Fabrication of antireflection subwavelength gratings at the tips of optical fibers using UV nanoimprint lithography

K. Kobayashi, N. Sakai, S. Matsui, and M. Nakagawa, “Fluorescent UV-curable resists for UV-nanoimprint lithography,” Jpn. J. Appl. Phys. 49(6), 06GL07 (2010).
[Crossref]

T. Yanagishita, K. Nishio, and H. Masuda, “Anti-reflection structures on lenses by nanoimprinting using ordered anodic porous alumina,” Appl. Phys. Express 2, 022001 (2009).
[Crossref]

K. Yamada, M. Umetani, T. Tamura, Y. Tanaka, H. Kasa, and J. Nishii, “Antireflective structure imprinted on the surface of optical glass by SiC mold,” Appl. Surf. Sci. 255(7), 4267–4270 (2009).
[Crossref]

T. Yanagishita, K. Nishio, and H. Masuda, “Antireflection polymer hole array structures by imprinting using metal molds from anodic porous alumina,” Appl. Phys. Express 1, 067004 (2008).
[Crossref]

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

M. M. Alkaisi, W. Jayatissa, and M. Konijn, “Multilevel nanoimprint lithography,” Curr. Appl. Phys. 4(2-4), 111–114 (2004).
[Crossref]

W. Zhang and S. Y. Chou, “Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels,” Appl. Phys. Lett. 83(8), 1632–1634 (2003).
[Crossref]

M. Karlsson and F. Nikolajeff, “Diamond micro-optics: microlenses and antireflection structured surfaces for the infrared spectral region,” Opt. Express 11(5), 502–507 (2003).
[Crossref] [PubMed]

L.-R. Bao, X. Cheng, X. D. Huang, L. J. Guo, S. W. Pang, and A. F. Yee, “Nanoimprinting over topography and multilayer three-dimensional printing,” J. Vac. Sci. Technol. B 20(6), 2881–2886 (2002).
[Crossref]

C. David, P. Häberling, M. Schnieper, J. Söchtig, and C. Zschokke, “Nano-structured anti-reflective surfaces replicated by hot embossing,” Microelectron. Eng. 61–62, 435–440 (2002).
[Crossref]

Y. Kanamori, M. Ishimori, and K. Hane, “High efficient light-emitting diodes with antireflection subwavelength gratings,” IEEE Photon. Technol. Lett. 14(8), 1064–1066 (2002).
[Crossref]

Y. Kanamori, K. Hane, H. Sai, and H. Yugami, “100 nm Period silicon antireflection structures fabricated using a porous alumina membrane mask,” Appl. Phys. Lett. 78(2), 142–143 (2001).
[Crossref]

H. Toyota, K. Takahara, M. Okano, T. Yotsuya, and H. Kikuta, “Fabrication of microcone array for antireflection structured surface using metal dotted pattern,” Jpn. J. Appl. Phys. 40(Part 2, No. 7B), L747–L749 (2001).
[Crossref]

K. Hadobás, S. Kirsch, A. Carl, M. Acet, and E. F. Wassermann, “Reflection properties of nanostructure-arrayed silicon surfaces,” Nanotechnology 11(3), 161–164 (2000).
[Crossref]

Y. Kanamori, M. Sasaki, and K. Hane, “Broadband antireflection gratings fabricated upon silicon substrates,” Opt. Lett. 24(20), 1422–1424 (1999).
[Crossref] [PubMed]

D. L. Brundrett, T. K. Gaylord, and E. N. Glytsis, “Polarizing mirror/absorber for visible wavelengths based on a silicon subwavelength grating: design and fabrication,” Appl. Opt. 37(13), 2534–2541 (1998).
[Crossref] [PubMed]

P. Lalanne and G. M. Morris, “Antireflection behavior of silicon subwavelength periodic structures for visible light,” Nanotechnology 8(2), 53–56 (1997).
[Crossref]

S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhuang, “Sub-10 nm imprint lithography and applications,” J. Vac. Sci. Technol. B 15(6), 2897–2904 (1997).
[Crossref]

J. Haisma, M. Verheijen, K. V. D. Heuvel, and J. V. D. Berg, “Mold-assisted nanolithography: a process for reliable pattern replication,” J. Vac. Sci. Technol. B 14(6), 4124–4128 (1996).
[Crossref]

E. B. Grann, M. G. Varga, and D. A. Pommet, “Optimal design for antireflective tapered two-dimensional subwavelength grating structures,” J. Opt. Soc. Am. A 12(2), 333–339 (1995).
[Crossref]

D. H. Raguin and G. M. Morris, “Antireflection structured surfaces for the infrared spectral region,” Appl. Opt. 32(7), 1154–1167 (1993).
[Crossref] [PubMed]

M. E. Motamedi, W. H. Southwell, and W. J. Gunning, “Antireflection surfaces in silicon using binary optics technology,” Appl. Opt. 31(22), 4371–4376 (1992).
[Crossref] [PubMed]

T. K. Gaylord, W. E. Baird, and M. G. Moharam, “Zero-reflectivity high spatial-frequency rectangular-groove dielectric surface-relief gratings,” Appl. Opt. 25(24), 4562–4567 (1986).
[Crossref] [PubMed]

S. J. Wilson and M. C. Hutley, “The optical properties of ‘moth eye’ antireflection surfaces,” Opt. Acta (Lond.) 29(7), 993–1009 (1982).
[Crossref]

M. G. Moharam and T. K. Gaylord, “Rigorous coupled-wave analysis of planar-grating diffraction,” J. Opt. Soc. Am. 71(7), 811–818 (1981).
[Crossref]

K. Hadobás, S. Kirsch, A. Carl, M. Acet, and E. F. Wassermann, “Reflection properties of nanostructure-arrayed silicon surfaces,” Nanotechnology 11(3), 161–164 (2000).
[Crossref]

M. M. Alkaisi, W. Jayatissa, and M. Konijn, “Multilevel nanoimprint lithography,” Curr. Appl. Phys. 4(2-4), 111–114 (2004).
[Crossref]

T. K. Gaylord, W. E. Baird, and M. G. Moharam, “Zero-reflectivity high spatial-frequency rectangular-groove dielectric surface-relief gratings,” Appl. Opt. 25(24), 4562–4567 (1986).
[Crossref] [PubMed]

L.-R. Bao, X. Cheng, X. D. Huang, L. J. Guo, S. W. Pang, and A. F. Yee, “Nanoimprinting over topography and multilayer three-dimensional printing,” J. Vac. Sci. Technol. B 20(6), 2881–2886 (2002).
[Crossref]

J. Haisma, M. Verheijen, K. V. D. Heuvel, and J. V. D. Berg, “Mold-assisted nanolithography: a process for reliable pattern replication,” J. Vac. Sci. Technol. B 14(6), 4124–4128 (1996).
[Crossref]

D. L. Brundrett, T. K. Gaylord, and E. N. Glytsis, “Polarizing mirror/absorber for visible wavelengths based on a silicon subwavelength grating: design and fabrication,” Appl. Opt. 37(13), 2534–2541 (1998).
[Crossref] [PubMed]

K. Hadobás, S. Kirsch, A. Carl, M. Acet, and E. F. Wassermann, “Reflection properties of nanostructure-arrayed silicon surfaces,” Nanotechnology 11(3), 161–164 (2000).
[Crossref]

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

L.-R. Bao, X. Cheng, X. D. Huang, L. J. Guo, S. W. Pang, and A. F. Yee, “Nanoimprinting over topography and multilayer three-dimensional printing,” J. Vac. Sci. Technol. B 20(6), 2881–2886 (2002).
[Crossref]

W. Zhang and S. Y. Chou, “Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels,” Appl. Phys. Lett. 83(8), 1632–1634 (2003).
[Crossref]

S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhuang, “Sub-10 nm imprint lithography and applications,” J. Vac. Sci. Technol. B 15(6), 2897–2904 (1997).
[Crossref]

C. David, P. Häberling, M. Schnieper, J. Söchtig, and C. Zschokke, “Nano-structured anti-reflective surfaces replicated by hot embossing,” Microelectron. Eng. 61–62, 435–440 (2002).
[Crossref]

D. L. Brundrett, T. K. Gaylord, and E. N. Glytsis, “Polarizing mirror/absorber for visible wavelengths based on a silicon subwavelength grating: design and fabrication,” Appl. Opt. 37(13), 2534–2541 (1998).
[Crossref] [PubMed]

T. K. Gaylord, W. E. Baird, and M. G. Moharam, “Zero-reflectivity high spatial-frequency rectangular-groove dielectric surface-relief gratings,” Appl. Opt. 25(24), 4562–4567 (1986).
[Crossref] [PubMed]

M. G. Moharam and T. K. Gaylord, “Rigorous coupled-wave analysis of planar-grating diffraction,” J. Opt. Soc. Am. 71(7), 811–818 (1981).
[Crossref]

D. L. Brundrett, T. K. Gaylord, and E. N. Glytsis, “Polarizing mirror/absorber for visible wavelengths based on a silicon subwavelength grating: design and fabrication,” Appl. Opt. 37(13), 2534–2541 (1998).
[Crossref] [PubMed]

E. B. Grann, M. G. Varga, and D. A. Pommet, “Optimal design for antireflective tapered two-dimensional subwavelength grating structures,” J. Opt. Soc. Am. A 12(2), 333–339 (1995).
[Crossref]

M. E. Motamedi, W. H. Southwell, and W. J. Gunning, “Antireflection surfaces in silicon using binary optics technology,” Appl. Opt. 31(22), 4371–4376 (1992).
[Crossref] [PubMed]

S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhuang, “Sub-10 nm imprint lithography and applications,” J. Vac. Sci. Technol. B 15(6), 2897–2904 (1997).
[Crossref]

L.-R. Bao, X. Cheng, X. D. Huang, L. J. Guo, S. W. Pang, and A. F. Yee, “Nanoimprinting over topography and multilayer three-dimensional printing,” J. Vac. Sci. Technol. B 20(6), 2881–2886 (2002).
[Crossref]

C. David, P. Häberling, M. Schnieper, J. Söchtig, and C. Zschokke, “Nano-structured anti-reflective surfaces replicated by hot embossing,” Microelectron. Eng. 61–62, 435–440 (2002).
[Crossref]

K. Hadobás, S. Kirsch, A. Carl, M. Acet, and E. F. Wassermann, “Reflection properties of nanostructure-arrayed silicon surfaces,” Nanotechnology 11(3), 161–164 (2000).
[Crossref]

J. Haisma, M. Verheijen, K. V. D. Heuvel, and J. V. D. Berg, “Mold-assisted nanolithography: a process for reliable pattern replication,” J. Vac. Sci. Technol. B 14(6), 4124–4128 (1996).
[Crossref]

Y. Kanamori, M. Ishimori, and K. Hane, “High efficient light-emitting diodes with antireflection subwavelength gratings,” IEEE Photon. Technol. Lett. 14(8), 1064–1066 (2002).
[Crossref]

Y. Kanamori, K. Hane, H. Sai, and H. Yugami, “100 nm Period silicon antireflection structures fabricated using a porous alumina membrane mask,” Appl. Phys. Lett. 78(2), 142–143 (2001).
[Crossref]

Y. Kanamori, M. Sasaki, and K. Hane, “Broadband antireflection gratings fabricated upon silicon substrates,” Opt. Lett. 24(20), 1422–1424 (1999).
[Crossref] [PubMed]

J. Haisma, M. Verheijen, K. V. D. Heuvel, and J. V. D. Berg, “Mold-assisted nanolithography: a process for reliable pattern replication,” J. Vac. Sci. Technol. B 14(6), 4124–4128 (1996).
[Crossref]

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

L.-R. Bao, X. Cheng, X. D. Huang, L. J. Guo, S. W. Pang, and A. F. Yee, “Nanoimprinting over topography and multilayer three-dimensional printing,” J. Vac. Sci. Technol. B 20(6), 2881–2886 (2002).
[Crossref]

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

S. J. Wilson and M. C. Hutley, “The optical properties of ‘moth eye’ antireflection surfaces,” Opt. Acta (Lond.) 29(7), 993–1009 (1982).
[Crossref]

Y. Kanamori, M. Ishimori, and K. Hane, “High efficient light-emitting diodes with antireflection subwavelength gratings,” IEEE Photon. Technol. Lett. 14(8), 1064–1066 (2002).
[Crossref]

M. M. Alkaisi, W. Jayatissa, and M. Konijn, “Multilevel nanoimprint lithography,” Curr. Appl. Phys. 4(2-4), 111–114 (2004).
[Crossref]

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Y. Kanamori, M. Ishimori, and K. Hane, “High efficient light-emitting diodes with antireflection subwavelength gratings,” IEEE Photon. Technol. Lett. 14(8), 1064–1066 (2002).
[Crossref]

Y. Kanamori, K. Hane, H. Sai, and H. Yugami, “100 nm Period silicon antireflection structures fabricated using a porous alumina membrane mask,” Appl. Phys. Lett. 78(2), 142–143 (2001).
[Crossref]

Y. Kanamori, M. Sasaki, and K. Hane, “Broadband antireflection gratings fabricated upon silicon substrates,” Opt. Lett. 24(20), 1422–1424 (1999).
[Crossref] [PubMed]

M. Karlsson and F. Nikolajeff, “Diamond micro-optics: microlenses and antireflection structured surfaces for the infrared spectral region,” Opt. Express 11(5), 502–507 (2003).
[Crossref] [PubMed]

K. Yamada, M. Umetani, T. Tamura, Y. Tanaka, H. Kasa, and J. Nishii, “Antireflective structure imprinted on the surface of optical glass by SiC mold,” Appl. Surf. Sci. 255(7), 4267–4270 (2009).
[Crossref]

H. Toyota, K. Takahara, M. Okano, T. Yotsuya, and H. Kikuta, “Fabrication of microcone array for antireflection structured surface using metal dotted pattern,” Jpn. J. Appl. Phys. 40(Part 2, No. 7B), L747–L749 (2001).
[Crossref]

K. Hadobás, S. Kirsch, A. Carl, M. Acet, and E. F. Wassermann, “Reflection properties of nanostructure-arrayed silicon surfaces,” Nanotechnology 11(3), 161–164 (2000).
[Crossref]

K. Kobayashi, N. Sakai, S. Matsui, and M. Nakagawa, “Fluorescent UV-curable resists for UV-nanoimprint lithography,” Jpn. J. Appl. Phys. 49(6), 06GL07 (2010).
[Crossref]

M. M. Alkaisi, W. Jayatissa, and M. Konijn, “Multilevel nanoimprint lithography,” Curr. Appl. Phys. 4(2-4), 111–114 (2004).
[Crossref]

S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhuang, “Sub-10 nm imprint lithography and applications,” J. Vac. Sci. Technol. B 15(6), 2897–2904 (1997).
[Crossref]

P. Lalanne and G. M. Morris, “Antireflection behavior of silicon subwavelength periodic structures for visible light,” Nanotechnology 8(2), 53–56 (1997).
[Crossref]

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

T. Yanagishita, K. Nishio, and H. Masuda, “Anti-reflection structures on lenses by nanoimprinting using ordered anodic porous alumina,” Appl. Phys. Express 2, 022001 (2009).
[Crossref]

T. Yanagishita, K. Nishio, and H. Masuda, “Antireflection polymer hole array structures by imprinting using metal molds from anodic porous alumina,” Appl. Phys. Express 1, 067004 (2008).
[Crossref]

K. Kobayashi, N. Sakai, S. Matsui, and M. Nakagawa, “Fluorescent UV-curable resists for UV-nanoimprint lithography,” Jpn. J. Appl. Phys. 49(6), 06GL07 (2010).
[Crossref]

T. K. Gaylord, W. E. Baird, and M. G. Moharam, “Zero-reflectivity high spatial-frequency rectangular-groove dielectric surface-relief gratings,” Appl. Opt. 25(24), 4562–4567 (1986).
[Crossref] [PubMed]

M. G. Moharam and T. K. Gaylord, “Rigorous coupled-wave analysis of planar-grating diffraction,” J. Opt. Soc. Am. 71(7), 811–818 (1981).
[Crossref]

P. Lalanne and G. M. Morris, “Antireflection behavior of silicon subwavelength periodic structures for visible light,” Nanotechnology 8(2), 53–56 (1997).
[Crossref]

D. H. Raguin and G. M. Morris, “Antireflection structured surfaces for the infrared spectral region,” Appl. Opt. 32(7), 1154–1167 (1993).
[Crossref] [PubMed]

M. E. Motamedi, W. H. Southwell, and W. J. Gunning, “Antireflection surfaces in silicon using binary optics technology,” Appl. Opt. 31(22), 4371–4376 (1992).
[Crossref] [PubMed]

K. Kobayashi, N. Sakai, S. Matsui, and M. Nakagawa, “Fluorescent UV-curable resists for UV-nanoimprint lithography,” Jpn. J. Appl. Phys. 49(6), 06GL07 (2010).
[Crossref]

M. Karlsson and F. Nikolajeff, “Diamond micro-optics: microlenses and antireflection structured surfaces for the infrared spectral region,” Opt. Express 11(5), 502–507 (2003).
[Crossref] [PubMed]

K. Yamada, M. Umetani, T. Tamura, Y. Tanaka, H. Kasa, and J. Nishii, “Antireflective structure imprinted on the surface of optical glass by SiC mold,” Appl. Surf. Sci. 255(7), 4267–4270 (2009).
[Crossref]

T. Yanagishita, K. Nishio, and H. Masuda, “Anti-reflection structures on lenses by nanoimprinting using ordered anodic porous alumina,” Appl. Phys. Express 2, 022001 (2009).
[Crossref]

T. Yanagishita, K. Nishio, and H. Masuda, “Antireflection polymer hole array structures by imprinting using metal molds from anodic porous alumina,” Appl. Phys. Express 1, 067004 (2008).
[Crossref]

H. Toyota, K. Takahara, M. Okano, T. Yotsuya, and H. Kikuta, “Fabrication of microcone array for antireflection structured surface using metal dotted pattern,” Jpn. J. Appl. Phys. 40(Part 2, No. 7B), L747–L749 (2001).
[Crossref]

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

L.-R. Bao, X. Cheng, X. D. Huang, L. J. Guo, S. W. Pang, and A. F. Yee, “Nanoimprinting over topography and multilayer three-dimensional printing,” J. Vac. Sci. Technol. B 20(6), 2881–2886 (2002).
[Crossref]

Y.-F. Huang, S. Chattopadhyay, Y.-J. Jen, C.-Y. Peng, T.-A. Liu, Y.-K. Hsu, C.-L. Pan, H.-C. Lo, C.-H. Hsu, Y.-H. Chang, C.-S. Lee, K.-H. Chen, and L.-C. Chen, “Improved broadband and quasiomnidirectional anti-reflection properties with biomimetic silicon nanostructures,” Nat. Nanotechnol. 2(12), 770–774 (2007).
[Crossref] [PubMed]

E. B. Grann, M. G. Varga, and D. A. Pommet, “Optimal design for antireflective tapered two-dimensional subwavelength grating structures,” J. Opt. Soc. Am. A 12(2), 333–339 (1995).
[Crossref]

D. H. Raguin and G. M. Morris, “Antireflection structured surfaces for the infrared spectral region,” Appl. Opt. 32(7), 1154–1167 (1993).
[Crossref] [PubMed]

Y. Kanamori, K. Hane, H. Sai, and H. Yugami, “100 nm Period silicon antireflection structures fabricated using a porous alumina membrane mask,” Appl. Phys. Lett. 78(2), 142–143 (2001).
[Crossref]

K. Kobayashi, N. Sakai, S. Matsui, and M. Nakagawa, “Fluorescent UV-curable resists for UV-nanoimprint lithography,” Jpn. J. Appl. Phys. 49(6), 06GL07 (2010).
[Crossref]

Y. Kanamori, M. Sasaki, and K. Hane, “Broadband antireflection gratings fabricated upon silicon substrates,” Opt. Lett. 24(20), 1422–1424 (1999).
[Crossref] [PubMed]

C. David, P. Häberling, M. Schnieper, J. Söchtig, and C. Zschokke, “Nano-structured anti-reflective surfaces replicated by hot embossing,” Microelectron. Eng. 61–62, 435–440 (2002).
[Crossref]

C. David, P. Häberling, M. Schnieper, J. Söchtig, and C. Zschokke, “Nano-structured anti-reflective surfaces replicated by hot embossing,” Microelectron. Eng. 61–62, 435–440 (2002).
[Crossref]

M. E. Motamedi, W. H. Southwell, and W. J. Gunning, “Antireflection surfaces in silicon using binary optics technology,” Appl. Opt. 31(22), 4371–4376 (1992).
[Crossref] [PubMed]

H. Toyota, K. Takahara, M. Okano, T. Yotsuya, and H. Kikuta, “Fabrication of microcone array for antireflection structured surface using metal dotted pattern,” Jpn. J. Appl. Phys. 40(Part 2, No. 7B), L747–L749 (2001).
[Crossref]

K. Yamada, M. Umetani, T. Tamura, Y. Tanaka, H. Kasa, and J. Nishii, “Antireflective structure imprinted on the surface of optical glass by SiC mold,” Appl. Surf. Sci. 255(7), 4267–4270 (2009).
[Crossref]

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