 (2010).
[CrossRef] [PubMed]

2009 (3)

2004 (1)

L. Lutterotti, D. Chateigner, S. Ferrari, and J. Ricote, “Texture, residual stress, and structural analysis of thin films using a combined x-ray analysis,” Thin Solid Films450(1), 34–41 (2004).
[CrossRef]

2002 (2)

H. Nii, M. Miyagawa, Y. Matsuo, Y. Sugie, M. Niibe, and H. Kinoshita, “Control of roughness in Mo/Al multilayer film fabricated by DC magnetron sputtering,” Jpn. J. Appl. Phys.41(Part 1, No. 8), 5338–5341 (2002).
[CrossRef]

S. Braun, H. Mai, M. Moss, R. Scholz, and A. Leson, “Mo/Si multilayers with different barrier layers for applications as extreme ultraviolet mirrors,” Jpn. J. Appl. Phys.41(Part 1, No. 6B), 4074–4081 (2002).
[CrossRef]

2000 (1)

Z. D. Popovic, S. Xie, N. Hu, A. Hor, D. Fork, G. Anderson, and C. Tripp, “Life extension of organic LEDs by doping of a hole transport layer,” Thin Solid Films363(1-2), 6–8 (2000).
[CrossRef]

1999 (2)

P. B. Mirkarimi, “Stress, reflectance, and temporal stability of sputter-deposited Mo/Si and Mo/Be multilayer films for extreme ultraviolet lithography,” Opt. Eng.38(7), 1246–1259 (1999).
[CrossRef]

M. Wormington, C. Panaccione, K. Matney, and D. Bowen, “Characterization of structures from X-ray scattering data using genetic algorithms,” Philos. Trans. R. Soc. Lond. A357(1761), 2827–2848 (1999).
[CrossRef]

1998 (2)

D. L. Windt, “IMD—software for modeling the optical properties of multilayer films,” Comput. Phys.12(4), 360–370 (1998).
[CrossRef]

H. Nii, M. Niibe, H. Kinoshita, and Y. Sugie, “Fabrication of Mo/Al multilayer films for a wavelength of 18.5 nm,” J. Synchrotron Radiat.5(Pt 3), 702–704 (1998).
[CrossRef] [PubMed]

1997 (2)

1996 (1)

H. L. Bai, E. Y. Jiang, C. D. Wang, and R. Y. Tian, “Enhancement of the reflectivity of soft-x-ray Co/C multilayers at grazing incidence by thermal treatment,” J. Phys.8, 8763–8776 (1996).

1991 (1)

A. Kloidt, K. Nolting, U. Kleineberg, B. Schmiedeskamp, U. Heinzmann, P. Müller, and M. Kühne, “Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment,” Appl. Phys. Lett.58(23), 2601–2603 (1991).
[CrossRef]

1969 (1)

P. A. Totta and R. P. Sopher, “SLT device metallurgy and its monolithic extension,” IBM J. Res. Develop.13(3), 226–238 (1969).
[CrossRef]

Anderson, G.

Z. D. Popovic, S. Xie, N. Hu, A. Hor, D. Fork, G. Anderson, and C. Tripp, “Life extension of organic LEDs by doping of a hole transport layer,” Thin Solid Films363(1-2), 6–8 (2000).
[CrossRef]

André, J.-M.

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, K. Le Guen, J.-M. André, and P. Jonnard, “The transition from amorphous to crystalline in Al/Zr multilayers,” J. Appl. Phys.113(13), 133508 (2013).
[CrossRef]

Q. Zhong, W. B. Li, Z. Zhang, J. T. Zhu, Q. S. Huang, H. Li, Z. S. Wang, P. Jonnard, K. Le Guen, J.-M. André, H. J. Zhou, and T. L. Huo, “Optical and structural performance of the Al/Zr reflection multilayers in the 17–19 nm region,” Opt. Express20(10), 10692–10700 (2012).
[CrossRef] [PubMed]

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, and J.-M. André, “The chemical characterization and reflectivity of the Al(1.0%wtSi)/Zr periodic multilayer,” Appl. Surf. Sci.259, 371–375 (2012).
[CrossRef]

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, Y. Y. Yuan, J.-M. André, H. J. Zhou, and T. L. Huo, “The thermal stability of Al(1%wtSi)/Zr EUV mirrors,” Appl. Phys. A: Mater. Sci. Process.109(1), 133–138 (2012).
[CrossRef]

M.-H. Hu, K. Le Guen, J.-M. André, P. Jonnard, E. Meltchakov, F. Delmotte, and A. Galtayries, “Structural properties of Al/Mo/SiC multilayers with high reflectivity for extreme ultraviolet light,” Opt. Express18(19), 20019–20028 (2010).
[CrossRef] [PubMed]

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, P. Jonnard, K. Le Guen, and J.-M. André, “Thermally-induced structural modification in the Al/Zr multilayers,” Appl. Surf. Sci. (submitted), http://hal.archives-ouvertes.fr/hal-00744814 .

Aquila, A.

Bai, H. L.

H. L. Bai, E. Y. Jiang, C. D. Wang, and R. Y. Tian, “Enhancement of the reflectivity of soft-x-ray Co/C multilayers at grazing incidence by thermal treatment,” J. Phys.8, 8763–8776 (1996).

Bellotti, J. A.

Bijkerk, F.

Böni, P.

M. S. Kumar, P. Böni, S. Tixier, and D. Clemens, “Stress minimization in sputtered Ni/Ti supermirrors,” Physica B241–243, 95–97 (1997).
[CrossRef]

Bowen, D.

M. Wormington, C. Panaccione, K. Matney, and D. Bowen, “Characterization of structures from X-ray scattering data using genetic algorithms,” Philos. Trans. R. Soc. Lond. A357(1761), 2827–2848 (1999).
[CrossRef]

Braun, S.

S. Braun, H. Mai, M. Moss, R. Scholz, and A. Leson, “Mo/Si multilayers with different barrier layers for applications as extreme ultraviolet mirrors,” Jpn. J. Appl. Phys.41(Part 1, No. 6B), 4074–4081 (2002).
[CrossRef]

Bridou, F.

E. Meltchakov, C. Hecquet, M. Roulliay, S. D. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys. A: Mater. Sci. Process.98(1), 111–117 (2010).
[CrossRef]

Chateigner, D.

L. Lutterotti, D. Chateigner, S. Ferrari, and J. Ricote, “Texture, residual stress, and structural analysis of thin films using a combined x-ray analysis,” Thin Solid Films450(1), 34–41 (2004).
[CrossRef]

Clemens, D.

M. S. Kumar, P. Böni, S. Tixier, and D. Clemens, “Stress minimization in sputtered Ni/Ti supermirrors,” Physica B241–243, 95–97 (1997).
[CrossRef]

Conley, R.

K. MacArthur, B. Shi, R. Conley, and A. T. Macrander, “Periodic variation of stress in sputter deposited Si/WSi2 multilayers,” Appl. Phys. Lett.99(8), 081905 (2011).
[CrossRef]

Delmotte, F.

E. Meltchakov, C. Hecquet, M. Roulliay, S. D. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys. A: Mater. Sci. Process.98(1), 111–117 (2010).
[CrossRef]

M.-H. Hu, K. Le Guen, J.-M. André, P. Jonnard, E. Meltchakov, F. Delmotte, and A. Galtayries, “Structural properties of Al/Mo/SiC multilayers with high reflectivity for extreme ultraviolet light,” Opt. Express18(19), 20019–20028 (2010).
[CrossRef] [PubMed]

Ferrari, S.

L. Lutterotti, D. Chateigner, S. Ferrari, and J. Ricote, “Texture, residual stress, and structural analysis of thin films using a combined x-ray analysis,” Thin Solid Films450(1), 34–41 (2004).
[CrossRef]

Fork, D.

Z. D. Popovic, S. Xie, N. Hu, A. Hor, D. Fork, G. Anderson, and C. Tripp, “Life extension of organic LEDs by doping of a hole transport layer,” Thin Solid Films363(1-2), 6–8 (2000).
[CrossRef]

Galtayries, A.

Gullikson, E. M.

Hamelmann, F.

Hecquet, C.

E. Meltchakov, C. Hecquet, M. Roulliay, S. D. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys. A: Mater. Sci. Process.98(1), 111–117 (2010).
[CrossRef]

Heidemann, K. F.

Heinzmann, U.

H.-J. Stock, F. Hamelmann, U. Kleineberg, D. Menke, B. Schmiedeskamp, K. Osterried, K. F. Heidemann, and U. Heinzmann, “Carbon buffer layers for smoothing superpolished glass surfaces as substrates for molybdenum /silicon multilayer soft-x-ray mirrors,” Appl. Opt.36(7), 1650–1654 (1997).
[CrossRef] [PubMed]

A. Kloidt, K. Nolting, U. Kleineberg, B. Schmiedeskamp, U. Heinzmann, P. Müller, and M. Kühne, “Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment,” Appl. Phys. Lett.58(23), 2601–2603 (1991).
[CrossRef]

Hor, A.

Z. D. Popovic, S. Xie, N. Hu, A. Hor, D. Fork, G. Anderson, and C. Tripp, “Life extension of organic LEDs by doping of a hole transport layer,” Thin Solid Films363(1-2), 6–8 (2000).
[CrossRef]

Hu, M.-H.

Hu, N.

Z. D. Popovic, S. Xie, N. Hu, A. Hor, D. Fork, G. Anderson, and C. Tripp, “Life extension of organic LEDs by doping of a hole transport layer,” Thin Solid Films363(1-2), 6–8 (2000).
[CrossRef]

Huang, Q. S.

Huo, T. L.

Q. Zhong, W. B. Li, Z. Zhang, J. T. Zhu, Q. S. Huang, H. Li, Z. S. Wang, P. Jonnard, K. Le Guen, J.-M. André, H. J. Zhou, and T. L. Huo, “Optical and structural performance of the Al/Zr reflection multilayers in the 17–19 nm region,” Opt. Express20(10), 10692–10700 (2012).
[CrossRef] [PubMed]

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, Y. Y. Yuan, J.-M. André, H. J. Zhou, and T. L. Huo, “The thermal stability of Al(1%wtSi)/Zr EUV mirrors,” Appl. Phys. A: Mater. Sci. Process.109(1), 133–138 (2012).
[CrossRef]

Jérome, A.

E. Meltchakov, C. Hecquet, M. Roulliay, S. D. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys. A: Mater. Sci. Process.98(1), 111–117 (2010).
[CrossRef]

Jiang, E. Y.

H. L. Bai, E. Y. Jiang, C. D. Wang, and R. Y. Tian, “Enhancement of the reflectivity of soft-x-ray Co/C multilayers at grazing incidence by thermal treatment,” J. Phys.8, 8763–8776 (1996).

Jonnard, P.

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, K. Le Guen, J.-M. André, and P. Jonnard, “The transition from amorphous to crystalline in Al/Zr multilayers,” J. Appl. Phys.113(13), 133508 (2013).
[CrossRef]

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, Y. Y. Yuan, J.-M. André, H. J. Zhou, and T. L. Huo, “The thermal stability of Al(1%wtSi)/Zr EUV mirrors,” Appl. Phys. A: Mater. Sci. Process.109(1), 133–138 (2012).
[CrossRef]

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, and J.-M. André, “The chemical characterization and reflectivity of the Al(1.0%wtSi)/Zr periodic multilayer,” Appl. Surf. Sci.259, 371–375 (2012).
[CrossRef]

Q. Zhong, W. B. Li, Z. Zhang, J. T. Zhu, Q. S. Huang, H. Li, Z. S. Wang, P. Jonnard, K. Le Guen, J.-M. André, H. J. Zhou, and T. L. Huo, “Optical and structural performance of the Al/Zr reflection multilayers in the 17–19 nm region,” Opt. Express20(10), 10692–10700 (2012).
[CrossRef] [PubMed]

M.-H. Hu, K. Le Guen, J.-M. André, P. Jonnard, E. Meltchakov, F. Delmotte, and A. Galtayries, “Structural properties of Al/Mo/SiC multilayers with high reflectivity for extreme ultraviolet light,” Opt. Express18(19), 20019–20028 (2010).
[CrossRef] [PubMed]

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, P. Jonnard, K. Le Guen, and J.-M. André, “Thermally-induced structural modification in the Al/Zr multilayers,” Appl. Surf. Sci. (submitted), http://hal.archives-ouvertes.fr/hal-00744814 .

Kinoshita, H.

H. Nii, M. Miyagawa, Y. Matsuo, Y. Sugie, M. Niibe, and H. Kinoshita, “Control of roughness in Mo/Al multilayer film fabricated by DC magnetron sputtering,” Jpn. J. Appl. Phys.41(Part 1, No. 8), 5338–5341 (2002).
[CrossRef]

H. Nii, M. Niibe, H. Kinoshita, and Y. Sugie, “Fabrication of Mo/Al multilayer films for a wavelength of 18.5 nm,” J. Synchrotron Radiat.5(Pt 3), 702–704 (1998).
[CrossRef] [PubMed]

Kleineberg, U.

H.-J. Stock, F. Hamelmann, U. Kleineberg, D. Menke, B. Schmiedeskamp, K. Osterried, K. F. Heidemann, and U. Heinzmann, “Carbon buffer layers for smoothing superpolished glass surfaces as substrates for molybdenum /silicon multilayer soft-x-ray mirrors,” Appl. Opt.36(7), 1650–1654 (1997).
[CrossRef] [PubMed]

A. Kloidt, K. Nolting, U. Kleineberg, B. Schmiedeskamp, U. Heinzmann, P. Müller, and M. Kühne, “Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment,” Appl. Phys. Lett.58(23), 2601–2603 (1991).
[CrossRef]

Kloidt, A.

A. Kloidt, K. Nolting, U. Kleineberg, B. Schmiedeskamp, U. Heinzmann, P. Müller, and M. Kühne, “Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment,” Appl. Phys. Lett.58(23), 2601–2603 (1991).
[CrossRef]

Kühne, M.

A. Kloidt, K. Nolting, U. Kleineberg, B. Schmiedeskamp, U. Heinzmann, P. Müller, and M. Kühne, “Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment,” Appl. Phys. Lett.58(23), 2601–2603 (1991).
[CrossRef]

Kumar, M. S.

M. S. Kumar, P. Böni, S. Tixier, and D. Clemens, “Stress minimization in sputtered Ni/Ti supermirrors,” Physica B241–243, 95–97 (1997).
[CrossRef]

Le Guen, K.

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, K. Le Guen, J.-M. André, and P. Jonnard, “The transition from amorphous to crystalline in Al/Zr multilayers,” J. Appl. Phys.113(13), 133508 (2013).
[CrossRef]

Q. Zhong, W. B. Li, Z. Zhang, J. T. Zhu, Q. S. Huang, H. Li, Z. S. Wang, P. Jonnard, K. Le Guen, J.-M. André, H. J. Zhou, and T. L. Huo, “Optical and structural performance of the Al/Zr reflection multilayers in the 17–19 nm region,” Opt. Express20(10), 10692–10700 (2012).
[CrossRef] [PubMed]

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, and J.-M. André, “The chemical characterization and reflectivity of the Al(1.0%wtSi)/Zr periodic multilayer,” Appl. Surf. Sci.259, 371–375 (2012).
[CrossRef]

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, Y. Y. Yuan, J.-M. André, H. J. Zhou, and T. L. Huo, “The thermal stability of Al(1%wtSi)/Zr EUV mirrors,” Appl. Phys. A: Mater. Sci. Process.109(1), 133–138 (2012).
[CrossRef]

M.-H. Hu, K. Le Guen, J.-M. André, P. Jonnard, E. Meltchakov, F. Delmotte, and A. Galtayries, “Structural properties of Al/Mo/SiC multilayers with high reflectivity for extreme ultraviolet light,” Opt. Express18(19), 20019–20028 (2010).
[CrossRef] [PubMed]

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, P. Jonnard, K. Le Guen, and J.-M. André, “Thermally-induced structural modification in the Al/Zr multilayers,” Appl. Surf. Sci. (submitted), http://hal.archives-ouvertes.fr/hal-00744814 .

Leson, A.

S. Braun, H. Mai, M. Moss, R. Scholz, and A. Leson, “Mo/Si multilayers with different barrier layers for applications as extreme ultraviolet mirrors,” Jpn. J. Appl. Phys.41(Part 1, No. 6B), 4074–4081 (2002).
[CrossRef]

Li, H.

Li, J.

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, K. Le Guen, J.-M. André, and P. Jonnard, “The transition from amorphous to crystalline in Al/Zr multilayers,” J. Appl. Phys.113(13), 133508 (2013).
[CrossRef]

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, P. Jonnard, K. Le Guen, and J.-M. André, “Thermally-induced structural modification in the Al/Zr multilayers,” Appl. Surf. Sci. (submitted), http://hal.archives-ouvertes.fr/hal-00744814 .

Li, W. B.

Liu, Y. W.

Lutterotti, L.

L. Lutterotti, D. Chateigner, S. Ferrari, and J. Ricote, “Texture, residual stress, and structural analysis of thin films using a combined x-ray analysis,” Thin Solid Films450(1), 34–41 (2004).
[CrossRef]

Ma, S.

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, K. Le Guen, J.-M. André, and P. Jonnard, “The transition from amorphous to crystalline in Al/Zr multilayers,” J. Appl. Phys.113(13), 133508 (2013).
[CrossRef]

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, P. Jonnard, K. Le Guen, and J.-M. André, “Thermally-induced structural modification in the Al/Zr multilayers,” Appl. Surf. Sci. (submitted), http://hal.archives-ouvertes.fr/hal-00744814 .

MacArthur, K.

K. MacArthur, B. Shi, R. Conley, and A. T. Macrander, “Periodic variation of stress in sputter deposited Si/WSi2 multilayers,” Appl. Phys. Lett.99(8), 081905 (2011).
[CrossRef]

Macrander, A. T.

K. MacArthur, B. Shi, R. Conley, and A. T. Macrander, “Periodic variation of stress in sputter deposited Si/WSi2 multilayers,” Appl. Phys. Lett.99(8), 081905 (2011).
[CrossRef]

Mai, H.

S. Braun, H. Mai, M. Moss, R. Scholz, and A. Leson, “Mo/Si multilayers with different barrier layers for applications as extreme ultraviolet mirrors,” Jpn. J. Appl. Phys.41(Part 1, No. 6B), 4074–4081 (2002).
[CrossRef]

Matney, K.

M. Wormington, C. Panaccione, K. Matney, and D. Bowen, “Characterization of structures from X-ray scattering data using genetic algorithms,” Philos. Trans. R. Soc. Lond. A357(1761), 2827–2848 (1999).
[CrossRef]

Matsuo, Y.

H. Nii, M. Miyagawa, Y. Matsuo, Y. Sugie, M. Niibe, and H. Kinoshita, “Control of roughness in Mo/Al multilayer film fabricated by DC magnetron sputtering,” Jpn. J. Appl. Phys.41(Part 1, No. 8), 5338–5341 (2002).
[CrossRef]

Meltchakov, E.

M.-H. Hu, K. Le Guen, J.-M. André, P. Jonnard, E. Meltchakov, F. Delmotte, and A. Galtayries, “Structural properties of Al/Mo/SiC multilayers with high reflectivity for extreme ultraviolet light,” Opt. Express18(19), 20019–20028 (2010).
[CrossRef] [PubMed]

E. Meltchakov, C. Hecquet, M. Roulliay, S. D. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys. A: Mater. Sci. Process.98(1), 111–117 (2010).
[CrossRef]

Menesguen, Y.

E. Meltchakov, C. Hecquet, M. Roulliay, S. D. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys. A: Mater. Sci. Process.98(1), 111–117 (2010).
[CrossRef]

Menke, D.

Mirkarimi, P. B.

P. B. Mirkarimi, “Stress, reflectance, and temporal stability of sputter-deposited Mo/Si and Mo/Be multilayer films for extreme ultraviolet lithography,” Opt. Eng.38(7), 1246–1259 (1999).
[CrossRef]

Miyagawa, M.

H. Nii, M. Miyagawa, Y. Matsuo, Y. Sugie, M. Niibe, and H. Kinoshita, “Control of roughness in Mo/Al multilayer film fabricated by DC magnetron sputtering,” Jpn. J. Appl. Phys.41(Part 1, No. 8), 5338–5341 (2002).
[CrossRef]

Moss, M.

S. Braun, H. Mai, M. Moss, R. Scholz, and A. Leson, “Mo/Si multilayers with different barrier layers for applications as extreme ultraviolet mirrors,” Jpn. J. Appl. Phys.41(Part 1, No. 6B), 4074–4081 (2002).
[CrossRef]

Müller, P.

A. Kloidt, K. Nolting, U. Kleineberg, B. Schmiedeskamp, U. Heinzmann, P. Müller, and M. Kühne, “Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment,” Appl. Phys. Lett.58(23), 2601–2603 (1991).
[CrossRef]

Nedelcu, I.

Nii, H.

H. Nii, M. Miyagawa, Y. Matsuo, Y. Sugie, M. Niibe, and H. Kinoshita, “Control of roughness in Mo/Al multilayer film fabricated by DC magnetron sputtering,” Jpn. J. Appl. Phys.41(Part 1, No. 8), 5338–5341 (2002).
[CrossRef]

H. Nii, M. Niibe, H. Kinoshita, and Y. Sugie, “Fabrication of Mo/Al multilayer films for a wavelength of 18.5 nm,” J. Synchrotron Radiat.5(Pt 3), 702–704 (1998).
[CrossRef] [PubMed]

Niibe, M.

H. Nii, M. Miyagawa, Y. Matsuo, Y. Sugie, M. Niibe, and H. Kinoshita, “Control of roughness in Mo/Al multilayer film fabricated by DC magnetron sputtering,” Jpn. J. Appl. Phys.41(Part 1, No. 8), 5338–5341 (2002).
[CrossRef]

H. Nii, M. Niibe, H. Kinoshita, and Y. Sugie, “Fabrication of Mo/Al multilayer films for a wavelength of 18.5 nm,” J. Synchrotron Radiat.5(Pt 3), 702–704 (1998).
[CrossRef] [PubMed]

Nolting, K.

A. Kloidt, K. Nolting, U. Kleineberg, B. Schmiedeskamp, U. Heinzmann, P. Müller, and M. Kühne, “Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment,” Appl. Phys. Lett.58(23), 2601–2603 (1991).
[CrossRef]

Osterried, K.

Panaccione, C.

M. Wormington, C. Panaccione, K. Matney, and D. Bowen, “Characterization of structures from X-ray scattering data using genetic algorithms,” Philos. Trans. R. Soc. Lond. A357(1761), 2827–2848 (1999).
[CrossRef]

Popovic, Z. D.

Z. D. Popovic, S. Xie, N. Hu, A. Hor, D. Fork, G. Anderson, and C. Tripp, “Life extension of organic LEDs by doping of a hole transport layer,” Thin Solid Films363(1-2), 6–8 (2000).
[CrossRef]

Ravet-Krill, M.-F.

E. Meltchakov, C. Hecquet, M. Roulliay, S. D. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys. A: Mater. Sci. Process.98(1), 111–117 (2010).
[CrossRef]

Ricote, J.

L. Lutterotti, D. Chateigner, S. Ferrari, and J. Ricote, “Texture, residual stress, and structural analysis of thin films using a combined x-ray analysis,” Thin Solid Films450(1), 34–41 (2004).
[CrossRef]

Rossi, S. D.

E. Meltchakov, C. Hecquet, M. Roulliay, S. D. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys. A: Mater. Sci. Process.98(1), 111–117 (2010).
[CrossRef]

Roulliay, M.

E. Meltchakov, C. Hecquet, M. Roulliay, S. D. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys. A: Mater. Sci. Process.98(1), 111–117 (2010).
[CrossRef]

Salmassi, F.

Schmiedeskamp, B.

H.-J. Stock, F. Hamelmann, U. Kleineberg, D. Menke, B. Schmiedeskamp, K. Osterried, K. F. Heidemann, and U. Heinzmann, “Carbon buffer layers for smoothing superpolished glass surfaces as substrates for molybdenum /silicon multilayer soft-x-ray mirrors,” Appl. Opt.36(7), 1650–1654 (1997).
[CrossRef] [PubMed]

A. Kloidt, K. Nolting, U. Kleineberg, B. Schmiedeskamp, U. Heinzmann, P. Müller, and M. Kühne, “Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment,” Appl. Phys. Lett.58(23), 2601–2603 (1991).
[CrossRef]

Scholz, R.

S. Braun, H. Mai, M. Moss, R. Scholz, and A. Leson, “Mo/Si multilayers with different barrier layers for applications as extreme ultraviolet mirrors,” Jpn. J. Appl. Phys.41(Part 1, No. 6B), 4074–4081 (2002).
[CrossRef]

Shi, B.

K. MacArthur, B. Shi, R. Conley, and A. T. Macrander, “Periodic variation of stress in sputter deposited Si/WSi2 multilayers,” Appl. Phys. Lett.99(8), 081905 (2011).
[CrossRef]

Sopher, R. P.

P. A. Totta and R. P. Sopher, “SLT device metallurgy and its monolithic extension,” IBM J. Res. Develop.13(3), 226–238 (1969).
[CrossRef]

Stock, H.-J.

Sugie, Y.

H. Nii, M. Miyagawa, Y. Matsuo, Y. Sugie, M. Niibe, and H. Kinoshita, “Control of roughness in Mo/Al multilayer film fabricated by DC magnetron sputtering,” Jpn. J. Appl. Phys.41(Part 1, No. 8), 5338–5341 (2002).
[CrossRef]

H. Nii, M. Niibe, H. Kinoshita, and Y. Sugie, “Fabrication of Mo/Al multilayer films for a wavelength of 18.5 nm,” J. Synchrotron Radiat.5(Pt 3), 702–704 (1998).
[CrossRef] [PubMed]

Tian, R. Y.

H. L. Bai, E. Y. Jiang, C. D. Wang, and R. Y. Tian, “Enhancement of the reflectivity of soft-x-ray Co/C multilayers at grazing incidence by thermal treatment,” J. Phys.8, 8763–8776 (1996).

Tixier, S.

M. S. Kumar, P. Böni, S. Tixier, and D. Clemens, “Stress minimization in sputtered Ni/Ti supermirrors,” Physica B241–243, 95–97 (1997).
[CrossRef]

Totta, P. A.

P. A. Totta and R. P. Sopher, “SLT device metallurgy and its monolithic extension,” IBM J. Res. Develop.13(3), 226–238 (1969).
[CrossRef]

Tripp, C.

Z. D. Popovic, S. Xie, N. Hu, A. Hor, D. Fork, G. Anderson, and C. Tripp, “Life extension of organic LEDs by doping of a hole transport layer,” Thin Solid Films363(1-2), 6–8 (2000).
[CrossRef]

van de Kruijs, R. W. E.

Varniere, F.

E. Meltchakov, C. Hecquet, M. Roulliay, S. D. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys. A: Mater. Sci. Process.98(1), 111–117 (2010).
[CrossRef]

Wang, C. D.

H. L. Bai, E. Y. Jiang, C. D. Wang, and R. Y. Tian, “Enhancement of the reflectivity of soft-x-ray Co/C multilayers at grazing incidence by thermal treatment,” J. Phys.8, 8763–8776 (1996).

Wang, Z. S.

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, K. Le Guen, J.-M. André, and P. Jonnard, “The transition from amorphous to crystalline in Al/Zr multilayers,” J. Appl. Phys.113(13), 133508 (2013).
[CrossRef]

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, Y. Y. Yuan, J.-M. André, H. J. Zhou, and T. L. Huo, “The thermal stability of Al(1%wtSi)/Zr EUV mirrors,” Appl. Phys. A: Mater. Sci. Process.109(1), 133–138 (2012).
[CrossRef]

Q. Zhong, W. B. Li, Z. Zhang, J. T. Zhu, Q. S. Huang, H. Li, Z. S. Wang, P. Jonnard, K. Le Guen, J.-M. André, H. J. Zhou, and T. L. Huo, “Optical and structural performance of the Al/Zr reflection multilayers in the 17–19 nm region,” Opt. Express20(10), 10692–10700 (2012).
[CrossRef] [PubMed]

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, and J.-M. André, “The chemical characterization and reflectivity of the Al(1.0%wtSi)/Zr periodic multilayer,” Appl. Surf. Sci.259, 371–375 (2012).
[CrossRef]

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, P. Jonnard, K. Le Guen, and J.-M. André, “Thermally-induced structural modification in the Al/Zr multilayers,” Appl. Surf. Sci. (submitted), http://hal.archives-ouvertes.fr/hal-00744814 .

Windt, D. L.

Wormington, M.

M. Wormington, C. Panaccione, K. Matney, and D. Bowen, “Characterization of structures from X-ray scattering data using genetic algorithms,” Philos. Trans. R. Soc. Lond. A357(1761), 2827–2848 (1999).
[CrossRef]

Xie, S.

Z. D. Popovic, S. Xie, N. Hu, A. Hor, D. Fork, G. Anderson, and C. Tripp, “Life extension of organic LEDs by doping of a hole transport layer,” Thin Solid Films363(1-2), 6–8 (2000).
[CrossRef]

Yakshin, A. E.

Yuan, Y. Y.

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, Y. Y. Yuan, J.-M. André, H. J. Zhou, and T. L. Huo, “The thermal stability of Al(1%wtSi)/Zr EUV mirrors,” Appl. Phys. A: Mater. Sci. Process.109(1), 133–138 (2012).
[CrossRef]

Ze, R. Q.

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, K. Le Guen, J.-M. André, and P. Jonnard, “The transition from amorphous to crystalline in Al/Zr multilayers,” J. Appl. Phys.113(13), 133508 (2013).
[CrossRef]

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, P. Jonnard, K. Le Guen, and J.-M. André, “Thermally-induced structural modification in the Al/Zr multilayers,” Appl. Surf. Sci. (submitted), http://hal.archives-ouvertes.fr/hal-00744814 .

Zhang, Z.

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, K. Le Guen, J.-M. André, and P. Jonnard, “The transition from amorphous to crystalline in Al/Zr multilayers,” J. Appl. Phys.113(13), 133508 (2013).
[CrossRef]

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, Y. Y. Yuan, J.-M. André, H. J. Zhou, and T. L. Huo, “The thermal stability of Al(1%wtSi)/Zr EUV mirrors,” Appl. Phys. A: Mater. Sci. Process.109(1), 133–138 (2012).
[CrossRef]

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, and J.-M. André, “The chemical characterization and reflectivity of the Al(1.0%wtSi)/Zr periodic multilayer,” Appl. Surf. Sci.259, 371–375 (2012).
[CrossRef]

Q. Zhong, W. B. Li, Z. Zhang, J. T. Zhu, Q. S. Huang, H. Li, Z. S. Wang, P. Jonnard, K. Le Guen, J.-M. André, H. J. Zhou, and T. L. Huo, “Optical and structural performance of the Al/Zr reflection multilayers in the 17–19 nm region,” Opt. Express20(10), 10692–10700 (2012).
[CrossRef] [PubMed]

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, P. Jonnard, K. Le Guen, and J.-M. André, “Thermally-induced structural modification in the Al/Zr multilayers,” Appl. Surf. Sci. (submitted), http://hal.archives-ouvertes.fr/hal-00744814 .

Zhong, Q.

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, K. Le Guen, J.-M. André, and P. Jonnard, “The transition from amorphous to crystalline in Al/Zr multilayers,” J. Appl. Phys.113(13), 133508 (2013).
[CrossRef]

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, and J.-M. André, “The chemical characterization and reflectivity of the Al(1.0%wtSi)/Zr periodic multilayer,” Appl. Surf. Sci.259, 371–375 (2012).
[CrossRef]

Q. Zhong, W. B. Li, Z. Zhang, J. T. Zhu, Q. S. Huang, H. Li, Z. S. Wang, P. Jonnard, K. Le Guen, J.-M. André, H. J. Zhou, and T. L. Huo, “Optical and structural performance of the Al/Zr reflection multilayers in the 17–19 nm region,” Opt. Express20(10), 10692–10700 (2012).
[CrossRef] [PubMed]

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, Y. Y. Yuan, J.-M. André, H. J. Zhou, and T. L. Huo, “The thermal stability of Al(1%wtSi)/Zr EUV mirrors,” Appl. Phys. A: Mater. Sci. Process.109(1), 133–138 (2012).
[CrossRef]

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, P. Jonnard, K. Le Guen, and J.-M. André, “Thermally-induced structural modification in the Al/Zr multilayers,” Appl. Surf. Sci. (submitted), http://hal.archives-ouvertes.fr/hal-00744814 .

Zhou, H. J.

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, Y. Y. Yuan, J.-M. André, H. J. Zhou, and T. L. Huo, “The thermal stability of Al(1%wtSi)/Zr EUV mirrors,” Appl. Phys. A: Mater. Sci. Process.109(1), 133–138 (2012).
[CrossRef]

Q. Zhong, W. B. Li, Z. Zhang, J. T. Zhu, Q. S. Huang, H. Li, Z. S. Wang, P. Jonnard, K. Le Guen, J.-M. André, H. J. Zhou, and T. L. Huo, “Optical and structural performance of the Al/Zr reflection multilayers in the 17–19 nm region,” Opt. Express20(10), 10692–10700 (2012).
[CrossRef] [PubMed]

Zhu, J. T.

Q. Zhong, W. B. Li, Z. Zhang, J. T. Zhu, Q. S. Huang, H. Li, Z. S. Wang, P. Jonnard, K. Le Guen, J.-M. André, H. J. Zhou, and T. L. Huo, “Optical and structural performance of the Al/Zr reflection multilayers in the 17–19 nm region,” Opt. Express20(10), 10692–10700 (2012).
[CrossRef] [PubMed]

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, and J.-M. André, “The chemical characterization and reflectivity of the Al(1.0%wtSi)/Zr periodic multilayer,” Appl. Surf. Sci.259, 371–375 (2012).
[CrossRef]

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, Y. Y. Yuan, J.-M. André, H. J. Zhou, and T. L. Huo, “The thermal stability of Al(1%wtSi)/Zr EUV mirrors,” Appl. Phys. A: Mater. Sci. Process.109(1), 133–138 (2012).
[CrossRef]

Appl. Opt. (3)

Appl. Phys. A: Mater. Sci. Process. (2)

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, Y. Y. Yuan, J.-M. André, H. J. Zhou, and T. L. Huo, “The thermal stability of Al(1%wtSi)/Zr EUV mirrors,” Appl. Phys. A: Mater. Sci. Process.109(1), 133–138 (2012).
[CrossRef]

E. Meltchakov, C. Hecquet, M. Roulliay, S. D. Rossi, Y. Menesguen, A. Jérome, F. Bridou, F. Varniere, M.-F. Ravet-Krill, and F. Delmotte, “Development of Al-based multilayer optics for EUV,” Appl. Phys. A: Mater. Sci. Process.98(1), 111–117 (2010).
[CrossRef]

Appl. Phys. Lett. (2)

K. MacArthur, B. Shi, R. Conley, and A. T. Macrander, “Periodic variation of stress in sputter deposited Si/WSi2 multilayers,” Appl. Phys. Lett.99(8), 081905 (2011).
[CrossRef]

A. Kloidt, K. Nolting, U. Kleineberg, B. Schmiedeskamp, U. Heinzmann, P. Müller, and M. Kühne, “Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment,” Appl. Phys. Lett.58(23), 2601–2603 (1991).
[CrossRef]

Appl. Surf. Sci. (2)

Q. Zhong, Z. Zhang, J. T. Zhu, Z. S. Wang, P. Jonnard, K. Le Guen, and J.-M. André, “The chemical characterization and reflectivity of the Al(1.0%wtSi)/Zr periodic multilayer,” Appl. Surf. Sci.259, 371–375 (2012).
[CrossRef]

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, P. Jonnard, K. Le Guen, and J.-M. André, “Thermally-induced structural modification in the Al/Zr multilayers,” Appl. Surf. Sci. (submitted), http://hal.archives-ouvertes.fr/hal-00744814 .

Comput. Phys. (1)

D. L. Windt, “IMD—software for modeling the optical properties of multilayer films,” Comput. Phys.12(4), 360–370 (1998).
[CrossRef]

IBM J. Res. Develop. (1)

P. A. Totta and R. P. Sopher, “SLT device metallurgy and its monolithic extension,” IBM J. Res. Develop.13(3), 226–238 (1969).
[CrossRef]

J. Appl. Phys. (1)

Q. Zhong, Z. Zhang, S. Ma, R. Q. Ze, J. Li, Z. S. Wang, K. Le Guen, J.-M. André, and P. Jonnard, “The transition from amorphous to crystalline in Al/Zr multilayers,” J. Appl. Phys.113(13), 133508 (2013).
[CrossRef]

J. Phys. (1)

H. L. Bai, E. Y. Jiang, C. D. Wang, and R. Y. Tian, “Enhancement of the reflectivity of soft-x-ray Co/C multilayers at grazing incidence by thermal treatment,” J. Phys.8, 8763–8776 (1996).

J. Synchrotron Radiat. (1)

H. Nii, M. Niibe, H. Kinoshita, and Y. Sugie, “Fabrication of Mo/Al multilayer films for a wavelength of 18.5 nm,” J. Synchrotron Radiat.5(Pt 3), 702–704 (1998).
[CrossRef] [PubMed]

Jpn. J. Appl. Phys. (2)

H. Nii, M. Miyagawa, Y. Matsuo, Y. Sugie, M. Niibe, and H. Kinoshita, “Control of roughness in Mo/Al multilayer film fabricated by DC magnetron sputtering,” Jpn. J. Appl. Phys.41(Part 1, No. 8), 5338–5341 (2002).
[CrossRef]

S. Braun, H. Mai, M. Moss, R. Scholz, and A. Leson, “Mo/Si multilayers with different barrier layers for applications as extreme ultraviolet mirrors,” Jpn. J. Appl. Phys.41(Part 1, No. 6B), 4074–4081 (2002).
[CrossRef]

Opt. Eng. (1)

P. B. Mirkarimi, “Stress, reflectance, and temporal stability of sputter-deposited Mo/Si and Mo/Be multilayer films for extreme ultraviolet lithography,” Opt. Eng.38(7), 1246–1259 (1999).
[CrossRef]

Opt. Express (3)

Philos. Trans. R. Soc. Lond. A (1)

M. Wormington, C. Panaccione, K. Matney, and D. Bowen, “Characterization of structures from X-ray scattering data using genetic algorithms,” Philos. Trans. R. Soc. Lond. A357(1761), 2827–2848 (1999).
[CrossRef]

Physica B (1)

M. S. Kumar, P. Böni, S. Tixier, and D. Clemens, “Stress minimization in sputtered Ni/Ti supermirrors,” Physica B241–243, 95–97 (1997).
[CrossRef]

Thin Solid Films (2)

L. Lutterotti, D. Chateigner, S. Ferrari, and J. Ricote, “Texture, residual stress, and structural analysis of thin films using a combined x-ray analysis,” Thin Solid Films450(1), 34–41 (2004).
[CrossRef]

Z. D. Popovic, S. Xie, N. Hu, A. Hor, D. Fork, G. Anderson, and C. Tripp, “Life extension of organic LEDs by doping of a hole transport layer,” Thin Solid Films363(1-2), 6–8 (2000).
[CrossRef]

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Figures (4)

Fig. 1
Fig. 1

Novel Al/Zr multilayer structures (a) with and (b) without Si barrier layers.

Fig. 2
Fig. 2

Comparison between the GIXR experimental data (symbols) and fitted curves (color lines) for S5, S6, and S7.

Fig. 3
Fig. 3

Modified multilayer structure with Si barrier layers.

Fig. 4
Fig. 4

(a): Measured EUV reflectivity at 5° angle of incidence versus wavelength for the traditional multilayer and novel multilayers with Si barrier layers. The curve fitting lines used the corresponding fitting models in Tables 3 and 4; (b) Diffraction curves of S7 (blue), S5 (purple), and S6 (red).

Tables (4)

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Table 1 Periodic Thicknesses of All Samples Deduced from the GIXR Measurements, and the Symbols are Also Shown

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Table 2 Fitting Parameters of Novel Multilayers from GIXR without Si Barrier Layers

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Table 4 Fitting parameters of traditional multilayer structure

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Table 3 Fitting Parameters of Novel Multilayers with Si Barrier Layers

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