Abstract

Antireflection (AR) layers at the tips of optical fibers are indispensable in high efficiency and low noise applications. We realized the AR structures with two-dimensional binary subwavelength gratings (SWGs) at the tips of optical fibers by using a dedicated UV nanoimprint machine. Using this technique, ideal AR structures with desired refractive indices can be realized at low cost in principle. The SWG with the period of 700 nm was fabricated at the tip of a single-mode optical fiber for optical communications system. The reflectance was decreased to less than 0.27% at measured wavelengths between 1460 nm and 1580 nm.

©2013 Optical Society of America

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    [Crossref]
  3. H. Toyota, K. Takahara, M. Okano, T. Yotsuya, and H. Kikuta, “Fabrication of microcone array for antireflection structured surface using metal dotted pattern,” Jpn. J. Appl. Phys. 40(Part 2, No. 7B), L747–L749 (2001).
    [Crossref]
  4. Y. Kanamori, M. Ishimori, and K. Hane, “High efficient light-emitting diodes with antireflection subwavelength gratings,” IEEE Photon. Technol. Lett. 14(8), 1064–1066 (2002).
    [Crossref]
  5. T. Yanagishita, K. Nishio, and H. Masuda, “Anti-reflection structures on lenses by nanoimprinting using ordered anodic porous alumina,” Appl. Phys. Express 2, 022001 (2009).
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    [Crossref] [PubMed]
  10. T. Yanagishita, K. Nishio, and H. Masuda, “Antireflection polymer hole array structures by imprinting using metal molds from anodic porous alumina,” Appl. Phys. Express 1, 067004 (2008).
    [Crossref]
  11. K. Yamada, M. Umetani, T. Tamura, Y. Tanaka, H. Kasa, and J. Nishii, “Antireflective structure imprinted on the surface of optical glass by SiC mold,” Appl. Surf. Sci. 255(7), 4267–4270 (2009).
    [Crossref]
  12. C. David, P. Häberling, M. Schnieper, J. Söchtig, and C. Zschokke, “Nano-structured anti-reflective surfaces replicated by hot embossing,” Microelectron. Eng. 61–62, 435–440 (2002).
    [Crossref]
  13. K. Hadobás, S. Kirsch, A. Carl, M. Acet, and E. F. Wassermann, “Reflection properties of nanostructure-arrayed silicon surfaces,” Nanotechnology 11(3), 161–164 (2000).
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  16. P. Lalanne and G. M. Morris, “Antireflection behavior of silicon subwavelength periodic structures for visible light,” Nanotechnology 8(2), 53–56 (1997).
    [Crossref]
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    [Crossref]
  20. W. Zhang and S. Y. Chou, “Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels,” Appl. Phys. Lett. 83(8), 1632–1634 (2003).
    [Crossref]
  21. L.-R. Bao, X. Cheng, X. D. Huang, L. J. Guo, S. W. Pang, and A. F. Yee, “Nanoimprinting over topography and multilayer three-dimensional printing,” J. Vac. Sci. Technol. B 20(6), 2881–2886 (2002).
    [Crossref]
  22. M. M. Alkaisi, W. Jayatissa, and M. Konijn, “Multilevel nanoimprint lithography,” Curr. Appl. Phys. 4(2-4), 111–114 (2004).
    [Crossref]
  23. J. Haisma, M. Verheijen, K. V. D. Heuvel, and J. V. D. Berg, “Mold-assisted nanolithography: a process for reliable pattern replication,” J. Vac. Sci. Technol. B 14(6), 4124–4128 (1996).
    [Crossref]
  24. K. Kobayashi, N. Sakai, S. Matsui, and M. Nakagawa, “Fluorescent UV-curable resists for UV-nanoimprint lithography,” Jpn. J. Appl. Phys. 49(6), 06GL07 (2010).
    [Crossref]
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    [Crossref]

2010 (1)

K. Kobayashi, N. Sakai, S. Matsui, and M. Nakagawa, “Fluorescent UV-curable resists for UV-nanoimprint lithography,” Jpn. J. Appl. Phys. 49(6), 06GL07 (2010).
[Crossref]

2009 (2)

T. Yanagishita, K. Nishio, and H. Masuda, “Anti-reflection structures on lenses by nanoimprinting using ordered anodic porous alumina,” Appl. Phys. Express 2, 022001 (2009).
[Crossref]

K. Yamada, M. Umetani, T. Tamura, Y. Tanaka, H. Kasa, and J. Nishii, “Antireflective structure imprinted on the surface of optical glass by SiC mold,” Appl. Surf. Sci. 255(7), 4267–4270 (2009).
[Crossref]

2008 (1)

T. Yanagishita, K. Nishio, and H. Masuda, “Antireflection polymer hole array structures by imprinting using metal molds from anodic porous alumina,” Appl. Phys. Express 1, 067004 (2008).
[Crossref]

2007 (1)

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

2004 (1)

M. M. Alkaisi, W. Jayatissa, and M. Konijn, “Multilevel nanoimprint lithography,” Curr. Appl. Phys. 4(2-4), 111–114 (2004).
[Crossref]

2003 (2)

W. Zhang and S. Y. Chou, “Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels,” Appl. Phys. Lett. 83(8), 1632–1634 (2003).
[Crossref]

M. Karlsson and F. Nikolajeff, “Diamond micro-optics: microlenses and antireflection structured surfaces for the infrared spectral region,” Opt. Express 11(5), 502–507 (2003).
[Crossref] [PubMed]

2002 (3)

C. David, P. Häberling, M. Schnieper, J. Söchtig, and C. Zschokke, “Nano-structured anti-reflective surfaces replicated by hot embossing,” Microelectron. Eng. 61–62, 435–440 (2002).
[Crossref]

Y. Kanamori, M. Ishimori, and K. Hane, “High efficient light-emitting diodes with antireflection subwavelength gratings,” IEEE Photon. Technol. Lett. 14(8), 1064–1066 (2002).
[Crossref]

L.-R. Bao, X. Cheng, X. D. Huang, L. J. Guo, S. W. Pang, and A. F. Yee, “Nanoimprinting over topography and multilayer three-dimensional printing,” J. Vac. Sci. Technol. B 20(6), 2881–2886 (2002).
[Crossref]

2001 (2)

Y. Kanamori, K. Hane, H. Sai, and H. Yugami, “100 nm Period silicon antireflection structures fabricated using a porous alumina membrane mask,” Appl. Phys. Lett. 78(2), 142–143 (2001).
[Crossref]

H. Toyota, K. Takahara, M. Okano, T. Yotsuya, and H. Kikuta, “Fabrication of microcone array for antireflection structured surface using metal dotted pattern,” Jpn. J. Appl. Phys. 40(Part 2, No. 7B), L747–L749 (2001).
[Crossref]

2000 (1)

K. Hadobás, S. Kirsch, A. Carl, M. Acet, and E. F. Wassermann, “Reflection properties of nanostructure-arrayed silicon surfaces,” Nanotechnology 11(3), 161–164 (2000).
[Crossref]

1999 (1)

1998 (1)

1997 (2)

S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhuang, “Sub-10 nm imprint lithography and applications,” J. Vac. Sci. Technol. B 15(6), 2897–2904 (1997).
[Crossref]

P. Lalanne and G. M. Morris, “Antireflection behavior of silicon subwavelength periodic structures for visible light,” Nanotechnology 8(2), 53–56 (1997).
[Crossref]

1996 (1)

J. Haisma, M. Verheijen, K. V. D. Heuvel, and J. V. D. Berg, “Mold-assisted nanolithography: a process for reliable pattern replication,” J. Vac. Sci. Technol. B 14(6), 4124–4128 (1996).
[Crossref]

1995 (1)

1993 (1)

1992 (1)

1986 (1)

1982 (1)

S. J. Wilson and M. C. Hutley, “The optical properties of ‘moth eye’ antireflection surfaces,” Opt. Acta (Lond.) 29(7), 993–1009 (1982).
[Crossref]

1981 (1)

Acet, M.

K. Hadobás, S. Kirsch, A. Carl, M. Acet, and E. F. Wassermann, “Reflection properties of nanostructure-arrayed silicon surfaces,” Nanotechnology 11(3), 161–164 (2000).
[Crossref]

Alkaisi, M. M.

M. M. Alkaisi, W. Jayatissa, and M. Konijn, “Multilevel nanoimprint lithography,” Curr. Appl. Phys. 4(2-4), 111–114 (2004).
[Crossref]

Baird, W. E.

Bao, L.-R.

L.-R. Bao, X. Cheng, X. D. Huang, L. J. Guo, S. W. Pang, and A. F. Yee, “Nanoimprinting over topography and multilayer three-dimensional printing,” J. Vac. Sci. Technol. B 20(6), 2881–2886 (2002).
[Crossref]

Berg, J. V. D.

J. Haisma, M. Verheijen, K. V. D. Heuvel, and J. V. D. Berg, “Mold-assisted nanolithography: a process for reliable pattern replication,” J. Vac. Sci. Technol. B 14(6), 4124–4128 (1996).
[Crossref]

Brundrett, D. L.

Carl, A.

K. Hadobás, S. Kirsch, A. Carl, M. Acet, and E. F. Wassermann, “Reflection properties of nanostructure-arrayed silicon surfaces,” Nanotechnology 11(3), 161–164 (2000).
[Crossref]

Chang, Y.-H.

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Chattopadhyay, S.

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Chen, K.-H.

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Chen, L.-C.

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Cheng, X.

L.-R. Bao, X. Cheng, X. D. Huang, L. J. Guo, S. W. Pang, and A. F. Yee, “Nanoimprinting over topography and multilayer three-dimensional printing,” J. Vac. Sci. Technol. B 20(6), 2881–2886 (2002).
[Crossref]

Chou, S. Y.

W. Zhang and S. Y. Chou, “Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels,” Appl. Phys. Lett. 83(8), 1632–1634 (2003).
[Crossref]

S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhuang, “Sub-10 nm imprint lithography and applications,” J. Vac. Sci. Technol. B 15(6), 2897–2904 (1997).
[Crossref]

David, C.

C. David, P. Häberling, M. Schnieper, J. Söchtig, and C. Zschokke, “Nano-structured anti-reflective surfaces replicated by hot embossing,” Microelectron. Eng. 61–62, 435–440 (2002).
[Crossref]

Gaylord, T. K.

Glytsis, E. N.

Grann, E. B.

Gunning, W. J.

Guo, L.

S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhuang, “Sub-10 nm imprint lithography and applications,” J. Vac. Sci. Technol. B 15(6), 2897–2904 (1997).
[Crossref]

Guo, L. J.

L.-R. Bao, X. Cheng, X. D. Huang, L. J. Guo, S. W. Pang, and A. F. Yee, “Nanoimprinting over topography and multilayer three-dimensional printing,” J. Vac. Sci. Technol. B 20(6), 2881–2886 (2002).
[Crossref]

Häberling, P.

C. David, P. Häberling, M. Schnieper, J. Söchtig, and C. Zschokke, “Nano-structured anti-reflective surfaces replicated by hot embossing,” Microelectron. Eng. 61–62, 435–440 (2002).
[Crossref]

Hadobás, K.

K. Hadobás, S. Kirsch, A. Carl, M. Acet, and E. F. Wassermann, “Reflection properties of nanostructure-arrayed silicon surfaces,” Nanotechnology 11(3), 161–164 (2000).
[Crossref]

Haisma, J.

J. Haisma, M. Verheijen, K. V. D. Heuvel, and J. V. D. Berg, “Mold-assisted nanolithography: a process for reliable pattern replication,” J. Vac. Sci. Technol. B 14(6), 4124–4128 (1996).
[Crossref]

Hane, K.

Y. Kanamori, M. Ishimori, and K. Hane, “High efficient light-emitting diodes with antireflection subwavelength gratings,” IEEE Photon. Technol. Lett. 14(8), 1064–1066 (2002).
[Crossref]

Y. Kanamori, K. Hane, H. Sai, and H. Yugami, “100 nm Period silicon antireflection structures fabricated using a porous alumina membrane mask,” Appl. Phys. Lett. 78(2), 142–143 (2001).
[Crossref]

Y. Kanamori, M. Sasaki, and K. Hane, “Broadband antireflection gratings fabricated upon silicon substrates,” Opt. Lett. 24(20), 1422–1424 (1999).
[Crossref] [PubMed]

Heuvel, K. V. D.

J. Haisma, M. Verheijen, K. V. D. Heuvel, and J. V. D. Berg, “Mold-assisted nanolithography: a process for reliable pattern replication,” J. Vac. Sci. Technol. B 14(6), 4124–4128 (1996).
[Crossref]

Hsu, C.-H.

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Hsu, Y.-K.

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Huang, X. D.

L.-R. Bao, X. Cheng, X. D. Huang, L. J. Guo, S. W. Pang, and A. F. Yee, “Nanoimprinting over topography and multilayer three-dimensional printing,” J. Vac. Sci. Technol. B 20(6), 2881–2886 (2002).
[Crossref]

Huang, Y.-F.

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Hutley, M. C.

S. J. Wilson and M. C. Hutley, “The optical properties of ‘moth eye’ antireflection surfaces,” Opt. Acta (Lond.) 29(7), 993–1009 (1982).
[Crossref]

Ishimori, M.

Y. Kanamori, M. Ishimori, and K. Hane, “High efficient light-emitting diodes with antireflection subwavelength gratings,” IEEE Photon. Technol. Lett. 14(8), 1064–1066 (2002).
[Crossref]

Jayatissa, W.

M. M. Alkaisi, W. Jayatissa, and M. Konijn, “Multilevel nanoimprint lithography,” Curr. Appl. Phys. 4(2-4), 111–114 (2004).
[Crossref]

Jen, Y.-J.

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Kanamori, Y.

Y. Kanamori, M. Ishimori, and K. Hane, “High efficient light-emitting diodes with antireflection subwavelength gratings,” IEEE Photon. Technol. Lett. 14(8), 1064–1066 (2002).
[Crossref]

Y. Kanamori, K. Hane, H. Sai, and H. Yugami, “100 nm Period silicon antireflection structures fabricated using a porous alumina membrane mask,” Appl. Phys. Lett. 78(2), 142–143 (2001).
[Crossref]

Y. Kanamori, M. Sasaki, and K. Hane, “Broadband antireflection gratings fabricated upon silicon substrates,” Opt. Lett. 24(20), 1422–1424 (1999).
[Crossref] [PubMed]

Karlsson, M.

Kasa, H.

K. Yamada, M. Umetani, T. Tamura, Y. Tanaka, H. Kasa, and J. Nishii, “Antireflective structure imprinted on the surface of optical glass by SiC mold,” Appl. Surf. Sci. 255(7), 4267–4270 (2009).
[Crossref]

Kikuta, H.

H. Toyota, K. Takahara, M. Okano, T. Yotsuya, and H. Kikuta, “Fabrication of microcone array for antireflection structured surface using metal dotted pattern,” Jpn. J. Appl. Phys. 40(Part 2, No. 7B), L747–L749 (2001).
[Crossref]

Kirsch, S.

K. Hadobás, S. Kirsch, A. Carl, M. Acet, and E. F. Wassermann, “Reflection properties of nanostructure-arrayed silicon surfaces,” Nanotechnology 11(3), 161–164 (2000).
[Crossref]

Kobayashi, K.

K. Kobayashi, N. Sakai, S. Matsui, and M. Nakagawa, “Fluorescent UV-curable resists for UV-nanoimprint lithography,” Jpn. J. Appl. Phys. 49(6), 06GL07 (2010).
[Crossref]

Konijn, M.

M. M. Alkaisi, W. Jayatissa, and M. Konijn, “Multilevel nanoimprint lithography,” Curr. Appl. Phys. 4(2-4), 111–114 (2004).
[Crossref]

Krauss, P. R.

S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhuang, “Sub-10 nm imprint lithography and applications,” J. Vac. Sci. Technol. B 15(6), 2897–2904 (1997).
[Crossref]

Lalanne, P.

P. Lalanne and G. M. Morris, “Antireflection behavior of silicon subwavelength periodic structures for visible light,” Nanotechnology 8(2), 53–56 (1997).
[Crossref]

Lee, C.-S.

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Liu, T.-A.

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Lo, H.-C.

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Masuda, H.

T. Yanagishita, K. Nishio, and H. Masuda, “Anti-reflection structures on lenses by nanoimprinting using ordered anodic porous alumina,” Appl. Phys. Express 2, 022001 (2009).
[Crossref]

T. Yanagishita, K. Nishio, and H. Masuda, “Antireflection polymer hole array structures by imprinting using metal molds from anodic porous alumina,” Appl. Phys. Express 1, 067004 (2008).
[Crossref]

Matsui, S.

K. Kobayashi, N. Sakai, S. Matsui, and M. Nakagawa, “Fluorescent UV-curable resists for UV-nanoimprint lithography,” Jpn. J. Appl. Phys. 49(6), 06GL07 (2010).
[Crossref]

Moharam, M. G.

Morris, G. M.

P. Lalanne and G. M. Morris, “Antireflection behavior of silicon subwavelength periodic structures for visible light,” Nanotechnology 8(2), 53–56 (1997).
[Crossref]

D. H. Raguin and G. M. Morris, “Antireflection structured surfaces for the infrared spectral region,” Appl. Opt. 32(7), 1154–1167 (1993).
[Crossref] [PubMed]

Motamedi, M. E.

Nakagawa, M.

K. Kobayashi, N. Sakai, S. Matsui, and M. Nakagawa, “Fluorescent UV-curable resists for UV-nanoimprint lithography,” Jpn. J. Appl. Phys. 49(6), 06GL07 (2010).
[Crossref]

Nikolajeff, F.

Nishii, J.

K. Yamada, M. Umetani, T. Tamura, Y. Tanaka, H. Kasa, and J. Nishii, “Antireflective structure imprinted on the surface of optical glass by SiC mold,” Appl. Surf. Sci. 255(7), 4267–4270 (2009).
[Crossref]

Nishio, K.

T. Yanagishita, K. Nishio, and H. Masuda, “Anti-reflection structures on lenses by nanoimprinting using ordered anodic porous alumina,” Appl. Phys. Express 2, 022001 (2009).
[Crossref]

T. Yanagishita, K. Nishio, and H. Masuda, “Antireflection polymer hole array structures by imprinting using metal molds from anodic porous alumina,” Appl. Phys. Express 1, 067004 (2008).
[Crossref]

Okano, M.

H. Toyota, K. Takahara, M. Okano, T. Yotsuya, and H. Kikuta, “Fabrication of microcone array for antireflection structured surface using metal dotted pattern,” Jpn. J. Appl. Phys. 40(Part 2, No. 7B), L747–L749 (2001).
[Crossref]

Pan, C.-L.

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Pang, S. W.

L.-R. Bao, X. Cheng, X. D. Huang, L. J. Guo, S. W. Pang, and A. F. Yee, “Nanoimprinting over topography and multilayer three-dimensional printing,” J. Vac. Sci. Technol. B 20(6), 2881–2886 (2002).
[Crossref]

Peng, C.-Y.

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Pommet, D. A.

Raguin, D. H.

Sai, H.

Y. Kanamori, K. Hane, H. Sai, and H. Yugami, “100 nm Period silicon antireflection structures fabricated using a porous alumina membrane mask,” Appl. Phys. Lett. 78(2), 142–143 (2001).
[Crossref]

Sakai, N.

K. Kobayashi, N. Sakai, S. Matsui, and M. Nakagawa, “Fluorescent UV-curable resists for UV-nanoimprint lithography,” Jpn. J. Appl. Phys. 49(6), 06GL07 (2010).
[Crossref]

Sasaki, M.

Schnieper, M.

C. David, P. Häberling, M. Schnieper, J. Söchtig, and C. Zschokke, “Nano-structured anti-reflective surfaces replicated by hot embossing,” Microelectron. Eng. 61–62, 435–440 (2002).
[Crossref]

Söchtig, J.

C. David, P. Häberling, M. Schnieper, J. Söchtig, and C. Zschokke, “Nano-structured anti-reflective surfaces replicated by hot embossing,” Microelectron. Eng. 61–62, 435–440 (2002).
[Crossref]

Southwell, W. H.

Takahara, K.

H. Toyota, K. Takahara, M. Okano, T. Yotsuya, and H. Kikuta, “Fabrication of microcone array for antireflection structured surface using metal dotted pattern,” Jpn. J. Appl. Phys. 40(Part 2, No. 7B), L747–L749 (2001).
[Crossref]

Tamura, T.

K. Yamada, M. Umetani, T. Tamura, Y. Tanaka, H. Kasa, and J. Nishii, “Antireflective structure imprinted on the surface of optical glass by SiC mold,” Appl. Surf. Sci. 255(7), 4267–4270 (2009).
[Crossref]

Tanaka, Y.

K. Yamada, M. Umetani, T. Tamura, Y. Tanaka, H. Kasa, and J. Nishii, “Antireflective structure imprinted on the surface of optical glass by SiC mold,” Appl. Surf. Sci. 255(7), 4267–4270 (2009).
[Crossref]

Toyota, H.

H. Toyota, K. Takahara, M. Okano, T. Yotsuya, and H. Kikuta, “Fabrication of microcone array for antireflection structured surface using metal dotted pattern,” Jpn. J. Appl. Phys. 40(Part 2, No. 7B), L747–L749 (2001).
[Crossref]

Umetani, M.

K. Yamada, M. Umetani, T. Tamura, Y. Tanaka, H. Kasa, and J. Nishii, “Antireflective structure imprinted on the surface of optical glass by SiC mold,” Appl. Surf. Sci. 255(7), 4267–4270 (2009).
[Crossref]

Varga, M. G.

Verheijen, M.

J. Haisma, M. Verheijen, K. V. D. Heuvel, and J. V. D. Berg, “Mold-assisted nanolithography: a process for reliable pattern replication,” J. Vac. Sci. Technol. B 14(6), 4124–4128 (1996).
[Crossref]

Wassermann, E. F.

K. Hadobás, S. Kirsch, A. Carl, M. Acet, and E. F. Wassermann, “Reflection properties of nanostructure-arrayed silicon surfaces,” Nanotechnology 11(3), 161–164 (2000).
[Crossref]

Wilson, S. J.

S. J. Wilson and M. C. Hutley, “The optical properties of ‘moth eye’ antireflection surfaces,” Opt. Acta (Lond.) 29(7), 993–1009 (1982).
[Crossref]

Yamada, K.

K. Yamada, M. Umetani, T. Tamura, Y. Tanaka, H. Kasa, and J. Nishii, “Antireflective structure imprinted on the surface of optical glass by SiC mold,” Appl. Surf. Sci. 255(7), 4267–4270 (2009).
[Crossref]

Yanagishita, T.

T. Yanagishita, K. Nishio, and H. Masuda, “Anti-reflection structures on lenses by nanoimprinting using ordered anodic porous alumina,” Appl. Phys. Express 2, 022001 (2009).
[Crossref]

T. Yanagishita, K. Nishio, and H. Masuda, “Antireflection polymer hole array structures by imprinting using metal molds from anodic porous alumina,” Appl. Phys. Express 1, 067004 (2008).
[Crossref]

Yee, A. F.

L.-R. Bao, X. Cheng, X. D. Huang, L. J. Guo, S. W. Pang, and A. F. Yee, “Nanoimprinting over topography and multilayer three-dimensional printing,” J. Vac. Sci. Technol. B 20(6), 2881–2886 (2002).
[Crossref]

Yotsuya, T.

H. Toyota, K. Takahara, M. Okano, T. Yotsuya, and H. Kikuta, “Fabrication of microcone array for antireflection structured surface using metal dotted pattern,” Jpn. J. Appl. Phys. 40(Part 2, No. 7B), L747–L749 (2001).
[Crossref]

Yugami, H.

Y. Kanamori, K. Hane, H. Sai, and H. Yugami, “100 nm Period silicon antireflection structures fabricated using a porous alumina membrane mask,” Appl. Phys. Lett. 78(2), 142–143 (2001).
[Crossref]

Zhang, W.

W. Zhang and S. Y. Chou, “Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels,” Appl. Phys. Lett. 83(8), 1632–1634 (2003).
[Crossref]

S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhuang, “Sub-10 nm imprint lithography and applications,” J. Vac. Sci. Technol. B 15(6), 2897–2904 (1997).
[Crossref]

Zhuang, L.

S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhuang, “Sub-10 nm imprint lithography and applications,” J. Vac. Sci. Technol. B 15(6), 2897–2904 (1997).
[Crossref]

Zschokke, C.

C. David, P. Häberling, M. Schnieper, J. Söchtig, and C. Zschokke, “Nano-structured anti-reflective surfaces replicated by hot embossing,” Microelectron. Eng. 61–62, 435–440 (2002).
[Crossref]

Appl. Opt. (4)

Appl. Phys. Express (2)

T. Yanagishita, K. Nishio, and H. Masuda, “Antireflection polymer hole array structures by imprinting using metal molds from anodic porous alumina,” Appl. Phys. Express 1, 067004 (2008).
[Crossref]

T. Yanagishita, K. Nishio, and H. Masuda, “Anti-reflection structures on lenses by nanoimprinting using ordered anodic porous alumina,” Appl. Phys. Express 2, 022001 (2009).
[Crossref]

Appl. Phys. Lett. (2)

Y. Kanamori, K. Hane, H. Sai, and H. Yugami, “100 nm Period silicon antireflection structures fabricated using a porous alumina membrane mask,” Appl. Phys. Lett. 78(2), 142–143 (2001).
[Crossref]

W. Zhang and S. Y. Chou, “Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels,” Appl. Phys. Lett. 83(8), 1632–1634 (2003).
[Crossref]

Appl. Surf. Sci. (1)

K. Yamada, M. Umetani, T. Tamura, Y. Tanaka, H. Kasa, and J. Nishii, “Antireflective structure imprinted on the surface of optical glass by SiC mold,” Appl. Surf. Sci. 255(7), 4267–4270 (2009).
[Crossref]

Curr. Appl. Phys. (1)

M. M. Alkaisi, W. Jayatissa, and M. Konijn, “Multilevel nanoimprint lithography,” Curr. Appl. Phys. 4(2-4), 111–114 (2004).
[Crossref]

IEEE Photon. Technol. Lett. (1)

Y. Kanamori, M. Ishimori, and K. Hane, “High efficient light-emitting diodes with antireflection subwavelength gratings,” IEEE Photon. Technol. Lett. 14(8), 1064–1066 (2002).
[Crossref]

J. Opt. Soc. Am. (1)

J. Opt. Soc. Am. A (1)

J. Vac. Sci. Technol. B (3)

J. Haisma, M. Verheijen, K. V. D. Heuvel, and J. V. D. Berg, “Mold-assisted nanolithography: a process for reliable pattern replication,” J. Vac. Sci. Technol. B 14(6), 4124–4128 (1996).
[Crossref]

L.-R. Bao, X. Cheng, X. D. Huang, L. J. Guo, S. W. Pang, and A. F. Yee, “Nanoimprinting over topography and multilayer three-dimensional printing,” J. Vac. Sci. Technol. B 20(6), 2881–2886 (2002).
[Crossref]

S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhuang, “Sub-10 nm imprint lithography and applications,” J. Vac. Sci. Technol. B 15(6), 2897–2904 (1997).
[Crossref]

Jpn. J. Appl. Phys. (2)

K. Kobayashi, N. Sakai, S. Matsui, and M. Nakagawa, “Fluorescent UV-curable resists for UV-nanoimprint lithography,” Jpn. J. Appl. Phys. 49(6), 06GL07 (2010).
[Crossref]

H. Toyota, K. Takahara, M. Okano, T. Yotsuya, and H. Kikuta, “Fabrication of microcone array for antireflection structured surface using metal dotted pattern,” Jpn. J. Appl. Phys. 40(Part 2, No. 7B), L747–L749 (2001).
[Crossref]

Microelectron. Eng. (1)

C. David, P. Häberling, M. Schnieper, J. Söchtig, and C. Zschokke, “Nano-structured anti-reflective surfaces replicated by hot embossing,” Microelectron. Eng. 61–62, 435–440 (2002).
[Crossref]

Nanotechnology (2)

K. Hadobás, S. Kirsch, A. Carl, M. Acet, and E. F. Wassermann, “Reflection properties of nanostructure-arrayed silicon surfaces,” Nanotechnology 11(3), 161–164 (2000).
[Crossref]

P. Lalanne and G. M. Morris, “Antireflection behavior of silicon subwavelength periodic structures for visible light,” Nanotechnology 8(2), 53–56 (1997).
[Crossref]

Nat. Nanotechnol. (1)

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Opt. Acta (Lond.) (1)

S. J. Wilson and M. C. Hutley, “The optical properties of ‘moth eye’ antireflection surfaces,” Opt. Acta (Lond.) 29(7), 993–1009 (1982).
[Crossref]

Opt. Express (1)

Opt. Lett. (1)

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Figures (7)

Fig. 1
Fig. 1

A schematic view of an SWG at the tip of an optical fiber.

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Fig. 2
Fig. 2

Fabrication steps.

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Fig. 3
Fig. 3

A schematic of a dedicated UV nanoimprint machine for the tips of optical fibers.

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Fig. 4
Fig. 4

An SEM image of the fabricated mold consisting of silicon.

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Fig. 5
Fig. 5

An SEM image of the fabricated SWG at the tip of the optical fiber.

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Fig. 6
Fig. 6

A schematic of the sectional view of a calculation model which was constructed from the fabricated SWG structure observed by an SEM. Λ, a, h, and d show the period, the diameter, the height, and the residual thickness of the UV-curable polymer, respectively. n means a refractive index.

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Fig. 7
Fig. 7

Reflectance spectra at the tip of the optical fiber.

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Equations (3)

Equations on this page are rendered with MathJax. Learn more.

Λ λ < 1 max[ n s , n i ]+ n i NA ,
N= n i n s ,
h= λ 4N ,

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