Abstract

We present a silicon-on-insulator Echelle grating 8-channel demutiplexer showing characteristic features, average insertion loss 2.4 dB measured at 1520~1570 nm, adjacent channel crosstalk 15-18 dB, and channel spacing 11.9 nm. Our Echelle grating is remarked by a total internal reflector (TIR) which reflects incident light by a single reflection in contrast to the double reflections of retro-reflector TIR Echelle gratings.

© 2012 OSA

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  1. S. Park, K. J. Kim, I. G. Kim, and G. Kim, “Si micro-ring MUX/DeMUX WDM filters,” Opt. Express19(14), 13531–13539 (2011).
    [CrossRef] [PubMed]
  2. L. Chen, C. R. Doerr, L. Buhl, Y. Baeyens, and R. A. Aroca, “Monolithically integrated 40-wavelength demultiplexer and photodetector array on silicon,” IEEE Photon. Technol. Lett.23(13), 869–871 (2011).
    [CrossRef]
  3. H. Nishi, T. Tsuchizawa, R. Kou, H. Shinojima, T. Yamada, H. Kimura, Y. Ishikawa, K. Wada, and K. Yamada, “Monolithic integration of a silica AWG and Ge photodiodes on Si photonic platform for one-chip WDM receiver,” Opt. Express20(8), 9312–9321 (2012).
    [CrossRef] [PubMed]
  4. A. Alduino, L. Liao, R. Jones, M. Morse, B. Kim, W. Lo, J. Basak, B. Koch, H. Liu, H. Rong, M. Sysak, C. Krause, R. Saba, D. Lazar, L. Horwitz, R. Bar, S. Litski, A. Liu, K. Sullivan, O. Dosunmu, N. Na, T. Yin, F. Haubensack, I. Hsieh, J. Heck, R. Beatty, H. Park, J. Bovington, S. Lee, H. Nguyen, H. Au, K. Nguyen, P. Merani, M. Hakami, and M. Paniccia, “Demonstration of a high speed 4-channel integrated silicon photonics WDM link with hybrid silicon lasers,” IPRSN 2010 postdeadline session, pdiwi5, Monterey, CA, USA, Jul. 25. (2010).
  5. D. Feng, W. Qian, H. Liang, N. N. Feng, S. Liao, C. C. Kung, J. Fong, Y. Liu, R. Shafiiha, D. C. Lee, B. J. Luff, and M. Asghari, “Terabit/s single chip WDM receiver on the SOI platform,” 8th IEEE International Conference on Group IV. Photonics, FA2, London, 320–322 (2011).
  6. O. K. Kwon, C. W. Lee, D. H. Lee, E. D. Sim, J. H. Kim, and Y. S. Baek, “InP-based polarization-insensitive planar waveguide concave grating demultiplexer with flattened spectral response,” ETRI J.31(2), 228–230 (2009).
    [CrossRef]
  7. F. Horst, W. M. J. Green, B. J. Offrein, and Y. A. Vlasov, “Silicon-on-insulator echelle grating WDM demultiplexers with two stigmatic points,” IEEE Photon. Technol. Lett.21(23), 1743–1745 (2009).
    [CrossRef]
  8. M. A. Foster, A. C. Turner, J. E. Sharping, B. S. Schmidt, M. Lipson, and A. L. Gaeta, “Amorphous-Si-based planar grating demultiplexers with total internal reflection grooves,” Electron. Lett.45(17), 905–906 (2009).
    [CrossRef]

2012 (1)

2011 (2)

S. Park, K. J. Kim, I. G. Kim, and G. Kim, “Si micro-ring MUX/DeMUX WDM filters,” Opt. Express19(14), 13531–13539 (2011).
[CrossRef] [PubMed]

L. Chen, C. R. Doerr, L. Buhl, Y. Baeyens, and R. A. Aroca, “Monolithically integrated 40-wavelength demultiplexer and photodetector array on silicon,” IEEE Photon. Technol. Lett.23(13), 869–871 (2011).
[CrossRef]

2009 (3)

O. K. Kwon, C. W. Lee, D. H. Lee, E. D. Sim, J. H. Kim, and Y. S. Baek, “InP-based polarization-insensitive planar waveguide concave grating demultiplexer with flattened spectral response,” ETRI J.31(2), 228–230 (2009).
[CrossRef]

F. Horst, W. M. J. Green, B. J. Offrein, and Y. A. Vlasov, “Silicon-on-insulator echelle grating WDM demultiplexers with two stigmatic points,” IEEE Photon. Technol. Lett.21(23), 1743–1745 (2009).
[CrossRef]

M. A. Foster, A. C. Turner, J. E. Sharping, B. S. Schmidt, M. Lipson, and A. L. Gaeta, “Amorphous-Si-based planar grating demultiplexers with total internal reflection grooves,” Electron. Lett.45(17), 905–906 (2009).
[CrossRef]

Aroca, R. A.

L. Chen, C. R. Doerr, L. Buhl, Y. Baeyens, and R. A. Aroca, “Monolithically integrated 40-wavelength demultiplexer and photodetector array on silicon,” IEEE Photon. Technol. Lett.23(13), 869–871 (2011).
[CrossRef]

Baek, Y. S.

O. K. Kwon, C. W. Lee, D. H. Lee, E. D. Sim, J. H. Kim, and Y. S. Baek, “InP-based polarization-insensitive planar waveguide concave grating demultiplexer with flattened spectral response,” ETRI J.31(2), 228–230 (2009).
[CrossRef]

Baeyens, Y.

L. Chen, C. R. Doerr, L. Buhl, Y. Baeyens, and R. A. Aroca, “Monolithically integrated 40-wavelength demultiplexer and photodetector array on silicon,” IEEE Photon. Technol. Lett.23(13), 869–871 (2011).
[CrossRef]

Buhl, L.

L. Chen, C. R. Doerr, L. Buhl, Y. Baeyens, and R. A. Aroca, “Monolithically integrated 40-wavelength demultiplexer and photodetector array on silicon,” IEEE Photon. Technol. Lett.23(13), 869–871 (2011).
[CrossRef]

Chen, L.

L. Chen, C. R. Doerr, L. Buhl, Y. Baeyens, and R. A. Aroca, “Monolithically integrated 40-wavelength demultiplexer and photodetector array on silicon,” IEEE Photon. Technol. Lett.23(13), 869–871 (2011).
[CrossRef]

Doerr, C. R.

L. Chen, C. R. Doerr, L. Buhl, Y. Baeyens, and R. A. Aroca, “Monolithically integrated 40-wavelength demultiplexer and photodetector array on silicon,” IEEE Photon. Technol. Lett.23(13), 869–871 (2011).
[CrossRef]

Foster, M. A.

M. A. Foster, A. C. Turner, J. E. Sharping, B. S. Schmidt, M. Lipson, and A. L. Gaeta, “Amorphous-Si-based planar grating demultiplexers with total internal reflection grooves,” Electron. Lett.45(17), 905–906 (2009).
[CrossRef]

Gaeta, A. L.

M. A. Foster, A. C. Turner, J. E. Sharping, B. S. Schmidt, M. Lipson, and A. L. Gaeta, “Amorphous-Si-based planar grating demultiplexers with total internal reflection grooves,” Electron. Lett.45(17), 905–906 (2009).
[CrossRef]

Green, W. M. J.

F. Horst, W. M. J. Green, B. J. Offrein, and Y. A. Vlasov, “Silicon-on-insulator echelle grating WDM demultiplexers with two stigmatic points,” IEEE Photon. Technol. Lett.21(23), 1743–1745 (2009).
[CrossRef]

Horst, F.

F. Horst, W. M. J. Green, B. J. Offrein, and Y. A. Vlasov, “Silicon-on-insulator echelle grating WDM demultiplexers with two stigmatic points,” IEEE Photon. Technol. Lett.21(23), 1743–1745 (2009).
[CrossRef]

Ishikawa, Y.

Kim, G.

Kim, I. G.

Kim, J. H.

O. K. Kwon, C. W. Lee, D. H. Lee, E. D. Sim, J. H. Kim, and Y. S. Baek, “InP-based polarization-insensitive planar waveguide concave grating demultiplexer with flattened spectral response,” ETRI J.31(2), 228–230 (2009).
[CrossRef]

Kim, K. J.

Kimura, H.

Kou, R.

Kwon, O. K.

O. K. Kwon, C. W. Lee, D. H. Lee, E. D. Sim, J. H. Kim, and Y. S. Baek, “InP-based polarization-insensitive planar waveguide concave grating demultiplexer with flattened spectral response,” ETRI J.31(2), 228–230 (2009).
[CrossRef]

Lee, C. W.

O. K. Kwon, C. W. Lee, D. H. Lee, E. D. Sim, J. H. Kim, and Y. S. Baek, “InP-based polarization-insensitive planar waveguide concave grating demultiplexer with flattened spectral response,” ETRI J.31(2), 228–230 (2009).
[CrossRef]

Lee, D. H.

O. K. Kwon, C. W. Lee, D. H. Lee, E. D. Sim, J. H. Kim, and Y. S. Baek, “InP-based polarization-insensitive planar waveguide concave grating demultiplexer with flattened spectral response,” ETRI J.31(2), 228–230 (2009).
[CrossRef]

Lipson, M.

M. A. Foster, A. C. Turner, J. E. Sharping, B. S. Schmidt, M. Lipson, and A. L. Gaeta, “Amorphous-Si-based planar grating demultiplexers with total internal reflection grooves,” Electron. Lett.45(17), 905–906 (2009).
[CrossRef]

Nishi, H.

Offrein, B. J.

F. Horst, W. M. J. Green, B. J. Offrein, and Y. A. Vlasov, “Silicon-on-insulator echelle grating WDM demultiplexers with two stigmatic points,” IEEE Photon. Technol. Lett.21(23), 1743–1745 (2009).
[CrossRef]

Park, S.

Schmidt, B. S.

M. A. Foster, A. C. Turner, J. E. Sharping, B. S. Schmidt, M. Lipson, and A. L. Gaeta, “Amorphous-Si-based planar grating demultiplexers with total internal reflection grooves,” Electron. Lett.45(17), 905–906 (2009).
[CrossRef]

Sharping, J. E.

M. A. Foster, A. C. Turner, J. E. Sharping, B. S. Schmidt, M. Lipson, and A. L. Gaeta, “Amorphous-Si-based planar grating demultiplexers with total internal reflection grooves,” Electron. Lett.45(17), 905–906 (2009).
[CrossRef]

Shinojima, H.

Sim, E. D.

O. K. Kwon, C. W. Lee, D. H. Lee, E. D. Sim, J. H. Kim, and Y. S. Baek, “InP-based polarization-insensitive planar waveguide concave grating demultiplexer with flattened spectral response,” ETRI J.31(2), 228–230 (2009).
[CrossRef]

Tsuchizawa, T.

Turner, A. C.

M. A. Foster, A. C. Turner, J. E. Sharping, B. S. Schmidt, M. Lipson, and A. L. Gaeta, “Amorphous-Si-based planar grating demultiplexers with total internal reflection grooves,” Electron. Lett.45(17), 905–906 (2009).
[CrossRef]

Vlasov, Y. A.

F. Horst, W. M. J. Green, B. J. Offrein, and Y. A. Vlasov, “Silicon-on-insulator echelle grating WDM demultiplexers with two stigmatic points,” IEEE Photon. Technol. Lett.21(23), 1743–1745 (2009).
[CrossRef]

Wada, K.

Yamada, K.

Yamada, T.

Electron. Lett. (1)

M. A. Foster, A. C. Turner, J. E. Sharping, B. S. Schmidt, M. Lipson, and A. L. Gaeta, “Amorphous-Si-based planar grating demultiplexers with total internal reflection grooves,” Electron. Lett.45(17), 905–906 (2009).
[CrossRef]

ETRI J. (1)

O. K. Kwon, C. W. Lee, D. H. Lee, E. D. Sim, J. H. Kim, and Y. S. Baek, “InP-based polarization-insensitive planar waveguide concave grating demultiplexer with flattened spectral response,” ETRI J.31(2), 228–230 (2009).
[CrossRef]

IEEE Photon. Technol. Lett. (2)

F. Horst, W. M. J. Green, B. J. Offrein, and Y. A. Vlasov, “Silicon-on-insulator echelle grating WDM demultiplexers with two stigmatic points,” IEEE Photon. Technol. Lett.21(23), 1743–1745 (2009).
[CrossRef]

L. Chen, C. R. Doerr, L. Buhl, Y. Baeyens, and R. A. Aroca, “Monolithically integrated 40-wavelength demultiplexer and photodetector array on silicon,” IEEE Photon. Technol. Lett.23(13), 869–871 (2011).
[CrossRef]

Opt. Express (2)

Other (2)

A. Alduino, L. Liao, R. Jones, M. Morse, B. Kim, W. Lo, J. Basak, B. Koch, H. Liu, H. Rong, M. Sysak, C. Krause, R. Saba, D. Lazar, L. Horwitz, R. Bar, S. Litski, A. Liu, K. Sullivan, O. Dosunmu, N. Na, T. Yin, F. Haubensack, I. Hsieh, J. Heck, R. Beatty, H. Park, J. Bovington, S. Lee, H. Nguyen, H. Au, K. Nguyen, P. Merani, M. Hakami, and M. Paniccia, “Demonstration of a high speed 4-channel integrated silicon photonics WDM link with hybrid silicon lasers,” IPRSN 2010 postdeadline session, pdiwi5, Monterey, CA, USA, Jul. 25. (2010).

D. Feng, W. Qian, H. Liang, N. N. Feng, S. Liao, C. C. Kung, J. Fong, Y. Liu, R. Shafiiha, D. C. Lee, B. J. Luff, and M. Asghari, “Terabit/s single chip WDM receiver on the SOI platform,” 8th IEEE International Conference on Group IV. Photonics, FA2, London, 320–322 (2011).

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Figures (3)

Fig. 1
Fig. 1

Mask diagrams of (a) two Echelle grating filters, MUX through DeMUX and (b) saw teeth of the grating, (c) scanning electron microscope (SEM) image of saw teeth

Fig. 2
Fig. 2

(a) 8 channel spectra of Echelle grating DeMUX, and (b) transmission spectrum of MUX through DeMUX, where 5 channels are shown within the strong ASE intensity region of EDFA.

Fig. 3
Fig. 3

Theoretical reproduction of 8 channel spectra of Echelle grating DeMUX filter.

Equations (2)

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n eff d(sinα+sinβ)=m λ 0 ,
( z i+1 in + z i+1 out )( z i in + z i out )=m λ 0

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