Abstract

We demonstrate the fabrication of As2S3 rib waveguides using hot embossing. Because of the high temperature required, a thin (50nm) Ge11.5As24Se64.5 was thermally evaporated on top of an 870nm As2S3 layer to protect against surface degradation during embossing. The waveguides propagation loss was 0.52dB/cm for the TE and 0.41dB/cm for the TM polarizations at 1550nm for a waveguide cross-section dimension of 3.8 × 1μm. The nonlinearity of a 2.2μm wide waveguide was shown to be 13500W−1km−1 using four-wave mixing demonstrating that these embossed waveguides were capable of being used for all-optical processing.

© 2011 OSA

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  1. C. Quémard, F. Smektala, V. Couderc, A. Barthelemy, and J. Lucas, “Chalcogenide glasses with high non linear optical properties for telecommunications,” J. Phys. Chem. Solids 62(8), 1435–1440 (2001).
    [CrossRef]
  2. J. M. Harbold, F. O. Ilday, F. W. Wise, J. S. Sanghera, V. Q. Nguyen, L. B. Shaw, and I. D. Aggarwal, “Highly nonlinear As-S-Se glasses for all-optical switching,” Opt. Lett. 27(2), 119–121 (2002).
    [CrossRef] [PubMed]
  3. A. Prasad, C. J. Zha, R. P. Wang, A. Smith, S. Madden, and B. Luther-Davies, “Properties of GexAsySe1-x-y glasses for all-optical signal processing,” Opt. Express 16(4), 2804–2815 (2008).
    [CrossRef] [PubMed]
  4. M. D. Pelusi, V. G. Ta’eed, E. Libin Fu, M. R. E. Magi, S. Lamont, Madden, D. A. P. Duk-Yong Choi, B. Bulla, Luther-Davies, and B. J. Eggleton, “Applications of highly-nonlinear chalcogenide glass devices tailored for high-speed all-optical signal processing,” IEEE J. Sel. Top. Quantum Electron. 14(3), 529–539 (2008).
    [CrossRef]
  5. M. Galili, J. Xu, H. C. Mulvad, L. K. Oxenløwe, A. T. Clausen, P. Jeppesen, B. Luther-Davies, S. Madden, A. Rode, D.-Y. Choi, M. Pelusi, F. Luan, and B. J. Eggleton, “Breakthrough switching speed with an all-optical chalcogenide glass chip: 640 Gbit/s demultiplexing,” Opt. Express 17(4), 2182–2187 (2009).
    [CrossRef] [PubMed]
  6. V. G. Ta’eed, M. R. E. Lamont, D. J. Moss, B. J. Eggleton, D. Y. Choi, S. Madden, and B. Luther-Davies, “All optical wavelength conversion via cross phase modulation in chalcogenide glass rib waveguides,” Opt. Express 14(23), 11242–11247 (2006).
    [CrossRef] [PubMed]
  7. S. J. Madden, D. Y. Choi, D. A. Bulla, A. V. Rode, B. Luther-Davies, V. G. Ta’eed, M. D. Pelusi, and B. J. Eggleton, “Long, low loss etched As(2)S(3) chalcogenide waveguides for all-optical signal regeneration,” Opt. Express 15(22), 14414–14421 (2007).
    [CrossRef] [PubMed]
  8. D. Choi, S. Madden, D. Bulla, R. Wang, A. Rode, and B. Luther-Davies, “Submicrometer-thick low-loss As2S3 planar waveguides for nonlinear optical devices,” IEEE Photon. Technol. Lett. 22(7), 495–497 (2010).
    [CrossRef]
  9. D. Choi, S. Madden, D. Bulla, R. Wang, A. Rode, and B. Luther-Davies, “Thermal annealing of arsenic tri-sulphide thin film and its influence on device performance,” J. Appl. Phys. 107(5), 053106 (2010).
    [CrossRef]
  10. D. Y. Choi, S. Madden, A. Rode, R. P. Wang, A. Ankiewicz, and B. Luther-Davies, “Surface roughness in plasma-etched As2S3 films: Its origin and improvement,” IEEE Trans. Nanotechnol. 7(3), 285–290 (2008).
    [CrossRef]
  11. T. Han, S. Madden, B. Luther-Davies, and R. Charters, “High-quality polarization-insensitive polysiloxane waveguide gratings produced by UV nanoimprint lithography,” IEEE Photon. Technol. Lett. 22(23), 1720–1722 (2010).
    [CrossRef]
  12. H. Schift, “Nanoimprint lithography: an old story in modern times? a review,” J. Vac. Sci. Technol. B 26(2), 458–480 (2008).
    [CrossRef]
  13. X. H. Zhang, Y. Guimond, and Y. Bellec, “Production of complex chalcogenide glass optics by molding for thermal imaging,” J. Non-Cryst. Sol. 326, 519–523 (2003).
  14. W. J. Pan, H. Rowe, D. Zhang, Y. Zhang, A. Loni, D. Furniss, P. Sewell, T. M. Benson, and A. B. Seddon, “One-step hot embossing of optical rib waveguides in chalcogenide glasses,” Microw. Opt. Technol. Lett. 50(7), 1961–1963 (2008).
    [CrossRef]
  15. M. Solmaz, H. Park, C. K. Madsen, and X. Cheng, “Patterning chalcogenide glass by direct resist-free thermal nanoimprint,” J. Vac. Sci. Technol. B 26(2), 606–610 (2008).
    [CrossRef]
  16. Z. G. Lian, W. Pan, D. Furniss, T. M. Benson, A. B. Seddon, T. Kohoutek, J. Orava, and T. Wagner, “Embossing of chalcogenide glasses: monomode rib optical waveguides in evaporated thin films,” Opt. Lett. 34(8), 1234–1236 (2009).
    [CrossRef] [PubMed]
  17. T. Han, S. Madden, D. Bulla, and B. Luther-Davies, “Low loss chalcogenide glass waveguides by thermal nano-imprint lithography,” Opt. Express 18(18), 19286–19291 (2010).
    [CrossRef] [PubMed]
  18. D. Y. Choi, S. Madden, D. Bulla, R. P. Wang, A. Rode, and B. Luther-Davies, “Thermal annealing of arsenic tri-sulphide thin film and its influence on device performance,” J. Appl. Phys. 107(5), 053106 (2010).
    [CrossRef]
  19. X. Gai, T. Han, A. Prasad, S. Madden, D. Y. Choi, R. P. Wang, D. Bulla, and B. Luther-Davies, “Progress in optical waveguides fabricated from chalcogenide glasses,” Opt. Express 18(25), 26635–26646 (2010).
    [CrossRef] [PubMed]
  20. H. Schmid and B. Michel, “Siloxane polymers for high-resolution, high-accuracy soft lithography,” Macromolecules 33(8), 3042–3049 (2000).
    [CrossRef]
  21. T. Han, S. Madden, M. Zhang, R. Charters, and B. Luther-Davies, “Low loss high index contrast nanoimprinted polysiloxane waveguides,” Opt. Express 17(4), 2623–2630 (2009).
    [CrossRef] [PubMed]
  22. M. R. E. Lamont, B. Luther-Davies, D. Y. Choi, S. Madden, X. Gai, and B. J. Eggleton, “Net-gain from a parametric amplifier on a chalcogenide optical chip,” Opt. Express 16(25), 20374–20381 (2008).
    [CrossRef] [PubMed]

2010

D. Choi, S. Madden, D. Bulla, R. Wang, A. Rode, and B. Luther-Davies, “Submicrometer-thick low-loss As2S3 planar waveguides for nonlinear optical devices,” IEEE Photon. Technol. Lett. 22(7), 495–497 (2010).
[CrossRef]

D. Choi, S. Madden, D. Bulla, R. Wang, A. Rode, and B. Luther-Davies, “Thermal annealing of arsenic tri-sulphide thin film and its influence on device performance,” J. Appl. Phys. 107(5), 053106 (2010).
[CrossRef]

T. Han, S. Madden, B. Luther-Davies, and R. Charters, “High-quality polarization-insensitive polysiloxane waveguide gratings produced by UV nanoimprint lithography,” IEEE Photon. Technol. Lett. 22(23), 1720–1722 (2010).
[CrossRef]

D. Y. Choi, S. Madden, D. Bulla, R. P. Wang, A. Rode, and B. Luther-Davies, “Thermal annealing of arsenic tri-sulphide thin film and its influence on device performance,” J. Appl. Phys. 107(5), 053106 (2010).
[CrossRef]

T. Han, S. Madden, D. Bulla, and B. Luther-Davies, “Low loss chalcogenide glass waveguides by thermal nano-imprint lithography,” Opt. Express 18(18), 19286–19291 (2010).
[CrossRef] [PubMed]

X. Gai, T. Han, A. Prasad, S. Madden, D. Y. Choi, R. P. Wang, D. Bulla, and B. Luther-Davies, “Progress in optical waveguides fabricated from chalcogenide glasses,” Opt. Express 18(25), 26635–26646 (2010).
[CrossRef] [PubMed]

2009

2008

A. Prasad, C. J. Zha, R. P. Wang, A. Smith, S. Madden, and B. Luther-Davies, “Properties of GexAsySe1-x-y glasses for all-optical signal processing,” Opt. Express 16(4), 2804–2815 (2008).
[CrossRef] [PubMed]

M. R. E. Lamont, B. Luther-Davies, D. Y. Choi, S. Madden, X. Gai, and B. J. Eggleton, “Net-gain from a parametric amplifier on a chalcogenide optical chip,” Opt. Express 16(25), 20374–20381 (2008).
[CrossRef] [PubMed]

M. D. Pelusi, V. G. Ta’eed, E. Libin Fu, M. R. E. Magi, S. Lamont, Madden, D. A. P. Duk-Yong Choi, B. Bulla, Luther-Davies, and B. J. Eggleton, “Applications of highly-nonlinear chalcogenide glass devices tailored for high-speed all-optical signal processing,” IEEE J. Sel. Top. Quantum Electron. 14(3), 529–539 (2008).
[CrossRef]

W. J. Pan, H. Rowe, D. Zhang, Y. Zhang, A. Loni, D. Furniss, P. Sewell, T. M. Benson, and A. B. Seddon, “One-step hot embossing of optical rib waveguides in chalcogenide glasses,” Microw. Opt. Technol. Lett. 50(7), 1961–1963 (2008).
[CrossRef]

M. Solmaz, H. Park, C. K. Madsen, and X. Cheng, “Patterning chalcogenide glass by direct resist-free thermal nanoimprint,” J. Vac. Sci. Technol. B 26(2), 606–610 (2008).
[CrossRef]

H. Schift, “Nanoimprint lithography: an old story in modern times? a review,” J. Vac. Sci. Technol. B 26(2), 458–480 (2008).
[CrossRef]

D. Y. Choi, S. Madden, A. Rode, R. P. Wang, A. Ankiewicz, and B. Luther-Davies, “Surface roughness in plasma-etched As2S3 films: Its origin and improvement,” IEEE Trans. Nanotechnol. 7(3), 285–290 (2008).
[CrossRef]

2007

2006

2003

X. H. Zhang, Y. Guimond, and Y. Bellec, “Production of complex chalcogenide glass optics by molding for thermal imaging,” J. Non-Cryst. Sol. 326, 519–523 (2003).

2002

2001

C. Quémard, F. Smektala, V. Couderc, A. Barthelemy, and J. Lucas, “Chalcogenide glasses with high non linear optical properties for telecommunications,” J. Phys. Chem. Solids 62(8), 1435–1440 (2001).
[CrossRef]

2000

H. Schmid and B. Michel, “Siloxane polymers for high-resolution, high-accuracy soft lithography,” Macromolecules 33(8), 3042–3049 (2000).
[CrossRef]

Aggarwal, I. D.

Ankiewicz, A.

D. Y. Choi, S. Madden, A. Rode, R. P. Wang, A. Ankiewicz, and B. Luther-Davies, “Surface roughness in plasma-etched As2S3 films: Its origin and improvement,” IEEE Trans. Nanotechnol. 7(3), 285–290 (2008).
[CrossRef]

Barthelemy, A.

C. Quémard, F. Smektala, V. Couderc, A. Barthelemy, and J. Lucas, “Chalcogenide glasses with high non linear optical properties for telecommunications,” J. Phys. Chem. Solids 62(8), 1435–1440 (2001).
[CrossRef]

Bellec, Y.

X. H. Zhang, Y. Guimond, and Y. Bellec, “Production of complex chalcogenide glass optics by molding for thermal imaging,” J. Non-Cryst. Sol. 326, 519–523 (2003).

Benson, T. M.

Z. G. Lian, W. Pan, D. Furniss, T. M. Benson, A. B. Seddon, T. Kohoutek, J. Orava, and T. Wagner, “Embossing of chalcogenide glasses: monomode rib optical waveguides in evaporated thin films,” Opt. Lett. 34(8), 1234–1236 (2009).
[CrossRef] [PubMed]

W. J. Pan, H. Rowe, D. Zhang, Y. Zhang, A. Loni, D. Furniss, P. Sewell, T. M. Benson, and A. B. Seddon, “One-step hot embossing of optical rib waveguides in chalcogenide glasses,” Microw. Opt. Technol. Lett. 50(7), 1961–1963 (2008).
[CrossRef]

Bulla, B.

M. D. Pelusi, V. G. Ta’eed, E. Libin Fu, M. R. E. Magi, S. Lamont, Madden, D. A. P. Duk-Yong Choi, B. Bulla, Luther-Davies, and B. J. Eggleton, “Applications of highly-nonlinear chalcogenide glass devices tailored for high-speed all-optical signal processing,” IEEE J. Sel. Top. Quantum Electron. 14(3), 529–539 (2008).
[CrossRef]

Bulla, D.

D. Choi, S. Madden, D. Bulla, R. Wang, A. Rode, and B. Luther-Davies, “Submicrometer-thick low-loss As2S3 planar waveguides for nonlinear optical devices,” IEEE Photon. Technol. Lett. 22(7), 495–497 (2010).
[CrossRef]

T. Han, S. Madden, D. Bulla, and B. Luther-Davies, “Low loss chalcogenide glass waveguides by thermal nano-imprint lithography,” Opt. Express 18(18), 19286–19291 (2010).
[CrossRef] [PubMed]

D. Y. Choi, S. Madden, D. Bulla, R. P. Wang, A. Rode, and B. Luther-Davies, “Thermal annealing of arsenic tri-sulphide thin film and its influence on device performance,” J. Appl. Phys. 107(5), 053106 (2010).
[CrossRef]

X. Gai, T. Han, A. Prasad, S. Madden, D. Y. Choi, R. P. Wang, D. Bulla, and B. Luther-Davies, “Progress in optical waveguides fabricated from chalcogenide glasses,” Opt. Express 18(25), 26635–26646 (2010).
[CrossRef] [PubMed]

D. Choi, S. Madden, D. Bulla, R. Wang, A. Rode, and B. Luther-Davies, “Thermal annealing of arsenic tri-sulphide thin film and its influence on device performance,” J. Appl. Phys. 107(5), 053106 (2010).
[CrossRef]

Bulla, D. A.

Charters, R.

T. Han, S. Madden, B. Luther-Davies, and R. Charters, “High-quality polarization-insensitive polysiloxane waveguide gratings produced by UV nanoimprint lithography,” IEEE Photon. Technol. Lett. 22(23), 1720–1722 (2010).
[CrossRef]

T. Han, S. Madden, M. Zhang, R. Charters, and B. Luther-Davies, “Low loss high index contrast nanoimprinted polysiloxane waveguides,” Opt. Express 17(4), 2623–2630 (2009).
[CrossRef] [PubMed]

Cheng, X.

M. Solmaz, H. Park, C. K. Madsen, and X. Cheng, “Patterning chalcogenide glass by direct resist-free thermal nanoimprint,” J. Vac. Sci. Technol. B 26(2), 606–610 (2008).
[CrossRef]

Choi, D.

D. Choi, S. Madden, D. Bulla, R. Wang, A. Rode, and B. Luther-Davies, “Thermal annealing of arsenic tri-sulphide thin film and its influence on device performance,” J. Appl. Phys. 107(5), 053106 (2010).
[CrossRef]

D. Choi, S. Madden, D. Bulla, R. Wang, A. Rode, and B. Luther-Davies, “Submicrometer-thick low-loss As2S3 planar waveguides for nonlinear optical devices,” IEEE Photon. Technol. Lett. 22(7), 495–497 (2010).
[CrossRef]

Choi, D. Y.

Choi, D.-Y.

Clausen, A. T.

Couderc, V.

C. Quémard, F. Smektala, V. Couderc, A. Barthelemy, and J. Lucas, “Chalcogenide glasses with high non linear optical properties for telecommunications,” J. Phys. Chem. Solids 62(8), 1435–1440 (2001).
[CrossRef]

Duk-Yong Choi, D. A. P.

M. D. Pelusi, V. G. Ta’eed, E. Libin Fu, M. R. E. Magi, S. Lamont, Madden, D. A. P. Duk-Yong Choi, B. Bulla, Luther-Davies, and B. J. Eggleton, “Applications of highly-nonlinear chalcogenide glass devices tailored for high-speed all-optical signal processing,” IEEE J. Sel. Top. Quantum Electron. 14(3), 529–539 (2008).
[CrossRef]

Eggleton, B. J.

Furniss, D.

Z. G. Lian, W. Pan, D. Furniss, T. M. Benson, A. B. Seddon, T. Kohoutek, J. Orava, and T. Wagner, “Embossing of chalcogenide glasses: monomode rib optical waveguides in evaporated thin films,” Opt. Lett. 34(8), 1234–1236 (2009).
[CrossRef] [PubMed]

W. J. Pan, H. Rowe, D. Zhang, Y. Zhang, A. Loni, D. Furniss, P. Sewell, T. M. Benson, and A. B. Seddon, “One-step hot embossing of optical rib waveguides in chalcogenide glasses,” Microw. Opt. Technol. Lett. 50(7), 1961–1963 (2008).
[CrossRef]

Gai, X.

Galili, M.

Guimond, Y.

X. H. Zhang, Y. Guimond, and Y. Bellec, “Production of complex chalcogenide glass optics by molding for thermal imaging,” J. Non-Cryst. Sol. 326, 519–523 (2003).

Han, T.

Harbold, J. M.

Ilday, F. O.

Jeppesen, P.

Kohoutek, T.

Lamont, M. R. E.

Lamont, S.

M. D. Pelusi, V. G. Ta’eed, E. Libin Fu, M. R. E. Magi, S. Lamont, Madden, D. A. P. Duk-Yong Choi, B. Bulla, Luther-Davies, and B. J. Eggleton, “Applications of highly-nonlinear chalcogenide glass devices tailored for high-speed all-optical signal processing,” IEEE J. Sel. Top. Quantum Electron. 14(3), 529–539 (2008).
[CrossRef]

Lian, Z. G.

Libin Fu, E.

M. D. Pelusi, V. G. Ta’eed, E. Libin Fu, M. R. E. Magi, S. Lamont, Madden, D. A. P. Duk-Yong Choi, B. Bulla, Luther-Davies, and B. J. Eggleton, “Applications of highly-nonlinear chalcogenide glass devices tailored for high-speed all-optical signal processing,” IEEE J. Sel. Top. Quantum Electron. 14(3), 529–539 (2008).
[CrossRef]

Loni, A.

W. J. Pan, H. Rowe, D. Zhang, Y. Zhang, A. Loni, D. Furniss, P. Sewell, T. M. Benson, and A. B. Seddon, “One-step hot embossing of optical rib waveguides in chalcogenide glasses,” Microw. Opt. Technol. Lett. 50(7), 1961–1963 (2008).
[CrossRef]

Luan, F.

Lucas, J.

C. Quémard, F. Smektala, V. Couderc, A. Barthelemy, and J. Lucas, “Chalcogenide glasses with high non linear optical properties for telecommunications,” J. Phys. Chem. Solids 62(8), 1435–1440 (2001).
[CrossRef]

Luther-Davies,

M. D. Pelusi, V. G. Ta’eed, E. Libin Fu, M. R. E. Magi, S. Lamont, Madden, D. A. P. Duk-Yong Choi, B. Bulla, Luther-Davies, and B. J. Eggleton, “Applications of highly-nonlinear chalcogenide glass devices tailored for high-speed all-optical signal processing,” IEEE J. Sel. Top. Quantum Electron. 14(3), 529–539 (2008).
[CrossRef]

Luther-Davies, B.

D. Choi, S. Madden, D. Bulla, R. Wang, A. Rode, and B. Luther-Davies, “Submicrometer-thick low-loss As2S3 planar waveguides for nonlinear optical devices,” IEEE Photon. Technol. Lett. 22(7), 495–497 (2010).
[CrossRef]

T. Han, S. Madden, D. Bulla, and B. Luther-Davies, “Low loss chalcogenide glass waveguides by thermal nano-imprint lithography,” Opt. Express 18(18), 19286–19291 (2010).
[CrossRef] [PubMed]

D. Y. Choi, S. Madden, D. Bulla, R. P. Wang, A. Rode, and B. Luther-Davies, “Thermal annealing of arsenic tri-sulphide thin film and its influence on device performance,” J. Appl. Phys. 107(5), 053106 (2010).
[CrossRef]

X. Gai, T. Han, A. Prasad, S. Madden, D. Y. Choi, R. P. Wang, D. Bulla, and B. Luther-Davies, “Progress in optical waveguides fabricated from chalcogenide glasses,” Opt. Express 18(25), 26635–26646 (2010).
[CrossRef] [PubMed]

D. Choi, S. Madden, D. Bulla, R. Wang, A. Rode, and B. Luther-Davies, “Thermal annealing of arsenic tri-sulphide thin film and its influence on device performance,” J. Appl. Phys. 107(5), 053106 (2010).
[CrossRef]

T. Han, S. Madden, B. Luther-Davies, and R. Charters, “High-quality polarization-insensitive polysiloxane waveguide gratings produced by UV nanoimprint lithography,” IEEE Photon. Technol. Lett. 22(23), 1720–1722 (2010).
[CrossRef]

M. Galili, J. Xu, H. C. Mulvad, L. K. Oxenløwe, A. T. Clausen, P. Jeppesen, B. Luther-Davies, S. Madden, A. Rode, D.-Y. Choi, M. Pelusi, F. Luan, and B. J. Eggleton, “Breakthrough switching speed with an all-optical chalcogenide glass chip: 640 Gbit/s demultiplexing,” Opt. Express 17(4), 2182–2187 (2009).
[CrossRef] [PubMed]

T. Han, S. Madden, M. Zhang, R. Charters, and B. Luther-Davies, “Low loss high index contrast nanoimprinted polysiloxane waveguides,” Opt. Express 17(4), 2623–2630 (2009).
[CrossRef] [PubMed]

A. Prasad, C. J. Zha, R. P. Wang, A. Smith, S. Madden, and B. Luther-Davies, “Properties of GexAsySe1-x-y glasses for all-optical signal processing,” Opt. Express 16(4), 2804–2815 (2008).
[CrossRef] [PubMed]

D. Y. Choi, S. Madden, A. Rode, R. P. Wang, A. Ankiewicz, and B. Luther-Davies, “Surface roughness in plasma-etched As2S3 films: Its origin and improvement,” IEEE Trans. Nanotechnol. 7(3), 285–290 (2008).
[CrossRef]

M. R. E. Lamont, B. Luther-Davies, D. Y. Choi, S. Madden, X. Gai, and B. J. Eggleton, “Net-gain from a parametric amplifier on a chalcogenide optical chip,” Opt. Express 16(25), 20374–20381 (2008).
[CrossRef] [PubMed]

S. J. Madden, D. Y. Choi, D. A. Bulla, A. V. Rode, B. Luther-Davies, V. G. Ta’eed, M. D. Pelusi, and B. J. Eggleton, “Long, low loss etched As(2)S(3) chalcogenide waveguides for all-optical signal regeneration,” Opt. Express 15(22), 14414–14421 (2007).
[CrossRef] [PubMed]

V. G. Ta’eed, M. R. E. Lamont, D. J. Moss, B. J. Eggleton, D. Y. Choi, S. Madden, and B. Luther-Davies, “All optical wavelength conversion via cross phase modulation in chalcogenide glass rib waveguides,” Opt. Express 14(23), 11242–11247 (2006).
[CrossRef] [PubMed]

Madden,

M. D. Pelusi, V. G. Ta’eed, E. Libin Fu, M. R. E. Magi, S. Lamont, Madden, D. A. P. Duk-Yong Choi, B. Bulla, Luther-Davies, and B. J. Eggleton, “Applications of highly-nonlinear chalcogenide glass devices tailored for high-speed all-optical signal processing,” IEEE J. Sel. Top. Quantum Electron. 14(3), 529–539 (2008).
[CrossRef]

Madden, S.

D. Choi, S. Madden, D. Bulla, R. Wang, A. Rode, and B. Luther-Davies, “Submicrometer-thick low-loss As2S3 planar waveguides for nonlinear optical devices,” IEEE Photon. Technol. Lett. 22(7), 495–497 (2010).
[CrossRef]

T. Han, S. Madden, D. Bulla, and B. Luther-Davies, “Low loss chalcogenide glass waveguides by thermal nano-imprint lithography,” Opt. Express 18(18), 19286–19291 (2010).
[CrossRef] [PubMed]

D. Y. Choi, S. Madden, D. Bulla, R. P. Wang, A. Rode, and B. Luther-Davies, “Thermal annealing of arsenic tri-sulphide thin film and its influence on device performance,” J. Appl. Phys. 107(5), 053106 (2010).
[CrossRef]

T. Han, S. Madden, B. Luther-Davies, and R. Charters, “High-quality polarization-insensitive polysiloxane waveguide gratings produced by UV nanoimprint lithography,” IEEE Photon. Technol. Lett. 22(23), 1720–1722 (2010).
[CrossRef]

D. Choi, S. Madden, D. Bulla, R. Wang, A. Rode, and B. Luther-Davies, “Thermal annealing of arsenic tri-sulphide thin film and its influence on device performance,” J. Appl. Phys. 107(5), 053106 (2010).
[CrossRef]

X. Gai, T. Han, A. Prasad, S. Madden, D. Y. Choi, R. P. Wang, D. Bulla, and B. Luther-Davies, “Progress in optical waveguides fabricated from chalcogenide glasses,” Opt. Express 18(25), 26635–26646 (2010).
[CrossRef] [PubMed]

M. Galili, J. Xu, H. C. Mulvad, L. K. Oxenløwe, A. T. Clausen, P. Jeppesen, B. Luther-Davies, S. Madden, A. Rode, D.-Y. Choi, M. Pelusi, F. Luan, and B. J. Eggleton, “Breakthrough switching speed with an all-optical chalcogenide glass chip: 640 Gbit/s demultiplexing,” Opt. Express 17(4), 2182–2187 (2009).
[CrossRef] [PubMed]

T. Han, S. Madden, M. Zhang, R. Charters, and B. Luther-Davies, “Low loss high index contrast nanoimprinted polysiloxane waveguides,” Opt. Express 17(4), 2623–2630 (2009).
[CrossRef] [PubMed]

A. Prasad, C. J. Zha, R. P. Wang, A. Smith, S. Madden, and B. Luther-Davies, “Properties of GexAsySe1-x-y glasses for all-optical signal processing,” Opt. Express 16(4), 2804–2815 (2008).
[CrossRef] [PubMed]

D. Y. Choi, S. Madden, A. Rode, R. P. Wang, A. Ankiewicz, and B. Luther-Davies, “Surface roughness in plasma-etched As2S3 films: Its origin and improvement,” IEEE Trans. Nanotechnol. 7(3), 285–290 (2008).
[CrossRef]

M. R. E. Lamont, B. Luther-Davies, D. Y. Choi, S. Madden, X. Gai, and B. J. Eggleton, “Net-gain from a parametric amplifier on a chalcogenide optical chip,” Opt. Express 16(25), 20374–20381 (2008).
[CrossRef] [PubMed]

V. G. Ta’eed, M. R. E. Lamont, D. J. Moss, B. J. Eggleton, D. Y. Choi, S. Madden, and B. Luther-Davies, “All optical wavelength conversion via cross phase modulation in chalcogenide glass rib waveguides,” Opt. Express 14(23), 11242–11247 (2006).
[CrossRef] [PubMed]

Madden, S. J.

Madsen, C. K.

M. Solmaz, H. Park, C. K. Madsen, and X. Cheng, “Patterning chalcogenide glass by direct resist-free thermal nanoimprint,” J. Vac. Sci. Technol. B 26(2), 606–610 (2008).
[CrossRef]

Magi, M. R. E.

M. D. Pelusi, V. G. Ta’eed, E. Libin Fu, M. R. E. Magi, S. Lamont, Madden, D. A. P. Duk-Yong Choi, B. Bulla, Luther-Davies, and B. J. Eggleton, “Applications of highly-nonlinear chalcogenide glass devices tailored for high-speed all-optical signal processing,” IEEE J. Sel. Top. Quantum Electron. 14(3), 529–539 (2008).
[CrossRef]

Michel, B.

H. Schmid and B. Michel, “Siloxane polymers for high-resolution, high-accuracy soft lithography,” Macromolecules 33(8), 3042–3049 (2000).
[CrossRef]

Moss, D. J.

Mulvad, H. C.

Nguyen, V. Q.

Orava, J.

Oxenløwe, L. K.

Pan, W.

Pan, W. J.

W. J. Pan, H. Rowe, D. Zhang, Y. Zhang, A. Loni, D. Furniss, P. Sewell, T. M. Benson, and A. B. Seddon, “One-step hot embossing of optical rib waveguides in chalcogenide glasses,” Microw. Opt. Technol. Lett. 50(7), 1961–1963 (2008).
[CrossRef]

Park, H.

M. Solmaz, H. Park, C. K. Madsen, and X. Cheng, “Patterning chalcogenide glass by direct resist-free thermal nanoimprint,” J. Vac. Sci. Technol. B 26(2), 606–610 (2008).
[CrossRef]

Pelusi, M.

Pelusi, M. D.

M. D. Pelusi, V. G. Ta’eed, E. Libin Fu, M. R. E. Magi, S. Lamont, Madden, D. A. P. Duk-Yong Choi, B. Bulla, Luther-Davies, and B. J. Eggleton, “Applications of highly-nonlinear chalcogenide glass devices tailored for high-speed all-optical signal processing,” IEEE J. Sel. Top. Quantum Electron. 14(3), 529–539 (2008).
[CrossRef]

S. J. Madden, D. Y. Choi, D. A. Bulla, A. V. Rode, B. Luther-Davies, V. G. Ta’eed, M. D. Pelusi, and B. J. Eggleton, “Long, low loss etched As(2)S(3) chalcogenide waveguides for all-optical signal regeneration,” Opt. Express 15(22), 14414–14421 (2007).
[CrossRef] [PubMed]

Prasad, A.

Quémard, C.

C. Quémard, F. Smektala, V. Couderc, A. Barthelemy, and J. Lucas, “Chalcogenide glasses with high non linear optical properties for telecommunications,” J. Phys. Chem. Solids 62(8), 1435–1440 (2001).
[CrossRef]

Rode, A.

D. Choi, S. Madden, D. Bulla, R. Wang, A. Rode, and B. Luther-Davies, “Thermal annealing of arsenic tri-sulphide thin film and its influence on device performance,” J. Appl. Phys. 107(5), 053106 (2010).
[CrossRef]

D. Y. Choi, S. Madden, D. Bulla, R. P. Wang, A. Rode, and B. Luther-Davies, “Thermal annealing of arsenic tri-sulphide thin film and its influence on device performance,” J. Appl. Phys. 107(5), 053106 (2010).
[CrossRef]

D. Choi, S. Madden, D. Bulla, R. Wang, A. Rode, and B. Luther-Davies, “Submicrometer-thick low-loss As2S3 planar waveguides for nonlinear optical devices,” IEEE Photon. Technol. Lett. 22(7), 495–497 (2010).
[CrossRef]

M. Galili, J. Xu, H. C. Mulvad, L. K. Oxenløwe, A. T. Clausen, P. Jeppesen, B. Luther-Davies, S. Madden, A. Rode, D.-Y. Choi, M. Pelusi, F. Luan, and B. J. Eggleton, “Breakthrough switching speed with an all-optical chalcogenide glass chip: 640 Gbit/s demultiplexing,” Opt. Express 17(4), 2182–2187 (2009).
[CrossRef] [PubMed]

D. Y. Choi, S. Madden, A. Rode, R. P. Wang, A. Ankiewicz, and B. Luther-Davies, “Surface roughness in plasma-etched As2S3 films: Its origin and improvement,” IEEE Trans. Nanotechnol. 7(3), 285–290 (2008).
[CrossRef]

Rode, A. V.

Rowe, H.

W. J. Pan, H. Rowe, D. Zhang, Y. Zhang, A. Loni, D. Furniss, P. Sewell, T. M. Benson, and A. B. Seddon, “One-step hot embossing of optical rib waveguides in chalcogenide glasses,” Microw. Opt. Technol. Lett. 50(7), 1961–1963 (2008).
[CrossRef]

Sanghera, J. S.

Schift, H.

H. Schift, “Nanoimprint lithography: an old story in modern times? a review,” J. Vac. Sci. Technol. B 26(2), 458–480 (2008).
[CrossRef]

Schmid, H.

H. Schmid and B. Michel, “Siloxane polymers for high-resolution, high-accuracy soft lithography,” Macromolecules 33(8), 3042–3049 (2000).
[CrossRef]

Seddon, A. B.

Z. G. Lian, W. Pan, D. Furniss, T. M. Benson, A. B. Seddon, T. Kohoutek, J. Orava, and T. Wagner, “Embossing of chalcogenide glasses: monomode rib optical waveguides in evaporated thin films,” Opt. Lett. 34(8), 1234–1236 (2009).
[CrossRef] [PubMed]

W. J. Pan, H. Rowe, D. Zhang, Y. Zhang, A. Loni, D. Furniss, P. Sewell, T. M. Benson, and A. B. Seddon, “One-step hot embossing of optical rib waveguides in chalcogenide glasses,” Microw. Opt. Technol. Lett. 50(7), 1961–1963 (2008).
[CrossRef]

Sewell, P.

W. J. Pan, H. Rowe, D. Zhang, Y. Zhang, A. Loni, D. Furniss, P. Sewell, T. M. Benson, and A. B. Seddon, “One-step hot embossing of optical rib waveguides in chalcogenide glasses,” Microw. Opt. Technol. Lett. 50(7), 1961–1963 (2008).
[CrossRef]

Shaw, L. B.

Smektala, F.

C. Quémard, F. Smektala, V. Couderc, A. Barthelemy, and J. Lucas, “Chalcogenide glasses with high non linear optical properties for telecommunications,” J. Phys. Chem. Solids 62(8), 1435–1440 (2001).
[CrossRef]

Smith, A.

Solmaz, M.

M. Solmaz, H. Park, C. K. Madsen, and X. Cheng, “Patterning chalcogenide glass by direct resist-free thermal nanoimprint,” J. Vac. Sci. Technol. B 26(2), 606–610 (2008).
[CrossRef]

Ta’eed, V. G.

Wagner, T.

Wang, R.

D. Choi, S. Madden, D. Bulla, R. Wang, A. Rode, and B. Luther-Davies, “Thermal annealing of arsenic tri-sulphide thin film and its influence on device performance,” J. Appl. Phys. 107(5), 053106 (2010).
[CrossRef]

D. Choi, S. Madden, D. Bulla, R. Wang, A. Rode, and B. Luther-Davies, “Submicrometer-thick low-loss As2S3 planar waveguides for nonlinear optical devices,” IEEE Photon. Technol. Lett. 22(7), 495–497 (2010).
[CrossRef]

Wang, R. P.

D. Y. Choi, S. Madden, D. Bulla, R. P. Wang, A. Rode, and B. Luther-Davies, “Thermal annealing of arsenic tri-sulphide thin film and its influence on device performance,” J. Appl. Phys. 107(5), 053106 (2010).
[CrossRef]

X. Gai, T. Han, A. Prasad, S. Madden, D. Y. Choi, R. P. Wang, D. Bulla, and B. Luther-Davies, “Progress in optical waveguides fabricated from chalcogenide glasses,” Opt. Express 18(25), 26635–26646 (2010).
[CrossRef] [PubMed]

A. Prasad, C. J. Zha, R. P. Wang, A. Smith, S. Madden, and B. Luther-Davies, “Properties of GexAsySe1-x-y glasses for all-optical signal processing,” Opt. Express 16(4), 2804–2815 (2008).
[CrossRef] [PubMed]

D. Y. Choi, S. Madden, A. Rode, R. P. Wang, A. Ankiewicz, and B. Luther-Davies, “Surface roughness in plasma-etched As2S3 films: Its origin and improvement,” IEEE Trans. Nanotechnol. 7(3), 285–290 (2008).
[CrossRef]

Wise, F. W.

Xu, J.

Zha, C. J.

Zhang, D.

W. J. Pan, H. Rowe, D. Zhang, Y. Zhang, A. Loni, D. Furniss, P. Sewell, T. M. Benson, and A. B. Seddon, “One-step hot embossing of optical rib waveguides in chalcogenide glasses,” Microw. Opt. Technol. Lett. 50(7), 1961–1963 (2008).
[CrossRef]

Zhang, M.

Zhang, X. H.

X. H. Zhang, Y. Guimond, and Y. Bellec, “Production of complex chalcogenide glass optics by molding for thermal imaging,” J. Non-Cryst. Sol. 326, 519–523 (2003).

Zhang, Y.

W. J. Pan, H. Rowe, D. Zhang, Y. Zhang, A. Loni, D. Furniss, P. Sewell, T. M. Benson, and A. B. Seddon, “One-step hot embossing of optical rib waveguides in chalcogenide glasses,” Microw. Opt. Technol. Lett. 50(7), 1961–1963 (2008).
[CrossRef]

IEEE J. Sel. Top. Quantum Electron.

M. D. Pelusi, V. G. Ta’eed, E. Libin Fu, M. R. E. Magi, S. Lamont, Madden, D. A. P. Duk-Yong Choi, B. Bulla, Luther-Davies, and B. J. Eggleton, “Applications of highly-nonlinear chalcogenide glass devices tailored for high-speed all-optical signal processing,” IEEE J. Sel. Top. Quantum Electron. 14(3), 529–539 (2008).
[CrossRef]

IEEE Photon. Technol. Lett.

D. Choi, S. Madden, D. Bulla, R. Wang, A. Rode, and B. Luther-Davies, “Submicrometer-thick low-loss As2S3 planar waveguides for nonlinear optical devices,” IEEE Photon. Technol. Lett. 22(7), 495–497 (2010).
[CrossRef]

T. Han, S. Madden, B. Luther-Davies, and R. Charters, “High-quality polarization-insensitive polysiloxane waveguide gratings produced by UV nanoimprint lithography,” IEEE Photon. Technol. Lett. 22(23), 1720–1722 (2010).
[CrossRef]

IEEE Trans. Nanotechnol.

D. Y. Choi, S. Madden, A. Rode, R. P. Wang, A. Ankiewicz, and B. Luther-Davies, “Surface roughness in plasma-etched As2S3 films: Its origin and improvement,” IEEE Trans. Nanotechnol. 7(3), 285–290 (2008).
[CrossRef]

J. Appl. Phys.

D. Choi, S. Madden, D. Bulla, R. Wang, A. Rode, and B. Luther-Davies, “Thermal annealing of arsenic tri-sulphide thin film and its influence on device performance,” J. Appl. Phys. 107(5), 053106 (2010).
[CrossRef]

D. Y. Choi, S. Madden, D. Bulla, R. P. Wang, A. Rode, and B. Luther-Davies, “Thermal annealing of arsenic tri-sulphide thin film and its influence on device performance,” J. Appl. Phys. 107(5), 053106 (2010).
[CrossRef]

J. Non-Cryst. Sol.

X. H. Zhang, Y. Guimond, and Y. Bellec, “Production of complex chalcogenide glass optics by molding for thermal imaging,” J. Non-Cryst. Sol. 326, 519–523 (2003).

J. Phys. Chem. Solids

C. Quémard, F. Smektala, V. Couderc, A. Barthelemy, and J. Lucas, “Chalcogenide glasses with high non linear optical properties for telecommunications,” J. Phys. Chem. Solids 62(8), 1435–1440 (2001).
[CrossRef]

J. Vac. Sci. Technol. B

M. Solmaz, H. Park, C. K. Madsen, and X. Cheng, “Patterning chalcogenide glass by direct resist-free thermal nanoimprint,” J. Vac. Sci. Technol. B 26(2), 606–610 (2008).
[CrossRef]

H. Schift, “Nanoimprint lithography: an old story in modern times? a review,” J. Vac. Sci. Technol. B 26(2), 458–480 (2008).
[CrossRef]

Macromolecules

H. Schmid and B. Michel, “Siloxane polymers for high-resolution, high-accuracy soft lithography,” Macromolecules 33(8), 3042–3049 (2000).
[CrossRef]

Microw. Opt. Technol. Lett.

W. J. Pan, H. Rowe, D. Zhang, Y. Zhang, A. Loni, D. Furniss, P. Sewell, T. M. Benson, and A. B. Seddon, “One-step hot embossing of optical rib waveguides in chalcogenide glasses,” Microw. Opt. Technol. Lett. 50(7), 1961–1963 (2008).
[CrossRef]

Opt. Express

V. G. Ta’eed, M. R. E. Lamont, D. J. Moss, B. J. Eggleton, D. Y. Choi, S. Madden, and B. Luther-Davies, “All optical wavelength conversion via cross phase modulation in chalcogenide glass rib waveguides,” Opt. Express 14(23), 11242–11247 (2006).
[CrossRef] [PubMed]

S. J. Madden, D. Y. Choi, D. A. Bulla, A. V. Rode, B. Luther-Davies, V. G. Ta’eed, M. D. Pelusi, and B. J. Eggleton, “Long, low loss etched As(2)S(3) chalcogenide waveguides for all-optical signal regeneration,” Opt. Express 15(22), 14414–14421 (2007).
[CrossRef] [PubMed]

A. Prasad, C. J. Zha, R. P. Wang, A. Smith, S. Madden, and B. Luther-Davies, “Properties of GexAsySe1-x-y glasses for all-optical signal processing,” Opt. Express 16(4), 2804–2815 (2008).
[CrossRef] [PubMed]

M. R. E. Lamont, B. Luther-Davies, D. Y. Choi, S. Madden, X. Gai, and B. J. Eggleton, “Net-gain from a parametric amplifier on a chalcogenide optical chip,” Opt. Express 16(25), 20374–20381 (2008).
[CrossRef] [PubMed]

M. Galili, J. Xu, H. C. Mulvad, L. K. Oxenløwe, A. T. Clausen, P. Jeppesen, B. Luther-Davies, S. Madden, A. Rode, D.-Y. Choi, M. Pelusi, F. Luan, and B. J. Eggleton, “Breakthrough switching speed with an all-optical chalcogenide glass chip: 640 Gbit/s demultiplexing,” Opt. Express 17(4), 2182–2187 (2009).
[CrossRef] [PubMed]

T. Han, S. Madden, M. Zhang, R. Charters, and B. Luther-Davies, “Low loss high index contrast nanoimprinted polysiloxane waveguides,” Opt. Express 17(4), 2623–2630 (2009).
[CrossRef] [PubMed]

T. Han, S. Madden, D. Bulla, and B. Luther-Davies, “Low loss chalcogenide glass waveguides by thermal nano-imprint lithography,” Opt. Express 18(18), 19286–19291 (2010).
[CrossRef] [PubMed]

X. Gai, T. Han, A. Prasad, S. Madden, D. Y. Choi, R. P. Wang, D. Bulla, and B. Luther-Davies, “Progress in optical waveguides fabricated from chalcogenide glasses,” Opt. Express 18(25), 26635–26646 (2010).
[CrossRef] [PubMed]

Opt. Lett.

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Figures (5)

Fig. 1
Fig. 1

Optical microscopic images of the embossed As2S3 waveguide showing (a) surface crystallization without protective coating; (b) no surface degradation with 50nm Ge11.5 coating; (c) the waveguide cross-section with 40nm SU8 coating; (d) the waveguide cross section with 50nm Ge11.5 coating.

Fig. 2
Fig. 2

SEM images of the embossed As2S3 waveguides. (a) side wall image at 45°; (b) plan view showing the embossed wavguide surrounded by depressed trenches; (c) magnified portion from (b) showing some roughening at the bottom of the rib.

Fig. 3
Fig. 3

Optical insertion loss of cutback measurements for nominal waveguide width of (a) 3.8μm averaged over 7 waveguides and (b) 2.2μm averaged over 4 waveguides.

Fig. 4
Fig. 4

Wavelength dependence of the propagation loss of the embossed waveguide.

Fig. 5
Fig. 5

(a) Experimental setup for FWM experiments; (b) measured FWM conversion efficiency versus pump power with a fit to a square law relation.

Equations (2)

Equations on this page are rendered with MathJax. Learn more.

η=exp(αL) (γ P p L eff ) 2
L eff = 1+exp(2αL)2exp(αL)cos(ΔβL) / α 2 +Δ β 2

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