Triple-wavelength, narrowband Mg/SiC multilayers with corrosion barriers and high peak reflectance in the 25-80 nm wavelength region

Mónica Fernández-Perea; Regina Soufli; Jeff C. Robinson; Luis Rodríguez De Marcos; Jose A. Méndez; Juan I. Larruquert; Eric M. Gullikson

doi:10.1364/OE.20.024018

Triple-wavelength, narrowband Mg/SiC multilayers with corrosion barriers and high peak reflectance in the 25-80 nm wavelength region

Mónica Fernández-Perea, Regina Soufli, Jeff C. Robinson, Luis Rodríguez De Marcos, Jose A. Méndez, Juan I. Larruquert, and Eric M. Gullikson

Optics Express
Vol. 20,
Issue 21,
pp. 24018-24029
(2012)
•https://doi.org/10.1364/OE.20.024018

Get Citation
Copy Citation Text
Mónica Fernández-Perea, Regina Soufli, Jeff C. Robinson, Luis Rodríguez De Marcos, Jose A. Méndez, Juan I. Larruquert, and Eric M. Gullikson, "Triple-wavelength, narrowband Mg/SiC multilayers with corrosion barriers and high peak reflectance in the 25-80 nm wavelength region," Opt. Express 20, 24018-24029 (2012)

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Get PDF (1910 KB)
Set citation alerts
Save article

Related Topics
Table of Contents Category
- Thin Films
Optics & Photonics Topics
?

The topics in this list come from the OSA Optics and Photonics Topics applied to this article.
Previously assigned OCIS codes
- Mirrors (230.4040)
- Space optics (350.6090)
- Ultraviolet, extreme (260.7200)
- Deposition and fabrication (310.1860)
- Multilayer design (310.4165)

About this Article
History
- Original Manuscript: August 16, 2012
- Revised Manuscript: September 27, 2012
- Manuscript Accepted: September 27, 2012
- Published: October 5, 2012

Accessible

Open Access

Abstract

We have developed new, Mg/SiC multilayer coatings with corrosion barriers which can be used to efficiently and simultaneously reflect extreme ultraviolet (EUV) radiation in single or multiple narrow bands centered at wavelengths in the spectral region from 25 to 80 nm. Corrosion mitigation was attempted through the use of Al-Mg or Al thin layers. Three different multilayer design concepts were developed and deposited by magnetron sputtering and the reflectance was measured at near-normal incidence in a broad spectral range. Standard Mg/SiC multilayers were also deposited and measured for comparison. They were shown to efficiently reflect radiation at a wavelength of 76.9 nm with a peak reflectance of 40.6% at near-normal incidence, the highest experimental reflectance reported at this wavelength for a narrowband coating. The demonstration of multilayer coatings with corrosion resistance and multiple-wavelength EUV performance is of great interest in the development of mirrors for space-borne solar physics telescopes and other applications requiring long-lasting coatings with narrowband response in multiple emission lines across the EUV range.

Full Article | PDF Article

OSA Recommended Articles

Aging and thermal stability of Mg/SiC and Mg/Y₂O₃ reflection multilayers in the 25–35 nm region

Takeo Ejima, Atsushi Yamazaki, Takanori Banse, Katsuhiko Saito, Yuji Kondo, Satoshi Ichimaru, and Hisataka Takenaka
Appl. Opt. 44(26) 5446-5453 (2005)

Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications

David L. Windt and Jeffrey A. Bellotti
Appl. Opt. 48(26) 4932-4941 (2009)

Comparison of Mg-based multilayers for solar He II radiation at 30.4 nm wavelength

Jingtao Zhu, Sika Zhou, Haochuan Li, Qiushi Huang, Zhanshan Wang, Karine Le Guen, Min-Hui Hu, Jean-Michel André, and Philippe Jonnard
Appl. Opt. 49(20) 3922-3925 (2010)

References

View by:
Article Order
|
Year
|
Author
|
Publication

A. B. C. Walker, J. F. Lindblom, T. W. Barbee, and R. B. Hoover, “Soft x-ray images of the solar corona with a normal-incidence Cassegrain multilayer telescope,” Science 241(4874), 1781–1787 (1988).
[Crossref] [PubMed]
B. De Pontieu, S. W. McIntosh, M. Carlsson, V. H. Hansteen, T. D. Tarbell, P. Boerner, J. Martinez-Sykora, C. J. Schrijver, and A. M. Title, “The origins of hot plasma in the solar corona,” Science 331(6013), 55–58 (2011).
[Crossref] [PubMed]
S. P. Hau-Riege, H. N. Chapman, J. Krzywinski, R. Sobierajski, S. Bajt, R. A. London, M. Bergh, C. Caleman, R. Nietubyc, L. Juha, J. Kuba, E. Spiller, S. Baker, R. Bionta, K. Sokolowski Tinten, N. Stojanovic, B. Kjornrattanawanich, E. M. Gullikson, E. Plönjes, S. Toleikis, and T. Tschentscher, “Subnanometer-scale measurements of the interaction of ultrafast soft x-ray free-electron-laser pulses with matter,” Phys. Rev. Lett. 98(14), 145502 (2007).
[Crossref] [PubMed]
S. Heinbuch, M. Grisham, D. Martz, and J. J. Rocca, “Demonstration of a desk-top size high repetition rate soft x-ray laser,” Opt. Express 13(11), 4050–4055 (2005).
[Crossref] [PubMed]
J. Filevich, K. Kanizay, M. C. Marconi, J. L. A. Chilla, and J. J. Rocca, “Dense plasma diagnostics with an amplitude-division soft-x-ray laser interferometer based on diffraction gratings,” Opt. Lett. 25(5), 356–358 (2000).
[Crossref] [PubMed]
I. A. Artioukov, B. R. Benware, J. J. Rocca, M. Forsythe, Y. A. Uspenskii, and A. V. Vinogradov, “Determination of XUV optical constants by reflectometry using a high-repetition rate 46.9-nm laser,” IEEE J. Sel. Top. Quantum Electron. 5(6), 1495–1501 (1999).
[Crossref]
M. Seminario, J. J. Rocca, R. A. Depine, B. Bach, and B. Bach, “Characterization of diffraction gratings by use of a tabletop soft-x-ray laser,” Appl. Opt. 40(30), 5539–5544 (2001).
[Crossref] [PubMed]
J. Shin, F. Dong, M. E. Grisham, J. J. Rocca, and E. R. Bernstein, “Extreme ultraviolet photoionization of aldoses and ketoses,” Chem. Phys. Lett. 506(4-6), 161–166 (2011).
[Crossref]
P. Wachulak, M. Grisham, S. Heinbuch, D. Martz, W. Rockward, D. Hill, J. J. Rocca, C. S. Menoni, E. Anderson, and M. Marconi, “Interferometric lithography with an amplitude division interferometer and a desktop extreme ultraviolet laser,” J. Opt. Soc. Am. B 25(7), B104–B107 (2008).
[Crossref]
C. A. Brewer, F. Brizuela, P. Wachulak, D. H. Martz, W. Chao, E. H. Anderson, D. T. Attwood, A. V. Vinogradov, I. A. Artyukov, A. G. Ponomareko, V. V. Kondratenko, M. C. Marconi, J. J. Rocca, and C. S. Menoni, “Single-shot extreme ultraviolet laser imaging of nanostructures with wavelength resolution,” Opt. Lett. 33(5), 518–520 (2008).
[Crossref] [PubMed]
C. Hecquet, F. Delmotte, M.-F. Ravet-Krill, S. Rossi, A. Jérome, F. Bridou, F. Varnière, E. Meltchakov, F. Auchère, A. Giglia, N. Mahne, and S. Nanaronne, “Design and performance of two-channel EUV multilayer mirrors with enhanced spectral selectivity,” Appl. Phys., A Mater. Sci. Process. 95(2), 401–408 (2009).
[Crossref]
T. Ejima, Y. Kondo, and M. Watanabe, “Two-color reflection multilayers for He-I and He-II resonance lines for microscopic ultraviolet photoelectron spectroscopy using Schwarzschild objective,” Jpn. J. Appl. Phys. 40(Part 1, No. 1), 376–379 (2001).
[Crossref]
P. Boerner, C. Edwards, J. Lemen, A. Rausch, C. Schrijver, R. Shine, L. Shing, R. Stern, T. Tarbell, A. Title, C. J. Wolfson, R. Soufli, E. Spiller, E. Gullikson, D. McKenzie, D. Windt, L. Golub, W. Podgorski, P. Testa, and M. Weber, “Initial calibration of the Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory (SDO),” Sol. Phys. 275(1-2), 41–66 (2012).
[Crossref]
R. Soufli, D. L. Windt, J. C. Robinson, S. L. Baker, E. A. Spiller, F. J. Dollar, A. L. Aquila, E. M. Gullikson, B. Kjornrattanawanich, J. F. Seely, and L. Golub, “Development and testing of EUV multilayer coatings for the atmospheric imaging assembly instrument aboard the Solar Dynamics Observatory,” SPIE Proc. 5901, 59010M, 59010M-11 (2005).
[Crossref]
R. Soufli, E. Spiller, D. L. Windt, J. C. Robinson, E. M. Gullikson, L. Rodriguez-de Marcos, M. Fernández-Perea, S. L. Baker, A. L. Aquila, F. J. Dollar, J. A. Méndez, J. I. Larruquert, L. Golub, and P. Boerner, “In-band and out-of-band reflectance calibrations of the EUV multilayer mirrors of the Atmospheric Imaging Assembly instrument aboard the Solar Dynamics Observatory,” SPIE Proc.in press.
D. Martínez-Galarce, R. Soufli, D. L. Windt, M. Bruner, E. Gullikson, S. Khatri, E. Spiller, J. Robinson, S. Baker, and E. Prast, “Microroughness measurements and EUV calibration of the Solar Ultraviolet Imager multilayer-coated mirrors,” SPIE Proc.in press.
H. Takenaka, S. Ichimaru, T. Ohchi, and E. M. Gullikson, “Soft-x-ray reflectivity and heat resistance of SiC/Mg multilayer,” J. Electron Spectrosc. Relat. Phenom. 144–147, 1047–1049 (2005).
[Crossref]
A. Aquila, F. Salmassi, Y. Liu, and E. M. Gullikson, “Tri-material multilayer coatings with high reflectivity and wide bandwidth for 25 to 50 nm extreme ultraviolet light,” Opt. Express 17(24), 22102–22107 (2009).
[Crossref] [PubMed]
D. L. Windt, S. Donguy, J. Seely, and B. Kjornrattanawanich, “Experimental comparison of extreme-ultraviolet multilayers for solar physics,” Appl. Opt. 43(9), 1835–1848 (2004).
[Crossref] [PubMed]
S. A. Yulin, F. Schaefers, T. Feigl, and N. Kaiser, “Enhanced reflectivity and stability of Sc/Si multilayers,” SPIE Proc. 5193, 155–163 (2004).
[Crossref]
D. L. Windt and J. A. Bellotti, “Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications,” Appl. Opt. 48(26), 4932–4941 (2009).
[Crossref] [PubMed]
J. Zhu, S. Zhou, H. Li, Q. Huang, Z. Wang, K. L. Guen, M.-H. Hu, J.-M. André, and P. Jonnard, “Comparison of Mg-based multilayers for solar He II radiation at 30.4 nm wavelength,” Appl. Opt. 49(20), 3922–3925 (2010).
[Crossref] [PubMed]
M. Vidal-Dasilva, M. Fernández-Perea, J. A. Méndez, J. A. Aznárez, and J. I. Larruquert, “Narrowband multilayer coatings for the extreme ultraviolet range of 50-92 nm,” Opt. Express 17(25), 22773–22784 (2009).
[Crossref] [PubMed]
D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Y. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30(23), 3186–3188 (2005).
[Crossref] [PubMed]
B. Kjornrattanawanich, D. L. Windt, and J. F. Seely, “Normal-incidence silicon-gadolinium multilayers for imaging at 63 nm wavelength,” Opt. Lett. 33(9), 965–967 (2008).
[Crossref] [PubMed]
J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” SPIE Proc. 6317, 63170T, 63170T-9 (2006).
[Crossref]
M. G. Pelizzo, S. Fineschi, A. J. Corso, P. Zuppella, P. Nicolosi, J. Seely, B. Kjornrattanawanich, and D. L. Windt, “Long-term stability of Mg/SiC multilayers,” Opt. Eng. 51(2), 023801 (2012).
[Crossref]
R. Soufli, M. Fernández-Perea, S. L. Baker, J. C. Robinson, J. Alameda, and C. C. Walton, “Spontaneously intermixed Al-Mg barriers enable corrosion-resistant Mg/SiC multilayer coatings,” Appl. Phys. Lett. 101(4), 043111 (2012).
[Crossref]
M. Vidal-Dasilva, A. L. Aquila, E. M. Gullikson, F. Salmassi, and J. I. Larruquert, “Optical constants of magnetron-sputtered magnesium films in the 25–1300 eV energy range,” J. Appl. Phys. 108(6), 063517 (2010).
[Crossref]
E. Shiles, T. Sasaki, M. Inokuti, and D. Y. Smith, “Self-consistency and sum-rule tests in the Kramers-Kronig analysis of optical data: Applications to aluminum,” Phys. Rev. B 22, 1612–1628 (1980), as compiled by E. D. Palik, Handbook of Optical Constants of Solids (Academic Press, 1985).
R. Soufli and E. M. Gullikson, “Reflectance measurements on clean surfaces for the determination of optical constants of silicon in the extreme ultraviolet-soft-x-ray region,” Appl. Opt. 36(22), 5499–5507 (1997).
[Crossref] [PubMed]
H. R. Philipp, “Influence of oxide layers on the determination of the optical properties of silicon,” J. Appl. Phys. 43, 2835–2839 (1972), as compiled by E. D. Palik, Handbook of Optical Constants of Solids (Academic Press, 1985).
M. Fernández-Perea, J. I. Larruquert, J. A. Aznárez, J. A. Méndez, L. Poletto, A. M. Malvezzi, A. Giglia, and S. Nannarone, “Determination of optical constants of scandium films in the 20-1000 eV range,” J. Opt. Soc. Am. A 23(11), 2880–2887 (2006).
[Crossref] [PubMed]
D. L. Windt, “IMD: Software for modeling the optical properties of multilayer films,” Comput. Phys. 12(4), 360–370 (1998), http://www.rxollc.com/idl/index.html .
[Crossref]
J. B. Kortright and D. L. Windt, “Amorphous silicon carbide coatings for extreme ultraviolet optics,” Appl. Opt. 27(14), 2841–2846 (1988).
[Crossref] [PubMed]
D. T. Attwood, Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications (Cambridge University Press, 1999).
The observation that the thickness of the intermixed Al-Mg layer is approximately equal to the sum of the thicknesses of the constituent Al and Mg layers was made in Ref. [28] for Al and Mg thicknesses of 20 and 19 nm, respectively. This assumption may not hold for Al and Mg layers in different thickness ranges. At the time of writing of this manuscript, this is the best assumption that can be made based on experimental evidence.
R. Soufli, R. M. Hudyma, E. Spiller, E. M. Gullikson, M. A. Schmidt, J. C. Robinson, S. L. Baker, C. C. Walton, and J. S. Taylor, “Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography,” Appl. Opt. 46(18), 3736–3746 (2007).
[Crossref] [PubMed]
G. G. Stoney, “The tension of metallic films deposited by electrolysis,” Proc. R. Soc. Lond., A Contain. Pap. Math. Phys. Character 82(553), 172–175 (1909).
[Crossref]
J. H. Underwood and E. M. Gullikson, “High-resolution, high-flux, user friendly VLS beamline at the ALS for the 50-1300 eV energy region,” J. Electr. Spectr. Rel. Phenom. 92(1-3), 265–272 (1998).
[Crossref]
E. M. Gullikson, S. Mrowka, and B. B. Kaufmann, “Recent developments in EUV reflectometry at the Advanced Light Source,” SPIE Proc. 4343, 363–373 (2001).
[Crossref]
J. I. Larruquert, M. Vidal-Dasilva, S. García-Cortés, L. Rodríguez-de Marcos, M. Fernández-Perea, J. A. Aznárez, and J. A. Méndez, “Multilayer coatings for the far and extreme ultraviolet,” Proc. SPIE 8076, 80760D, 80760D-8 (2011).
[Crossref]

2012 (3)

P. Boerner, C. Edwards, J. Lemen, A. Rausch, C. Schrijver, R. Shine, L. Shing, R. Stern, T. Tarbell, A. Title, C. J. Wolfson, R. Soufli, E. Spiller, E. Gullikson, D. McKenzie, D. Windt, L. Golub, W. Podgorski, P. Testa, and M. Weber, “Initial calibration of the Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory (SDO),” Sol. Phys. 275(1-2), 41–66 (2012).
[Crossref]

M. G. Pelizzo, S. Fineschi, A. J. Corso, P. Zuppella, P. Nicolosi, J. Seely, B. Kjornrattanawanich, and D. L. Windt, “Long-term stability of Mg/SiC multilayers,” Opt. Eng. 51(2), 023801 (2012).
[Crossref]

R. Soufli, M. Fernández-Perea, S. L. Baker, J. C. Robinson, J. Alameda, and C. C. Walton, “Spontaneously intermixed Al-Mg barriers enable corrosion-resistant Mg/SiC multilayer coatings,” Appl. Phys. Lett. 101(4), 043111 (2012).
[Crossref]

2011 (3)

J. I. Larruquert, M. Vidal-Dasilva, S. García-Cortés, L. Rodríguez-de Marcos, M. Fernández-Perea, J. A. Aznárez, and J. A. Méndez, “Multilayer coatings for the far and extreme ultraviolet,” Proc. SPIE 8076, 80760D, 80760D-8 (2011).
[Crossref]

B. De Pontieu, S. W. McIntosh, M. Carlsson, V. H. Hansteen, T. D. Tarbell, P. Boerner, J. Martinez-Sykora, C. J. Schrijver, and A. M. Title, “The origins of hot plasma in the solar corona,” Science 331(6013), 55–58 (2011).
[Crossref] [PubMed]

J. Shin, F. Dong, M. E. Grisham, J. J. Rocca, and E. R. Bernstein, “Extreme ultraviolet photoionization of aldoses and ketoses,” Chem. Phys. Lett. 506(4-6), 161–166 (2011).
[Crossref]

2010 (2)

J. Zhu, S. Zhou, H. Li, Q. Huang, Z. Wang, K. L. Guen, M.-H. Hu, J.-M. André, and P. Jonnard, “Comparison of Mg-based multilayers for solar He II radiation at 30.4 nm wavelength,” Appl. Opt. 49(20), 3922–3925 (2010).
[Crossref] [PubMed]

M. Vidal-Dasilva, A. L. Aquila, E. M. Gullikson, F. Salmassi, and J. I. Larruquert, “Optical constants of magnetron-sputtered magnesium films in the 25–1300 eV energy range,” J. Appl. Phys. 108(6), 063517 (2010).
[Crossref]

2009 (4)

D. L. Windt and J. A. Bellotti, “Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications,” Appl. Opt. 48(26), 4932–4941 (2009).
[Crossref] [PubMed]

M. Vidal-Dasilva, M. Fernández-Perea, J. A. Méndez, J. A. Aznárez, and J. I. Larruquert, “Narrowband multilayer coatings for the extreme ultraviolet range of 50-92 nm,” Opt. Express 17(25), 22773–22784 (2009).
[Crossref] [PubMed]

A. Aquila, F. Salmassi, Y. Liu, and E. M. Gullikson, “Tri-material multilayer coatings with high reflectivity and wide bandwidth for 25 to 50 nm extreme ultraviolet light,” Opt. Express 17(24), 22102–22107 (2009).
[Crossref] [PubMed]

C. Hecquet, F. Delmotte, M.-F. Ravet-Krill, S. Rossi, A. Jérome, F. Bridou, F. Varnière, E. Meltchakov, F. Auchère, A. Giglia, N. Mahne, and S. Nanaronne, “Design and performance of two-channel EUV multilayer mirrors with enhanced spectral selectivity,” Appl. Phys., A Mater. Sci. Process. 95(2), 401–408 (2009).
[Crossref]

2008 (3)

P. Wachulak, M. Grisham, S. Heinbuch, D. Martz, W. Rockward, D. Hill, J. J. Rocca, C. S. Menoni, E. Anderson, and M. Marconi, “Interferometric lithography with an amplitude division interferometer and a desktop extreme ultraviolet laser,” J. Opt. Soc. Am. B 25(7), B104–B107 (2008).
[Crossref]

C. A. Brewer, F. Brizuela, P. Wachulak, D. H. Martz, W. Chao, E. H. Anderson, D. T. Attwood, A. V. Vinogradov, I. A. Artyukov, A. G. Ponomareko, V. V. Kondratenko, M. C. Marconi, J. J. Rocca, and C. S. Menoni, “Single-shot extreme ultraviolet laser imaging of nanostructures with wavelength resolution,” Opt. Lett. 33(5), 518–520 (2008).
[Crossref] [PubMed]

B. Kjornrattanawanich, D. L. Windt, and J. F. Seely, “Normal-incidence silicon-gadolinium multilayers for imaging at 63 nm wavelength,” Opt. Lett. 33(9), 965–967 (2008).
[Crossref] [PubMed]

2007 (2)

R. Soufli, R. M. Hudyma, E. Spiller, E. M. Gullikson, M. A. Schmidt, J. C. Robinson, S. L. Baker, C. C. Walton, and J. S. Taylor, “Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography,” Appl. Opt. 46(18), 3736–3746 (2007).
[Crossref] [PubMed]

S. P. Hau-Riege, H. N. Chapman, J. Krzywinski, R. Sobierajski, S. Bajt, R. A. London, M. Bergh, C. Caleman, R. Nietubyc, L. Juha, J. Kuba, E. Spiller, S. Baker, R. Bionta, K. Sokolowski Tinten, N. Stojanovic, B. Kjornrattanawanich, E. M. Gullikson, E. Plönjes, S. Toleikis, and T. Tschentscher, “Subnanometer-scale measurements of the interaction of ultrafast soft x-ray free-electron-laser pulses with matter,” Phys. Rev. Lett. 98(14), 145502 (2007).
[Crossref] [PubMed]

2006 (2)

J. F. Seely, Y. A. Uspenskii, B. Kjornrattanawanich, and D. L. Windt, “Coated photodiode technique for the determination of the optical constants of reactive elements: La and Tb,” SPIE Proc. 6317, 63170T, 63170T-9 (2006).
[Crossref]

M. Fernández-Perea, J. I. Larruquert, J. A. Aznárez, J. A. Méndez, L. Poletto, A. M. Malvezzi, A. Giglia, and S. Nannarone, “Determination of optical constants of scandium films in the 20-1000 eV range,” J. Opt. Soc. Am. A 23(11), 2880–2887 (2006).
[Crossref] [PubMed]

2005 (4)

S. Heinbuch, M. Grisham, D. Martz, and J. J. Rocca, “Demonstration of a desk-top size high repetition rate soft x-ray laser,” Opt. Express 13(11), 4050–4055 (2005).
[Crossref] [PubMed]

R. Soufli, D. L. Windt, J. C. Robinson, S. L. Baker, E. A. Spiller, F. J. Dollar, A. L. Aquila, E. M. Gullikson, B. Kjornrattanawanich, J. F. Seely, and L. Golub, “Development and testing of EUV multilayer coatings for the atmospheric imaging assembly instrument aboard the Solar Dynamics Observatory,” SPIE Proc. 5901, 59010M, 59010M-11 (2005).
[Crossref]

H. Takenaka, S. Ichimaru, T. Ohchi, and E. M. Gullikson, “Soft-x-ray reflectivity and heat resistance of SiC/Mg multilayer,” J. Electron Spectrosc. Relat. Phenom. 144–147, 1047–1049 (2005).
[Crossref]

D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Y. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30(23), 3186–3188 (2005).
[Crossref] [PubMed]

2004 (2)

D. L. Windt, S. Donguy, J. Seely, and B. Kjornrattanawanich, “Experimental comparison of extreme-ultraviolet multilayers for solar physics,” Appl. Opt. 43(9), 1835–1848 (2004).
[Crossref] [PubMed]

S. A. Yulin, F. Schaefers, T. Feigl, and N. Kaiser, “Enhanced reflectivity and stability of Sc/Si multilayers,” SPIE Proc. 5193, 155–163 (2004).
[Crossref]

2001 (3)

T. Ejima, Y. Kondo, and M. Watanabe, “Two-color reflection multilayers for He-I and He-II resonance lines for microscopic ultraviolet photoelectron spectroscopy using Schwarzschild objective,” Jpn. J. Appl. Phys. 40(Part 1, No. 1), 376–379 (2001).
[Crossref]

M. Seminario, J. J. Rocca, R. A. Depine, B. Bach, and B. Bach, “Characterization of diffraction gratings by use of a tabletop soft-x-ray laser,” Appl. Opt. 40(30), 5539–5544 (2001).
[Crossref] [PubMed]

E. M. Gullikson, S. Mrowka, and B. B. Kaufmann, “Recent developments in EUV reflectometry at the Advanced Light Source,” SPIE Proc. 4343, 363–373 (2001).
[Crossref]

2000 (1)

J. Filevich, K. Kanizay, M. C. Marconi, J. L. A. Chilla, and J. J. Rocca, “Dense plasma diagnostics with an amplitude-division soft-x-ray laser interferometer based on diffraction gratings,” Opt. Lett. 25(5), 356–358 (2000).
[Crossref] [PubMed]

1999 (1)

I. A. Artioukov, B. R. Benware, J. J. Rocca, M. Forsythe, Y. A. Uspenskii, and A. V. Vinogradov, “Determination of XUV optical constants by reflectometry using a high-repetition rate 46.9-nm laser,” IEEE J. Sel. Top. Quantum Electron. 5(6), 1495–1501 (1999).
[Crossref]

1998 (2)

J. H. Underwood and E. M. Gullikson, “High-resolution, high-flux, user friendly VLS beamline at the ALS for the 50-1300 eV energy region,” J. Electr. Spectr. Rel. Phenom. 92(1-3), 265–272 (1998).
[Crossref]

D. L. Windt, “IMD: Software for modeling the optical properties of multilayer films,” Comput. Phys. 12(4), 360–370 (1998), http://www.rxollc.com/idl/index.html .
[Crossref]

1997 (1)

R. Soufli and E. M. Gullikson, “Reflectance measurements on clean surfaces for the determination of optical constants of silicon in the extreme ultraviolet-soft-x-ray region,” Appl. Opt. 36(22), 5499–5507 (1997).
[Crossref] [PubMed]

1988 (2)

J. B. Kortright and D. L. Windt, “Amorphous silicon carbide coatings for extreme ultraviolet optics,” Appl. Opt. 27(14), 2841–2846 (1988).
[Crossref] [PubMed]

A. B. C. Walker, J. F. Lindblom, T. W. Barbee, and R. B. Hoover, “Soft x-ray images of the solar corona with a normal-incidence Cassegrain multilayer telescope,” Science 241(4874), 1781–1787 (1988).
[Crossref] [PubMed]

1909 (1)

G. G. Stoney, “The tension of metallic films deposited by electrolysis,” Proc. R. Soc. Lond., A Contain. Pap. Math. Phys. Character 82(553), 172–175 (1909).
[Crossref]

Alameda, J.

Anderson, E.

Anderson, E. H.

André, J.-M.

Aquila, A.

Aquila, A. L.

R. Soufli, E. Spiller, D. L. Windt, J. C. Robinson, E. M. Gullikson, L. Rodriguez-de Marcos, M. Fernández-Perea, S. L. Baker, A. L. Aquila, F. J. Dollar, J. A. Méndez, J. I. Larruquert, L. Golub, and P. Boerner, “In-band and out-of-band reflectance calibrations of the EUV multilayer mirrors of the Atmospheric Imaging Assembly instrument aboard the Solar Dynamics Observatory,” SPIE Proc.in press.

Artioukov, I. A.

Artyukov, I. A.

Attwood, D. T.

Auchère, F.

Aznárez, J. A.

Bach, B.

Bajt, S.

Baker, S.

D. Martínez-Galarce, R. Soufli, D. L. Windt, M. Bruner, E. Gullikson, S. Khatri, E. Spiller, J. Robinson, S. Baker, and E. Prast, “Microroughness measurements and EUV calibration of the Solar Ultraviolet Imager multilayer-coated mirrors,” SPIE Proc.in press.

Baker, S. L.

Barbee, T. W.

Bellotti, J. A.

D. L. Windt and J. A. Bellotti, “Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications,” Appl. Opt. 48(26), 4932–4941 (2009).
[Crossref] [PubMed]

Benware, B. R.

Bergh, M.

Bernstein, E. R.

J. Shin, F. Dong, M. E. Grisham, J. J. Rocca, and E. R. Bernstein, “Extreme ultraviolet photoionization of aldoses and ketoses,” Chem. Phys. Lett. 506(4-6), 161–166 (2011).
[Crossref]

Bionta, R.

Boerner, P.

Brewer, C. A.

Bridou, F.

Brizuela, F.

Bruner, M.

Caleman, C.

Carlsson, M.

Chao, W.

Chapman, H. N.

Chilla, J. L. A.

Corso, A. J.

De Pontieu, B.

Delmotte, F.

Depine, R. A.

Dollar, F. J.

Dong, F.

J. Shin, F. Dong, M. E. Grisham, J. J. Rocca, and E. R. Bernstein, “Extreme ultraviolet photoionization of aldoses and ketoses,” Chem. Phys. Lett. 506(4-6), 161–166 (2011).
[Crossref]

Donguy, S.

Edwards, C.

Ejima, T.

Feigl, T.

S. A. Yulin, F. Schaefers, T. Feigl, and N. Kaiser, “Enhanced reflectivity and stability of Sc/Si multilayers,” SPIE Proc. 5193, 155–163 (2004).
[Crossref]

Fernández-Perea, M.

Filevich, J.

Fineschi, S.

Forsythe, M.

García-Cortés, S.

Giglia, A.

Golub, L.

Grisham, M.

S. Heinbuch, M. Grisham, D. Martz, and J. J. Rocca, “Demonstration of a desk-top size high repetition rate soft x-ray laser,” Opt. Express 13(11), 4050–4055 (2005).
[Crossref] [PubMed]

Grisham, M. E.

J. Shin, F. Dong, M. E. Grisham, J. J. Rocca, and E. R. Bernstein, “Extreme ultraviolet photoionization of aldoses and ketoses,” Chem. Phys. Lett. 506(4-6), 161–166 (2011).
[Crossref]

Guen, K. L.

Gullikson, E.

Gullikson, E. M.

E. M. Gullikson, S. Mrowka, and B. B. Kaufmann, “Recent developments in EUV reflectometry at the Advanced Light Source,” SPIE Proc. 4343, 363–373 (2001).
[Crossref]

Hansteen, V. H.

Hau-Riege, S. P.

Hecquet, C.

Heinbuch, S.

S. Heinbuch, M. Grisham, D. Martz, and J. J. Rocca, “Demonstration of a desk-top size high repetition rate soft x-ray laser,” Opt. Express 13(11), 4050–4055 (2005).
[Crossref] [PubMed]

Hill, D.

Hoover, R. B.

Hu, M.-H.

Huang, Q.

Hudyma, R. M.

Ichimaru, S.

Jérome, A.

Jonnard, P.

Juha, L.

Kaiser, N.

S. A. Yulin, F. Schaefers, T. Feigl, and N. Kaiser, “Enhanced reflectivity and stability of Sc/Si multilayers,” SPIE Proc. 5193, 155–163 (2004).
[Crossref]

Kanizay, K.

Kaufmann, B. B.

E. M. Gullikson, S. Mrowka, and B. B. Kaufmann, “Recent developments in EUV reflectometry at the Advanced Light Source,” SPIE Proc. 4343, 363–373 (2001).
[Crossref]

Khatri, S.

Kjornrattanawanich, B.

B. Kjornrattanawanich, D. L. Windt, and J. F. Seely, “Normal-incidence silicon-gadolinium multilayers for imaging at 63 nm wavelength,” Opt. Lett. 33(9), 965–967 (2008).
[Crossref] [PubMed]

D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Y. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30(23), 3186–3188 (2005).
[Crossref] [PubMed]

Kondo, Y.

Kondratenko, V. V.

Kortright, J. B.

J. B. Kortright and D. L. Windt, “Amorphous silicon carbide coatings for extreme ultraviolet optics,” Appl. Opt. 27(14), 2841–2846 (1988).
[Crossref] [PubMed]

Krzywinski, J.

Kuba, J.

Larruquert, J. I.

Lemen, J.

Li, H.

Lindblom, J. F.

Liu, Y.

London, R. A.

Mahne, N.

Malvezzi, A. M.

Marconi, M.

Marconi, M. C.

Martínez-Galarce, D.

Martinez-Sykora, J.

Martz, D.

S. Heinbuch, M. Grisham, D. Martz, and J. J. Rocca, “Demonstration of a desk-top size high repetition rate soft x-ray laser,” Opt. Express 13(11), 4050–4055 (2005).
[Crossref] [PubMed]

Martz, D. H.

McIntosh, S. W.

McKenzie, D.

Meltchakov, E.

Méndez, J. A.

Menoni, C. S.

Mrowka, S.

E. M. Gullikson, S. Mrowka, and B. B. Kaufmann, “Recent developments in EUV reflectometry at the Advanced Light Source,” SPIE Proc. 4343, 363–373 (2001).
[Crossref]

Nanaronne, S.

Nannarone, S.

Nicolosi, P.

Nietubyc, R.

Ohchi, T.

Pelizzo, M. G.

Plönjes, E.

Podgorski, W.

Poletto, L.

Ponomareko, A. G.

Prast, E.

Rausch, A.

Ravet-Krill, M.-F.

Robinson, J.

Robinson, J. C.

Rocca, J. J.

J. Shin, F. Dong, M. E. Grisham, J. J. Rocca, and E. R. Bernstein, “Extreme ultraviolet photoionization of aldoses and ketoses,” Chem. Phys. Lett. 506(4-6), 161–166 (2011).
[Crossref]

S. Heinbuch, M. Grisham, D. Martz, and J. J. Rocca, “Demonstration of a desk-top size high repetition rate soft x-ray laser,” Opt. Express 13(11), 4050–4055 (2005).
[Crossref] [PubMed]

Rockward, W.

Rodriguez-de Marcos, L.

Rodríguez-de Marcos, L.

Rossi, S.

Salmassi, F.

Schaefers, F.

S. A. Yulin, F. Schaefers, T. Feigl, and N. Kaiser, “Enhanced reflectivity and stability of Sc/Si multilayers,” SPIE Proc. 5193, 155–163 (2004).
[Crossref]

Schmidt, M. A.

Schrijver, C.

Schrijver, C. J.

Seely, J.

Seely, J. F.

B. Kjornrattanawanich, D. L. Windt, and J. F. Seely, “Normal-incidence silicon-gadolinium multilayers for imaging at 63 nm wavelength,” Opt. Lett. 33(9), 965–967 (2008).
[Crossref] [PubMed]

D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Y. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30(23), 3186–3188 (2005).
[Crossref] [PubMed]

Seminario, M.

Shin, J.

J. Shin, F. Dong, M. E. Grisham, J. J. Rocca, and E. R. Bernstein, “Extreme ultraviolet photoionization of aldoses and ketoses,” Chem. Phys. Lett. 506(4-6), 161–166 (2011).
[Crossref]

Shine, R.

Shing, L.

Sobierajski, R.

Sokolowski Tinten, K.

Soufli, R.

Spiller, E.

Spiller, E. A.

Stern, R.

Stojanovic, N.

Stoney, G. G.

G. G. Stoney, “The tension of metallic films deposited by electrolysis,” Proc. R. Soc. Lond., A Contain. Pap. Math. Phys. Character 82(553), 172–175 (1909).
[Crossref]

Takenaka, H.

Tarbell, T.

Tarbell, T. D.

Taylor, J. S.

Testa, P.

Title, A.

Title, A. M.

Toleikis, S.

Tschentscher, T.

Underwood, J. H.

Uspenskii, Y. A.

D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Y. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30(23), 3186–3188 (2005).
[Crossref] [PubMed]

Varnière, F.

Vidal-Dasilva, M.

Vinogradov, A. V.

Wachulak, P.

Walker, A. B. C.

Walton, C. C.

Wang, Z.

Watanabe, M.

Weber, M.

Windt, D.

Windt, D. L.

D. L. Windt and J. A. Bellotti, “Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications,” Appl. Opt. 48(26), 4932–4941 (2009).
[Crossref] [PubMed]

B. Kjornrattanawanich, D. L. Windt, and J. F. Seely, “Normal-incidence silicon-gadolinium multilayers for imaging at 63 nm wavelength,” Opt. Lett. 33(9), 965–967 (2008).
[Crossref] [PubMed]

D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Y. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30(23), 3186–3188 (2005).
[Crossref] [PubMed]

D. L. Windt, “IMD: Software for modeling the optical properties of multilayer films,” Comput. Phys. 12(4), 360–370 (1998), http://www.rxollc.com/idl/index.html .
[Crossref]

J. B. Kortright and D. L. Windt, “Amorphous silicon carbide coatings for extreme ultraviolet optics,” Appl. Opt. 27(14), 2841–2846 (1988).
[Crossref] [PubMed]

Wolfson, C. J.

Yulin, S. A.

S. A. Yulin, F. Schaefers, T. Feigl, and N. Kaiser, “Enhanced reflectivity and stability of Sc/Si multilayers,” SPIE Proc. 5193, 155–163 (2004).
[Crossref]

Zhou, S.

Zhu, J.

Zuppella, P.

Appl. Opt. (7)

D. L. Windt and J. A. Bellotti, “Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications,” Appl. Opt. 48(26), 4932–4941 (2009).
[Crossref] [PubMed]

J. B. Kortright and D. L. Windt, “Amorphous silicon carbide coatings for extreme ultraviolet optics,” Appl. Opt. 27(14), 2841–2846 (1988).
[Crossref] [PubMed]

Appl. Phys. Lett. (1)

Appl. Phys., A Mater. Sci. Process. (1)

Chem. Phys. Lett. (1)

J. Shin, F. Dong, M. E. Grisham, J. J. Rocca, and E. R. Bernstein, “Extreme ultraviolet photoionization of aldoses and ketoses,” Chem. Phys. Lett. 506(4-6), 161–166 (2011).
[Crossref]

Comput. Phys. (1)

D. L. Windt, “IMD: Software for modeling the optical properties of multilayer films,” Comput. Phys. 12(4), 360–370 (1998), http://www.rxollc.com/idl/index.html .
[Crossref]

IEEE J. Sel. Top. Quantum Electron. (1)

J. Appl. Phys. (1)

J. Electr. Spectr. Rel. Phenom. (1)

J. Electron Spectrosc. Relat. Phenom. (1)

J. Opt. Soc. Am. A (1)

J. Opt. Soc. Am. B (1)

Jpn. J. Appl. Phys. (1)

Opt. Eng. (1)

Opt. Express (3)

S. Heinbuch, M. Grisham, D. Martz, and J. J. Rocca, “Demonstration of a desk-top size high repetition rate soft x-ray laser,” Opt. Express 13(11), 4050–4055 (2005).
[Crossref] [PubMed]

Opt. Lett. (4)

B. Kjornrattanawanich, D. L. Windt, and J. F. Seely, “Normal-incidence silicon-gadolinium multilayers for imaging at 63 nm wavelength,” Opt. Lett. 33(9), 965–967 (2008).
[Crossref] [PubMed]

D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Y. A. Uspenskii, “Terbium-based extreme ultraviolet multilayers,” Opt. Lett. 30(23), 3186–3188 (2005).
[Crossref] [PubMed]

Phys. Rev. Lett. (1)

Proc. R. Soc. Lond., A Contain. Pap. Math. Phys. Character (1)

G. G. Stoney, “The tension of metallic films deposited by electrolysis,” Proc. R. Soc. Lond., A Contain. Pap. Math. Phys. Character 82(553), 172–175 (1909).
[Crossref]

Proc. SPIE (1)

Science (2)

Sol. Phys. (1)

SPIE Proc. (6)

S. A. Yulin, F. Schaefers, T. Feigl, and N. Kaiser, “Enhanced reflectivity and stability of Sc/Si multilayers,” SPIE Proc. 5193, 155–163 (2004).
[Crossref]

E. M. Gullikson, S. Mrowka, and B. B. Kaufmann, “Recent developments in EUV reflectometry at the Advanced Light Source,” SPIE Proc. 4343, 363–373 (2001).
[Crossref]

Other (4)

D. T. Attwood, Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications (Cambridge University Press, 1999).

The observation that the thickness of the intermixed Al-Mg layer is approximately equal to the sum of the thicknesses of the constituent Al and Mg layers was made in Ref. [28] for Al and Mg thicknesses of 20 and 19 nm, respectively. This assumption may not hold for Al and Mg layers in different thickness ranges. At the time of writing of this manuscript, this is the best assumption that can be made based on experimental evidence.

E. Shiles, T. Sasaki, M. Inokuti, and D. Y. Smith, “Self-consistency and sum-rule tests in the Kramers-Kronig analysis of optical data: Applications to aluminum,” Phys. Rev. B 22, 1612–1628 (1980), as compiled by E. D. Palik, Handbook of Optical Constants of Solids (Academic Press, 1985).

H. R. Philipp, “Influence of oxide layers on the determination of the optical properties of silicon,” J. Appl. Phys. 43, 2835–2839 (1972), as compiled by E. D. Palik, Handbook of Optical Constants of Solids (Academic Press, 1985).

Cited By

OSA participates in Crossref's Cited-By Linking service. Citing articles from OSA journals and other participating publishers are listed here.

Alert me when this article is cited.

Click here to see a list of articles that cite this paper

Fig. 1 Extinction coefficient of several materials widely used as spacers for multilayers in the EUV. Mg shows the lowest extinction coefficient values in the EUV above the Mg 2p edge at 25 nm. Notice that Al also exhibits relatively low absorption between the Al 2p edge at 17 nm and the Al plasma wavelength at 83 nm.

Download Full Size | PPT Slide | PDF

Fig. 2 Two-dimensional, calculated [34] contour plots of near-normal-incidence (θ = 85°) reflectance (R) as a function of both wavelength and multilayer period, for (a) standard Mg/SiC multilayers ([SiC/Mg]x40/SiC), (b) Mg/SiC multilayers where the topmost Mg layer has been replaced by an Al-Mg layer of optimized thickness ([SiC/Mg]x39/SiC/Al-Mg/SiC), and (c) (Al-Mg)/SiC multilayers ([SiC/Al-Mg]x40/SiC).

Download Full Size | PPT Slide | PDF

Fig. 3 Experimental reflectance of standard Mg/SiC multilayer showing a) the first four reflectance orders in log-linear scale and b) data spanning 5 orders of magnitude in log-log scale. Calculated values [34], corresponding to a model with parameters as shown in Table 1, are also included as a solid line. A record narrowband peak reflectance value of 40.6% was obtained at 76.9 nm.

Download Full Size | PPT Slide | PDF

Fig. 4 Experimental reflectance of candidate corrosion-resistant, multiple-wavelength Mg/SiC multilayer concepts where a) the topmost Mg layer has been replaced by an Al-Mg layer with 15.3 wt. % of Al, b) each Mg layer has been replaced by an Al-Mg layer with 60.8 wt. % of Al, and c) the topmost Mg layer has been replaced by an Al layer. All plots include calculated [34] values corresponding to models with parameters as shown in Table 1. In b) the performance of a multilayer with the same thickness and roughness parameters but with a 15.3 wt. % of Al in the Al-Mg layers was also calculated and is shown for the purpose of illustrating the potential of this concept towards high peak reflectance.

Download Full Size | PPT Slide | PDF

Tables (1)

Table 1 Coating parameters corresponding to the models shown as red solid lines in Figs. 3 and 4. The multilayer structure is specified from the bottom to the top of the sample. All thickness (period, d) and roughness (σ) values are given in nm and nm rms, respectively. The thickness of the base Al layer (Al′) is 20 nm. Γ is the ratio of Mg (or Al-Mg) thickness to the total period thickness. σ′ and σ″ represent the roughness in nm of the Mg (or Al-Mg) on SiC and SiC on Mg (or Al-Mg) multilayer interfaces, respectively. The multilayers were designed to have the 1st order reflectance peak at 75, 75, 65 and 55 nm wavelengths.

View Table

Equations (4)

Equations on this page are rendered with MathJax. Learn more.

f_{1} ≅ \frac{2 π}{n_{a} r_{e} λ^{2}} (1 - n),

f_{2} ≅ \frac{2 π}{n_{a} r_{e} λ^{2}} k .

n (A l - M g) ≅ 1 - \frac{r_{e} λ^{2}}{2 π} [{\tilde{n}}_{a} (A l) f_{1} (A l) + {\tilde{n}}_{a} (M g) f_{1} (M g)],

k (A l - M g) ≅ \frac{r_{e} λ^{2}}{2 π} [{\tilde{n}}_{a} (A l) f_{2} (A l) + {\tilde{n}}_{a} (M g) f_{2} (M g)] .

Multilayer structure	Period	Γ	N	σ′	σ″	d(SiC′)	d(Al-Mg′) or d(Al″)	d(SiC″)
[SiC/Mg]xN/SiC″	52.4	0.77	10	0.5	2.0	0	0	10.8
Al′/[SiC/Mg]xN/ SiC′/Al-Mg′/SiC″	52.2	0.78	9	0.3	1.8	11.8	45.0	9.5
Al′/[SiC/Al-Mg]xN/ SiC″	45.0	0.79	10	0.8	1.8	0	0	8.8
Al′/[SiC/Mg]xN/ SiC′/Al″/SiC″	31.5	0.75	35	0.5	0.8	6.2	30.9	9.2