L. Duan, J. Cheng, G. Sun, and Y. Chen, “New 0.75 NA ArF scanning lithographic tool,” Proc. SPIE 7973, 79732D (2011).

[CrossRef]

A. Y. Bourov, L. Li, Z. Yang, F. Wang, and L. Duan, “Aerial image model and application to aberration measurement,” Proc. SPIE 7640, 764032, 764032-8 (2010).

[CrossRef]

B. Peng, X. Wang, Z. Qiu, Q. Yuan, and Y. Cao, “Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging,” Opt. Lett. 35(9), 1404–1406 (2010).

[CrossRef]
[PubMed]

F. Wang, X. Wang, and M. Ma, “Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools,” Appl. Opt. 45(24), 6086–6093 (2006).

[PubMed]

M. Ma, X. Wang, and F. Wang, “Aberration measurement of projection optics in lithographic tools based on two-beam interference theory,” Appl. Opt. 45(32), 8200–8208 (2006).

[CrossRef]
[PubMed]

Y. Ohsaki, T. Mori, S. Koga, M. Ando, K. Yamamoto, T. Tezuka, and Y. Shiode, “A new on-machine measurement system to measure wavefront aberration of projection optics with hyper-NA,” Proc. SPIE 6154, 615424, 615424-10 (2006).

[CrossRef]

C. A. Mack, “Lithography simulation in semiconductor manufacturing,” Proc. SPIE 5645, 63–83 (2005).

[CrossRef]

C. A. Mack, “Thirty years of lithography simulation,” Proc. SPIE 5754, 1–12 (2004).

[CrossRef]

L. V. Zavyalova, B. W. Smith, T. Suganaga, S. Matsuura, T. Itani, and J. S. Cashmore, “In-situ aberration monitoring using phase wheel targets,” Proc. SPIE 5377, 172–184 (2004).

[CrossRef]

P. Graeupner, R. Garreis, A. Goehnermeiter, T. Heil, M. Lowisch, and D. Flagello, “Impact of wavefront errors on low k1 processes at extreme high NA,” Proc. SPIE 5040, 119–130 (2003).

[CrossRef]

M. Moers, H. van der Laan, M. Zellenrath, W. de Boeij, N. Beaudry, K. D. Cummings, A. van Zwol, A. Bechtz, and R. Willekersa, “Application of the aberration ring test (ARTEMISTM) to determine lens quality and predict its lithographic performance,” Proc. SPIE 4346, 1379–1387 (2001).

[CrossRef]

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration set-up and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

[CrossRef]

H. Ooki, T. Noda, and K. Matsumoto, “Aberration averaging using point spread function for scanning projection system,” Proc. SPIE 4000, 551–558 (2000).

[CrossRef]

J. P. Kirk, “Review of photoresist-based lens evaluation methods,” Proc. SPIE 4000, 2–8 (2000).

[CrossRef]

D. G. Flagello, J. Mulkens, and C. Wagner, “Optical lithography into the millennium: sensitivity to aberrations, vibration and polarization,” Proc. SPIE 4000, 172–183 (2000).

[CrossRef]

Y. Ohsaki, T. Mori, S. Koga, M. Ando, K. Yamamoto, T. Tezuka, and Y. Shiode, “A new on-machine measurement system to measure wavefront aberration of projection optics with hyper-NA,” Proc. SPIE 6154, 615424, 615424-10 (2006).

[CrossRef]

M. Moers, H. van der Laan, M. Zellenrath, W. de Boeij, N. Beaudry, K. D. Cummings, A. van Zwol, A. Bechtz, and R. Willekersa, “Application of the aberration ring test (ARTEMISTM) to determine lens quality and predict its lithographic performance,” Proc. SPIE 4346, 1379–1387 (2001).

[CrossRef]

M. Moers, H. van der Laan, M. Zellenrath, W. de Boeij, N. Beaudry, K. D. Cummings, A. van Zwol, A. Bechtz, and R. Willekersa, “Application of the aberration ring test (ARTEMISTM) to determine lens quality and predict its lithographic performance,” Proc. SPIE 4346, 1379–1387 (2001).

[CrossRef]

A. Y. Bourov, L. Li, Z. Yang, F. Wang, and L. Duan, “Aerial image model and application to aberration measurement,” Proc. SPIE 7640, 764032, 764032-8 (2010).

[CrossRef]

L. V. Zavyalova, B. W. Smith, T. Suganaga, S. Matsuura, T. Itani, and J. S. Cashmore, “In-situ aberration monitoring using phase wheel targets,” Proc. SPIE 5377, 172–184 (2004).

[CrossRef]

L. Duan, J. Cheng, G. Sun, and Y. Chen, “New 0.75 NA ArF scanning lithographic tool,” Proc. SPIE 7973, 79732D (2011).

[CrossRef]

L. Duan, J. Cheng, G. Sun, and Y. Chen, “New 0.75 NA ArF scanning lithographic tool,” Proc. SPIE 7973, 79732D (2011).

[CrossRef]

M. Moers, H. van der Laan, M. Zellenrath, W. de Boeij, N. Beaudry, K. D. Cummings, A. van Zwol, A. Bechtz, and R. Willekersa, “Application of the aberration ring test (ARTEMISTM) to determine lens quality and predict its lithographic performance,” Proc. SPIE 4346, 1379–1387 (2001).

[CrossRef]

M. Moers, H. van der Laan, M. Zellenrath, W. de Boeij, N. Beaudry, K. D. Cummings, A. van Zwol, A. Bechtz, and R. Willekersa, “Application of the aberration ring test (ARTEMISTM) to determine lens quality and predict its lithographic performance,” Proc. SPIE 4346, 1379–1387 (2001).

[CrossRef]

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration set-up and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

[CrossRef]

L. Duan, J. Cheng, G. Sun, and Y. Chen, “New 0.75 NA ArF scanning lithographic tool,” Proc. SPIE 7973, 79732D (2011).

[CrossRef]

A. Y. Bourov, L. Li, Z. Yang, F. Wang, and L. Duan, “Aerial image model and application to aberration measurement,” Proc. SPIE 7640, 764032, 764032-8 (2010).

[CrossRef]

P. Graeupner, R. Garreis, A. Goehnermeiter, T. Heil, M. Lowisch, and D. Flagello, “Impact of wavefront errors on low k1 processes at extreme high NA,” Proc. SPIE 5040, 119–130 (2003).

[CrossRef]

D. G. Flagello, J. Mulkens, and C. Wagner, “Optical lithography into the millennium: sensitivity to aberrations, vibration and polarization,” Proc. SPIE 4000, 172–183 (2000).

[CrossRef]

P. Graeupner, R. Garreis, A. Goehnermeiter, T. Heil, M. Lowisch, and D. Flagello, “Impact of wavefront errors on low k1 processes at extreme high NA,” Proc. SPIE 5040, 119–130 (2003).

[CrossRef]

P. Graeupner, R. Garreis, A. Goehnermeiter, T. Heil, M. Lowisch, and D. Flagello, “Impact of wavefront errors on low k1 processes at extreme high NA,” Proc. SPIE 5040, 119–130 (2003).

[CrossRef]

P. Graeupner, R. Garreis, A. Goehnermeiter, T. Heil, M. Lowisch, and D. Flagello, “Impact of wavefront errors on low k1 processes at extreme high NA,” Proc. SPIE 5040, 119–130 (2003).

[CrossRef]

P. Graeupner, R. Garreis, A. Goehnermeiter, T. Heil, M. Lowisch, and D. Flagello, “Impact of wavefront errors on low k1 processes at extreme high NA,” Proc. SPIE 5040, 119–130 (2003).

[CrossRef]

L. V. Zavyalova, B. W. Smith, T. Suganaga, S. Matsuura, T. Itani, and J. S. Cashmore, “In-situ aberration monitoring using phase wheel targets,” Proc. SPIE 5377, 172–184 (2004).

[CrossRef]

J. P. Kirk, “Review of photoresist-based lens evaluation methods,” Proc. SPIE 4000, 2–8 (2000).

[CrossRef]

Y. Ohsaki, T. Mori, S. Koga, M. Ando, K. Yamamoto, T. Tezuka, and Y. Shiode, “A new on-machine measurement system to measure wavefront aberration of projection optics with hyper-NA,” Proc. SPIE 6154, 615424, 615424-10 (2006).

[CrossRef]

A. Y. Bourov, L. Li, Z. Yang, F. Wang, and L. Duan, “Aerial image model and application to aberration measurement,” Proc. SPIE 7640, 764032, 764032-8 (2010).

[CrossRef]

P. Graeupner, R. Garreis, A. Goehnermeiter, T. Heil, M. Lowisch, and D. Flagello, “Impact of wavefront errors on low k1 processes at extreme high NA,” Proc. SPIE 5040, 119–130 (2003).

[CrossRef]

Q. Yuan, X. Wang, Z. Qiu, F. Wang, M. Ma, and L. He, “Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings,” Opt. Express 15(24), 15878–15885 (2007).

[CrossRef]
[PubMed]

F. Wang, X. Wang, and M. Ma, “Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools,” Appl. Opt. 45(24), 6086–6093 (2006).

[PubMed]

M. Ma, X. Wang, and F. Wang, “Aberration measurement of projection optics in lithographic tools based on two-beam interference theory,” Appl. Opt. 45(32), 8200–8208 (2006).

[CrossRef]
[PubMed]

C. A. Mack, “Lithography simulation in semiconductor manufacturing,” Proc. SPIE 5645, 63–83 (2005).

[CrossRef]

C. A. Mack, “Thirty years of lithography simulation,” Proc. SPIE 5754, 1–12 (2004).

[CrossRef]

H. Ooki, T. Noda, and K. Matsumoto, “Aberration averaging using point spread function for scanning projection system,” Proc. SPIE 4000, 551–558 (2000).

[CrossRef]

L. V. Zavyalova, B. W. Smith, T. Suganaga, S. Matsuura, T. Itani, and J. S. Cashmore, “In-situ aberration monitoring using phase wheel targets,” Proc. SPIE 5377, 172–184 (2004).

[CrossRef]

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration set-up and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

[CrossRef]

M. Moers, H. van der Laan, M. Zellenrath, W. de Boeij, N. Beaudry, K. D. Cummings, A. van Zwol, A. Bechtz, and R. Willekersa, “Application of the aberration ring test (ARTEMISTM) to determine lens quality and predict its lithographic performance,” Proc. SPIE 4346, 1379–1387 (2001).

[CrossRef]

Y. Ohsaki, T. Mori, S. Koga, M. Ando, K. Yamamoto, T. Tezuka, and Y. Shiode, “A new on-machine measurement system to measure wavefront aberration of projection optics with hyper-NA,” Proc. SPIE 6154, 615424, 615424-10 (2006).

[CrossRef]

D. G. Flagello, J. Mulkens, and C. Wagner, “Optical lithography into the millennium: sensitivity to aberrations, vibration and polarization,” Proc. SPIE 4000, 172–183 (2000).

[CrossRef]

H. Ooki, T. Noda, and K. Matsumoto, “Aberration averaging using point spread function for scanning projection system,” Proc. SPIE 4000, 551–558 (2000).

[CrossRef]

Y. Ohsaki, T. Mori, S. Koga, M. Ando, K. Yamamoto, T. Tezuka, and Y. Shiode, “A new on-machine measurement system to measure wavefront aberration of projection optics with hyper-NA,” Proc. SPIE 6154, 615424, 615424-10 (2006).

[CrossRef]

H. Ooki, T. Noda, and K. Matsumoto, “Aberration averaging using point spread function for scanning projection system,” Proc. SPIE 4000, 551–558 (2000).

[CrossRef]

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration set-up and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

[CrossRef]

B. Peng, X. Wang, Z. Qiu, Q. Yuan, and Y. Cao, “Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging,” Opt. Lett. 35(9), 1404–1406 (2010).

[CrossRef]
[PubMed]

Z. Qiu, X. Wang, Q. Yuan, and F. Wang, “Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width,” Appl. Opt. 48(2), 261–269 (2009).

[CrossRef]
[PubMed]

Q. Yuan, X. Wang, Z. Qiu, F. Wang, M. Ma, and L. He, “Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings,” Opt. Express 15(24), 15878–15885 (2007).

[CrossRef]
[PubMed]

Y. Ohsaki, T. Mori, S. Koga, M. Ando, K. Yamamoto, T. Tezuka, and Y. Shiode, “A new on-machine measurement system to measure wavefront aberration of projection optics with hyper-NA,” Proc. SPIE 6154, 615424, 615424-10 (2006).

[CrossRef]

L. V. Zavyalova, B. W. Smith, T. Suganaga, S. Matsuura, T. Itani, and J. S. Cashmore, “In-situ aberration monitoring using phase wheel targets,” Proc. SPIE 5377, 172–184 (2004).

[CrossRef]

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration set-up and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

[CrossRef]

L. V. Zavyalova, B. W. Smith, T. Suganaga, S. Matsuura, T. Itani, and J. S. Cashmore, “In-situ aberration monitoring using phase wheel targets,” Proc. SPIE 5377, 172–184 (2004).

[CrossRef]

L. Duan, J. Cheng, G. Sun, and Y. Chen, “New 0.75 NA ArF scanning lithographic tool,” Proc. SPIE 7973, 79732D (2011).

[CrossRef]

Y. Ohsaki, T. Mori, S. Koga, M. Ando, K. Yamamoto, T. Tezuka, and Y. Shiode, “A new on-machine measurement system to measure wavefront aberration of projection optics with hyper-NA,” Proc. SPIE 6154, 615424, 615424-10 (2006).

[CrossRef]

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration set-up and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

[CrossRef]

M. Moers, H. van der Laan, M. Zellenrath, W. de Boeij, N. Beaudry, K. D. Cummings, A. van Zwol, A. Bechtz, and R. Willekersa, “Application of the aberration ring test (ARTEMISTM) to determine lens quality and predict its lithographic performance,” Proc. SPIE 4346, 1379–1387 (2001).

[CrossRef]

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration set-up and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

[CrossRef]

M. Moers, H. van der Laan, M. Zellenrath, W. de Boeij, N. Beaudry, K. D. Cummings, A. van Zwol, A. Bechtz, and R. Willekersa, “Application of the aberration ring test (ARTEMISTM) to determine lens quality and predict its lithographic performance,” Proc. SPIE 4346, 1379–1387 (2001).

[CrossRef]

D. G. Flagello, J. Mulkens, and C. Wagner, “Optical lithography into the millennium: sensitivity to aberrations, vibration and polarization,” Proc. SPIE 4000, 172–183 (2000).

[CrossRef]

A. Y. Bourov, L. Li, Z. Yang, F. Wang, and L. Duan, “Aerial image model and application to aberration measurement,” Proc. SPIE 7640, 764032, 764032-8 (2010).

[CrossRef]

Z. Qiu, X. Wang, Q. Yuan, and F. Wang, “Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width,” Appl. Opt. 48(2), 261–269 (2009).

[CrossRef]
[PubMed]

Q. Yuan, X. Wang, Z. Qiu, F. Wang, M. Ma, and L. He, “Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings,” Opt. Express 15(24), 15878–15885 (2007).

[CrossRef]
[PubMed]

M. Ma, X. Wang, and F. Wang, “Aberration measurement of projection optics in lithographic tools based on two-beam interference theory,” Appl. Opt. 45(32), 8200–8208 (2006).

[CrossRef]
[PubMed]

F. Wang, X. Wang, and M. Ma, “Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools,” Appl. Opt. 45(24), 6086–6093 (2006).

[PubMed]

B. Peng, X. Wang, Z. Qiu, Q. Yuan, and Y. Cao, “Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging,” Opt. Lett. 35(9), 1404–1406 (2010).

[CrossRef]
[PubMed]

Z. Qiu, X. Wang, Q. Yuan, and F. Wang, “Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width,” Appl. Opt. 48(2), 261–269 (2009).

[CrossRef]
[PubMed]

Q. Yuan, X. Wang, Z. Qiu, F. Wang, M. Ma, and L. He, “Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings,” Opt. Express 15(24), 15878–15885 (2007).

[CrossRef]
[PubMed]

M. Ma, X. Wang, and F. Wang, “Aberration measurement of projection optics in lithographic tools based on two-beam interference theory,” Appl. Opt. 45(32), 8200–8208 (2006).

[CrossRef]
[PubMed]

F. Wang, X. Wang, and M. Ma, “Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools,” Appl. Opt. 45(24), 6086–6093 (2006).

[PubMed]

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration set-up and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

[CrossRef]

M. Moers, H. van der Laan, M. Zellenrath, W. de Boeij, N. Beaudry, K. D. Cummings, A. van Zwol, A. Bechtz, and R. Willekersa, “Application of the aberration ring test (ARTEMISTM) to determine lens quality and predict its lithographic performance,” Proc. SPIE 4346, 1379–1387 (2001).

[CrossRef]

Y. Ohsaki, T. Mori, S. Koga, M. Ando, K. Yamamoto, T. Tezuka, and Y. Shiode, “A new on-machine measurement system to measure wavefront aberration of projection optics with hyper-NA,” Proc. SPIE 6154, 615424, 615424-10 (2006).

[CrossRef]

A. Y. Bourov, L. Li, Z. Yang, F. Wang, and L. Duan, “Aerial image model and application to aberration measurement,” Proc. SPIE 7640, 764032, 764032-8 (2010).

[CrossRef]

B. Peng, X. Wang, Z. Qiu, Q. Yuan, and Y. Cao, “Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging,” Opt. Lett. 35(9), 1404–1406 (2010).

[CrossRef]
[PubMed]

Z. Qiu, X. Wang, Q. Yuan, and F. Wang, “Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width,” Appl. Opt. 48(2), 261–269 (2009).

[CrossRef]
[PubMed]

Q. Yuan, X. Wang, Z. Qiu, F. Wang, M. Ma, and L. He, “Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings,” Opt. Express 15(24), 15878–15885 (2007).

[CrossRef]
[PubMed]

L. V. Zavyalova, B. W. Smith, T. Suganaga, S. Matsuura, T. Itani, and J. S. Cashmore, “In-situ aberration monitoring using phase wheel targets,” Proc. SPIE 5377, 172–184 (2004).

[CrossRef]

M. Moers, H. van der Laan, M. Zellenrath, W. de Boeij, N. Beaudry, K. D. Cummings, A. van Zwol, A. Bechtz, and R. Willekersa, “Application of the aberration ring test (ARTEMISTM) to determine lens quality and predict its lithographic performance,” Proc. SPIE 4346, 1379–1387 (2001).

[CrossRef]

Z. Qiu, X. Wang, Q. Yuan, and F. Wang, “Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width,” Appl. Opt. 48(2), 261–269 (2009).

[CrossRef]
[PubMed]

F. Wang, X. Wang, and M. Ma, “Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools,” Appl. Opt. 45(24), 6086–6093 (2006).

[PubMed]

M. Ma, X. Wang, and F. Wang, “Aberration measurement of projection optics in lithographic tools based on two-beam interference theory,” Appl. Opt. 45(32), 8200–8208 (2006).

[CrossRef]
[PubMed]

L. V. Zavyalova, B. W. Smith, T. Suganaga, S. Matsuura, T. Itani, and J. S. Cashmore, “In-situ aberration monitoring using phase wheel targets,” Proc. SPIE 5377, 172–184 (2004).

[CrossRef]

H. van der Laan, M. Dierichs, H. van Greevenbroek, E. McCoo, F. Stoffels, R. Pongers, and R. Willekers, “Aerial image measurement methods for fast aberration set-up and illumination pupil verification,” Proc. SPIE 4346, 394–407 (2001).

[CrossRef]

Y. Ohsaki, T. Mori, S. Koga, M. Ando, K. Yamamoto, T. Tezuka, and Y. Shiode, “A new on-machine measurement system to measure wavefront aberration of projection optics with hyper-NA,” Proc. SPIE 6154, 615424, 615424-10 (2006).

[CrossRef]

A. Y. Bourov, L. Li, Z. Yang, F. Wang, and L. Duan, “Aerial image model and application to aberration measurement,” Proc. SPIE 7640, 764032, 764032-8 (2010).

[CrossRef]

J. P. Kirk, “Review of photoresist-based lens evaluation methods,” Proc. SPIE 4000, 2–8 (2000).

[CrossRef]

C. A. Mack, “Lithography simulation in semiconductor manufacturing,” Proc. SPIE 5645, 63–83 (2005).

[CrossRef]

C. A. Mack, “Thirty years of lithography simulation,” Proc. SPIE 5754, 1–12 (2004).

[CrossRef]

L. Duan, J. Cheng, G. Sun, and Y. Chen, “New 0.75 NA ArF scanning lithographic tool,” Proc. SPIE 7973, 79732D (2011).

[CrossRef]

H. Ooki, T. Noda, and K. Matsumoto, “Aberration averaging using point spread function for scanning projection system,” Proc. SPIE 4000, 551–558 (2000).

[CrossRef]

P. Graeupner, R. Garreis, A. Goehnermeiter, T. Heil, M. Lowisch, and D. Flagello, “Impact of wavefront errors on low k1 processes at extreme high NA,” Proc. SPIE 5040, 119–130 (2003).

[CrossRef]

D. G. Flagello, J. Mulkens, and C. Wagner, “Optical lithography into the millennium: sensitivity to aberrations, vibration and polarization,” Proc. SPIE 4000, 172–183 (2000).

[CrossRef]

M. Moers, H. van der Laan, M. Zellenrath, W. de Boeij, N. Beaudry, K. D. Cummings, A. van Zwol, A. Bechtz, and R. Willekersa, “Application of the aberration ring test (ARTEMISTM) to determine lens quality and predict its lithographic performance,” Proc. SPIE 4346, 1379–1387 (2001).

[CrossRef]

KLA-Tencor, Software package Prolith v8.0.3.

M. Born and E. Wolf, Principles of Optics, 7th ed. (Cambridge University Press, 1999).

H. George, Dunteman, Principal Components Analysis (SAGE, Newbury Park, London, 1989).

J. Timothy, Robinson, Box–Behnken Designs. Encyclopedia of Statistics in Quality and Reliability (Wiley, 2008).