Abstract

We demonstrate high quality factor etchless silicon photonic ring resonators fabricated by selective thermal oxidation of silicon without the silicon layer being exposed to any plasma etching throughout the fabrication process. We achieve a high intrinsic quality factor of 510,000 in 50 µm-radius ring resonators, corresponding to a ring loss of 0.8 dB/cm. The device has a total chip insertion loss of 2.5 dB, achieved by designing etchless silicon inverse nanotapers at both the input and output of the chip.

© 2011 OSA

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2010 (2)

2009 (2)

2008 (1)

F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the local oxidation of silicon (LOCOS),” SPIE (2008).

2007 (4)

L. K. Rowe, M. Elsey, N. G. Tarr, A. P. Knights, and E. Post, “CMOS-compatible optical rib waveguides defined by local oxidation of silicon,” Electron. Lett. 43(7), 392–393 (2007).
[CrossRef]

F. N. Xia, L. Sekaric, and Y. Vlasov, “Ultracompact optical buffers on a silicon chip,” Nat. Photonics 1(1), 65–71 (2007).
[CrossRef]

Q. F. Xu, P. Dong, and M. Lipson, “Breaking the delay-bandwidth limit in a photonic structure,” Nat. Phys. 3(6), 406–410 (2007).
[CrossRef]

S. J. Xiao, M. H. Khan, H. Shen, and M. H. Qi, “Compact silicon microring resonators with ultra-low propagation loss in the C band,” Opt. Express 15(22), 14467–14475 (2007).
[CrossRef] [PubMed]

2006 (2)

R. Soref, “The past, present, and future of silicon photonics,” IEEE J. Sel Top. Quant. 12(6), 1678–1687 (2006).
[CrossRef]

M. Haurylau, G. Q. Chen, H. Chen, J. D. Zhang, N. A. Nelson, D. H. Albonesi, E. G. Friedman, and P. M. Fauchet, “On-chip optical interconnect roadmap: Challenges and critical directions,” IEEE J. Sel. Top. Quant. 12(6), 1699–1705 (2006).
[CrossRef]

2005 (6)

I. Kiyat, A. Aydinli, and N. Dagli, “High-Q silicon-on-insulator optical rib waveguide racetrack resonators,” Opt. Express 13(6), 1900–1905 (2005).
[CrossRef] [PubMed]

M. A. Webster, R. M. Pafchek, G. Sukumaran, and T. L. Koch, “Low-loss quasi-planar ridge waveguides formed on thin silicon-on-insulator,” Appl. Phys. Lett. 87(23), 231108 (2005).
[CrossRef]

H. S. Rong, A. S. Liu, R. Jones, O. Cohen, D. Hak, R. Nicolaescu, A. Fang, and M. Paniccia, “An all-silicon Raman laser,” Nature 433(7023), 292–294 (2005).
[CrossRef] [PubMed]

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quant. 11(1), 232–240 (2005).
[CrossRef]

M. Borselli, T. J. Johnson, and O. Painter, “Beyond the Rayleigh scattering limit in high-Q silicon microdisks: theory and experiment,” Opt. Express 13(5), 1515–1530 (2005).
[CrossRef] [PubMed]

P. E. Barclay, K. Srinivasan, and O. Painter, “Nonlinear response of silicon photonic crystal microresonators excited via an integrated waveguide and fiber taper,” Opt. Express 13(3), 801–820 (2005).
[CrossRef] [PubMed]

2004 (3)

J. Niehusmann, A. Vorckel, P. H. Bolivar, T. Wahlbrink, W. Henschel, and H. Kurz, “Ultrahigh-quality-factor silicon-on-insulator microring resonator,” Opt. Lett. 29(24), 2861–2863 (2004).
[CrossRef]

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Tech. L 16(5), 1328–1330 (2004).
[CrossRef]

Y. A. Vlasov and S. J. McNab, “Losses in single-mode silicon-on-insulator strip waveguides and bends,” Opt. Express 12(8), 1622–1631 (2004).
[CrossRef] [PubMed]

2003 (2)

2002 (1)

2001 (1)

2000 (2)

A. Yariv, “Universal relations for coupling of optical power between microresonators and dielectric waveguides,” Electron. Lett. 36(4), 321–322 (2000).
[CrossRef]

D. A. B. Miller, “Optical interconnects to silicon,” IEEE J. Sel. Top. Quant. 6(6), 1312–1317 (2000).
[CrossRef]

1996 (1)

U. Fischer, T. Zinke, J. R. Kropp, F. Arndt, and K. Petermann, “0.1 dB/cm waveguide losses in single-mode SOI rib waveguides,” IEEE Photon. Tech. L 8(5), 647–648 (1996).
[CrossRef]

1994 (1)

F. P. Payne and J. P. R. Lacey, “A Theoretical-Analysis of Scattering Loss from Planar Optical Wave-Guides,” Opt. Quantum Electron. 26(10), 977–986 (1994).
[CrossRef]

1989 (1)

G. S. Oehrlein, “Dry Etching Damage of Silicon - a Review,” Mat. Sci. Eng. B. 4(1-4), 441–450 (1989).
[CrossRef]

Albonesi, D. H.

M. Haurylau, G. Q. Chen, H. Chen, J. D. Zhang, N. A. Nelson, D. H. Albonesi, E. G. Friedman, and P. M. Fauchet, “On-chip optical interconnect roadmap: Challenges and critical directions,” IEEE J. Sel. Top. Quant. 12(6), 1699–1705 (2006).
[CrossRef]

Almeida, V. R.

Arndt, F.

U. Fischer, T. Zinke, J. R. Kropp, F. Arndt, and K. Petermann, “0.1 dB/cm waveguide losses in single-mode SOI rib waveguides,” IEEE Photon. Tech. L 8(5), 647–648 (1996).
[CrossRef]

Asghari, M.

Aydinli, A.

Baets, R.

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Tech. L 16(5), 1328–1330 (2004).
[CrossRef]

Barclay, P. E.

Beckx, S.

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Tech. L 16(5), 1328–1330 (2004).
[CrossRef]

Bienstman, P.

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Tech. L 16(5), 1328–1330 (2004).
[CrossRef]

Bogaerts, W.

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Tech. L 16(5), 1328–1330 (2004).
[CrossRef]

Bolivar, P. H.

Borselli, M.

Bouzaida, N.

Bruce, D.

F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the local oxidation of silicon (LOCOS),” SPIE (2008).

Cardenas, J.

Cassan, E.

Cerrina, F.

Chen, E.

Chen, G. Q.

M. Haurylau, G. Q. Chen, H. Chen, J. D. Zhang, N. A. Nelson, D. H. Albonesi, E. G. Friedman, and P. M. Fauchet, “On-chip optical interconnect roadmap: Challenges and critical directions,” IEEE J. Sel. Top. Quant. 12(6), 1699–1705 (2006).
[CrossRef]

Chen, H.

M. Haurylau, G. Q. Chen, H. Chen, J. D. Zhang, N. A. Nelson, D. H. Albonesi, E. G. Friedman, and P. M. Fauchet, “On-chip optical interconnect roadmap: Challenges and critical directions,” IEEE J. Sel. Top. Quant. 12(6), 1699–1705 (2006).
[CrossRef]

Chen, L.

Cohen, O.

H. S. Rong, A. S. Liu, R. Jones, O. Cohen, D. Hak, R. Nicolaescu, A. Fang, and M. Paniccia, “An all-silicon Raman laser,” Nature 433(7023), 292–294 (2005).
[CrossRef] [PubMed]

Dagli, N.

Dalton, L. R.

Dong, P.

Dumon, P.

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Tech. L 16(5), 1328–1330 (2004).
[CrossRef]

Elsey, M.

L. K. Rowe, M. Elsey, N. G. Tarr, A. P. Knights, and E. Post, “CMOS-compatible optical rib waveguides defined by local oxidation of silicon,” Electron. Lett. 43(7), 392–393 (2007).
[CrossRef]

Fang, A.

H. S. Rong, A. S. Liu, R. Jones, O. Cohen, D. Hak, R. Nicolaescu, A. Fang, and M. Paniccia, “An all-silicon Raman laser,” Nature 433(7023), 292–294 (2005).
[CrossRef] [PubMed]

Fauchet, P. M.

M. Haurylau, G. Q. Chen, H. Chen, J. D. Zhang, N. A. Nelson, D. H. Albonesi, E. G. Friedman, and P. M. Fauchet, “On-chip optical interconnect roadmap: Challenges and critical directions,” IEEE J. Sel. Top. Quant. 12(6), 1699–1705 (2006).
[CrossRef]

Feng, D. Z.

Feng, N. N.

Fischer, U.

U. Fischer, T. Zinke, J. R. Kropp, F. Arndt, and K. Petermann, “0.1 dB/cm waveguide losses in single-mode SOI rib waveguides,” IEEE Photon. Tech. L 8(5), 647–648 (1996).
[CrossRef]

Fong, J. A.

Foster, M. A.

Friedman, E. G.

M. Haurylau, G. Q. Chen, H. Chen, J. D. Zhang, N. A. Nelson, D. H. Albonesi, E. G. Friedman, and P. M. Fauchet, “On-chip optical interconnect roadmap: Challenges and critical directions,” IEEE J. Sel. Top. Quant. 12(6), 1699–1705 (2006).
[CrossRef]

Fukuda, H.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quant. 11(1), 232–240 (2005).
[CrossRef]

Gaeta, A. L.

Gardes, F. Y.

F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the local oxidation of silicon (LOCOS),” SPIE (2008).

Hak, D.

H. S. Rong, A. S. Liu, R. Jones, O. Cohen, D. Hak, R. Nicolaescu, A. Fang, and M. Paniccia, “An all-silicon Raman laser,” Nature 433(7023), 292–294 (2005).
[CrossRef] [PubMed]

Haurylau, M.

M. Haurylau, G. Q. Chen, H. Chen, J. D. Zhang, N. A. Nelson, D. H. Albonesi, E. G. Friedman, and P. M. Fauchet, “On-chip optical interconnect roadmap: Challenges and critical directions,” IEEE J. Sel. Top. Quant. 12(6), 1699–1705 (2006).
[CrossRef]

Heitzmann, M.

Henschel, W.

Itabashi, S.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quant. 11(1), 232–240 (2005).
[CrossRef]

Jessop, P. E.

F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the local oxidation of silicon (LOCOS),” SPIE (2008).

Johnson, T. J.

Jones, R.

H. S. Rong, A. S. Liu, R. Jones, O. Cohen, D. Hak, R. Nicolaescu, A. Fang, and M. Paniccia, “An all-silicon Raman laser,” Nature 433(7023), 292–294 (2005).
[CrossRef] [PubMed]

Khan, M. H.

Khurgin, J. B.

Kimerling, L. C.

Kiyat, I.

Knights, A. P.

F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the local oxidation of silicon (LOCOS),” SPIE (2008).

L. K. Rowe, M. Elsey, N. G. Tarr, A. P. Knights, and E. Post, “CMOS-compatible optical rib waveguides defined by local oxidation of silicon,” Electron. Lett. 43(7), 392–393 (2007).
[CrossRef]

Koch, T. L.

R. Pafchek, R. Tummidi, J. Li, M. A. Webster, E. Chen, and T. L. Koch, “Low-loss silicon-on-insulator shallow-ridge TE and TM waveguides formed using thermal oxidation,” Appl. Opt. 48(5), 958–963 (2009).
[CrossRef] [PubMed]

M. A. Webster, R. M. Pafchek, G. Sukumaran, and T. L. Koch, “Low-loss quasi-planar ridge waveguides formed on thin silicon-on-insulator,” Appl. Phys. Lett. 87(23), 231108 (2005).
[CrossRef]

Krishnamoorthy, A. V.

Kropp, J. R.

U. Fischer, T. Zinke, J. R. Kropp, F. Arndt, and K. Petermann, “0.1 dB/cm waveguide losses in single-mode SOI rib waveguides,” IEEE Photon. Tech. L 8(5), 647–648 (1996).
[CrossRef]

Kung, C. C.

Kurz, H.

Lacey, J. P. R.

F. P. Payne and J. P. R. Lacey, “A Theoretical-Analysis of Scattering Loss from Planar Optical Wave-Guides,” Opt. Quantum Electron. 26(10), 977–986 (1994).
[CrossRef]

Lardenois, S.

Laval, S.

Lee, K. K.

Li, J.

Liang, H.

Liao, S. R.

Lim, D. R.

Lipson, M.

Lira, H. L. R.

Liu, A. S.

H. S. Rong, A. S. Liu, R. Jones, O. Cohen, D. Hak, R. Nicolaescu, A. Fang, and M. Paniccia, “An all-silicon Raman laser,” Nature 433(7023), 292–294 (2005).
[CrossRef] [PubMed]

Luyssaert, B.

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Tech. L 16(5), 1328–1330 (2004).
[CrossRef]

Mashanovich, G.

F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the local oxidation of silicon (LOCOS),” SPIE (2008).

McFaul, S.

F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the local oxidation of silicon (LOCOS),” SPIE (2008).

McNab, S. J.

Miller, D. A. B.

D. A. B. Miller, “Optical interconnects to silicon,” IEEE J. Sel. Top. Quant. 6(6), 1312–1317 (2000).
[CrossRef]

Mollard, L.

Morita, H.

T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quant. 11(1), 232–240 (2005).
[CrossRef]

Morton, P.

Nelson, N. A.

M. Haurylau, G. Q. Chen, H. Chen, J. D. Zhang, N. A. Nelson, D. H. Albonesi, E. G. Friedman, and P. M. Fauchet, “On-chip optical interconnect roadmap: Challenges and critical directions,” IEEE J. Sel. Top. Quant. 12(6), 1699–1705 (2006).
[CrossRef]

Nicolaescu, R.

H. S. Rong, A. S. Liu, R. Jones, O. Cohen, D. Hak, R. Nicolaescu, A. Fang, and M. Paniccia, “An all-silicon Raman laser,” Nature 433(7023), 292–294 (2005).
[CrossRef] [PubMed]

Niehusmann, J.

Oehrlein, G. S.

G. S. Oehrlein, “Dry Etching Damage of Silicon - a Review,” Mat. Sci. Eng. B. 4(1-4), 441–450 (1989).
[CrossRef]

Orobtchouk, R.

Pafchek, R.

Pafchek, R. M.

M. A. Webster, R. M. Pafchek, G. Sukumaran, and T. L. Koch, “Low-loss quasi-planar ridge waveguides formed on thin silicon-on-insulator,” Appl. Phys. Lett. 87(23), 231108 (2005).
[CrossRef]

Painter, O.

Panepucci, R. R.

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F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the local oxidation of silicon (LOCOS),” SPIE (2008).

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H. S. Rong, A. S. Liu, R. Jones, O. Cohen, D. Hak, R. Nicolaescu, A. Fang, and M. Paniccia, “An all-silicon Raman laser,” Nature 433(7023), 292–294 (2005).
[CrossRef] [PubMed]

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F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the local oxidation of silicon (LOCOS),” SPIE (2008).

Rowe, L. K.

L. K. Rowe, M. Elsey, N. G. Tarr, A. P. Knights, and E. Post, “CMOS-compatible optical rib waveguides defined by local oxidation of silicon,” Electron. Lett. 43(7), 392–393 (2007).
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P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Tech. L 16(5), 1328–1330 (2004).
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T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quant. 11(1), 232–240 (2005).
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T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quant. 11(1), 232–240 (2005).
[CrossRef]

Tarr, N. G.

F. Y. Gardes, G. T. Reed, A. P. Knights, G. Mashanovich, P. E. Jessop, L. Rowe, S. McFaul, D. Bruce, and N. G. Tarr, “Sub-micron optical waveguides for silicon photonics formed via the local oxidation of silicon (LOCOS),” SPIE (2008).

L. K. Rowe, M. Elsey, N. G. Tarr, A. P. Knights, and E. Post, “CMOS-compatible optical rib waveguides defined by local oxidation of silicon,” Electron. Lett. 43(7), 392–393 (2007).
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T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quant. 11(1), 232–240 (2005).
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P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Tech. L 16(5), 1328–1330 (2004).
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T. Tsuchizawa, K. Yamada, H. Fukuda, T. Watanabe, J. Takahashi, M. Takahashi, T. Shoji, E. Tamechika, S. Itabashi, and H. Morita, “Microphotonics devices based on silicon microfabrication technology,” IEEE J. Sel. Top. Quant. 11(1), 232–240 (2005).
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P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Tech. L 16(5), 1328–1330 (2004).
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P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Tech. L 16(5), 1328–1330 (2004).
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F. N. Xia, L. Sekaric, and Y. Vlasov, “Ultracompact optical buffers on a silicon chip,” Nat. Photonics 1(1), 65–71 (2007).
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Appl. Opt. (1)

Appl. Phys. Lett. (1)

M. A. Webster, R. M. Pafchek, G. Sukumaran, and T. L. Koch, “Low-loss quasi-planar ridge waveguides formed on thin silicon-on-insulator,” Appl. Phys. Lett. 87(23), 231108 (2005).
[CrossRef]

Electron. Lett. (2)

L. K. Rowe, M. Elsey, N. G. Tarr, A. P. Knights, and E. Post, “CMOS-compatible optical rib waveguides defined by local oxidation of silicon,” Electron. Lett. 43(7), 392–393 (2007).
[CrossRef]

A. Yariv, “Universal relations for coupling of optical power between microresonators and dielectric waveguides,” Electron. Lett. 36(4), 321–322 (2000).
[CrossRef]

IEEE J. Sel Top. Quant. (1)

R. Soref, “The past, present, and future of silicon photonics,” IEEE J. Sel Top. Quant. 12(6), 1678–1687 (2006).
[CrossRef]

IEEE J. Sel. Top. Quant. (3)

M. Haurylau, G. Q. Chen, H. Chen, J. D. Zhang, N. A. Nelson, D. H. Albonesi, E. G. Friedman, and P. M. Fauchet, “On-chip optical interconnect roadmap: Challenges and critical directions,” IEEE J. Sel. Top. Quant. 12(6), 1699–1705 (2006).
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[CrossRef]

IEEE Photon. Tech. L (2)

U. Fischer, T. Zinke, J. R. Kropp, F. Arndt, and K. Petermann, “0.1 dB/cm waveguide losses in single-mode SOI rib waveguides,” IEEE Photon. Tech. L 8(5), 647–648 (1996).
[CrossRef]

P. Dumon, W. Bogaerts, V. Wiaux, J. Wouters, S. Beckx, J. Van Campenhout, D. Taillaert, B. Luyssaert, P. Bienstman, D. Van Thourhout, and R. Baets, “Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography,” IEEE Photon. Tech. L 16(5), 1328–1330 (2004).
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[CrossRef]

Nat. Phys. (1)

Q. F. Xu, P. Dong, and M. Lipson, “Breaking the delay-bandwidth limit in a photonic structure,” Nat. Phys. 3(6), 406–410 (2007).
[CrossRef]

Nature (1)

H. S. Rong, A. S. Liu, R. Jones, O. Cohen, D. Hak, R. Nicolaescu, A. Fang, and M. Paniccia, “An all-silicon Raman laser,” Nature 433(7023), 292–294 (2005).
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Figures (4)

Fig. 1
Fig. 1

Etchless silicon photonic ring resonator fabrication process flow. (a) Thermal oxidation of a 500 nm silicon-on-insulator (SOI) to leave behind 140 nm thick silicon layer with 785 nm thick thermally grown oxide on top. (b) Patterning of the waveguides using ma-N 2405 resist, leaving a coupling gap between the ring resonator and bus waveguide. (c) Etching of the thermally grown oxide, leaving behind a thin 50 nm oxide slab. (d) Selective wet thermal oxidation of the silicon. (e) Structural profile of the oxidized silicon waveguides. (f) Deposition of 300 nm HTO and 1.8 μm PECVD silicon dioxide.

Fig. 2
Fig. 2

(a) SEM picture of the fabricated 50 µm-radius etchless silicon photonic ring resonator. (b) Simulated structural profiles of the etchless silicon ring resonator with coupling gap = 930 nm. (c) Symmetric mode of the bus waveguide and the ring resonator. (d) Cross-sectional SEM picture of the coupling region. (e) Transmission electron microscope (TEM) picture of the thin oxidized silicon slab.

Fig. 3
Fig. 3

Transverse electric (TE) mode profile (Ex-component) of (a) Etchless silicon waveguide. (b) Etchless silicon inverse nanotaper.

Fig. 4
Fig. 4

(a) Through-port transmission spectrum of the ring resonator in transverse electric (TE) polarization. (b) Normalized transmission spectrum at λ 0 = 1531.416 nm.

Equations (2)

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Q int = 2 Q l o a d e d 1 + T 0 ,
α r i n g = 2 π n g Q int λ 0 = λ 0 Q int × F S R × R r i n g ,

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