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Experimental and simulation studies of anti-reflection sub-micron conical structures on a GaAs substrate

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Abstract

In order to reduce surface reflection, anti-reflective (AR) coatings are widely used on the surfaces of solar cells to improve the efficiency of photoelectric conversion. This study employed colloidal lithography with a dry etching process to fabricate sub-micron anti-reflection structures on a GaAs substrate. Etching parameters, such as RF power and etching gas were investigated to determine their influence on surface morphology. We fabricated an array of conical structures 550 nm in diameter and 450 nm in height. The average reflectance of a bare GaAs wafer was reduced from 35.0% to 2.3% across a spectral range of 300 nm – 1200 nm. The anti-reflective performance of SWSs was also calculated using Rigorous Coupled Wave Analysis (RCWA) method. Both simulation and experiment results demonstrate a high degree of similarity.

©2012 Optical Society of America

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Figures (12)

Fig. 1
Fig. 1 (a) Schematic illustration of PS spheres organized on a GaAs substrate; (b) SEM image of close-packed monolayer comprising hexagonal PS spheres 600 nm in diameter
Fig. 2
Fig. 2 Schematic illustration of etching processes
Fig. 3
Fig. 3 Cross-sectional schematic of SWS array and the parameters used in simulation
Fig. 4
Fig. 4 SEM images of SWSs produced with RF power of (a) 10 W, (b) 20 W, and (c) 50 W
Fig. 5
Fig. 5 SEM images of SWSs produced at Cl2 flow rates of (a) 10 sccm, (b) 20 sccm, and (c) 30 sccm
Fig. 6
Fig. 6 SEM images of SWSs produced by Ar at flow rates of (a) 10 sccm, (b) 20 sccm, and (c) 30 sccm
Fig. 7
Fig. 7 Etching mechanism at Ar flow rates of (a) 10 sccm and (b) 20 sccm
Fig. 8
Fig. 8 (a) Etching mechanism at an Ar flow rate of 30 sccm; (b) SEM image of PS fragment
Fig. 9
Fig. 9 Reflectance spectra of SWSs with a same bottom diameter of 550 nm and height of 400 nm with various top diameters
Fig. 10
Fig. 10 SEM image of narrowed PS spheres
Fig. 11
Fig. 11 SEM images of SWSs on the substrate
Fig. 12
Fig. 12 Reflectance spectra of measured and simulation result
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