Abstract

Vertical GaN-based light-emitting diodes (LEDs) were fabricated with a Si substrate using the wafer-bonding technique. Lapping and dry-etching processes were performed for thinning the sapphire substrate instead of removing this substrate using the laser lift-off technique and the thinning process associated with the wafer-bonding technique to feature LEDs with a sapphire-face-up structure and vertical conduction property. Compared with conventional lateral GaN/sapphire-based LEDs, GaN/Si-based vertical LEDs exhibit higher light output power and less power degradation at a high driving current, which could be attributed to the fact that vertical LEDs behave in a manner similar to flip-chip GaN/sapphire LEDs with excellent heat conduction. In addition, with an injection current of 350 mA, the output power (or forward voltage) of fabricated vertical LEDs can be enhanced (or reduced) by a magnitude of 60% (or 5%) compared with conventional GaN/sapphire-based LEDs.

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  1. E. F. Schubert, Light-Emitting Diode, 2nd ed. (Cambridge University Press, 2006), pp. 150–160.
  2. W. S. Wong, M. Kneissl, P. Mei, D. W. Treat, M. Teepe, and N. M. Johnson, “Continuous-wave InGaN multiple-quantum-well laser diodes on copper substrates,” Appl. Phys. Lett.78(9), 1198–1200 (2001) (and references therein).
    [CrossRef]
  3. S. C. Hsu, B. J. Pong, W. H. Li, T. E. Beechem, S. Graham, and C. Y. Liu, “Stress relaxation in GaN by transfer bonding on Si substrates,” Appl. Phys. Lett.91(25), 251114 (2007) (and references therein).
    [CrossRef]
  4. D. S. Wuu, S. C. Hsu, S. H. Huang, C. C. Wu, C. E. Lee, and R. H. Horng, “GaN/mirror/Si light-emitting diodes for vertical current injection by laser lift-off and wafer bonding techniques,” Jpn. J. Appl. Phys.43(8A), 5239–5242 (2004) (and references therein).
    [CrossRef]
  5. Y. S. Wu, J. H. Cheng, W. C. Peng, and H. Ouyang, “Effects of laser sources on the reverse-bias leakages of laser lift-off GaN-based light-emitting diodes,” Appl. Phys. Lett.90(25), 251110 (2007).
  6. C. M. Tsai, J. K. Sheu, W. C. Lai, M. L. Lee, S. J. Chang, C. S. Chang, T. K. Ko, and C. F. Shen, “GaN-based LEDs output power improved by textured GaN/sapphire interface using in situ SiH4 treatment process during epitaxial growth,” IEEE J. Sel. Top. Quantum Electron.15(4), 1275–1280 (2009).
    [CrossRef]
  7. H. Y. Kuo, S. J. Wang, P. R. Wang, K. M. Uang, T. M. Chen, S. L. Chen, W. C. Lee, H. K. Hsu, J. C. Chou, and C. H. Wu, “Use of elastic conductive adhesive as the bonding agent for the fabrication of vertical structure GaN-based LEDs on flexible metal substrate,” IEEE Photon. Technol. Lett.20(7), 523–525 (2008).
    [CrossRef]
  8. O. B. Shchekin, J. E. Epler, T. A. Trottier, T. Margalith, D. A. Steigerwald, M. O. Holcomb, P. S. Martin, and M. R. Krames, “High performance thin-film flip-chip InGaN–GaN light-emitting diodes,” Appl. Phys. Lett.89(7), 071109 (2006).
    [CrossRef]
  9. T. Mukai, M. Yamada, and S. Nakamura, “Current and temperature dependences of electroluminescence of InGaN-based UV/blue/green light-emitting diodes,” Jpn. J. Appl. Phys.37(11B), L1358–L1361 (1998).
    [CrossRef]

2009 (1)

C. M. Tsai, J. K. Sheu, W. C. Lai, M. L. Lee, S. J. Chang, C. S. Chang, T. K. Ko, and C. F. Shen, “GaN-based LEDs output power improved by textured GaN/sapphire interface using in situ SiH4 treatment process during epitaxial growth,” IEEE J. Sel. Top. Quantum Electron.15(4), 1275–1280 (2009).
[CrossRef]

2008 (1)

H. Y. Kuo, S. J. Wang, P. R. Wang, K. M. Uang, T. M. Chen, S. L. Chen, W. C. Lee, H. K. Hsu, J. C. Chou, and C. H. Wu, “Use of elastic conductive adhesive as the bonding agent for the fabrication of vertical structure GaN-based LEDs on flexible metal substrate,” IEEE Photon. Technol. Lett.20(7), 523–525 (2008).
[CrossRef]

2007 (2)

S. C. Hsu, B. J. Pong, W. H. Li, T. E. Beechem, S. Graham, and C. Y. Liu, “Stress relaxation in GaN by transfer bonding on Si substrates,” Appl. Phys. Lett.91(25), 251114 (2007) (and references therein).
[CrossRef]

Y. S. Wu, J. H. Cheng, W. C. Peng, and H. Ouyang, “Effects of laser sources on the reverse-bias leakages of laser lift-off GaN-based light-emitting diodes,” Appl. Phys. Lett.90(25), 251110 (2007).

2006 (1)

O. B. Shchekin, J. E. Epler, T. A. Trottier, T. Margalith, D. A. Steigerwald, M. O. Holcomb, P. S. Martin, and M. R. Krames, “High performance thin-film flip-chip InGaN–GaN light-emitting diodes,” Appl. Phys. Lett.89(7), 071109 (2006).
[CrossRef]

2004 (1)

D. S. Wuu, S. C. Hsu, S. H. Huang, C. C. Wu, C. E. Lee, and R. H. Horng, “GaN/mirror/Si light-emitting diodes for vertical current injection by laser lift-off and wafer bonding techniques,” Jpn. J. Appl. Phys.43(8A), 5239–5242 (2004) (and references therein).
[CrossRef]

2001 (1)

W. S. Wong, M. Kneissl, P. Mei, D. W. Treat, M. Teepe, and N. M. Johnson, “Continuous-wave InGaN multiple-quantum-well laser diodes on copper substrates,” Appl. Phys. Lett.78(9), 1198–1200 (2001) (and references therein).
[CrossRef]

1998 (1)

T. Mukai, M. Yamada, and S. Nakamura, “Current and temperature dependences of electroluminescence of InGaN-based UV/blue/green light-emitting diodes,” Jpn. J. Appl. Phys.37(11B), L1358–L1361 (1998).
[CrossRef]

Beechem, T. E.

S. C. Hsu, B. J. Pong, W. H. Li, T. E. Beechem, S. Graham, and C. Y. Liu, “Stress relaxation in GaN by transfer bonding on Si substrates,” Appl. Phys. Lett.91(25), 251114 (2007) (and references therein).
[CrossRef]

Chang, C. S.

C. M. Tsai, J. K. Sheu, W. C. Lai, M. L. Lee, S. J. Chang, C. S. Chang, T. K. Ko, and C. F. Shen, “GaN-based LEDs output power improved by textured GaN/sapphire interface using in situ SiH4 treatment process during epitaxial growth,” IEEE J. Sel. Top. Quantum Electron.15(4), 1275–1280 (2009).
[CrossRef]

Chang, S. J.

C. M. Tsai, J. K. Sheu, W. C. Lai, M. L. Lee, S. J. Chang, C. S. Chang, T. K. Ko, and C. F. Shen, “GaN-based LEDs output power improved by textured GaN/sapphire interface using in situ SiH4 treatment process during epitaxial growth,” IEEE J. Sel. Top. Quantum Electron.15(4), 1275–1280 (2009).
[CrossRef]

Chen, S. L.

H. Y. Kuo, S. J. Wang, P. R. Wang, K. M. Uang, T. M. Chen, S. L. Chen, W. C. Lee, H. K. Hsu, J. C. Chou, and C. H. Wu, “Use of elastic conductive adhesive as the bonding agent for the fabrication of vertical structure GaN-based LEDs on flexible metal substrate,” IEEE Photon. Technol. Lett.20(7), 523–525 (2008).
[CrossRef]

Chen, T. M.

H. Y. Kuo, S. J. Wang, P. R. Wang, K. M. Uang, T. M. Chen, S. L. Chen, W. C. Lee, H. K. Hsu, J. C. Chou, and C. H. Wu, “Use of elastic conductive adhesive as the bonding agent for the fabrication of vertical structure GaN-based LEDs on flexible metal substrate,” IEEE Photon. Technol. Lett.20(7), 523–525 (2008).
[CrossRef]

Cheng, J. H.

Y. S. Wu, J. H. Cheng, W. C. Peng, and H. Ouyang, “Effects of laser sources on the reverse-bias leakages of laser lift-off GaN-based light-emitting diodes,” Appl. Phys. Lett.90(25), 251110 (2007).

Chou, J. C.

H. Y. Kuo, S. J. Wang, P. R. Wang, K. M. Uang, T. M. Chen, S. L. Chen, W. C. Lee, H. K. Hsu, J. C. Chou, and C. H. Wu, “Use of elastic conductive adhesive as the bonding agent for the fabrication of vertical structure GaN-based LEDs on flexible metal substrate,” IEEE Photon. Technol. Lett.20(7), 523–525 (2008).
[CrossRef]

Epler, J. E.

O. B. Shchekin, J. E. Epler, T. A. Trottier, T. Margalith, D. A. Steigerwald, M. O. Holcomb, P. S. Martin, and M. R. Krames, “High performance thin-film flip-chip InGaN–GaN light-emitting diodes,” Appl. Phys. Lett.89(7), 071109 (2006).
[CrossRef]

Graham, S.

S. C. Hsu, B. J. Pong, W. H. Li, T. E. Beechem, S. Graham, and C. Y. Liu, “Stress relaxation in GaN by transfer bonding on Si substrates,” Appl. Phys. Lett.91(25), 251114 (2007) (and references therein).
[CrossRef]

Holcomb, M. O.

O. B. Shchekin, J. E. Epler, T. A. Trottier, T. Margalith, D. A. Steigerwald, M. O. Holcomb, P. S. Martin, and M. R. Krames, “High performance thin-film flip-chip InGaN–GaN light-emitting diodes,” Appl. Phys. Lett.89(7), 071109 (2006).
[CrossRef]

Horng, R. H.

D. S. Wuu, S. C. Hsu, S. H. Huang, C. C. Wu, C. E. Lee, and R. H. Horng, “GaN/mirror/Si light-emitting diodes for vertical current injection by laser lift-off and wafer bonding techniques,” Jpn. J. Appl. Phys.43(8A), 5239–5242 (2004) (and references therein).
[CrossRef]

Hsu, H. K.

H. Y. Kuo, S. J. Wang, P. R. Wang, K. M. Uang, T. M. Chen, S. L. Chen, W. C. Lee, H. K. Hsu, J. C. Chou, and C. H. Wu, “Use of elastic conductive adhesive as the bonding agent for the fabrication of vertical structure GaN-based LEDs on flexible metal substrate,” IEEE Photon. Technol. Lett.20(7), 523–525 (2008).
[CrossRef]

Hsu, S. C.

S. C. Hsu, B. J. Pong, W. H. Li, T. E. Beechem, S. Graham, and C. Y. Liu, “Stress relaxation in GaN by transfer bonding on Si substrates,” Appl. Phys. Lett.91(25), 251114 (2007) (and references therein).
[CrossRef]

D. S. Wuu, S. C. Hsu, S. H. Huang, C. C. Wu, C. E. Lee, and R. H. Horng, “GaN/mirror/Si light-emitting diodes for vertical current injection by laser lift-off and wafer bonding techniques,” Jpn. J. Appl. Phys.43(8A), 5239–5242 (2004) (and references therein).
[CrossRef]

Huang, S. H.

D. S. Wuu, S. C. Hsu, S. H. Huang, C. C. Wu, C. E. Lee, and R. H. Horng, “GaN/mirror/Si light-emitting diodes for vertical current injection by laser lift-off and wafer bonding techniques,” Jpn. J. Appl. Phys.43(8A), 5239–5242 (2004) (and references therein).
[CrossRef]

Johnson, N. M.

W. S. Wong, M. Kneissl, P. Mei, D. W. Treat, M. Teepe, and N. M. Johnson, “Continuous-wave InGaN multiple-quantum-well laser diodes on copper substrates,” Appl. Phys. Lett.78(9), 1198–1200 (2001) (and references therein).
[CrossRef]

Kneissl, M.

W. S. Wong, M. Kneissl, P. Mei, D. W. Treat, M. Teepe, and N. M. Johnson, “Continuous-wave InGaN multiple-quantum-well laser diodes on copper substrates,” Appl. Phys. Lett.78(9), 1198–1200 (2001) (and references therein).
[CrossRef]

Ko, T. K.

C. M. Tsai, J. K. Sheu, W. C. Lai, M. L. Lee, S. J. Chang, C. S. Chang, T. K. Ko, and C. F. Shen, “GaN-based LEDs output power improved by textured GaN/sapphire interface using in situ SiH4 treatment process during epitaxial growth,” IEEE J. Sel. Top. Quantum Electron.15(4), 1275–1280 (2009).
[CrossRef]

Krames, M. R.

O. B. Shchekin, J. E. Epler, T. A. Trottier, T. Margalith, D. A. Steigerwald, M. O. Holcomb, P. S. Martin, and M. R. Krames, “High performance thin-film flip-chip InGaN–GaN light-emitting diodes,” Appl. Phys. Lett.89(7), 071109 (2006).
[CrossRef]

Kuo, H. Y.

H. Y. Kuo, S. J. Wang, P. R. Wang, K. M. Uang, T. M. Chen, S. L. Chen, W. C. Lee, H. K. Hsu, J. C. Chou, and C. H. Wu, “Use of elastic conductive adhesive as the bonding agent for the fabrication of vertical structure GaN-based LEDs on flexible metal substrate,” IEEE Photon. Technol. Lett.20(7), 523–525 (2008).
[CrossRef]

Lai, W. C.

C. M. Tsai, J. K. Sheu, W. C. Lai, M. L. Lee, S. J. Chang, C. S. Chang, T. K. Ko, and C. F. Shen, “GaN-based LEDs output power improved by textured GaN/sapphire interface using in situ SiH4 treatment process during epitaxial growth,” IEEE J. Sel. Top. Quantum Electron.15(4), 1275–1280 (2009).
[CrossRef]

Lee, C. E.

D. S. Wuu, S. C. Hsu, S. H. Huang, C. C. Wu, C. E. Lee, and R. H. Horng, “GaN/mirror/Si light-emitting diodes for vertical current injection by laser lift-off and wafer bonding techniques,” Jpn. J. Appl. Phys.43(8A), 5239–5242 (2004) (and references therein).
[CrossRef]

Lee, M. L.

C. M. Tsai, J. K. Sheu, W. C. Lai, M. L. Lee, S. J. Chang, C. S. Chang, T. K. Ko, and C. F. Shen, “GaN-based LEDs output power improved by textured GaN/sapphire interface using in situ SiH4 treatment process during epitaxial growth,” IEEE J. Sel. Top. Quantum Electron.15(4), 1275–1280 (2009).
[CrossRef]

Lee, W. C.

H. Y. Kuo, S. J. Wang, P. R. Wang, K. M. Uang, T. M. Chen, S. L. Chen, W. C. Lee, H. K. Hsu, J. C. Chou, and C. H. Wu, “Use of elastic conductive adhesive as the bonding agent for the fabrication of vertical structure GaN-based LEDs on flexible metal substrate,” IEEE Photon. Technol. Lett.20(7), 523–525 (2008).
[CrossRef]

Li, W. H.

S. C. Hsu, B. J. Pong, W. H. Li, T. E. Beechem, S. Graham, and C. Y. Liu, “Stress relaxation in GaN by transfer bonding on Si substrates,” Appl. Phys. Lett.91(25), 251114 (2007) (and references therein).
[CrossRef]

Liu, C. Y.

S. C. Hsu, B. J. Pong, W. H. Li, T. E. Beechem, S. Graham, and C. Y. Liu, “Stress relaxation in GaN by transfer bonding on Si substrates,” Appl. Phys. Lett.91(25), 251114 (2007) (and references therein).
[CrossRef]

Margalith, T.

O. B. Shchekin, J. E. Epler, T. A. Trottier, T. Margalith, D. A. Steigerwald, M. O. Holcomb, P. S. Martin, and M. R. Krames, “High performance thin-film flip-chip InGaN–GaN light-emitting diodes,” Appl. Phys. Lett.89(7), 071109 (2006).
[CrossRef]

Martin, P. S.

O. B. Shchekin, J. E. Epler, T. A. Trottier, T. Margalith, D. A. Steigerwald, M. O. Holcomb, P. S. Martin, and M. R. Krames, “High performance thin-film flip-chip InGaN–GaN light-emitting diodes,” Appl. Phys. Lett.89(7), 071109 (2006).
[CrossRef]

Mei, P.

W. S. Wong, M. Kneissl, P. Mei, D. W. Treat, M. Teepe, and N. M. Johnson, “Continuous-wave InGaN multiple-quantum-well laser diodes on copper substrates,” Appl. Phys. Lett.78(9), 1198–1200 (2001) (and references therein).
[CrossRef]

Mukai, T.

T. Mukai, M. Yamada, and S. Nakamura, “Current and temperature dependences of electroluminescence of InGaN-based UV/blue/green light-emitting diodes,” Jpn. J. Appl. Phys.37(11B), L1358–L1361 (1998).
[CrossRef]

Nakamura, S.

T. Mukai, M. Yamada, and S. Nakamura, “Current and temperature dependences of electroluminescence of InGaN-based UV/blue/green light-emitting diodes,” Jpn. J. Appl. Phys.37(11B), L1358–L1361 (1998).
[CrossRef]

Ouyang, H.

Y. S. Wu, J. H. Cheng, W. C. Peng, and H. Ouyang, “Effects of laser sources on the reverse-bias leakages of laser lift-off GaN-based light-emitting diodes,” Appl. Phys. Lett.90(25), 251110 (2007).

Peng, W. C.

Y. S. Wu, J. H. Cheng, W. C. Peng, and H. Ouyang, “Effects of laser sources on the reverse-bias leakages of laser lift-off GaN-based light-emitting diodes,” Appl. Phys. Lett.90(25), 251110 (2007).

Pong, B. J.

S. C. Hsu, B. J. Pong, W. H. Li, T. E. Beechem, S. Graham, and C. Y. Liu, “Stress relaxation in GaN by transfer bonding on Si substrates,” Appl. Phys. Lett.91(25), 251114 (2007) (and references therein).
[CrossRef]

Shchekin, O. B.

O. B. Shchekin, J. E. Epler, T. A. Trottier, T. Margalith, D. A. Steigerwald, M. O. Holcomb, P. S. Martin, and M. R. Krames, “High performance thin-film flip-chip InGaN–GaN light-emitting diodes,” Appl. Phys. Lett.89(7), 071109 (2006).
[CrossRef]

Shen, C. F.

C. M. Tsai, J. K. Sheu, W. C. Lai, M. L. Lee, S. J. Chang, C. S. Chang, T. K. Ko, and C. F. Shen, “GaN-based LEDs output power improved by textured GaN/sapphire interface using in situ SiH4 treatment process during epitaxial growth,” IEEE J. Sel. Top. Quantum Electron.15(4), 1275–1280 (2009).
[CrossRef]

Sheu, J. K.

C. M. Tsai, J. K. Sheu, W. C. Lai, M. L. Lee, S. J. Chang, C. S. Chang, T. K. Ko, and C. F. Shen, “GaN-based LEDs output power improved by textured GaN/sapphire interface using in situ SiH4 treatment process during epitaxial growth,” IEEE J. Sel. Top. Quantum Electron.15(4), 1275–1280 (2009).
[CrossRef]

Steigerwald, D. A.

O. B. Shchekin, J. E. Epler, T. A. Trottier, T. Margalith, D. A. Steigerwald, M. O. Holcomb, P. S. Martin, and M. R. Krames, “High performance thin-film flip-chip InGaN–GaN light-emitting diodes,” Appl. Phys. Lett.89(7), 071109 (2006).
[CrossRef]

Teepe, M.

W. S. Wong, M. Kneissl, P. Mei, D. W. Treat, M. Teepe, and N. M. Johnson, “Continuous-wave InGaN multiple-quantum-well laser diodes on copper substrates,” Appl. Phys. Lett.78(9), 1198–1200 (2001) (and references therein).
[CrossRef]

Treat, D. W.

W. S. Wong, M. Kneissl, P. Mei, D. W. Treat, M. Teepe, and N. M. Johnson, “Continuous-wave InGaN multiple-quantum-well laser diodes on copper substrates,” Appl. Phys. Lett.78(9), 1198–1200 (2001) (and references therein).
[CrossRef]

Trottier, T. A.

O. B. Shchekin, J. E. Epler, T. A. Trottier, T. Margalith, D. A. Steigerwald, M. O. Holcomb, P. S. Martin, and M. R. Krames, “High performance thin-film flip-chip InGaN–GaN light-emitting diodes,” Appl. Phys. Lett.89(7), 071109 (2006).
[CrossRef]

Tsai, C. M.

C. M. Tsai, J. K. Sheu, W. C. Lai, M. L. Lee, S. J. Chang, C. S. Chang, T. K. Ko, and C. F. Shen, “GaN-based LEDs output power improved by textured GaN/sapphire interface using in situ SiH4 treatment process during epitaxial growth,” IEEE J. Sel. Top. Quantum Electron.15(4), 1275–1280 (2009).
[CrossRef]

Uang, K. M.

H. Y. Kuo, S. J. Wang, P. R. Wang, K. M. Uang, T. M. Chen, S. L. Chen, W. C. Lee, H. K. Hsu, J. C. Chou, and C. H. Wu, “Use of elastic conductive adhesive as the bonding agent for the fabrication of vertical structure GaN-based LEDs on flexible metal substrate,” IEEE Photon. Technol. Lett.20(7), 523–525 (2008).
[CrossRef]

Wang, P. R.

H. Y. Kuo, S. J. Wang, P. R. Wang, K. M. Uang, T. M. Chen, S. L. Chen, W. C. Lee, H. K. Hsu, J. C. Chou, and C. H. Wu, “Use of elastic conductive adhesive as the bonding agent for the fabrication of vertical structure GaN-based LEDs on flexible metal substrate,” IEEE Photon. Technol. Lett.20(7), 523–525 (2008).
[CrossRef]

Wang, S. J.

H. Y. Kuo, S. J. Wang, P. R. Wang, K. M. Uang, T. M. Chen, S. L. Chen, W. C. Lee, H. K. Hsu, J. C. Chou, and C. H. Wu, “Use of elastic conductive adhesive as the bonding agent for the fabrication of vertical structure GaN-based LEDs on flexible metal substrate,” IEEE Photon. Technol. Lett.20(7), 523–525 (2008).
[CrossRef]

Wong, W. S.

W. S. Wong, M. Kneissl, P. Mei, D. W. Treat, M. Teepe, and N. M. Johnson, “Continuous-wave InGaN multiple-quantum-well laser diodes on copper substrates,” Appl. Phys. Lett.78(9), 1198–1200 (2001) (and references therein).
[CrossRef]

Wu, C. C.

D. S. Wuu, S. C. Hsu, S. H. Huang, C. C. Wu, C. E. Lee, and R. H. Horng, “GaN/mirror/Si light-emitting diodes for vertical current injection by laser lift-off and wafer bonding techniques,” Jpn. J. Appl. Phys.43(8A), 5239–5242 (2004) (and references therein).
[CrossRef]

Wu, C. H.

H. Y. Kuo, S. J. Wang, P. R. Wang, K. M. Uang, T. M. Chen, S. L. Chen, W. C. Lee, H. K. Hsu, J. C. Chou, and C. H. Wu, “Use of elastic conductive adhesive as the bonding agent for the fabrication of vertical structure GaN-based LEDs on flexible metal substrate,” IEEE Photon. Technol. Lett.20(7), 523–525 (2008).
[CrossRef]

Wu, Y. S.

Y. S. Wu, J. H. Cheng, W. C. Peng, and H. Ouyang, “Effects of laser sources on the reverse-bias leakages of laser lift-off GaN-based light-emitting diodes,” Appl. Phys. Lett.90(25), 251110 (2007).

Wuu, D. S.

D. S. Wuu, S. C. Hsu, S. H. Huang, C. C. Wu, C. E. Lee, and R. H. Horng, “GaN/mirror/Si light-emitting diodes for vertical current injection by laser lift-off and wafer bonding techniques,” Jpn. J. Appl. Phys.43(8A), 5239–5242 (2004) (and references therein).
[CrossRef]

Yamada, M.

T. Mukai, M. Yamada, and S. Nakamura, “Current and temperature dependences of electroluminescence of InGaN-based UV/blue/green light-emitting diodes,” Jpn. J. Appl. Phys.37(11B), L1358–L1361 (1998).
[CrossRef]

Appl. Phys. Lett. (4)

W. S. Wong, M. Kneissl, P. Mei, D. W. Treat, M. Teepe, and N. M. Johnson, “Continuous-wave InGaN multiple-quantum-well laser diodes on copper substrates,” Appl. Phys. Lett.78(9), 1198–1200 (2001) (and references therein).
[CrossRef]

S. C. Hsu, B. J. Pong, W. H. Li, T. E. Beechem, S. Graham, and C. Y. Liu, “Stress relaxation in GaN by transfer bonding on Si substrates,” Appl. Phys. Lett.91(25), 251114 (2007) (and references therein).
[CrossRef]

Y. S. Wu, J. H. Cheng, W. C. Peng, and H. Ouyang, “Effects of laser sources on the reverse-bias leakages of laser lift-off GaN-based light-emitting diodes,” Appl. Phys. Lett.90(25), 251110 (2007).

O. B. Shchekin, J. E. Epler, T. A. Trottier, T. Margalith, D. A. Steigerwald, M. O. Holcomb, P. S. Martin, and M. R. Krames, “High performance thin-film flip-chip InGaN–GaN light-emitting diodes,” Appl. Phys. Lett.89(7), 071109 (2006).
[CrossRef]

IEEE J. Sel. Top. Quantum Electron. (1)

C. M. Tsai, J. K. Sheu, W. C. Lai, M. L. Lee, S. J. Chang, C. S. Chang, T. K. Ko, and C. F. Shen, “GaN-based LEDs output power improved by textured GaN/sapphire interface using in situ SiH4 treatment process during epitaxial growth,” IEEE J. Sel. Top. Quantum Electron.15(4), 1275–1280 (2009).
[CrossRef]

IEEE Photon. Technol. Lett. (1)

H. Y. Kuo, S. J. Wang, P. R. Wang, K. M. Uang, T. M. Chen, S. L. Chen, W. C. Lee, H. K. Hsu, J. C. Chou, and C. H. Wu, “Use of elastic conductive adhesive as the bonding agent for the fabrication of vertical structure GaN-based LEDs on flexible metal substrate,” IEEE Photon. Technol. Lett.20(7), 523–525 (2008).
[CrossRef]

Jpn. J. Appl. Phys. (2)

D. S. Wuu, S. C. Hsu, S. H. Huang, C. C. Wu, C. E. Lee, and R. H. Horng, “GaN/mirror/Si light-emitting diodes for vertical current injection by laser lift-off and wafer bonding techniques,” Jpn. J. Appl. Phys.43(8A), 5239–5242 (2004) (and references therein).
[CrossRef]

T. Mukai, M. Yamada, and S. Nakamura, “Current and temperature dependences of electroluminescence of InGaN-based UV/blue/green light-emitting diodes,” Jpn. J. Appl. Phys.37(11B), L1358–L1361 (1998).
[CrossRef]

Other (1)

E. F. Schubert, Light-Emitting Diode, 2nd ed. (Cambridge University Press, 2006), pp. 150–160.

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Figures (4)

Fig. 1
Fig. 1

(a) Schematic vertical LED structure with Si substrate (b) schematic lateral LED structure with sapphire substrate (c) show typical cross-sections of scanning electron microscopy (SEM) images taken from the LED-II.

Fig. 2
Fig. 2

(a) Typical forward I-V and light-output power-current (L-I) characteristics of the experimental LEDs (b) reverse I-V characteristics of the experimental LEDs.

Fig. 3
Fig. 3

Emission wavelength against injection current for the LED-I and LED-II.

Fig. 4
Fig. 4

Typical AFM images taken from the sapphire surfaces of (a) LED-II and (b) LED-III.

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